JPH0244800B2 - - Google Patents
Info
- Publication number
- JPH0244800B2 JPH0244800B2 JP57166121A JP16612182A JPH0244800B2 JP H0244800 B2 JPH0244800 B2 JP H0244800B2 JP 57166121 A JP57166121 A JP 57166121A JP 16612182 A JP16612182 A JP 16612182A JP H0244800 B2 JPH0244800 B2 JP H0244800B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- tube
- reaction tube
- substrate
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57166121A JPS5954698A (ja) | 1982-09-24 | 1982-09-24 | 単結晶成長装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57166121A JPS5954698A (ja) | 1982-09-24 | 1982-09-24 | 単結晶成長装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5954698A JPS5954698A (ja) | 1984-03-29 |
| JPH0244800B2 true JPH0244800B2 (enExample) | 1990-10-05 |
Family
ID=15825415
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57166121A Granted JPS5954698A (ja) | 1982-09-24 | 1982-09-24 | 単結晶成長装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5954698A (enExample) |
-
1982
- 1982-09-24 JP JP57166121A patent/JPS5954698A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5954698A (ja) | 1984-03-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6134929A (ja) | 半導体結晶成長装置 | |
| JPH0691020B2 (ja) | 気相成長方法および装置 | |
| US5525156A (en) | Apparatus for epitaxially growing a chemical compound crystal | |
| US5463977A (en) | Method of and apparatus for epitaxially growing chemical compound crystal | |
| US4365588A (en) | Fixture for VPE reactor | |
| Lee et al. | MOCVD in inverted stagnation point flow: I. Deposition of GaAs from TMAs and TMGa | |
| US6527857B1 (en) | Method and apparatus for growing a gallium nitride boule | |
| US3235418A (en) | Method for producing crystalline layers of high-boiling substances from the gaseous phase | |
| JPS6136372B2 (enExample) | ||
| JP2528912B2 (ja) | 半導体成長装置 | |
| Lu et al. | Device quality Hg1− x Cd x Te material by low‐temperature precracking metalorganic chemical vapor deposition | |
| JPH02291113A (ja) | 窒化ガリウム系化合物半導体の気相成長装置 | |
| JPH0136691B2 (enExample) | ||
| JPS5954698A (ja) | 単結晶成長装置 | |
| JPH02284417A (ja) | 気相結晶成長装置 | |
| JPS60264399A (ja) | 炭化珪素単結晶の製造方法 | |
| JP2753832B2 (ja) | 第▲iii▼・v族化合物半導体の気相成長法 | |
| JPS5958326A (ja) | 炉内温度測定方法 | |
| JPS63198322A (ja) | 半導体結晶成長装置 | |
| JPS62182196A (ja) | 気相成長装置 | |
| JPS62230693A (ja) | 気相成長装置 | |
| JPH0543388A (ja) | 分子線結晶成長装置 | |
| JPS61284915A (ja) | 薄膜気相成長装置 | |
| JPH0142488B2 (enExample) | ||
| JPH0529637B2 (enExample) |