JPH0233350U - - Google Patents

Info

Publication number
JPH0233350U
JPH0233350U JP11307588U JP11307588U JPH0233350U JP H0233350 U JPH0233350 U JP H0233350U JP 11307588 U JP11307588 U JP 11307588U JP 11307588 U JP11307588 U JP 11307588U JP H0233350 U JPH0233350 U JP H0233350U
Authority
JP
Japan
Prior art keywords
vacuum
evacuation system
ray
standing wave
atmosphere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11307588U
Other languages
Japanese (ja)
Other versions
JPH0714874Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988113075U priority Critical patent/JPH0714874Y2/en
Publication of JPH0233350U publication Critical patent/JPH0233350U/ja
Application granted granted Critical
Publication of JPH0714874Y2 publication Critical patent/JPH0714874Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の第1の実施例を示す概念図、
第2図は本考案の第1の実施例の回転軸に関する
構造概念図、第3図は本考案によるX線定在波測
定の一例を示す図、第4図は本考案の第2の実施
例の排気系に関する構造概念図、第5図は従来例
を説明する図である。 1……X線源、2……平行化用スリツト、3…
…非対称モノクロメーター、4……スリツト、5
……試料、6……半導体検出器、7……Brag
g反射測定用検出器、8……入射X線強度測定用
検出器、9……高精度ゴニオメーター、10……
真空槽、11……回転駆動機構、12……試料、
13……フランジにBe窓を設けた入射窓、14
……フランジにBe窓を設けた出射窓、15……
蛍光X線検出用半導体検出器、16……X線源、
17……Bragg反射X線測定用シンチレーシ
ヨンカウンター、18……真空槽、19……ベロ
ーズ、20……真空槽の外壁、21,22,23
……シール材、24……差動排気ダクト、25…
…差動排気用排気系、26……差動排気ダクト、
27……差動排気用排気系、28……駆動軸の回
転軸受、29……回転用駆動軸、30……粗動回
転ステージ、31……高精度微動回転ステージ、
32……試料支持台、33……試料、34……真
空槽、35……荒引排気系、36……高真空無振
動排気系、37……回転軸、38,39,40…
…シール材、41,42……無振動排気系、43
,44,45……真空バルブ。
FIG. 1 is a conceptual diagram showing the first embodiment of the present invention;
Figure 2 is a structural conceptual diagram of the rotating shaft of the first embodiment of the present invention, Figure 3 is a diagram showing an example of X-ray standing wave measurement according to the present invention, and Figure 4 is the second embodiment of the present invention. FIG. 5 is a structural conceptual diagram of an example exhaust system, and is a diagram illustrating a conventional example. 1... X-ray source, 2... Parallelizing slit, 3...
...Asymmetrical monochromator, 4...Slit, 5
...Sample, 6...Semiconductor detector, 7...Brag
g Detector for reflection measurement, 8...Detector for measuring incident X-ray intensity, 9...High precision goniometer, 10...
Vacuum chamber, 11... Rotation drive mechanism, 12... Sample,
13...Incidence window with Be window provided on the flange, 14
...Output window with a Be window on the flange, 15...
Semiconductor detector for fluorescent X-ray detection, 16...X-ray source,
17...Scintillation counter for Bragg reflection X-ray measurement, 18...Vacuum chamber, 19...Bellows, 20...Outer wall of vacuum chamber, 21, 22, 23
...Sealing material, 24...Differential exhaust duct, 25...
...Exhaust system for differential exhaust, 26...Differential exhaust duct,
27...Exhaust system for differential exhaust, 28...Rotation bearing for drive shaft, 29...Rotation drive shaft, 30...Coarse movement rotation stage, 31...High precision fine movement rotation stage,
32... Sample support stand, 33... Sample, 34... Vacuum chamber, 35... Rough evacuation system, 36... High vacuum vibrationless exhaust system, 37... Rotating shaft, 38, 39, 40...
...Sealing material, 41, 42...Vibrationless exhaust system, 43
, 44, 45...vacuum valve.

Claims (1)

【実用新案登録請求の範囲】 (1) X線源と、真空容器と、該真空容器におけ
るX線の入・出射窓と、前記真空容器内に設置さ
れた試料から蛍光X線を取り出すための蛍光X線
検出器と、ブラツグ反射検出器とからなる装置に
おいて、試料を真空容器内で高精度に回転させる
ため、前記真空容器の壁を貫通して設けられた回
転軸と、該回転軸の真空側先端に試料支持台を設
けると共に、大気側には高精度回転駆動機構を連
接し、更に前記真空容器と回転軸との間に複数の
シーリング部分を設け、該シーリング部分で区画
された空間に差動排気機構を連接したことを特徴
とする真空用X線定在波測定装置。 (2) 大気から排気可能な荒引き排気系と、振動
のない高真空用排気系とを備え、前記荒引き排気
系と高真空用排気系とは真空バルブで連結され、
前記真空バルブを開閉して大気からの排気には荒
引き排気系を用い、高真空においては高真空排気
系を用いることを特徴とする請求項1記載の真空
用X線定在波測定装置。
[Claims for Utility Model Registration] (1) An X-ray source, a vacuum container, an X-ray entrance/exit window in the vacuum container, and a device for extracting fluorescent X-rays from a sample placed in the vacuum container. In an apparatus consisting of a fluorescent X-ray detector and a Bragg reflection detector, in order to rotate the sample within a vacuum container with high precision, A sample support stand is provided at the tip on the vacuum side, a high-precision rotary drive mechanism is connected to the atmosphere side, and a plurality of sealing parts are provided between the vacuum container and the rotating shaft, and a space is partitioned by the sealing parts. An X-ray standing wave measuring device for vacuum use, characterized in that a differential pumping mechanism is connected to the vacuum X-ray standing wave measuring device. (2) A rough evacuation system capable of exhausting air from the atmosphere and a vibration-free high vacuum evacuation system, the rough evacuation system and the high vacuum evacuation system being connected by a vacuum valve,
2. The vacuum X-ray standing wave measurement apparatus according to claim 1, wherein a rough evacuation system is used to open and close the vacuum valve to evacuate air from the atmosphere, and a high vacuum evacuation system is used for high vacuum.
JP1988113075U 1988-08-29 1988-08-29 X-ray standing wave measuring device for vacuum Expired - Lifetime JPH0714874Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988113075U JPH0714874Y2 (en) 1988-08-29 1988-08-29 X-ray standing wave measuring device for vacuum

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988113075U JPH0714874Y2 (en) 1988-08-29 1988-08-29 X-ray standing wave measuring device for vacuum

Publications (2)

Publication Number Publication Date
JPH0233350U true JPH0233350U (en) 1990-03-02
JPH0714874Y2 JPH0714874Y2 (en) 1995-04-10

Family

ID=31352594

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988113075U Expired - Lifetime JPH0714874Y2 (en) 1988-08-29 1988-08-29 X-ray standing wave measuring device for vacuum

Country Status (1)

Country Link
JP (1) JPH0714874Y2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62226048A (en) * 1986-03-28 1987-10-05 Toshiba Corp Spectrochemical analysis of crystal solid
JPS63142811A (en) * 1986-12-05 1988-06-15 Nec Corp Manufacture of boundary superstructure

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62226048A (en) * 1986-03-28 1987-10-05 Toshiba Corp Spectrochemical analysis of crystal solid
JPS63142811A (en) * 1986-12-05 1988-06-15 Nec Corp Manufacture of boundary superstructure

Also Published As

Publication number Publication date
JPH0714874Y2 (en) 1995-04-10

Similar Documents

Publication Publication Date Title
JPH0233350U (en)
US4358854A (en) Measuring devices for X-ray fluorescence analysis
GB637744A (en) Improvements in or relating to x-ray spectrometers for use in crystal analysis
Kunieda et al. Thirty-meter x-ray pencil beam line at the Institute of Space and Astronautical Science
JPS62116243A (en) Detector
JP3396460B2 (en) X-ray fluorescence analyzer and X-ray detector used therefor
Sluyters et al. Grating Vacuum Monochromator for the Spectral Range 1000–6500 A
JP3287069B2 (en) Measurement method and apparatus for total reflection X-ray fluorescence analysis
US3939353A (en) Electron microscope specimen mounting apparatus
JP2768545B2 (en) X-ray light source device
JP3158391B2 (en) Total reflection X-ray fluorescence analyzer
JP2001033403A (en) On-the-spot total reflection fluorescence xafs measuring device
JPH077652B2 (en) Beam exposure device
JPS63167251A (en) X-ray analyzer
JPH06102213A (en) X-ray diffraction apparatus
JP3198127B2 (en) X-ray spectrometer
JPH0380255B2 (en)
GB1044026A (en) Grazing incidence vacuum spectrometer
JP2508884Y2 (en) Sample stand for X-ray diffractometer
JPS57120858A (en) Detector for position of ultrasonic probe
JPH03216539A (en) X-ray analyzer
JPH04128641A (en) Detecting device for x-ray specimen
JPH0239150U (en)
JPH05288694A (en) Detecting device for material deterioration by positron annihilation method
JPH0572151A (en) Reflection high speed electron diffraction-soft x-ray radiation spectroscopic analysis device