JP2707726B2 - Optical memory - Google Patents

Optical memory

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Publication number
JP2707726B2
JP2707726B2 JP1141009A JP14100989A JP2707726B2 JP 2707726 B2 JP2707726 B2 JP 2707726B2 JP 1141009 A JP1141009 A JP 1141009A JP 14100989 A JP14100989 A JP 14100989A JP 2707726 B2 JP2707726 B2 JP 2707726B2
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Japan
Prior art keywords
glass substrate
tempered glass
film
optical memory
target
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP1141009A
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Japanese (ja)
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JPH038137A (en
Inventor
明伸 佐藤
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日本電気株式会社
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Priority to JP1141009A priority Critical patent/JP2707726B2/en
Publication of JPH038137A publication Critical patent/JPH038137A/en
Application granted granted Critical
Publication of JP2707726B2 publication Critical patent/JP2707726B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical memory used for audio equipment or information equipment, and more particularly to an optical memory using a tempered glass substrate.

2. Description of the Related Art In general, a read-only optical disk (hereinafter abbreviated as an optical ROM) is capable of high-density recording, and is being used as a read-only external memory of a computer system as a CD-ROM. Optical storage media called CDs (compact discs) are currently the mainstream of recording media for audio because of their excellent reproducibility of low and high-pitched sounds and excellent SN ratios.

The basic structure of an optical ROM currently on the market is a hard coat layer / polycarbonate resin substrate / reflective film / protective resin film. Optical ROM using polycarbonate resin substrate
It is pointed out that swelling due to water vapor absorption of the resin substrate and corrosion of the reflection film due to the absorbed water are problems.

Recently, the use of tempered glass with high reliability and long service life as a substrate material, taking advantage of the excellent corrosion resistance of glass,
ROM is reported as a known example (for example, Toge, Matsuda, Minami: Journal of the Ceramic Society of Japan, Vol. 95, 1987, 182). The advantages of a tempered glass substrate include that it has impact resistance comparable to that of a resin substrate, and that the absorption and diffusion of water vapor are so small as to be negligible compared to a resin substrate, and that deterioration due to moisture can be prevented.

[Problems to be Solved by the Invention] The tempered glass contains an alkali metal or an alkaline earth metal as much as 10 to 20 wt% in total. It is known that alkali metals and alkaline earth metals generally have a small ionic radius, and therefore have high mobility in glass and easily diffuse in glass. Further, it has extremely high reactivity with oxygen, carbon dioxide gas, water vapor and the like in the atmosphere, and is considered to be an additive component that impairs reliability in terms of corrosion resistance.

In fact, sodium oxide (Na 2 O), potassium oxide (K 2
O), calcium oxide (CaO), etc., due to their high diffusion coefficient and high reactivity with atmospheric gas molecules, sodium carbonate (Na 2 CO 3 ), potassium carbonate (K 2 CO 3 ), calcium carbonate ( It has been observed that CaCO 3 ) is produced on a tempered glass substrate.

The formation of such a carbonate causes an error in the optical storage body due to several synergistic effects, such as changing the refractive index of the substrate, enlarging the reflective film at that portion due to volume expansion, and the like. . Therefore, at present, the expected improvement in corrosion resistance and reliability has not been achieved by using a tempered glass substrate.

SUMMARY OF THE INVENTION An object of the present invention is to provide an optical memory having a high reliability and a long life in an optical memory having a multilayer structure composed of a plurality of thin films on a tempered glass substrate.

[Means for Solving the Problems] The present invention relates to an optical storage medium having a multilayer structure composed of a plurality of thin films on a tempered glass substrate.
An optical storage element characterized by being coated with an anticorrosion layer made of an oxynitride (oxynitride) containing at least one element selected from i, Ti, Zr, Hf, Al and Ta. .

[Operation] SiO x N y, SiTi x O y N z, SiZr x O y N z, SiHf x O y N z, SiAl x O y
Oxynitrides such as N z and SiTa x O y N z are already known to have improved alkali resistance, acid resistance, and water resistance as compared with SiO 2 , but prevent corrosion of a reinforced glass substrate. It was not known whether it was effective as an anticorrosion layer. The present inventor has made intensive studies on the anticorrosion properties, and as a result, these oxynitrides suppress the diffusion of alkali metals or alkaline earth metals from tempered glass, and further suppress the entry of water vapor from the outside. Have been found to serve as a protective film for improving the corrosion resistance of the tempered glass substrate. Therefore, when a tempered glass substrate is coated with this oxynitride, an optical memory having excellent corrosion resistance can be obtained.

[Examples] Hereinafter, examples of the present invention will be described in detail.

Embodiments 1 to 6 FIG. 1 is a partial sectional view of an embodiment of the present invention. An anticorrosion layer 2 comprising the components of the present invention is provided on both sides of
a, 2b are provided, a groove layer 3 provided with a guide groove and a bit in which information is written is provided on the anticorrosion layer 2a, and a reflective film 4, a protective film 5, and a label layer 6 are sequentially laminated. I have.

Hereinafter, a method for manufacturing the optical memory body configured as described above will be described.

The chemical composition of the tempered glass substrate 1 is expressed as SiO 2 -15
NaO is a 2 -5CaO-1Al 2 O 3 -3.5MgO . As the groove layer 3 provided on the anticorrosion layer 2a, a dry-etched SiO 2 film in which a groove was formed by a direct dry etching method on an SiO 2 film formed by reactive sputtering was used. Dry etching Si
The thickness of the O 2 film 3 is 200 nm. As the reflective film 4, an Al—Cu—Si alloy film (150 nm thick) formed by a sputtering method was used. In the embodiment of the present invention, Al-Cu having relatively poor corrosion resistance
Although the -Si alloy film was used, a noble metal film such as Au, Pt, or Pd can also be used. The protective film 5 for suppressing corrosion from the reflective film side was a Si 3 N 4 film (thickness: 300 nm) produced by a reactive sputtering method. The label layer 6 is made of an ultraviolet curable resin and has a thickness of 20 μm. The manufacturing method and the film forming conditions described above correspond to the optical
It is the same in all of the ROM examples and comparative samples.

In Example 1, a 200 nm-thick SiO x Ny film was formed on the tempered glass substrate 1 as the anticorrosion layers 2a and 2b by the reactive sputtering method. The composition ratio of oxygen and nitrogen was O: N = 3: 1. Ar + N 2 (50%) as sputtering target using SiO 2 as sputtering gas
Was used. The sputtering power was 300 W and the gas pressure was 10 mTorr.

In Example 2, 200-nm SiZr x O y N z films were formed on the tempered glass substrate 1 as the anticorrosion layers 2a and 2b by the reactive sputtering method. The composition ratio of oxygen and nitrogen was O: N = 3: 1. The target used is a target in which a SiO 2 fan-shaped chip is placed on ZrO 2 (Y 2 O 3 : 3 mol%), and Ar + N 2 (50
%). The composition ratio of Zr and Si was Zr: Si = 1: 5, and was controlled by the area ratio of the target. The sputtering power was 300 W and the gas pressure was 10 mTorr.

In Example 3, SiAl x O y N z films each having a thickness of 200 nm were formed as the anticorrosion layers 2 a and 2 b on the tempered glass substrate 1 by the reactive sputtering method. The composition ratio of oxygen and nitrogen was O: N = 3: 1. The target used was an SiO 2 fan-shaped tip on Al 2 O 3 , and Ar + N 2 (50%) was used as a sputtering gas. Al
The composition ratio of Al and Si was set to Al: Si = 1: 4 and controlled by the area ratio of the target. The sputtering power was 300 W and the gas pressure was 10 mTorr.

In Example 4, a 200 nm SiTa x O y N z film was formed on the reinforced glass substrate 1 as the anticorrosion layers 2 a and 2 b by the reactive sputtering method. The composition ratio of oxygen and nitrogen was O: N = 3: 1. The target used was an SiO 2 fan-shaped chip on Ta 2 O 5 , and Ar + N 2 (50%) was used as a sputtering gas. Ta
The composition ratio of Si and Si was set to Ta: Si = 1: 4 and controlled by the area ratio of the target. The sputtering power was 300 W and the gas pressure was 10 mTorr.

In Example 5, 200 nm each of SiTi x O y N z films were formed on the reinforced glass substrate 1 as the anticorrosion layers 2 a and 2 b by the reactive sputtering method. The composition ratio of oxygen and nitrogen was O: N = 3: 1. The target used was a SiO 2 fan-shaped chip on TiO 2 , and Ar + N 2 (50%) was used as a sputtering gas. Ti and
The composition ratio of Si was set to Ti: Si = 1: 4 and controlled by the area ratio of the target. The sputtering power was 300 W and the gas pressure was 10 mTorr.

In Example 6, SiHf x O y N z films having a thickness of 200 nm were formed as the anticorrosion layers 2 a and 2 b on the tempered glass substrate 1 by the reactive sputtering method. The composition ratio of oxygen and nitrogen was O: N = 3: 1. As a target, a target in which a SiO 2 fan-shaped chip was placed on HfO 2 was used, and Ar + N 2 (50%) was used as a sputtering gas. Hf
The Si composition ratio was Hf: Si = 1: 4, and was controlled by the area ratio of the target. The sputtering power was 300 W and the gas pressure was 10 mTorr.

In each of the above embodiments, a sputtering method was adopted as a film forming method. However, a vapor deposition method, an ion plating method, a cluster ion beam method, a plasma chemical vapor deposition (PCVD) method,
A film forming method such as a sol-gel method can also be applied.

A sample manufactured for comparison was manufactured in exactly the same manner as the optical ROM of the example except that the anticorrosion layers 2a and 2b were not provided.

After holding the optical storage medium manufactured in each example and the optical storage medium of the comparative sample in a pressure cooker weather resistance test apparatus at a temperature of 120 ° C. and a relative humidity of 90% for 192 hours, observation and error of corrosion and peeling by an interference microscope were performed. The block error rate was measured by a tester.

As a result, in the comparative sample, the peeling occurred at the interface between the tempered glass substrate and the groove layer, and the corrosion of the reflection film had progressed from the peeled portion as a starting point, whereas in each example according to the present invention,
No occurrence of peeling or corrosion at a level observable with an interference microscope was observed at all. In the block error rate measurement, 0 to 10 pieces / sec before the pressure cooker weather resistance test was compared with 200 to 800 pieces / sec for the comparative sample after the test.
In seconds, the number of bit errors has increased beyond the standard value, whereas no increase in the bit error rate was observed in each embodiment.

It is clear that the anticorrosion layer of the present invention is also effective for an additional writable optical disk (DRAW) using a tempered glass substrate, or for a rewritable magneto-optical disk and a phase change optical disk.

[Effects of the Invention] As described above, according to the present invention, the weather resistance of an optical memory using a tempered glass substrate is improved, and a highly reliable and long-life optical memory is provided.

[Brief description of the drawings]

 FIG. 1 is a partial sectional view of one embodiment of the present invention. DESCRIPTION OF SYMBOLS 1 ... Tempered glass substrate, 2a, 2b ... Anticorrosion layer 3 ... Groove layer, 4 ... Reflection film 5 ... Protective film, 6 ... Label layer

Claims (1)

(57) [Claims]
1. An optical memory having a multilayer structure comprising a plurality of thin films on a tempered glass substrate, wherein the tempered glass substrate is S
An optical storage element characterized by being coated with an anticorrosion layer made of an oxynitride containing at least one element selected from i, Ti, Zr, Hf, Al and Ta.
JP1141009A 1989-06-05 1989-06-05 Optical memory Expired - Lifetime JP2707726B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1141009A JP2707726B2 (en) 1989-06-05 1989-06-05 Optical memory

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1141009A JP2707726B2 (en) 1989-06-05 1989-06-05 Optical memory

Publications (2)

Publication Number Publication Date
JPH038137A JPH038137A (en) 1991-01-16
JP2707726B2 true JP2707726B2 (en) 1998-02-04

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP1141009A Expired - Lifetime JP2707726B2 (en) 1989-06-05 1989-06-05 Optical memory

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JP (1) JP2707726B2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0564709B1 (en) * 1991-12-13 1996-01-24 Balzers Aktiengesellschaft Coated transparent substrate, use thereof, method and apparatus of manufacturing such coatings, and hafnium-oxynitride HfOxNy with 1.5 x/y 3 and 2.6 n 2.8
JP2005251279A (en) 2004-03-03 2005-09-15 Nec Corp Optical information recording medium and its manufacturing method
CN106007393B (en) * 2016-05-30 2018-11-23 济南大学 The preparation method and products obtained therefrom of a kind of liquid self-cleaning glass film, self-cleaning glass
CN106116143B (en) * 2016-06-29 2019-12-03 成都光明光电股份有限公司 Optical glass
CN106145671A (en) * 2016-08-08 2016-11-23 太仓市双凤镇薄彩工艺品厂 A kind of preparation method of material exquisiteness coloured glaze
CN106082608B (en) * 2016-08-17 2018-07-31 四川科伦药业股份有限公司 Ring soldering machine
CN106277775A (en) * 2016-08-23 2017-01-04 太仓市双凤镇薄彩工艺品厂 A kind of low melting point coloured glaze containing bismuth oxide and manufacture method thereof
CN106277773A (en) * 2016-08-23 2017-01-04 太仓市双凤镇薄彩工艺品厂 Tempering plane coloured glaze and preparation method thereof
CN107188424A (en) * 2017-07-17 2017-09-22 太仓市双凤镇薄彩工艺品厂 A kind of low coloured glaze of fragility
CN107216033A (en) * 2017-07-17 2017-09-29 太仓市双凤镇薄彩工艺品厂 A kind of cherry coloured glaze

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Publication number Publication date
JPH038137A (en) 1991-01-16

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