JPH0233741A - Optical memory and its manufacture - Google Patents
Optical memory and its manufactureInfo
- Publication number
- JPH0233741A JPH0233741A JP63184168A JP18416888A JPH0233741A JP H0233741 A JPH0233741 A JP H0233741A JP 63184168 A JP63184168 A JP 63184168A JP 18416888 A JP18416888 A JP 18416888A JP H0233741 A JPH0233741 A JP H0233741A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- tempered glass
- layer
- film
- optical memory
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 239000005341 toughened glass Substances 0.000 claims abstract description 23
- 239000002131 composite material Substances 0.000 claims abstract description 7
- 229910052712 strontium Inorganic materials 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 11
- 230000003647 oxidation Effects 0.000 claims description 2
- 238000007254 oxidation reaction Methods 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims 3
- 229910052751 metal Inorganic materials 0.000 claims 3
- 239000010408 film Substances 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
- 230000007797 corrosion Effects 0.000 abstract description 14
- 238000005260 corrosion Methods 0.000 abstract description 14
- 238000009792 diffusion process Methods 0.000 abstract description 13
- 239000011521 glass Substances 0.000 abstract description 13
- 229920005989 resin Polymers 0.000 abstract description 13
- 239000011347 resin Substances 0.000 abstract description 13
- 230000001681 protective effect Effects 0.000 abstract description 8
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 abstract description 6
- 230000006866 deterioration Effects 0.000 abstract description 2
- 229910044991 metal oxide Inorganic materials 0.000 abstract 1
- 150000004706 metal oxides Chemical class 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 15
- 150000001340 alkali metals Chemical class 0.000 description 8
- 239000011247 coating layer Substances 0.000 description 8
- 238000003860 storage Methods 0.000 description 6
- 229910052783 alkali metal Inorganic materials 0.000 description 5
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 5
- 150000001342 alkaline earth metals Chemical class 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 3
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 229910000676 Si alloy Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920005668 polycarbonate resin Polymers 0.000 description 2
- 239000004431 polycarbonate resin Substances 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- -1 that is Inorganic materials 0.000 description 2
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- UBAZGMLMVVQSCD-UHFFFAOYSA-N carbon dioxide;molecular oxygen Chemical compound O=O.O=C=O UBAZGMLMVVQSCD-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は音響機器などに用いられる光記憶体に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to an optical storage medium used in audio equipment and the like.
一般にＣＤ（コンパクトティスフ）と呼ばれる光記憶体
く以下、ＣＤと略す）は、低 高音部の再現性や再生時
のＳＮ比が極めて良好であることから、現在オーディオ
用の記録媒体の主流を占めている。現在市販されている
ＣＤの基本的な構造は、ハードコート層／ポリカーボネ
ート樹脂基板／反射膜／保護樹脂層である。ポリカーボ
ネート樹脂基板を用いたＣＤは、樹脂基板の水蒸気吸収
による膨潤や、吸収した水分による反射膜の腐食の問題
が指摘されている。最近では、ガラスの高い耐蝕性を利
用し、高信頼性・高寿命を意図した強化ガラスを基板材
料に採用したＣＤが公知例として報告されている（例え
ば、峠、松山、甫：窯業協会誌、９５巻、１９８７年、
１）Ｐ２Ｓ５）。Optical storage devices generally referred to as CDs (hereinafter abbreviated as CDs) are currently the mainstream audio recording medium due to their extremely good reproducibility of low and high frequencies and the S/N ratio during playback. is occupying. The basic structure of currently commercially available CDs is a hard coat layer/polycarbonate resin substrate/reflective film/protective resin layer. It has been pointed out that CDs using polycarbonate resin substrates have problems such as swelling of the resin substrate due to water vapor absorption and corrosion of the reflective film due to absorbed moisture. Recently, there have been reports of CDs that utilize the high corrosion resistance of glass and use tempered glass as the substrate material to achieve high reliability and long life (for example, Toge, Matsuyama, and Ho: Journal of the Ceramics Association). , Volume 95, 1987,
1) P2S5).
Ｃ発明が解決しようとする課題〕
ポリカーボネー１へ樹脂基板を用いたＣ Ｉ）では、樹
脂基板に特有の吸水性と透湿性に起因する基板の反り変
形と反射膜の腐食か避ｉ−＋られす、樹脂基板を使用す
る限り、高信頼性 高寿命のＣＤを提供することは困難
である。このような樹脂基板の欠点を考慮して、強化ガ
ラス基板を用いたＣ Ｄか報告されていることは先に記
述した。強化ガラス基板の優位性は、１）樹脂基板に匹
敵する耐衝撃性を有すること、２）樹脂基板に比較する
と水蒸気の吸収量や拡散は無視てきるほど小さく、水分
による劣化を防止てきると予想されること、の２点が挙
けられる。ところて、強化ガラスの作製方法には、物理
的手段である風冷強化基板、化学的な高温型イオン交換
や低温型イオン交換があるか、その製法を問わす、主な
構成成分は５ｉ０２．Ｎａ２Ｏ，に２０Ｃａｂ、人１２
０３．Ｂ２Ｏ３，ＪＯ，ＰｂＯ，ＴｉＯ２である。アル
カリ金属やアルカリ土類金属の酸化物であるＮａ２Ｏに
２０．ＣａＯはガラスに加工性を付与するために添加さ
れており、全体て１０〜２０ｗｔ％ものアルカリ金属や
アルカリ土類金属の酸化物か強化ガラスに含まれている
。アルカリ金属やアルカリ土類金属は一般にそのイオン
半径か小さいために、ガラス内での易動度か高く、ガラ
ス中を容易に拡散することか知られている。また、大気
中の酸素、炭酸カス、水蒸気なととの反応性も極めて高
く、耐蝕性の面で信頼性を損なう添加成分であると考え
られる。実際に、ＮａＯはその高い拡散係数（Ｋ２Ｏや
ＣａＯの拡散係数に比較して］桁大きい）や雰囲気カス
分子との高い反応性に起因して、炭酸す１ヘリウムＮａ
２ＣＯ３か強化ガラス基板１−に生成されることが観察
される。Ｎａ２ＣＯ３の形成は、１）基板の屈折率を変
化させる。２）体積膨張を伴うために、その部分て反射
膜の剥離を促す。なといくつかの相乗効果によって、光
記憶体にエラーを発生させる。したかって、強化ガラス
基板を用いることによって期待した耐蝕性および信頼性
の向上は達成されていないというのか現状である。C Problems to be Solved by the Invention In CI) using a resin substrate for polycarbonate 1, it is possible to avoid warping of the substrate and corrosion of the reflective film due to the water absorption and moisture permeability specific to the resin substrate. However, as long as a resin substrate is used, it is difficult to provide a CD with high reliability and long life. As mentioned above, in consideration of the drawbacks of resin substrates, CDs using reinforced glass substrates have been reported. The advantages of tempered glass substrates are 1) impact resistance comparable to resin substrates, and 2) compared to resin substrates, the absorption and diffusion of water vapor is negligibly small, which is expected to prevent deterioration due to moisture. There are two points that can be raised: By the way, the main constituent components of tempered glass are 5i02. Na2O, 20 Cab, 12 people
03. They are B2O3, JO, PbO, and TiO2. 20. to Na2O, which is an oxide of alkali metals and alkaline earth metals. CaO is added to impart workability to glass, and is contained in tempered glass as a total of 10 to 20 wt% of alkali metal or alkaline earth metal oxides. It is known that alkali metals and alkaline earth metals generally have a small ionic radius, have high mobility within glass, and easily diffuse within glass. Furthermore, it is highly reactive with oxygen, carbon dioxide, and water vapor in the atmosphere, and is considered to be an additive component that impairs reliability in terms of corrosion resistance. In fact, due to its high diffusion coefficient (an order of magnitude higher than that of K2O and CaO) and high reactivity with atmospheric gas molecules, NaO
It is observed that 2CO3 is generated on the tempered glass substrate 1-. The formation of Na2CO3 1) changes the refractive index of the substrate; 2) Since volumetric expansion is involved, peeling of the reflective film is promoted in that area. Due to several synergistic effects, errors occur in the optical memory. Therefore, at present, the expected improvement in corrosion resistance and reliability by using a reinforced glass substrate has not been achieved.
そこて、本発明は強化ガラスを基板として用いた光記憶
体において、強化ガラス基板の全面をＢａ、Ｒｂ、Ｓｎ
、Ｓｉ、Ｓｉ、Ｔｉから選ばれる少なくとも１種類具」
二の元素からなる酸化物もしくは複合酸化物層で被覆す
ることにより、強化ガラス基板の耐蝕性劣化成分である
アルカリ金属やアルカリ土類金属の酸化物の拡散および
反応を抑えることにより、高信頼性 高か命の光記憶体
とその製造方法を提供するものである。Therefore, the present invention provides an optical memory using tempered glass as a substrate, in which the entire surface of the tempered glass substrate is made of Ba, Rb, and Sn.
, at least one type selected from Si, Si, and Ti.
Coating with an oxide or composite oxide layer consisting of two elements suppresses the diffusion and reaction of alkali metal and alkaline earth metal oxides, which are components that degrade the corrosion resistance of tempered glass substrates, resulting in high reliability. The present invention provides a highly durable optical storage medium and a method for manufacturing the same.
本発明は、ガラス中の耐蝕性劣化成分であるアルカリ金
属やアルカリ土類金属の酸化物、すなわちＮａ２Ｏ，に
２０．ＣａＯの拡散を防止するために、強化ガラス基板
の全面にＢａ、Ｒｂ、Ｓｎ、Ｓｉ、Ｓｉ、Ｔｉから選は
れる少なくとも１種類以上の元素からなる酸化物もしく
は複合酸化物層を設けるものである。前記アルカリ金属
やアルカリ土類金属の酸化物、特にＮａ２Ｏは、原子（
イオン）半径の大きい、２価の元素の酸化物、例えはＳ
ｎＯのような酸化物中で安定化し、その拡散速度が純Ｓ
ｉＯ３中におけるそれに比較して１０〜］、 Ｏ０分の
１に低下することが知られている。本発明はこの効果を
利用することにより、強化ガラス基板からのアルカリ金
属やアルカリ土類金属の酸化物、特にＮａ２Ｏの流出を
抑え、耐蝕性の向上に寄与するものである。強化ガラス
基板の被覆層に要求されるその他の主な特性は、７８０
ｎ ｍのレーザー光に対して透明であること、その屈
折率かｌ、４５〜１．６５の範囲内にあることの２点で
ある。Ｂａ、Ｒｂ、Ｓｎ、Ｓｉ、Ｓｒ、Ｔｉから選はれ
る少なくとも１種類以上の元素からなる酸化物もしくは
複合酸化物層は、上記２点の必要条件を加味して選択し
な。The present invention uses oxides of alkali metals and alkaline earth metals, that is, Na2O, which are corrosion-resistant deteriorating components in glass. In order to prevent diffusion of CaO, an oxide or composite oxide layer made of at least one element selected from Ba, Rb, Sn, Si, Si, and Ti is provided on the entire surface of the tempered glass substrate. . The oxides of alkali metals and alkaline earth metals, especially Na2O, have atoms (
ions) oxides of divalent elements with large radius, such as S
It is stabilized in oxides such as nO, and its diffusion rate is higher than that of pure S.
Compared to that in iO3, it is known to decrease to one-fold of O0. By utilizing this effect, the present invention suppresses the outflow of alkali metal and alkaline earth metal oxides, particularly Na2O, from the tempered glass substrate and contributes to improving corrosion resistance. Other main characteristics required for the coating layer of the tempered glass substrate are 780
The two points are that it is transparent to laser light of nm, and that its refractive index is within the range of 45 to 1.65. The oxide or composite oxide layer made of at least one element selected from Ba, Rb, Sn, Si, Sr, and Ti should be selected in consideration of the above two requirements.
以下、この発明の実施例を詳細に説明する。第１図は本
発明の光記憶体の構成を示す部分断面図である。１が強
化ガラス基板、２が本発明の拡散防止被覆層、３がハー
トコート層、４は案内溝と情報を書込んだヒツトを設け
たクルーフ層、５は反射膜、６は保護膜、７は保護樹脂
層である。以下に、本発明の実施例に基づいて作製条件
などを説明する。Examples of the present invention will be described in detail below. FIG. 1 is a partial sectional view showing the structure of the optical storage medium of the present invention. 1 is a tempered glass substrate, 2 is an anti-diffusion coating layer of the present invention, 3 is a heart coat layer, 4 is a kloof layer provided with a guide groove and a mark on which information is written, 5 is a reflective film, 6 is a protective film, 7 is a protective resin layer. Manufacturing conditions and the like will be explained below based on Examples of the present invention.
］の強化ガラス基板の化学組成は重量比て、５１０２
１５Ｎａ２０−５ＣａＯ−ＩＡＩ２０３３．５ＪＯであ
る。前述のように腐食におよぼずアルカリ金属やアルカ
リ土類金属の酸化物の影響か大きいため、Ｎ ａ ２０
−１−ＣａＯの星か２０ ｗ ｔ％とかなり多い強化ガ
ラス基板を用いた。バー１〜コート層３は傷の発生を防
止する樹脂系バートコ−１へ層く厚さ３μｍ）である。] The chemical composition of the tempered glass substrate is 5102 by weight.
15Na20-5CaO-IAI2033.5JO. As mentioned above, it does not cause corrosion and is largely affected by oxides of alkali metals and alkaline earth metals, so N a 20
A tempered glass substrate containing a fairly large amount of -1-CaO, 20 wt%, was used. Bar 1 to coating layer 3 are layered on resin-based bar coat 1 to prevent scratches and have a thickness of 3 μm.
ハートコートＭ３は拡散防止被覆Ｎ２を強化ガラス基板
に処理した後に成膜した。拡散防止被覆層」二に設けた
グループ層４には、反応性スパッタによって成膜した５
１０２膜に直接１’ライエツヂンク法により講を作製し
たトライエッチンク膜と、ＳｉＯ□とＢ２Ｏ３の混合ツ
ル溶液のケル化反応を利用して溝を作製するツルケル膜
を用いた。トライエッチンク膜、ゾルゲル膜ともに、そ
の膜厚は２０Ｏｎｍである。なお、実施例をまとめた表
−１にはそれぞれ１へライ、ツルケルとして表示しな。Heart coat M3 was formed after the anti-diffusion coating N2 was applied to the tempered glass substrate. The group layer 4 provided in the diffusion prevention coating layer 2 has a layer 5 formed by reactive sputtering.
A tri-etch film was used in which grooves were formed directly on the 102 film by the 1'-Lietszink method, and a Tsurkel film was used in which grooves were formed using the kelization reaction of a mixed vine solution of SiO□ and B2O3. The thickness of both the tri-etch film and the sol-gel film is 20 Onm. In addition, in Table 1 summarizing the examples, they are indicated as 1 and 1, respectively.
反射膜はやはりスパッタ法により成膜したＡｌ−Ｃｕ−
Ｓｉ合金膜（膜厚１５０ ｎ ｍ ）を使用した。本発
明の実施例では比較のために耐蝕性に劣るＡｌ−Ｃｕ−
Ｓｉ合金膜を用いたか、Ａｕ、ＰＬ、Ｐｄなとの貴金属
膜なとも用いることかできる。６は反射膜側からの腐食
を抑えるための保護膜てあり、反応性スパッタ法によっ
て作製した５ｉＪ４膜（膜厚３００ｎｍ）である。７は
バー１−コー１へ層３と同様の樹脂保護層てあり、その
厚さは２０μｍである。以上述へてきた製造方法および
成膜材料は後述する本発明によるＣＤの実施例および比
較試料のすへてにおいて同一である。The reflective film is also an Al-Cu- film formed by sputtering.
A Si alloy film (thickness: 150 nm) was used. For comparison, in Examples of the present invention, Al-Cu-
A Si alloy film or a noble metal film such as Au, PL, or Pd may be used. 6 is a protective film for suppressing corrosion from the reflective film side, and is a 5iJ4 film (thickness: 300 nm) produced by reactive sputtering. 7 is a resin protective layer similar to layer 3 on bar 1-co 1, and its thickness is 20 μm. The manufacturing method and film-forming materials described above are the same for all of the examples and comparative samples of the CD according to the present invention, which will be described later.
実施例１は強化ガラス基板」二にイオンプレーテインク
法によりＳｎを３００ｎｍ被覆した後に、３５０℃の清
浄大気中て２時間焼成し、Ｓｎの酸化物膜を作製したも
のである。この方法を熱酸化法と名付けた。実施例２は
反応性のイオンプレーテインク法によりＳｎのＰ酸化膜
を直接強化ガラス基板上に成膜したもので、直接法と名
付けた。なお、本実施例ではイオンプレーテインクを成
膜法として採用したか、スパッタ法、蒸着、クラスタイ
オンヒームなとの成膜方法を適用することもてきる。In Example 1, a reinforced glass substrate was coated with Sn to a thickness of 300 nm using the ion plate ink method, and then baked in a clean atmosphere at 350° C. for 2 hours to form an oxide film of Sn. This method was named the thermal oxidation method. In Example 2, a P oxide film of Sn was directly formed on a reinforced glass substrate by a reactive ion plate ink method, which was named the direct method. In this embodiment, ion plate ink was used as the film forming method, but other film forming methods such as sputtering, vapor deposition, and cluster ion beam forming may also be applied.
表 ］に本発明による実施例をまとめて示す。table ] Examples according to the present invention are collectively shown.
表−１
比較のために作製した比較試料］と２は拡散防止被覆層
を設けていない点を除けは、実施例のＣＤのまったく同
様にして作製した。Table 1 Comparative Samples Prepared for Comparison] and 2 were prepared in exactly the same manner as the CD of Example, except that no diffusion-preventing coating layer was provided.
表−１に示したずへての光記憶体を温度８０°Ｃ１相対
湿度８０％の環境試験装置内に７日間保持した後に、干
渉顕微鏡による腐食や剥離の観察と、エラーテスターに
よりヒッＩ−−エラーの発生数を測定した。比較試料１
，２は強化ガラス基板とグループ層の界面に剥離部分が
発生し、剥離部を起点として反射膜の腐食が進行してい
る。After holding the optical storage bodies shown in Table 1 in an environmental test device at a temperature of 80°C and a relative humidity of 80% for 7 days, they were observed for corrosion and peeling using an interference microscope, and tested using an error tester. - Measured the number of errors that occurred. Comparison sample 1
, 2, a peeled portion occurred at the interface between the reinforced glass substrate and the group layer, and corrosion of the reflective film progressed from the peeled portion as a starting point.
方、本発明による実施例１〜１０ては干渉顕微鏡で観察
できるレベルの剥離や腐食の発生はまったく認められな
かった。またビットエラー測定では比較試料のいずれも
か再生不能といえるほどにヒツトエラー数が増加してい
るのに対して、実施例１〜１０てはヒツトエラー数は高
／Ｚ ］、 Ｏ個であった。On the other hand, in Examples 1 to 10 according to the present invention, no peeling or corrosion at a level observable with an interference microscope was observed. Further, in the bit error measurement, the number of hit errors in all of the comparative samples increased to such an extent that it could be said that reproduction was impossible, whereas in Examples 1 to 10, the number of hit errors was high/Z], O pieces.
以上のように、本発明に事づく拡散防止被覆層を強化ガ
ラス基板とグループ層との間に設けることによって、Ｃ
Ｄ耐候性を著しく向上さぜることがてきる。As described above, by providing the diffusion prevention coating layer according to the present invention between the reinforced glass substrate and the group layer, C
D Weather resistance can be significantly improved.
第１図は本発明の光記憶体の構成を示す部分断面図てあ
り、１が強化ガラス基板、２か拡散防止被覆層、３がバ
ー１〜コート層、４はクルーフ層、５は反射膜、６は保
護膜、７は保護樹脂層である。
代理人 弁理士 内 原 晋FIG. 1 is a partial cross-sectional view showing the structure of the optical storage medium of the present invention, in which 1 is a reinforced glass substrate, 2 is a diffusion prevention coating layer, 3 is a bar 1 to coating layer, 4 is a kloof layer, and 5 is a reflective film. , 6 is a protective film, and 7 is a protective resin layer. Agent Patent Attorney Susumu Uchihara
Claims (2)
造を備えた光記憶体において、前記強化ガラス基板の全
面をＢａ、Ｒｂ、Ｓｎ、Ｓｉ、Ｓｒ、Ｔｉから選ばれる
少なくとも１種類以上の元素からなる酸化物もしくは複
合酸化物層で被覆したことを特徴とした光記憶体。(1) In an optical memory having a multilayer structure consisting of a plurality of thin films on a tempered glass substrate, the entire surface of the tempered glass substrate is coated with at least one kind selected from Ba, Rb, Sn, Si, Sr, and Ti. An optical memory characterized by being coated with an oxide or composite oxide layer consisting of an element.
の製造方法において、強化ガラス基板の全面をＢａ、Ｒ
ｂ、Ｓｎ、Ｓｉ、Ｓｒ、Ｔｉから選ばれる少なくとも１
種類以上の元素からなる金属膜で被覆したのちに、熱酸
化法により該金属膜を酸化させ、該金属の酸化物もしく
は複合酸化物層で強化ガラス基板を被覆することを特徴
とした光記憶体の製造方法。(2) In a method for manufacturing an optical memory in which a multilayer thin film is formed on a tempered glass substrate, the entire surface of the tempered glass substrate is coated with Ba, R,
At least one selected from b, Sn, Si, Sr, and Ti
An optical memory device characterized in that a tempered glass substrate is coated with a metal film made of more than one kind of element, and then the metal film is oxidized by a thermal oxidation method, and a tempered glass substrate is covered with an oxide or composite oxide layer of the metal. manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63184168A JPH0233741A (en) | 1988-07-22 | 1988-07-22 | Optical memory and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63184168A JPH0233741A (en) | 1988-07-22 | 1988-07-22 | Optical memory and its manufacture |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0233741A true JPH0233741A (en) | 1990-02-02 |
Family
ID=16148554
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63184168A Pending JPH0233741A (en) | 1988-07-22 | 1988-07-22 | Optical memory and its manufacture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0233741A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0596716A2 (en) * | 1992-11-06 | 1994-05-11 | Sharp Kabushiki Kaisha | Magneto-optical recording medium and recording and reproducing method and optical head designed for the magneto-optical recording medium |
| EP0936195A2 (en) * | 1998-02-10 | 1999-08-18 | Matsushita Electronics Corporation | Glass composition, stem and bulb for lamps |
| US6665235B2 (en) | 1992-11-06 | 2003-12-16 | Sharp Kabushiki Kaisha | Magneto-optical recording medium and recording and reproducing method and optical head designed for the magneto-optical recording medium |
-
1988
- 1988-07-22 JP JP63184168A patent/JPH0233741A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0596716A2 (en) * | 1992-11-06 | 1994-05-11 | Sharp Kabushiki Kaisha | Magneto-optical recording medium and recording and reproducing method and optical head designed for the magneto-optical recording medium |
| EP0596716A3 (en) * | 1992-11-06 | 1996-09-11 | Sharp Kk | Magneto-optical recording medium and recording and reproducing method and optical head designed for the magneto-optical recording medium. |
| EP0974961A2 (en) * | 1992-11-06 | 2000-01-26 | Sharp Kabushiki Kaisha | Magneto-optical recording medium and recording and reproducing method and optical head designed for the magneto-optical recording medium |
| EP0974961A3 (en) * | 1992-11-06 | 2000-07-05 | Sharp Kabushiki Kaisha | Magneto-optical recording medium and recording and reproducing method and optical head designed for the magneto-optical recording medium |
| US6261707B1 (en) | 1992-11-06 | 2001-07-17 | Sharp Kabushiki Kaisha | Magneto-optical recording medium and recording and reproducing method and optical head designed for the magneto-optical recording medium |
| US6483785B1 (en) | 1992-11-06 | 2002-11-19 | Sharp Kk | Magneto-optical recording method using the relation of beam diameter and an aperture of converging lens |
| US6665235B2 (en) | 1992-11-06 | 2003-12-16 | Sharp Kabushiki Kaisha | Magneto-optical recording medium and recording and reproducing method and optical head designed for the magneto-optical recording medium |
| EP0936195A2 (en) * | 1998-02-10 | 1999-08-18 | Matsushita Electronics Corporation | Glass composition, stem and bulb for lamps |
| EP0936195A3 (en) * | 1998-02-10 | 1999-09-22 | Matsushita Electronics Corporation | Glass composition, stem and bulb for lamps |
| US6528444B1 (en) | 1998-02-10 | 2003-03-04 | Matsushita Electric Industrial Co., Ltd. | Glass composition, stem and bulb for lamps |
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