JPH0244323U - - Google Patents

Info

Publication number
JPH0244323U
JPH0244323U JP12341588U JP12341588U JPH0244323U JP H0244323 U JPH0244323 U JP H0244323U JP 12341588 U JP12341588 U JP 12341588U JP 12341588 U JP12341588 U JP 12341588U JP H0244323 U JPH0244323 U JP H0244323U
Authority
JP
Japan
Prior art keywords
discharge tube
processing apparatus
plasma processing
porous
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12341588U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12341588U priority Critical patent/JPH0244323U/ja
Publication of JPH0244323U publication Critical patent/JPH0244323U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP12341588U 1988-09-22 1988-09-22 Pending JPH0244323U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12341588U JPH0244323U (enrdf_load_stackoverflow) 1988-09-22 1988-09-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12341588U JPH0244323U (enrdf_load_stackoverflow) 1988-09-22 1988-09-22

Publications (1)

Publication Number Publication Date
JPH0244323U true JPH0244323U (enrdf_load_stackoverflow) 1990-03-27

Family

ID=31372248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12341588U Pending JPH0244323U (enrdf_load_stackoverflow) 1988-09-22 1988-09-22

Country Status (1)

Country Link
JP (1) JPH0244323U (enrdf_load_stackoverflow)

Similar Documents

Publication Publication Date Title
KR100219873B1 (ko) 플라즈마 가공을 위한 장치 및 방법
JPH0244323U (enrdf_load_stackoverflow)
KR920005282A (ko) 미세가공 장치 및 방법
JPS5710629A (en) Plasma treatment of hollow body
JPS62129061U (enrdf_load_stackoverflow)
JPS6237055U (enrdf_load_stackoverflow)
JPS62126362U (enrdf_load_stackoverflow)
JPS63100827U (enrdf_load_stackoverflow)
JPS6426374U (enrdf_load_stackoverflow)
JPS61168630U (enrdf_load_stackoverflow)
JPH0323303Y2 (enrdf_load_stackoverflow)
JPS62101859U (enrdf_load_stackoverflow)
JPS61136537U (enrdf_load_stackoverflow)
JPS62107439U (enrdf_load_stackoverflow)
JPH0283017U (enrdf_load_stackoverflow)
JPS5995259U (ja) 液体試料導入装置
JPH0244324U (enrdf_load_stackoverflow)
JPH069490Y2 (ja) 半導体ウエハのプラズマアツシング装置
JPH024237U (enrdf_load_stackoverflow)
JPH01154630U (enrdf_load_stackoverflow)
JPH0295234U (enrdf_load_stackoverflow)
JPH0267637U (enrdf_load_stackoverflow)
JPS62191868U (enrdf_load_stackoverflow)
JPH0171438U (enrdf_load_stackoverflow)
JPH0425230U (enrdf_load_stackoverflow)