JPH0233350U - - Google Patents
Info
- Publication number
- JPH0233350U JPH0233350U JP11307588U JP11307588U JPH0233350U JP H0233350 U JPH0233350 U JP H0233350U JP 11307588 U JP11307588 U JP 11307588U JP 11307588 U JP11307588 U JP 11307588U JP H0233350 U JPH0233350 U JP H0233350U
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- evacuation system
- ray
- standing wave
- atmosphere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005259 measurement Methods 0.000 claims description 4
- 238000007789 sealing Methods 0.000 claims 2
- 238000005086 pumping Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 5
- 239000003566 sealing material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Description
第1図は本考案の第1の実施例を示す概念図、
第2図は本考案の第1の実施例の回転軸に関する
構造概念図、第3図は本考案によるX線定在波測
定の一例を示す図、第4図は本考案の第2の実施
例の排気系に関する構造概念図、第5図は従来例
を説明する図である。
1……X線源、2……平行化用スリツト、3…
…非対称モノクロメーター、4……スリツト、5
……試料、6……半導体検出器、7……Brag
g反射測定用検出器、8……入射X線強度測定用
検出器、9……高精度ゴニオメーター、10……
真空槽、11……回転駆動機構、12……試料、
13……フランジにBe窓を設けた入射窓、14
……フランジにBe窓を設けた出射窓、15……
蛍光X線検出用半導体検出器、16……X線源、
17……Bragg反射X線測定用シンチレーシ
ヨンカウンター、18……真空槽、19……ベロ
ーズ、20……真空槽の外壁、21,22,23
……シール材、24……差動排気ダクト、25…
…差動排気用排気系、26……差動排気ダクト、
27……差動排気用排気系、28……駆動軸の回
転軸受、29……回転用駆動軸、30……粗動回
転ステージ、31……高精度微動回転ステージ、
32……試料支持台、33……試料、34……真
空槽、35……荒引排気系、36……高真空無振
動排気系、37……回転軸、38,39,40…
…シール材、41,42……無振動排気系、43
,44,45……真空バルブ。
FIG. 1 is a conceptual diagram showing the first embodiment of the present invention;
Figure 2 is a structural conceptual diagram of the rotating shaft of the first embodiment of the present invention, Figure 3 is a diagram showing an example of X-ray standing wave measurement according to the present invention, and Figure 4 is the second embodiment of the present invention. FIG. 5 is a structural conceptual diagram of an example exhaust system, and is a diagram illustrating a conventional example. 1... X-ray source, 2... Parallelizing slit, 3...
...Asymmetrical monochromator, 4...Slit, 5
...Sample, 6...Semiconductor detector, 7...Brag
g Detector for reflection measurement, 8...Detector for measuring incident X-ray intensity, 9...High precision goniometer, 10...
Vacuum chamber, 11... Rotation drive mechanism, 12... Sample,
13...Incidence window with Be window provided on the flange, 14
...Output window with a Be window on the flange, 15...
Semiconductor detector for fluorescent X-ray detection, 16...X-ray source,
17...Scintillation counter for Bragg reflection X-ray measurement, 18...Vacuum chamber, 19...Bellows, 20...Outer wall of vacuum chamber, 21, 22, 23
...Sealing material, 24...Differential exhaust duct, 25...
...Exhaust system for differential exhaust, 26...Differential exhaust duct,
27...Exhaust system for differential exhaust, 28...Rotation bearing for drive shaft, 29...Rotation drive shaft, 30...Coarse movement rotation stage, 31...High precision fine movement rotation stage,
32... Sample support stand, 33... Sample, 34... Vacuum chamber, 35... Rough evacuation system, 36... High vacuum vibrationless exhaust system, 37... Rotating shaft, 38, 39, 40...
...Sealing material, 41, 42...Vibrationless exhaust system, 43
, 44, 45...vacuum valve.
Claims (1)
るX線の入・出射窓と、前記真空容器内に設置さ
れた試料から蛍光X線を取り出すための蛍光X線
検出器と、ブラツグ反射検出器とからなる装置に
おいて、試料を真空容器内で高精度に回転させる
ため、前記真空容器の壁を貫通して設けられた回
転軸と、該回転軸の真空側先端に試料支持台を設
けると共に、大気側には高精度回転駆動機構を連
接し、更に前記真空容器と回転軸との間に複数の
シーリング部分を設け、該シーリング部分で区画
された空間に差動排気機構を連接したことを特徴
とする真空用X線定在波測定装置。 (2) 大気から排気可能な荒引き排気系と、振動
のない高真空用排気系とを備え、前記荒引き排気
系と高真空用排気系とは真空バルブで連結され、
前記真空バルブを開閉して大気からの排気には荒
引き排気系を用い、高真空においては高真空排気
系を用いることを特徴とする請求項1記載の真空
用X線定在波測定装置。[Claims for Utility Model Registration] (1) An X-ray source, a vacuum container, an X-ray entrance/exit window in the vacuum container, and a device for extracting fluorescent X-rays from a sample placed in the vacuum container. In an apparatus consisting of a fluorescent X-ray detector and a Bragg reflection detector, in order to rotate the sample within a vacuum container with high precision, A sample support stand is provided at the tip on the vacuum side, a high-precision rotary drive mechanism is connected to the atmosphere side, and a plurality of sealing parts are provided between the vacuum container and the rotating shaft, and a space is partitioned by the sealing parts. An X-ray standing wave measuring device for vacuum use, characterized in that a differential pumping mechanism is connected to the vacuum X-ray standing wave measuring device. (2) A rough evacuation system capable of exhausting air from the atmosphere and a vibration-free high vacuum evacuation system, the rough evacuation system and the high vacuum evacuation system being connected by a vacuum valve,
2. The vacuum X-ray standing wave measurement apparatus according to claim 1, wherein a rough evacuation system is used to open and close the vacuum valve to evacuate air from the atmosphere, and a high vacuum evacuation system is used for high vacuum.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988113075U JPH0714874Y2 (en) | 1988-08-29 | 1988-08-29 | X-ray standing wave measuring device for vacuum |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988113075U JPH0714874Y2 (en) | 1988-08-29 | 1988-08-29 | X-ray standing wave measuring device for vacuum |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0233350U true JPH0233350U (en) | 1990-03-02 |
JPH0714874Y2 JPH0714874Y2 (en) | 1995-04-10 |
Family
ID=31352594
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1988113075U Expired - Lifetime JPH0714874Y2 (en) | 1988-08-29 | 1988-08-29 | X-ray standing wave measuring device for vacuum |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0714874Y2 (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62226048A (en) * | 1986-03-28 | 1987-10-05 | Toshiba Corp | Spectrochemical analysis of crystal solid |
JPS63142811A (en) * | 1986-12-05 | 1988-06-15 | Nec Corp | Manufacture of boundary superstructure |
-
1988
- 1988-08-29 JP JP1988113075U patent/JPH0714874Y2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62226048A (en) * | 1986-03-28 | 1987-10-05 | Toshiba Corp | Spectrochemical analysis of crystal solid |
JPS63142811A (en) * | 1986-12-05 | 1988-06-15 | Nec Corp | Manufacture of boundary superstructure |
Also Published As
Publication number | Publication date |
---|---|
JPH0714874Y2 (en) | 1995-04-10 |
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