JPH0238943Y2 - - Google Patents
Info
- Publication number
- JPH0238943Y2 JPH0238943Y2 JP13712484U JP13712484U JPH0238943Y2 JP H0238943 Y2 JPH0238943 Y2 JP H0238943Y2 JP 13712484 U JP13712484 U JP 13712484U JP 13712484 U JP13712484 U JP 13712484U JP H0238943 Y2 JPH0238943 Y2 JP H0238943Y2
- Authority
- JP
- Japan
- Prior art keywords
- exhaust pipe
- reaction tube
- tube
- actuator
- guide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001947 vapour-phase growth Methods 0.000 claims description 11
- 239000007789 gas Substances 0.000 description 19
- 235000012431 wafers Nutrition 0.000 description 9
- 238000002791 soaking Methods 0.000 description 8
- 239000012495 reaction gas Substances 0.000 description 5
- 238000010926 purge Methods 0.000 description 4
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13712484U JPH0238943Y2 (enrdf_load_html_response) | 1984-09-10 | 1984-09-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13712484U JPH0238943Y2 (enrdf_load_html_response) | 1984-09-10 | 1984-09-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6155074U JPS6155074U (enrdf_load_html_response) | 1986-04-14 |
| JPH0238943Y2 true JPH0238943Y2 (enrdf_load_html_response) | 1990-10-19 |
Family
ID=30695541
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13712484U Expired JPH0238943Y2 (enrdf_load_html_response) | 1984-09-10 | 1984-09-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0238943Y2 (enrdf_load_html_response) |
-
1984
- 1984-09-10 JP JP13712484U patent/JPH0238943Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6155074U (enrdf_load_html_response) | 1986-04-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6225602B1 (en) | Vertical furnace for the treatment of semiconductor substrates | |
| US4989543A (en) | Process and means for producing films for use in electronics and/or optoelectronics using plasma | |
| KR100280689B1 (ko) | 열처리 장치 | |
| JPS6097622A (ja) | エピタキシヤル装置 | |
| JPH06117558A (ja) | 単結晶引上装置におけるアイソレーションバルブ | |
| US5833754A (en) | Deposition apparatus for growing a material with reduced hazard | |
| JPH0238943Y2 (enrdf_load_html_response) | ||
| KR19990029904A (ko) | 진공 처리 장치 | |
| WO2024234562A1 (zh) | 外延用动密封沉积装置 | |
| US4976610A (en) | Purge cantilevered wafer loading system for LP CVD processes | |
| KR20050118245A (ko) | 유황회수 장치를 위한 밀폐형 관찰 요소 | |
| JP4519227B2 (ja) | 雰囲気制御された加工品加熱チャンバ | |
| US5354198A (en) | Movable cantilevered purge system | |
| JP7623085B2 (ja) | フランジ構造及びこれを用いた真空排気システム | |
| JP3749471B2 (ja) | 高純度シリコン製造用反応炉及び高純度シリコン製造方法 | |
| JPH0261078A (ja) | 平行平板型プラズマエッチング装置 | |
| JPS5926119A (ja) | フイルタ−装置 | |
| CN218939640U (zh) | 半导体处理设备及其托盘旋转驱动机构 | |
| JP2865271B2 (ja) | 薄膜光電変換素子の製造装置 | |
| CN219350194U (zh) | 半导体处理设备及其晶圆托盘组件 | |
| KR102474033B1 (ko) | 반도체설비용 배관 불소수지층 성형장치 | |
| CN214044575U (zh) | 一种密封式配电箱 | |
| JPS6339961Y2 (enrdf_load_html_response) | ||
| CN221759978U (zh) | 一种钻石生成专机 | |
| CN120497179A (zh) | 一种反应腔室结构及半导体器件的加工设备 |