JPH0235446B2 - - Google Patents

Info

Publication number
JPH0235446B2
JPH0235446B2 JP61125102A JP12510286A JPH0235446B2 JP H0235446 B2 JPH0235446 B2 JP H0235446B2 JP 61125102 A JP61125102 A JP 61125102A JP 12510286 A JP12510286 A JP 12510286A JP H0235446 B2 JPH0235446 B2 JP H0235446B2
Authority
JP
Japan
Prior art keywords
alignment
optical system
wafer
reticle
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61125102A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62281422A (ja
Inventor
Akyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61125102A priority Critical patent/JPS62281422A/ja
Publication of JPS62281422A publication Critical patent/JPS62281422A/ja
Priority to US07/333,727 priority patent/US4888614A/en
Publication of JPH0235446B2 publication Critical patent/JPH0235446B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61125102A 1986-05-30 1986-05-30 露光装置 Granted JPS62281422A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP61125102A JPS62281422A (ja) 1986-05-30 1986-05-30 露光装置
US07/333,727 US4888614A (en) 1986-05-30 1989-04-03 Observation system for a projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61125102A JPS62281422A (ja) 1986-05-30 1986-05-30 露光装置

Publications (2)

Publication Number Publication Date
JPS62281422A JPS62281422A (ja) 1987-12-07
JPH0235446B2 true JPH0235446B2 (enrdf_load_stackoverflow) 1990-08-10

Family

ID=14901899

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61125102A Granted JPS62281422A (ja) 1986-05-30 1986-05-30 露光装置

Country Status (1)

Country Link
JP (1) JPS62281422A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2788242B2 (ja) * 1988-02-05 1998-08-20 株式会社日立製作所 パターン検出装置及び露光装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3963353A (en) * 1974-09-26 1976-06-15 The Perkin-Elmer Corporation Monolithic beam splitter mirror arrangement
DE2900921C2 (de) * 1979-01-11 1981-06-04 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren zum Projektionskopieren von Masken auf ein Werkstück
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device

Also Published As

Publication number Publication date
JPS62281422A (ja) 1987-12-07

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term