JPH023780B2 - - Google Patents
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- Publication number
- JPH023780B2 JPH023780B2 JP62247738A JP24773887A JPH023780B2 JP H023780 B2 JPH023780 B2 JP H023780B2 JP 62247738 A JP62247738 A JP 62247738A JP 24773887 A JP24773887 A JP 24773887A JP H023780 B2 JPH023780 B2 JP H023780B2
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- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- formula
- acid
- compound according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 150000001875 compounds Chemical class 0.000 claims description 75
- 125000004432 carbon atom Chemical group C* 0.000 claims description 36
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 23
- 125000000217 alkyl group Chemical group 0.000 claims description 20
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 5
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 5
- 125000000623 heterocyclic group Chemical group 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical group C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 claims description 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 2
- ZVJHJDDKYZXRJI-UHFFFAOYSA-N pyrroline Chemical group C1CC=NC1 ZVJHJDDKYZXRJI-UHFFFAOYSA-N 0.000 claims description 2
- IEHREUXTRWNOAP-UHFFFAOYSA-N 4-(4-piperidin-1-yl-2-pyrrolidin-1-yl-1H-pyrrol-3-yl)morpholine Chemical group C1CCCN1C1=C(N2CCOCC2)C(N2CCCCC2)=CN1 IEHREUXTRWNOAP-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 description 37
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 30
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 27
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 239000002253 acid Substances 0.000 description 15
- 239000000243 solution Substances 0.000 description 13
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- -1 Amino ester Chemical class 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 239000002244 precipitate Substances 0.000 description 9
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 8
- 239000012074 organic phase Substances 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 239000011541 reaction mixture Substances 0.000 description 8
- 239000012429 reaction media Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 6
- YMRXWPCWJDWPCO-UHFFFAOYSA-N 4-[[3-(trifluoromethyl)phenyl]sulfonylamino]butanoic acid Chemical compound OC(=O)CCCNS(=O)(=O)C1=CC=CC(C(F)(F)F)=C1 YMRXWPCWJDWPCO-UHFFFAOYSA-N 0.000 description 5
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 5
- 150000001413 amino acids Chemical class 0.000 description 5
- 239000008346 aqueous phase Substances 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 150000002148 esters Chemical group 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 238000003760 magnetic stirring Methods 0.000 description 5
- 235000011121 sodium hydroxide Nutrition 0.000 description 5
- 229910052938 sodium sulfate Inorganic materials 0.000 description 5
- 235000011152 sodium sulphate Nutrition 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- BTCSSZJGUNDROE-UHFFFAOYSA-N gamma-aminobutyric acid Chemical compound NCCCC(O)=O BTCSSZJGUNDROE-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 4
- 239000002168 alkylating agent Substances 0.000 description 3
- 229940100198 alkylating agent Drugs 0.000 description 3
- 150000001412 amines Chemical group 0.000 description 3
- 150000001555 benzenes Chemical class 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 description 3
- 125000000587 piperidin-1-yl group Chemical group [H]C1([H])N(*)C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 3
- 125000002112 pyrrolidino group Chemical group [*]N1C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 3
- 125000000168 pyrrolyl group Chemical group 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- HPYNZHMRTTWQTB-UHFFFAOYSA-N 2,3-dimethylpyridine Chemical compound CC1=CC=CN=C1C HPYNZHMRTTWQTB-UHFFFAOYSA-N 0.000 description 2
- ZIZGWNOAHUCACM-UHFFFAOYSA-N 2-(trifluoromethyl)benzenesulfonyl chloride Chemical compound FC(F)(F)C1=CC=CC=C1S(Cl)(=O)=O ZIZGWNOAHUCACM-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 125000001422 pyrrolinyl group Chemical group 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- YOETUEMZNOLGDB-UHFFFAOYSA-N 2-methylpropyl carbonochloridate Chemical compound CC(C)COC(Cl)=O YOETUEMZNOLGDB-UHFFFAOYSA-N 0.000 description 1
- ONCAZCNPWWQQMW-UHFFFAOYSA-N 3-(trifluoromethyl)benzenesulfonyl chloride Chemical compound FC(F)(F)C1=CC=CC(S(Cl)(=O)=O)=C1 ONCAZCNPWWQQMW-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- ZEFMBAFMCSYJOO-UHFFFAOYSA-N 4-nitro-3-(trifluoromethyl)phenol Chemical compound OC1=CC=C([N+]([O-])=O)C(C(F)(F)F)=C1 ZEFMBAFMCSYJOO-UHFFFAOYSA-N 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 150000001351 alkyl iodides Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 125000004421 aryl sulphonamide group Chemical group 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 1
- 229940008406 diethyl sulfate Drugs 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 229960003692 gamma aminobutyric acid Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000011987 methylation Effects 0.000 description 1
- 238000007069 methylation reaction Methods 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000006296 sulfonyl amino group Chemical group [H]N(*)S(*)(=O)=O 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
- C07D295/18—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carboxylic acids, or sulfur or nitrogen analogues thereof
- C07D295/182—Radicals derived from carboxylic acids
- C07D295/185—Radicals derived from carboxylic acids from aliphatic carboxylic acids
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
- A61P3/00—Drugs for disorders of the metabolism
- A61P3/06—Antihyperlipidemics
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
- A61P9/00—Drugs for disorders of the cardiovascular system
- A61P9/10—Drugs for disorders of the cardiovascular system for treating ischaemic or atherosclerotic diseases, e.g. antianginal drugs, coronary vasodilators, drugs for myocardial infarction, retinopathy, cerebrovascula insufficiency, renal arteriosclerosis
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D213/62—Oxygen or sulfur atoms
- C07D213/70—Sulfur atoms
- C07D213/71—Sulfur atoms to which a second hetero atom is attached
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D333/30—Hetero atoms other than halogen
- C07D333/34—Sulfur atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Bioinformatics & Cheminformatics (AREA)
- Veterinary Medicine (AREA)
- General Health & Medical Sciences (AREA)
- Public Health (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Pharmacology & Pharmacy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Animal Behavior & Ethology (AREA)
- Hematology (AREA)
- Obesity (AREA)
- Diabetes (AREA)
- Urology & Nephrology (AREA)
- Vascular Medicine (AREA)
- Cardiology (AREA)
- Heart & Thoracic Surgery (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Pyridine Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
Description
本発明は、脂質調節作用を有し、アリールスル
ホンアミド型の基本構造を持つ化合物またはこれ
ら化合物の生理学的に許容される塩に係る。
また本発明は上記化合物およびその塩の製造方
法にも係る。
本発明の化合物は、一般式
で示されることを特徴とする。
該式中、
− R1とR2は互に同一であるかもしくは異なり、
水素原子、ハロゲン原子、NO2基、NH2基、
CF3基、炭素原子を1〜6個、好ましくは1〜
4個有するアルキル基、炭素原子を1〜6個、
好ましくは1〜4個有するアルコキシ基を表わ
し、
− n+m+1は3〜11であり、好ましくは3,
5または10に等しく、
− R5とR6はそれぞれ独立しており、水素原子、
1〜6個、好ましくは1〜4個の炭素原子を有
するアルキル基、または7〜9個の炭素原子を
有するアルコキシ基を表わし、
− R4は、ヒドロキシ基、または 基OR7[ただ
し、R7は1〜6個、好ましくは1〜4個の炭
素原子を有するアルキル基]、または
The present invention relates to compounds having a lipid-regulating action and having a basic structure of the arylsulfonamide type, or physiologically acceptable salts of these compounds. The present invention also relates to a method for producing the above-mentioned compound and its salt. The compounds of the present invention have the general formula It is characterized by the following. In the formula, - R 1 and R 2 are the same or different,
Hydrogen atom, halogen atom, NO 2 group, NH 2 group,
CF3 group, 1 to 6 carbon atoms, preferably 1 to 6 carbon atoms
an alkyl group having 4, 1 to 6 carbon atoms;
preferably represents an alkoxy group having 1 to 4, -n+m+1 is 3 to 11, preferably 3,
equal to 5 or 10, − R 5 and R 6 are each independent, a hydrogen atom,
represents an alkyl group having 1 to 6 carbon atoms, preferably 1 to 4 carbon atoms, or an alkoxy group having 7 to 9 carbon atoms, -R 4 is a hydroxy group, or a group OR 7 [wherein R 7 is an alkyl group having 1 to 6 carbon atoms, preferably 1 to 4 carbon atoms], or
【式】
基[ただし、R8とR9は同一であるかまたは異
なり、水素原子、または1〜6個、好ましくは
1〜4個の炭素原子を有するアルキル基を表わ
すか、あるいはR8とR9がこれらが結合してい
る窒素原子と共に5または6員の含窒素複素環
基、特にピペリジノ基、モルホリノ基、ピロリ
ジノ基、ピロール基またはピロリン基を形成す
る]
を表わす。
本発明の好ましい1群の化合物は、一般式
()でR6が水素原子を表わす化合物である。こ
のような化合物は次の一般式
で示される。
該式中、n+m+1は3〜11であり、好ましく
は3,5または10に等しく、
− R5は水素、炭素原子を1〜6個、好ましく
は1〜4個有するアルキル基、または炭素原子
を7〜9個有するアラルキルを表わし、
− R4は、ヒドロキシ基、
基OR7[ただし、R7は炭素原子を1〜6個、
好ましくは1〜4個有するアルキル基]、また
は基[Formula] Group [provided that R 8 and R 9 are the same or different and represent a hydrogen atom or an alkyl group having 1 to 6, preferably 1 to 4 carbon atoms, or R 8 and R 9 together with the nitrogen atom to which they are bonded form a 5- or 6-membered nitrogen-containing heterocyclic group, particularly a piperidino group, a morpholino group, a pyrrolidino group, a pyrrole group or a pyrroline group. A preferred group of compounds of the present invention are compounds in the general formula () in which R 6 represents a hydrogen atom. Such compounds have the general formula It is indicated by. where n+m+1 is from 3 to 11, preferably equal to 3, 5 or 10, - R 5 is hydrogen, an alkyl group having 1 to 6 carbon atoms, preferably 1 to 4 carbon atoms, or represents an aralkyl group having 7 to 9 carbon atoms, -R 4 is a hydroxy group, OR 7 [wherein R 7 is a hydroxy group,
preferably an alkyl group having 1 to 4], or a group
【式】[ただし、R8とR9は同一である
かまたは互に異なり、水素原子、1〜6個、好
ましくは1〜4個の炭素原子を有するアルキル
基を表わすか、あるいはR8とR9がこれらが結
合している窒素と共に5または6員の含窒素複
素環基、特にピペリジノ基、モルホリノ基、ピ
ロリジノ基、ピロール基またはピロリン基を形
成する]を表わす。
本発明の化合物の中で別の好ましいグループの
化合物は、式()中のR5が水素を表わす化合
物である。
このような化合物は、次式()
で示される。
以上のグループの中でさらに好ましい化合物は
次式()
で示される化合物である。
本発明の好ましい化合物は、式()中のR1
とR2がどちらも水素原子を表わすかまたはいず
れも水素とは異なり、ハロゲン原子、NO2基、
NH2基、CF3基、1〜6個、好ましくは1〜4個
の炭素原子を有するアルキル基、および1〜6
個、好ましくは1〜4個の炭素原子を有するアル
コキシ基から選択された化合物である。
R1およびR2が2つとも水素ではない場合の式
()および()で示される化合物のうち好ま
しい化合物は、R6が水素である化合物である。
このグループの中で好ましい化合物は、R1と
R2がNO2,NH2,OCH3,CH3,CF3、およびハ
ロゲン原子、特に塩素から選択され、ベンゼン核
が3個の基によつて置換された場合の式()で
示される化合物である。
前記グループの化合物の中で別の好ましい1群
は、式()中のR1が水素原子を表わし、R2が
ハロゲン原子、NO2基、NH2基、CF3基、1〜6
個、好ましくは1〜4個の炭素原子を有するアル
キル基、1〜6個、好ましくは1〜4個の炭素原
子を有するアルコキシ基を表わす化合物である。
このような化合物は、その芳香核が2個の置換
基を有しており、次式()
[式中、R2,R4およびR6は前記定義に従う]
で示されるグループを形成する。
該グループ中の好ましい化合物は、式
[式中、n+m+1は3〜11であり、好ましく
は3,5または10に等しく、R2とR4は前記定義
に従う]で示される化合物である。
このグループ中の好ましい化合物は、ベンゼン
核がNO2,NH2,OCH3,CF3,CH3およびハロ
ゲン特に塩素より選択された1つの基とCF3とで
置換されている化合物である。
前記グループの化合物中で別の好ましい1群
は、式()中のR1とR2が双方共水素原子を表
わす化合物である。
このような化合物はその芳香核がモノ置換され
ており、次式()
で示されるグループを形成する。
該グループの中で本発明による好ましい化合物
は、R6が水素原子を表わす化合物で構成される。
これらの化合物は次式()
で示される。
本発明の別の好ましいグループの化合物は、前
記グループの化合物のうちでCF3置換基をベンゼ
ン核のメタ位に有する化合物である。
本発明による別の好ましい化合物は、ベンゼン
核がメタ位でCF3基によりモノ置換されている1
群の化合物である。
このグループの化合物は次式()
で示される。
該式()中、
R4は−ヒドロキシ基、
− 基OR7[ただし、R7は炭素原子を1〜6個有
するアルキル基、好ましくは基C2H5]、[Formula] [However, R 8 and R 9 are the same or different from each other and represent a hydrogen atom, an alkyl group having 1 to 6, preferably 1 to 4 carbon atoms, or R 8 and R 9 together with the nitrogen to which they are bonded form a 5- or 6-membered nitrogen-containing heterocyclic group, particularly a piperidino group, a morpholino group, a pyrrolidino group, a pyrrole group or a pyrroline group. Another preferred group of compounds of the invention are compounds in which R 5 in formula () represents hydrogen. Such a compound has the following formula () It is indicated by. A more preferable compound among the above groups is the following formula () This is a compound represented by Preferred compounds of the present invention are R 1 in formula ()
and R 2 both represent hydrogen atoms or are different from hydrogen, halogen atom, NO 2 group,
NH2 groups, CF3 groups, alkyl groups having 1 to 6, preferably 1 to 4 carbon atoms, and 1 to 6
, preferably 1 to 4 carbon atoms. Among the compounds represented by formulas () and () when both R 1 and R 2 are not hydrogen, preferred compounds are compounds in which R 6 is hydrogen. Preferred compounds within this group are R 1 and
Compounds of formula () when R 2 is selected from NO 2 , NH 2 , OCH 3 , CH 3 , CF 3 and halogen atoms, especially chlorine, and the benzene nucleus is replaced by three groups It is. Another preferable group of compounds in the above group is one in which R 1 in formula () represents a hydrogen atom, and R 2 represents a halogen atom, NO 2 group, NH 2 group, CF 3 group, 1 to 6
, preferably 1 to 4 carbon atoms, and an alkoxy group having 1 to 6, preferably 1 to 4 carbon atoms. Such a compound has two substituents on its aromatic nucleus, and has the following formula () [In the formula, R 2 , R 4 and R 6 follow the above definition]
Form a group indicated by . Preferred compounds in said group are of the formula [wherein n+m+1 is 3 to 11, preferably equal to 3, 5 or 10, and R2 and R4 are as defined above]. Preferred compounds in this group are those in which the benzene nucleus is substituted with CF 3 and one group selected from NO 2 , NH 2 , OCH 3 , CF 3 , CH 3 and halogens, especially chlorine. Another preferred group of compounds in the above group is compounds in which R 1 and R 2 in formula () both represent hydrogen atoms. Such compounds have monosubstituted aromatic nuclei, and have the following formula () Form a group indicated by . Preferred compounds according to the invention within this group are comprised of compounds in which R 6 represents a hydrogen atom.
These compounds have the following formula () It is indicated by. Another preferred group of compounds of the invention are those having a CF 3 substituent in the meta position of the benzene nucleus among the compounds of said group. Another preferred compound according to the invention is 1 in which the benzene nucleus is monosubstituted in the meta position by a CF3 group.
It is a group of compounds. This group of compounds has the following formula () It is indicated by. In the formula (), R 4 is a -hydroxy group, - group OR 7 [However, R 7 is an alkyl group having 1 to 6 carbon atoms, preferably a group C 2 H 5 ],
【式】[ただし、R8とR9は同一であ
るかまたは互いに異なり、水素原子、1〜6
個、好ましくは1〜4個の炭素原子を有するア
ルキル基を表わすか、あるいはR8とR9とが窒
素と共に5または6員の含窒素複素環基、特
に、ピペリジノ基、モルホリノ基、ピロリジノ
基、ピロール基もしくはピロリン基を形成す
る]を表わし、
− n+m+1が3〜11であり、好ましくは3,
5または10に等しい。
このグループの中で、更に好ましい本発明の化
合物は、R6が水素原子である化合物である。
このような化合物は次式()
で示される。
本発明による好ましい化合物では、nの値が
3,5または10であると有利である。
本発明の別の好ましい化合物では、R4がヒド
ロキシ基またはOC2H5基を表わすと有利である。
本発明は更に、式()で示される化合物の光
学異性体とこれら異性体の生理学上許容され得る
塩類にも係る。
本発明による特に好ましい化合物は以下の式で
示される。
本発明による化合物の合成
以下、本発明による化合物の合成について説明
する。
プロセスA:
式
[式中、
− R4は基OR7(R7は炭素原子を1〜6個有する
アルキル基)を表わし、
− R1,R2,R5およびR6は前述の定義に従う]
で示される化合物の第一の製法(プロセスA)
では、ハロゲン化物、特に式
で示される適当な酸塩化物を、式
で示されるアミノエステル、または式
で示される該アミノエステルの塩酸塩と、
次式
に従つて反応させる。
上記式中、R1,R2,n,m,R5,R6およびR7
はいずれも前述の意味を表わす。
該製法を実施する場合は次の手順に従うと有利
である。
アミノエステルまたはその塩酸塩(2×10-2モ
ル)を無水ベンゼン(50cm3)中、0〜5℃の温度
で激しく撹拌した後、トリエチルアミン(または
第三アミンタイプの他の有機塩基)を15〜20cm3加
え、5〜10分後、酸塩化物(2×10-2モル)を、
それが固体であれば少量ずつ、液体であれば一滴
ずつ添加する。トリエチルアミンは過剰に加え
る。なぜならばこれは、アミノ酸塩酸塩を必要に
応じて対応する塩基の形態に中和し得るものであ
り、且つまた、いずれの場合にも、酸塩化物とア
ミノエステルとの縮合反応の結果生ずる塩酸を中
和し得るものであるからである。反応媒質を徐々
に室温に戻し、12時間後、形成されたトリエチル
アミン塩酸塩の結晶を過しベンゼンで洗う。有
機相を濃縮し、その後酢酸エチル(200cm3)中に
入れる。得られた溶液を希塩酸溶液および薄い重
炭酸ナトリウム溶液で順次洗浄した後乾燥し、溶
媒を蒸発させる。
このようにして得られた残留物は、必要であれ
ばクロマトグラフイー操作にかける。
前記酸塩化物は市販されているが、入手不可能
な場合は従来の方法で合成することもできる。
プロセスA:
式
で示される化合物の第2の製法(プロセスA)
は、酸ハロゲン化物、特に適当な式
の酸塩化物を出発材料とし、これを式
で示されるアミノ酸と、次式
に従つて反応させ、次に、得られた酸を更に式
R7OHで示される適当なアルコール類と、次式
に従つて反応させることによりエステル化する方
法である。
前記式中、R1,R2,n,m,R5,R6およびR7
は前述の定義に従う。
該第2の製法は以下の手順で実施される。
先ず次の方法により酸を調製する。アミノ酸
(40mM)を、無水ピリジンまたは無水、2,6
−ジメチルピリジンの如き無水有機塩基(15cm3)
中に懸濁または溶解する。次に酸塩化物
(10mM)を少量ずつまたは一滴ずつ加える。添
加の間反応混合物を激しく撹拌し、20℃以下の温
度に維持する。次いでこれを40℃で1時間加熱
し、室温で12時間撹拌する。減圧下で濃縮するこ
とによりピリジンを除去する。希塩酸の如き希酸
の冷溶液を添加してPHを3より小さくする。生成
物が沈澱する場合はこれを過し、水で洗浄した
後低級アルコール(エタノールまたはメタノー
ル)中に溶解する。必要があれば活性炭で脱色
し、最後にクロマトグラフイー操作を行う。生成
物が沈澱しない場合は酢酸エチル(または同一の
極性を有する他のいずれかの有機溶媒)を用いて
媒質より抽出する。該抽出相を硫酸ナトリウムで
乾燥し、必要であれば活性炭で脱色し、減圧下で
濃縮した後クロマトグラフイー操作を行う。
該実施方法の変形として、カセイソーダ水中に
溶解しているアミノ酸に酸塩化物のエーテル溶液
を注ぐ方法もある(MAC CHESMY,SWAM,
J.A.C.S.,59,1116参照)。
エステル化は次の如く実施される。
30cm3の無水アルコール中に前記の酸(2×10-2
モル)を溶解する。次に過塩素酸(1.5cm3)を加
える。得られた混合物を出発物質が消失してエス
テルが生成するまで50℃に加熱する。
プロセスA:
式
で示される化合物の第3の製法(プロセスA)
では、式
で示される適当な酸を出発材料とし、これを式
で示される適当なアミノエステルと、次の反応式
に従つて反応させる。
前記の式において、R1,R2,n,m,R5,R6
およびR7は前述の定義に従う。
このプロセスは以下の手順で実施される。
最小値のジメチルホルムアミド(DMF)また
はヘキサメチルホスホリルアミド(HMPA)中
に溶解した酸溶液(10-2モル)を磁気で撹拌しな
がら−15℃に冷却する。次いで、アルキル部に1
〜4個の炭素原子を有しアミン部が第三アミンに
由来するN−アルキルアミン例えばN−メチルモ
ルホリン(1.1cm3=10-2モル)と、アルキルクロ
ロホルメート(アルキル部に1〜4個の炭素原子
を有するもの)例えばイソブチルクロロホルメー
ト(1.3cm3)とを前記溶液に順次添加する。5分
後、この媒質に最小量のDMF中のアミノエステ
ル(10-2モル)を注ぐ。アミノエステル塩酸塩の
場合はN−メチルモルホリン(1.1cm3=10-2モル)
で中和するとよい。4時間後、該反応混合物を0
℃の重炭酸ナトリウムまたは重炭酸カリウムの稀
薄溶液に注ぐ。生成物が沈澱する場合は結晶を水
で洗浄し、酢酸エチル中に溶解した後、有機相を
塩酸の如き希酸で洗浄してPHを3より小さくす
る。溶液を硫酸ナトリウムで乾燥した後、溶媒を
蒸発させ、残留物をクロマトグラフイーにかけ
る。
プロセスB:
式
[式中、R4はヒドロキシ基を表わす]
で示される化合物の第1の製法(プロセスB)
では、前述の式
で示される化合物の第2の製法(プロセスA)
の場合と同様に、式
で示される適当な酸塩化物を、式
で示される適当なアミノ酸と、次の反応式
に従つて反応させる。
次の実施例は全般的に前述のプロセスに従う化
合物の製法を説明するものである。
実施例
4−(3−トリフルオロメチルベンゼンスルホ
ニルアミノ)酪酸の製造
ω−アミノ酪酸(5×10-2モル=5.15g)をピ
リジン(100cm3)に加え、磁気撹拌しながら水浴
で約20℃に維持し、これに、トリフルオロメチル
ベンゼンスルホニルクロリド(2×10-2モル=
4.89g)を少量ずつ添加した。
次いで該反応混合物を40℃に1時間加熱した。
溶媒を蒸発させ、得られた残留物を3%塩酸
(200cm3)で洗浄し、酢酸エチルで抽出した(先ず
400cm3使用して抽出し、その後、100cm3ずつ使用し
て2回抽出した)。有機相をまとめ、硫酸ナトリ
ウムで乾燥した後減圧下で濃縮した。生成物をメ
タノール中に溶解し、活性炭で脱色し、濃縮した
後、溶離液としてトルエン/酢酸エチル/酢酸
(80:20:2)を使用してシリカH上でクロマト
グラフ操作を行つた。
4−(3−トリフルオロメチルベンゼンスルホ
ニルアミノ)酪酸を含む画分を濃縮し、この化合
物を水/エタノール混合物中から再晶出させた
(収率41%)。
実施例
4−(3−トリフルオロメチルベンゼンスルホ
ニルアミノ)−酪酸の製造
ω−アミノ酪酸(5×10-2モル=5.15g)をピ
リジン(100cm3)に加え磁気撹拌しながら水浴で
約20℃に維持し、これにトリフルオロメチルベン
ゼンスルホニルクロリド(2×10-2モル=4.89
g)を一滴ずつ添加した。
次いで該反応混合物を40℃に1時間加熱した。
溶媒を蒸発させ、残留物を水100cm3中に集め、得
られた溶液に2N塩酸を加えてPHの値を2.3にし
た。
沈澱物を遠心分離機にかけ、乾燥した後ベンゼ
ン中で再晶出させた(収率42%)。
このプロセスによる生成された化合物をそれぞ
れ表と表′に示す。[Formula] [However, R 8 and R 9 are the same or different from each other, hydrogen atoms, 1 to 6
, preferably 1 to 4 carbon atoms, or R 8 and R 9 together with nitrogen represent a 5- or 6-membered nitrogen-containing heterocyclic group, in particular a piperidino group, a morpholino group, or a pyrrolidino group. , forming a pyrrole group or a pyrroline group], - n+m+1 is 3 to 11, preferably 3,
Equal to 5 or 10. More preferred compounds of the invention within this group are those in which R 6 is a hydrogen atom. Such a compound has the following formula () It is indicated by. In preferred compounds according to the invention, the value of n is advantageously 3, 5 or 10. In other preferred compounds of the invention, R 4 advantageously represents a hydroxy group or an OC 2 H 5 group. The invention further relates to optical isomers of the compounds of formula () and physiologically acceptable salts of these isomers. A particularly preferred compound according to the invention is represented by the formula below. Synthesis of the compound according to the present invention The synthesis of the compound according to the present invention will be explained below. Process A: Eq. [In the formula, - R 4 represents a group OR 7 (R 7 is an alkyl group having 1 to 6 carbon atoms), and - R 1 , R 2 , R 5 and R 6 follow the above definition] First manufacturing method of compound (process A)
So, halides, especially the formula A suitable acid chloride of the formula Amino ester of the formula or The hydrochloride of the amino ester represented by the following formula: React according to. In the above formula, R 1 , R 2 , n, m, R 5 , R 6 and R 7
have the above meanings. When carrying out the process it is advantageous to follow the following procedure. After vigorous stirring of the amino ester or its hydrochloride (2×10 −2 mol) in anhydrous benzene (50 cm 3 ) at a temperature of 0 to 5° C., triethylamine (or other organic base of the tertiary amine type) was added to 15 Add ~20 cm 3 and after 5-10 minutes, add acid chloride (2 x 10 -2 mol),
If it is a solid, add it little by little, if it is a liquid, add it drop by drop. Add triethylamine in excess. This is because it is possible to neutralize the amino acid hydrochloride to the corresponding base form if necessary, and in each case also to the hydrochloric acid resulting from the condensation reaction of the acid chloride with the amino ester. This is because it can neutralize the The reaction medium is gradually brought to room temperature and after 12 hours the triethylamine hydrochloride crystals formed are filtered and washed with benzene. The organic phase is concentrated and then taken up in ethyl acetate (200 cm 3 ). The solution obtained is washed successively with dilute hydrochloric acid solution and dilute sodium bicarbonate solution and then dried and the solvent is evaporated. The residue thus obtained is, if necessary, subjected to chromatographic operations. The acid chlorides are commercially available, but if not available, they can be synthesized by conventional methods. Process A: Eq. Second manufacturing method (process A) of the compound represented by
is an acid halide, especially suitable formula Starting material is acid chloride, which is given by the formula The amino acid represented by and the following formula The resulting acid is then further reacted according to the formula
A suitable alcohol represented by R 7 OH and the following formula This is a method of esterification by reacting according to the following. In the above formula, R 1 , R 2 , n, m, R 5 , R 6 and R 7
follows the above definition. The second manufacturing method is carried out in the following steps. First, an acid is prepared by the following method. Amino acids (40mM) were added to anhydrous pyridine or anhydrous, 2,6
- Anhydrous organic base such as dimethylpyridine (15 cm 3 )
suspend or dissolve in Acid chloride (10mM) is then added in small portions or dropwise. The reaction mixture is stirred vigorously during the addition and maintained at a temperature below 20°C. This is then heated at 40° C. for 1 hour and stirred at room temperature for 12 hours. Pyridine is removed by concentrating under reduced pressure. A cold solution of dilute acid, such as dilute hydrochloric acid, is added to bring the pH below 3. If the product precipitates, it is filtered, washed with water and then dissolved in lower alcohol (ethanol or methanol). If necessary, decolorize with activated carbon and finally perform chromatography. If the product does not precipitate, it is extracted from the medium using ethyl acetate (or any other organic solvent with the same polarity). The extracted phase is dried over sodium sulfate, decolorized if necessary with activated carbon, concentrated under reduced pressure, and then subjected to chromatography. A variation of this method is to pour an ethereal solution of acid chloride onto an amino acid dissolved in caustic soda water (MAC CHESMY, SWAM,
JACS, 59 , 1116). Esterification is carried out as follows. The above acid (2 x 10 -2
mole). Then add perchloric acid (1.5 cm 3 ). The resulting mixture is heated to 50° C. until the starting material disappears and the ester forms. Process A: Eq. Third manufacturing method (process A) of the compound shown by
Now, the formula Starting material is an appropriate acid represented by the formula A suitable amino ester shown by and the following reaction formula React according to. In the above formula, R 1 , R 2 , n, m, R 5 , R 6
and R 7 follow the above definitions. This process is carried out in the following steps. A solution of the acid (10 −2 mol) dissolved in a minimum of dimethylformamide (DMF) or hexamethylphosphorylamide (HMPA) is cooled to −15° C. with magnetic stirring. Next, 1 on the alkyl part
N-alkylamines having ~4 carbon atoms and in which the amine moiety is derived from a tertiary amine, such as N-methylmorpholine (1.1 cm 3 =10 -2 mol) and alkyl chloroformates (with 1 to 4 carbon atoms in the alkyl moiety). carbon atoms), for example isobutyl chloroformate (1.3 cm 3 ), are sequentially added to the solution. After 5 minutes, a minimum amount of the amino ester in DMF (10 -2 mol) is poured into this medium. For amino ester hydrochloride, N-methylmorpholine (1.1 cm 3 = 10 -2 mol)
It is best to neutralize it with After 4 hours, the reaction mixture was reduced to 0.
Pour into a dilute solution of sodium bicarbonate or potassium bicarbonate at °C. If the product precipitates, the crystals are washed with water, dissolved in ethyl acetate, and the organic phase is washed with a dilute acid such as hydrochloric acid to bring the pH below 3. After drying the solution over sodium sulfate, the solvent is evaporated and the residue is chromatographed. Process B: Eq. [In the formula, R 4 represents a hydroxy group] A first method for producing a compound represented by (Process B)
Now, the above formula Second manufacturing method (process A) of the compound represented by
As in the case of the expression A suitable acid chloride of the formula An appropriate amino acid shown in and the following reaction formula React according to. The following examples generally illustrate the preparation of compounds according to the process described above. Example 4 Preparation of 4-(3-trifluoromethylbenzenesulfonylamino)butyric acid Omega-aminobutyric acid (5 x 10 -2 moles = 5.15 g) was added to pyridine (100 cm 3 ) maintained at about 20°C in a water bath with magnetic stirring, and to this was added trifluoromethylbenzenesulfonyl chloride (2 x 10 -2 moles =
4.89g) was added little by little. The reaction mixture was then heated to 40°C for 1 hour.
The solvent was evaporated and the resulting residue was washed with 3% hydrochloric acid (200 cm 3 ) and extracted with ethyl acetate (first
(extracted using 400 cm 3 and then twice using 100 cm 3 each). The organic phases were combined, dried over sodium sulfate, and concentrated under reduced pressure. The product was dissolved in methanol, decolorized with activated charcoal, concentrated and chromatographed on silica H using toluene/ethyl acetate/acetic acid (80:20:2) as eluent. The fraction containing 4-(3-trifluoromethylbenzenesulfonylamino)butyric acid was concentrated, and this compound was recrystallized from a water/ethanol mixture (41% yield). Example 4 Preparation of 4-(3-trifluoromethylbenzenesulfonylamino)-butyric acid ω-Aminobutyric acid (5 x 10 -2 mol = 5.15 g) was added to pyridine (100 cm 3 ) and maintained at about 20°C in a water bath with magnetic stirring, and trifluoromethylbenzenesulfonyl chloride (2 x 10 -2 Mol = 4.89
g) was added dropwise. The reaction mixture was then heated to 40°C for 1 hour.
The solvent was evaporated, the residue was collected in 100 cm 3 of water, and 2N hydrochloric acid was added to the resulting solution to a pH value of 2.3. The precipitate was centrifuged, dried and recrystallized in benzene (42% yield). The compounds produced by this process are shown in Table and Table ', respectively.
【表】【table】
【表】
実施例で説明したプロセスの変形として、酸
塩化物を、これに対して不活性であり且つ水に対
して非混和性である有機溶媒、例えばクロロホル
ム、ジオキサン、ベンゼン、トルエン、好ましく
はエーテルに溶解して得た溶液を、水酸化ナトリ
ウム水溶液又は水酸化カリウム水溶液の如き水溶
液中のアミノ酸に注ぐ方法もある(MAC
CHESMY,SWAM,JACS,59,1116参照)。
次の実施例でこの製法を説明する。
実施例
化合物n゜1038の製造
Nソーダ30cm3中の4−アミノ酪酸1.545g
(0.015モル)に、30cm3のエチルエーテルに3.7g
(0.015モル)の3−トリフルオロメチルベンゼン
スルホニルクロリドを溶解して生成した溶液を一
滴ずつ、激しく撹拌しながら加えた。
4時間撹拌した後、有機相を除去し、2N塩酸
で水相のPHを3にした。形成された沈澱物の水を
切り、Cl-イオンが消滅するまで水で洗浄した後
乾燥した。
このプロセスに従い生成された化合物を表と
表′にそれぞれ記載する。Table: As a variant of the process described in the examples, the acid chloride can be removed in an organic solvent which is inert towards it and immiscible with water, such as chloroform, dioxane, benzene, toluene, preferably Another method is to pour the solution obtained by dissolving in ether into an amino acid in an aqueous solution such as an aqueous sodium hydroxide solution or an aqueous potassium hydroxide solution (MAC
(See CHESMY, SWAM, JACS, 59 , 1116). The following example illustrates this method. Example Production of compound n゜1038 1.545g of 4-aminobutyric acid in 30cm3 of N soda
(0.015 mol), 3.7 g in 30 cm3 of ethyl ether
(0.015 mol) of 3-trifluoromethylbenzenesulfonyl chloride was added dropwise with vigorous stirring. After stirring for 4 hours, the organic phase was removed and the pH of the aqueous phase was brought to 3 with 2N hydrochloric acid. The formed precipitate was drained, washed with water until the Cl - ions disappeared, and then dried. The compounds produced according to this process are listed in Table and Table ', respectively.
【表】【table】
【表】
プロセスB:
式
で示される本発明による化合物の第2の製法(プ
ロセスB)では、
− 第1段階で、式
で示される化合物を合成するための前述の2つ
のプロセスAまたはAのいずれかに従い、
所望の酸のエステルを生成し、
− 第2段階で、得られたエステルを、次の反応
式
に従い、対応する酸に加水分解する。
このプロセスの第2段階を実施する場合は次の
手順で作業を行う。
対応アルコールが1〜4個の炭素原子を有する
ようなアルコール媒質中の1N〜5Nのアルカリ金
属塩基またはアルカリ土類金属塩基、好ましくは
1N〜5Nのエタノールソーダ、より特定的には
2Nエタノールソーダ(50cm3)に10-2モルのエス
テルを加え、室温で12時間磁気撹拌する。2N〜
10N濃塩酸の如き酸を用い冷浴内で該反応媒質を
中和し、PHを3より小さくした時、酢酸エチルな
ど水に対して非混和性の有機溶媒で抽出する。該
有機相を水で洗浄し、硫酸ナトリウムで乾燥した
後減圧下で濃縮する。
次の実施例は全般的に前述の方法に従う本発明
の化合物の製法を説明するものである。
実施例
化合物N゜1129の製造
2Nソーダとエタノールとの混合物にエステル
Aを懸濁させた。
磁気撹拌しながら室温で一晩放置した後、真空
中で該反応媒質を蒸発乾固し、残留物を再度200
cm3の水中に入れ、2N塩酸を添加してPHを3にし
た。沈澱物の水を切り、Cl-イオンが消滅するま
で水で洗浄した後真空中で乾燥した。収率は80%
であつた。
実施例
6−(3−トリフルオロメチルベンゼンスルホ
ニルアミノ)ヘキサン酸の製造
2N水酸化ナトリウム(20cm3)とエタノール
(10cm3)との混和物中にエステルA(2×10-2モル
=7.35g)を懸濁させた。
室温で磁気撹拌しながら一晩放置した後、該反
応媒質を真空中で蒸発させ乾燥状態にした。
残留物を30cm3の水中に集め、2N塩酸を添加し
てPHを8にした。沈澱物を乾燥し、Cl-イオンが
消滅するまで水で洗浄した後、真空中で乾燥した
(収率80%)。
この方法で生成した化合物をそれぞれ表と表
′に示す。[Table] Process B: Formula In a second process (process B) for the preparation of compounds according to the invention of the formula: - in a first step, the formula According to either of the two processes A or A described above for synthesizing the compound shown in
produce an ester of the desired acid; - in a second step, convert the resulting ester to the following reaction equation: Hydrolyze to the corresponding acid according to To perform the second step of this process, follow these steps: 1N to 5N alkali metal base or alkaline earth metal base in an alcoholic medium, preferably such that the corresponding alcohol has 1 to 4 carbon atoms.
1N to 5N ethanol soda, more specifically
Add 10 −2 moles of ester to 2N ethanol soda (50 cm 3 ) and stir magnetically at room temperature for 12 hours. 2N~
The reaction medium is neutralized in a cold bath using an acid such as 10N concentrated hydrochloric acid, and when the pH is below 3, it is extracted with a water-immiscible organic solvent such as ethyl acetate. The organic phase is washed with water, dried over sodium sulfate and concentrated under reduced pressure. The following examples illustrate the preparation of compounds of the invention generally according to the methods previously described. Example Production of compound N゜1129 Ester A was suspended in a mixture of 2N soda and ethanol. After standing overnight at room temperature with magnetic stirring, the reaction medium was evaporated to dryness in vacuo and the residue was again dried at 200 °C.
cm 3 of water and 2N hydrochloric acid was added to adjust the pH to 3. The precipitate was drained, washed with water until Cl - ions disappeared, and then dried in vacuum. Yield is 80%
It was hot. Example 6 Preparation of (3-trifluoromethylbenzenesulfonylamino)hexanoic acid Ester A (2 x 10 -2 moles = 7.35 g) was suspended in a mixture of 2N sodium hydroxide (20 cm 3 ) and ethanol (10 cm 3 ). After standing overnight at room temperature with magnetic stirring, the reaction medium was evaporated to dryness in vacuo. The residue was collected in 30 cm 3 of water and 2N hydrochloric acid was added to bring the pH to 8. The precipitate was dried, washed with water until the Cl - ions disappeared, and then dried in vacuo (80% yield). The compounds produced by this method are shown in Table and Table ', respectively.
【表】【table】
【表】
他の合成法:
次式
の化合物から次式
の化合物を調製する方法について説明する。上記
式中において、基R4はOHまたは1〜6個の炭素
原子を有するアルコキシ基を表わしている。この
製法は、ヨウ化アルキルR5の如きアルキルハ
ロゲン化物を、次式
に従つて反応させることから成る。
実際的な観点から手順は次の通りである。
スルホニルアミノ酸(1mM)を過剰の強い水
性塩基(苛性ソーダ、苛性カリ)の添加により溶
解させる。使用されるアルキル化剤は、アルキル
もしくはアラルキルハロゲン化物(ハロゲン化物
は塩化物、臭化物またはヨウ化物である)または
アルキル硫酸エステル(ジメチル硫酸エステル、
ジエチル硫酸エステル)でよい。
このアルキル化剤を低温下で一滴ずつ添加し、
もし必要なら反応混合物のPHを10以上の値に維持
する。
60℃から100℃の間の温度で3〜24時間(この
時間は前記アルキル化剤に応じて決定する)反応
媒質を加熱し、冷却後非混和性溶媒(エーテル、
TMF、ベンゼン、酢酸エチル)、好ましくはエー
テルを用いて水性相を抽出する。
次に水性相を無機酸(塩酸、臭化水素酸、硫
酸)、好ましくは塩酸の添加によりPH≦3にする。
沈澱物を取り出し、適当な有機または水性溶媒
で再結晶させる。
次の実施例はこの態様による調製方法を示して
おり、一般的に前記手順によるものである。
実施例
4−(3−トリフルオロメチルベンゼンスルホ
ニルアミノ)酪酸(化合物n゜1038)のメチル化
4gのヨウ化メチルを30cm3の水酸化ナトリウム
N中の3.1gの4−(3−トリフルオロメチルベン
ゼンスルホニルアミノ)酪酸(1×10-2モル)に
撹拌しながら一滴ずつ加えた。
反応混合物を4時間80℃にした。冷却後水性相
をエーテルで抽出した。有機相を除去した後、水
性相を2N塩酸でPH3にした。
沈澱物を遠心分離機にかけ、水で洗い、乾燥さ
せた。
得られた化合物(化合物n゜1174)の融点は115
℃であり、収率は80%であつた。
その他のプロセス:
次式
の化合物を、次式
の化合物から製造する方法について述べる(上記
式中、R1,R2,R5,R6,R8、およびR9は前述の
意味を有する)。この方法は、次式
に従つて酸と塩化チオニルを反応させることと、
次に、次の反応式
に従つて適当なアミンを酸塩化物と反応させるこ
ととから成る。
実際的な観点から操作は次の通りである。
酸を無水ベンゼンに溶解させ、過剰量の塩化チ
オニルを添加する。還流後反応混合物を蒸発乾固
させ、残渣を再び適当なアミンで取り出す。40℃
と60℃の間で加熱した後反応混合物を再び酢酸エ
チルで取り出す。有機相を2N塩酸で、次に水で、
その次に炭酸ナトリウム溶液で洗浄後、蒸発させ
ると、アミドに対応する結晶残渣が得られる。
次の実施例は本発明による調製方法を示してお
り、一般的に前記手順によるものである。
実施例
化合物n゜1130の製造
20cm3の無水ベンゼン中の0.01モルの酸Aに0.85
ml(1.43g即ち0.012モル)の蒸溜した塩化チオ
ニルを添加した。反応媒質を、5時間60℃にし
た。真空中で蒸発乾固した後、残渣を10cm3のベン
ゼンに取り出し、次に10cm3の蒸溜したばかりのピ
ペリジンを一滴ずつ添加した。次に反応媒質を、
2時間70℃にし、次に真空中で蒸発乾固させた。
残渣を150cm3の酢酸エチルに溶解させた。得られ
た有機相を水で、次にN塩酸で、さらに水で洗
い、硫酸ナトリウム上で乾燥させた。蒸発により
得られた結晶をベンゼンから再結晶した(収率:
73%)。
本発明の化合物を実施例の場合と同様な製法
に従つて製造し、次の表に集めた。[Table] Other synthesis methods: The following formula From the compound of The method for preparing the compound will be explained. In the above formula, the radical R 4 represents OH or an alkoxy group having 1 to 6 carbon atoms. This process involves converting an alkyl halide such as alkyl iodide R 5 into It consists of reacting according to From a practical point of view the procedure is as follows. Sulfonylamino acids (1 mM) are dissolved by addition of excess strong aqueous base (caustic soda, caustic potash). The alkylating agents used are alkyl or aralkyl halides (the halides are chlorides, bromides or iodides) or alkyl sulfates (dimethyl sulfate,
diethyl sulfate). Add this alkylating agent drop by drop at low temperature,
If necessary, maintain the PH of the reaction mixture at a value above 10. The reaction medium is heated for 3 to 24 hours (this time is determined depending on the alkylating agent) at a temperature between 60 °C and 100 °C and, after cooling, an immiscible solvent (ether, ether,
Extract the aqueous phase with TMF, benzene, ethyl acetate), preferably ether. The aqueous phase is then brought to a pH≦3 by addition of an inorganic acid (hydrochloric acid, hydrobromic acid, sulfuric acid), preferably hydrochloric acid. The precipitate is removed and recrystallized from a suitable organic or aqueous solvent. The following examples illustrate preparations according to this embodiment and generally follow the procedure described above. Example 4 Methylation of 4-(3-trifluoromethylbenzenesulfonylamino)butyric acid (compound n°1038) 4 g of methyl iodide were added dropwise to 3.1 g of 4-(3-trifluoromethylbenzenesulfonylamino)butyric acid (1×10 −2 mol) in 30 cm 3 of sodium hydroxide N with stirring. The reaction mixture was brought to 80° C. for 4 hours. After cooling the aqueous phase was extracted with ether. After removing the organic phase, the aqueous phase was brought to PH3 with 2N hydrochloric acid. The precipitate was centrifuged, washed with water and dried. The melting point of the obtained compound (compound n゜1174) is 115
The yield was 80%. Other processes: The compound of (In the above formula, R 1 , R 2 , R 5 , R 6 , R 8 and R 9 have the above-mentioned meanings.) This method uses the following formula reacting the acid with thionyl chloride according to
Then, the following reaction equation reacting a suitable amine with an acid chloride according to the method. From a practical point of view, the operation is as follows. The acid is dissolved in anhydrous benzene and excess thionyl chloride is added. After refluxing, the reaction mixture is evaporated to dryness and the residue is taken up again with a suitable amine. 40℃
After heating between and 60° C., the reaction mixture is taken up again with ethyl acetate. The organic phase was treated with 2N hydrochloric acid and then with water.
After subsequent washing with sodium carbonate solution and evaporation, a crystalline residue corresponding to the amide is obtained. The following examples illustrate preparations according to the invention and generally follow the procedure described above. Example Production of compound n゜1130 0.85 to 0.01 mol of acid A in 20 cm 3 of anhydrous benzene
ml (1.43 g or 0.012 mole) of distilled thionyl chloride was added. The reaction medium was brought to 60° C. for 5 hours. After evaporation to dryness in vacuo, the residue was taken up in 10 cm 3 of benzene and then 10 cm 3 of freshly distilled piperidine were added dropwise. Next, the reaction medium is
It was brought to 70° C. for 2 hours and then evaporated to dryness in vacuo.
The residue was dissolved in 150 cm 3 of ethyl acetate. The organic phase obtained was washed with water, then with N-hydrochloric acid, then with water and dried over sodium sulfate. The crystals obtained by evaporation were recrystallized from benzene (yield:
73%). Compounds of the invention were prepared according to the same procedure as in the Examples and are collected in the following table.
【表】【table】
【表】【table】
Claims (1)
おり、水素原子、ハロゲン原子、NO2基、NH2
基、CF3基、1〜6個の炭素原子を有するアルキ
ル基、または1〜6個の炭素原子を有するアルコ
キシ基を表わし、 n+m+1は3〜11であり、 R5およびR6は、同一であるかまたは異なつて
おり、水素原子、1〜6個の炭素原子を有するア
ルキル基、または7〜9個の炭素原子を有するア
ラルキル基を表わし、 R4はヒドロキシ基、基OR7(R7は1〜6個の炭
素原子を有するアルキル基)、または基【式】 (ただし、R8およびR9は同一であるかまたは異な
つており、水素原子、または1〜6個、好ましく
は1〜4個の炭素原子を有するアルキル基を表わ
すか、あるいはR8とR9とが窒素と共に一緒にな
つて5または6員の窒素含有複素環基、特にピペ
リジノ基、モルホリノ基、ピロリジノ基、ピロー
ル基またはピロリン基を表わす)]に相当する化
合物。 2 R1およびR2が、同一であるかまたは異なつ
ており、水素原子、ハロゲン原子、NO2基、
NH2基、1〜4個の炭素原子を有するアルキル
基、または1〜4個の炭素原子を有するアルコキ
シ基を表わし、n+m+1が3,5または10であ
り、R5およびR6が各々、水素原子、1〜4個の
炭素原子を有するアルキル基、または7〜9個の
炭素原子を有するアラルキル基であり、R4がヒ
ドロキシ基または基OR7(R7は1〜4個の炭素原
子を有するアルキル基)を表わすことを特徴とす
る特許請求の範囲第1項に記載の化合物。 3 R1およびR2が、同一であるかまたは異なつ
ており、ハロゲン原子、NO2基、NH2基、CF3
基、1〜6個の炭素原子を有するアルキル基、ま
たは1〜6個の炭素原子を有するアルコキシ基を
表わすことを特徴とする特許請求の範囲第1項に
記載の化合物。 4 R5およびR6のどちらかが水素原子であるこ
とを特徴とする特許請求の範囲第1項に記載の化
合物。 5 R5が水素原子であることを特徴とする特許
請求の範囲第1項に記載の化合物。 6 R1およびR6が水素原子であることを特徴と
する特許請求の範囲第5項に記載の化合物。 7 R1およびR2が水素原子であることを特徴と
する特許請求の範囲第5項に記載の化合物。 8 R1,R2およびR6が水素原子であることを特
徴とする特許請求の範囲第5項に記載の化合物。 9 式 [式中、n+m+1は3〜11の整数であり、
R4はヒドロキシ基または1〜6個の炭素原子を
有するアルコキシ基である]に相当することを特
徴とする特許請求の範囲第1項に記載の化合物。 10 n+m+1が3,5または10であることを
特徴とする特許請求の範囲第9項に記載の化合
物。 11 n+m+1が3であり、R4がヒドロキシ
基であることを特徴とする特許請求の範囲第10
項に記載の化合物。 12 下記式で表わされることを特徴とする特許
請求の範囲第1項に記載の化合物。 [Claims] Linear formula [In the formula, R 1 and R 2 are the same or different, hydrogen atom, halogen atom, NO 2 group, NH 2
represents a group, CF 3 group, an alkyl group having 1 to 6 carbon atoms, or an alkoxy group having 1 to 6 carbon atoms, n+m+1 is 3 to 11, and R 5 and R 6 are the same R 4 is a hydroxy group, the group OR 7 (R 7 is an alkyl group having 1 to 6 carbon atoms), or a group [formula] (wherein R 8 and R 9 are the same or different, hydrogen atoms, or 1 to 6, preferably 1 to 4 R 8 and R 9 together with nitrogen represent a 5- or 6-membered nitrogen-containing heterocyclic group, in particular piperidino, morpholino, pyrrolidino, pyrrole or pyrroline group)]. 2 R 1 and R 2 are the same or different, a hydrogen atom, a halogen atom, an NO 2 group,
represents an NH 2 group, an alkyl group having 1 to 4 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, where n+m+1 is 3, 5 or 10, and R 5 and R 6 are each hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an aralkyl group having 7 to 9 carbon atoms, and R 4 is a hydroxy group or a group OR 7 (R 7 is an alkyl group having 1 to 4 carbon atoms). The compound according to claim 1, characterized in that it represents an alkyl group). 3 R 1 and R 2 are the same or different, a halogen atom, NO 2 group, NH 2 group, CF 3
2. A compound according to claim 1, characterized in that it represents a group, an alkyl group having 1 to 6 carbon atoms, or an alkoxy group having 1 to 6 carbon atoms. 4. The compound according to claim 1, wherein either R 5 or R 6 is a hydrogen atom. 5. The compound according to claim 1, wherein R 5 is a hydrogen atom. 6. The compound according to claim 5, wherein R 1 and R 6 are hydrogen atoms. 7. The compound according to claim 5, wherein R 1 and R 2 are hydrogen atoms. 8. The compound according to claim 5, wherein R 1 , R 2 and R 6 are hydrogen atoms. 9 formula [In the formula, n+m+1 is an integer from 3 to 11,
2. A compound according to claim 1, wherein R 4 is a hydroxy group or an alkoxy group having 1 to 6 carbon atoms. 10. A compound according to claim 9, characterized in that n+m+1 is 3, 5 or 10. 11 Claim 10, characterized in that n+m+1 is 3 and R 4 is a hydroxy group.
Compounds described in Section. 12. The compound according to claim 1, which is represented by the following formula.
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FR8111858 | 1981-06-16 | ||
FR8111858A FR2507598A1 (en) | 1981-06-16 | 1981-06-16 | Benzene, thiophene and pyrimidine sulphonamido alkanoic acid derivs. - are normolipaemic cpds. with good therapeutic index, have low toxicity |
FR8111859 | 1981-06-16 |
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---|---|---|---|---|
GB562349A (en) * | 1943-02-12 | 1944-06-28 | Wellcome Found | Improvements relating to the manufacture of sulphanilamide derivatives |
DE1101408B (en) * | 1959-02-10 | 1961-03-09 | Chemische Werke Radebeul Veb | Process for the preparation of hypoglycemic sulfonylaminocarboxylic acid derivatives |
GB1194388A (en) * | 1966-11-08 | 1970-06-10 | American Cyanamid Co | Preparation of N-(2-Carbamoylethyl) and N,N-Bis(2-Carbamoylethyl) Sulfonamides |
JPS57314B2 (en) * | 1974-04-10 | 1982-01-06 | ||
JPS5218821A (en) * | 1975-07-30 | 1977-02-12 | Sumitomo Chem Co Ltd | Plant growth regulators |
-
1981
- 1981-06-16 FR FR8111858A patent/FR2507598A1/en active Granted
-
1982
- 1982-06-16 JP JP57103672A patent/JPS58957A/en active Granted
-
1987
- 1987-09-30 JP JP62247738A patent/JPS6399048A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6355487B2 (en) | 1988-11-02 |
JPS6399048A (en) | 1988-04-30 |
FR2507598B1 (en) | 1984-10-12 |
JPS58957A (en) | 1983-01-06 |
FR2507598A1 (en) | 1982-12-17 |
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