JPH02312106A - Conductive inorganic oxide composite and manufacture thereof - Google Patents
Conductive inorganic oxide composite and manufacture thereofInfo
- Publication number
- JPH02312106A JPH02312106A JP13128589A JP13128589A JPH02312106A JP H02312106 A JPH02312106 A JP H02312106A JP 13128589 A JP13128589 A JP 13128589A JP 13128589 A JP13128589 A JP 13128589A JP H02312106 A JPH02312106 A JP H02312106A
- Authority
- JP
- Japan
- Prior art keywords
- salt
- heteropolyacid
- group
- inorganic oxide
- conductive inorganic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052809 inorganic oxide Inorganic materials 0.000 title claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000002131 composite material Substances 0.000 title abstract 5
- 239000000203 mixture Substances 0.000 claims abstract description 48
- 150000003839 salts Chemical class 0.000 claims abstract description 34
- 239000011964 heteropoly acid Substances 0.000 claims abstract description 23
- 239000012298 atmosphere Substances 0.000 claims abstract description 10
- 238000010438 heat treatment Methods 0.000 claims abstract description 8
- 239000002253 acid Substances 0.000 claims abstract description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract 4
- 150000001875 compounds Chemical class 0.000 claims description 12
- -1 amine salt Chemical class 0.000 claims description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 7
- 229910052750 molybdenum Inorganic materials 0.000 claims description 7
- 239000011733 molybdenum Substances 0.000 claims description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- 239000010937 tungsten Substances 0.000 claims description 6
- 229910052720 vanadium Inorganic materials 0.000 claims description 6
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 229910052684 Cerium Inorganic materials 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 2
- 229910052787 antimony Inorganic materials 0.000 claims 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 229910052797 bismuth Inorganic materials 0.000 claims 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims 2
- 229910052796 boron Inorganic materials 0.000 claims 2
- 229910052732 germanium Inorganic materials 0.000 claims 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052698 phosphorus Inorganic materials 0.000 claims 2
- 239000011574 phosphorus Substances 0.000 claims 2
- 229910052697 platinum Inorganic materials 0.000 claims 2
- 229910052703 rhodium Inorganic materials 0.000 claims 2
- 239000010948 rhodium Substances 0.000 claims 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- 239000010936 titanium Substances 0.000 claims 2
- 229910052726 zirconium Inorganic materials 0.000 claims 2
- 150000003863 ammonium salts Chemical group 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 13
- 238000000576 coating method Methods 0.000 abstract description 11
- 238000000354 decomposition reaction Methods 0.000 abstract description 11
- 239000011248 coating agent Substances 0.000 abstract description 10
- 238000002441 X-ray diffraction Methods 0.000 abstract description 8
- 230000002829 reductive effect Effects 0.000 abstract description 8
- 239000000126 substance Substances 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 6
- 239000000843 powder Substances 0.000 abstract description 6
- 239000011231 conductive filler Substances 0.000 abstract description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract description 4
- 239000001257 hydrogen Substances 0.000 abstract description 4
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 4
- 238000002425 crystallisation Methods 0.000 abstract description 3
- 230000008025 crystallization Effects 0.000 abstract description 3
- 239000012299 nitrogen atmosphere Substances 0.000 abstract description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract description 2
- 229910000476 molybdenum oxide Inorganic materials 0.000 abstract description 2
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 abstract description 2
- 238000000967 suction filtration Methods 0.000 abstract description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 238000002156 mixing Methods 0.000 abstract 1
- 239000003973 paint Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 230000000704 physical effect Effects 0.000 description 9
- 239000010419 fine particle Substances 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- DHRLEVQXOMLTIM-UHFFFAOYSA-N phosphoric acid;trioxomolybdenum Chemical compound O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.OP(O)(O)=O DHRLEVQXOMLTIM-UHFFFAOYSA-N 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000010974 bronze Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000010416 ion conductor Substances 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Inorganic materials O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- CGFYHILWFSGVJS-UHFFFAOYSA-N silicic acid;trioxotungsten Chemical compound O[Si](O)(O)O.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 CGFYHILWFSGVJS-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007784 solid electrolyte Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 238000002411 thermogravimetry Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、導電性を有する無機酸化物組成物およびその
製造方法に関する。更に詳しくは、本発明はヘテロポリ
酸および/またはその塩と、その分解還元生成物とを主
成分とするS電性無機酸化物組成物に藺する。更に、本
発明はその製造においてヘテロポリ酸および/またはそ
の塩を還元雰囲気上加熱することにより導電性態R酸化
物組成物を製造する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an inorganic oxide composition having electrical conductivity and a method for producing the same. More specifically, the present invention relates to an S-electroconductive inorganic oxide composition containing a heteropolyacid and/or a salt thereof, and a decomposition and reduction product thereof as main components. Furthermore, the present invention relates to a method for producing a conductive R oxide composition by heating a heteropolyacid and/or a salt thereof in a reducing atmosphere.
本発明が提供する導電性態ms化物組成物は安定なS電
性を示し、樹脂、溶剤等との親。The conductive MS compound composition provided by the present invention exhibits stable S conductivity and is compatible with resins, solvents, etc.
相性に優れるため、導電性フィラー、その他の材料とし
て電子、電機、塗料、!1紺、プラスチック等の各種分
野に有用なものである。Due to its excellent compatibility, it can be used as a conductive filler and other materials in electronics, electrical equipment, paints,! 1. It is useful in various fields such as navy blue and plastics.
(従来の技術)
従来から用いられている導電性フィラーとしては、例え
ばカーボンブラックやカーボン繊維等のカーボン系フィ
ラー、金属粉や金罵iI雑等の金属系フィラー、炭化ケ
イ素やタングステンカーバイド等の炭化物系フィラー、
あるいは酸化錫や酸化インジウム等の金!l!iQ化物
系フィラーなどがあり、その特性に応じて各種用途に使
い分けられている。(Prior art) Conventionally used conductive fillers include, for example, carbon-based fillers such as carbon black and carbon fiber, metal-based fillers such as metal powder and metal powder, and carbides such as silicon carbide and tungsten carbide. filler,
Or gold such as tin oxide or indium oxide! l! There are iQ compound fillers, etc., which are used for various purposes depending on their characteristics.
しかし、これらの導電性フィラーは形状や組成上での偏
りから導電性が不均一であったり、また形状や組成上の
偏りがない場合でも、樹脂あるいは塗料への分散性が悪
いために得られる樹脂分散体あるいは塗膜での導電性が
不均一となったり、樹脂分散体あるいは塗膜中での経時
安定性が悪い等の問題点があった。しかも、目的とする
導電性を得るためには導電性フィラーを多量に添加する
必要があったり、樹脂分散体あるいは塗膜の色調も限定
されてしまうという問題点があった。However, these conductive fillers may have non-uniform conductivity due to variations in shape or composition, or even if there is no variation in shape or composition, they may be obtained due to poor dispersibility in resin or paint. There have been problems such as non-uniform conductivity in the resin dispersion or coating, and poor stability over time in the resin dispersion or coating. Moreover, there are problems in that it is necessary to add a large amount of conductive filler in order to obtain the desired conductivity, and the color tone of the resin dispersion or coating film is also limited.
また、四級アンモニウム塩などの界面活性剤を配合した
導電性樹脂および導電性塗料も知られているが、これら
は大量に配合しないと導電性付与効果がなく、得られる
樹脂および塗膜の表面がべとついたり、水洗により効果
が低下したりするという問題点があった。Also, conductive resins and conductive paints containing surfactants such as quaternary ammonium salts are known, but these do not have the effect of imparting conductivity unless they are blended in large quantities, and the surface of the resulting resin and coating film is There were problems in that it became sticky and its effectiveness decreased when washed with water.
一方、従来より、ケギン構造を有するヘテロポリ酸およ
びその塩は良好なイオン導電体であることは公知である
[化学と工業、第11巻、第4号、第332〜328頁
(1958)など1゜本発明者らが、それらの化合物の
導電性を調べたところ、体積固有抵抗値は104〜10
6Ω・cryであった。On the other hand, it has been known that heteropolyacids having a Keggin structure and their salts are good ionic conductors [Kagaku to Kogyo, Vol. 11, No. 4, pp. 332-328 (1958), etc.゜When the present inventors investigated the conductivity of these compounds, the volume resistivity value was 104 to 10
It was 6Ω・cry.
それらの導電性は比較的低いため、電子、電機、塗料、
繊維、プラスチック等の各分野の幅広い要求に充分対応
しきれないという欠点を有している。Their conductivity is relatively low, so they are used in electronics, electrical equipment, paints, etc.
It has the disadvantage that it cannot fully meet the wide range of demands in various fields such as textiles and plastics.
(発明が解決しようとする課題)
本発明者らは、ヘテロポリ酸およびその塩の導電性を向
上させることを目的として鋭意検討を行なった結果、元
のヘテロポリ酸およびその塩よりも導電性が優れ、かつ
ヘテロポリ酸およびその塩の他の物性をそこなわない導
電性無機酸化物組成物とその工業的に有利な製法を見い
出し、本発明を完成するに至った。(Problems to be Solved by the Invention) The present inventors have conducted extensive studies with the aim of improving the conductivity of heteropolyacids and their salts, and have found that the conductivity is superior to the original heteropolyacids and their salts. The present inventors have discovered a conductive inorganic oxide composition that does not impair other physical properties of heteropolyacids and their salts, and an industrially advantageous method for producing the same, and have completed the present invention.
(課題を解決するための手段および作用)すなわち、本
発明の第1発明は、ヘテロポリ酸および/またはその塩
と一般式
%式%()
(但し、一般式(I)中、Xは0<X<1の任意の数、
yはO≦y<3の任意の数、2はモリブデン、タングス
テンおよびバナジウムよりなる群から選ばれた少なくと
も一種の元素をそれぞれ表わす)
で示される化合物を主成分とする導電性無機酸化物組成
物を提供する。(Means and effects for solving the problem) That is, the first invention of the present invention provides a heteropolyacid and/or a salt thereof and the general formula % formula % () (However, in the general formula (I), X is 0< any number of X<1,
y is any number satisfying O≦y<3, and 2 represents at least one element selected from the group consisting of molybdenum, tungsten, and vanadium. I will provide a.
また、本発明の第2発明はヘテロポリ酸および/または
その塩を還元雰囲気下に加熱してその一部を分解還元す
ることによって上記の導電性無機酸化物組成物を製造す
る方法を提供する。Further, a second aspect of the present invention provides a method for producing the above-mentioned conductive inorganic oxide composition by heating a heteropolyacid and/or its salt in a reducing atmosphere to decompose and reduce a part of the heteropolyacid and/or its salt.
本発明において、開示する導電性無機酸化物組成物およ
びその製法は以下の特徴を有する。In the present invention, the disclosed conductive inorganic oxide composition and method for producing the same have the following characteristics.
(1)導電性態tlIM化物組成物からなる粒子は平均
粒径が0.01μTrL〜10μ乳の範囲にあるものが
容易に製造しうる。(1) Particles made of a conductive tlIM compound composition having an average particle size in the range of 0.01 μTrL to 10 μL can be easily produced.
(2)導電性を体積抵抗値で表わして10〜106Ω・
傭の範囲で自由に制御できる。(2) Conductivity expressed as volume resistivity: 10 to 106Ω・
It can be freely controlled within the scope of employment.
(3)水、アルコール類等の極性溶媒との親和性に優れ
、粒子の場合はそれらへの分散が良好である。(3) It has excellent affinity with polar solvents such as water and alcohols, and in the case of particles, it is well dispersed therein.
(4)導電性は大気下の種々の環境においても安定して
いる。(4) Conductivity is stable even in various atmospheric environments.
(5)各秒樹脂や溶剤に対して安定で耐薬品性がある。(5) Stable and chemical resistant to resins and solvents.
(6)500℃程度までの耐熱性がある。(6) Heat resistant up to about 500°C.
従って、粒子化された該組成物を塗料あるいは樹脂等に
分散せた後、各種成形体又は塗膜にした時、粒子が剥離
し難く、環境依存性が小さく安定で信頼性の高い導電体
が得られる。Therefore, when the particulate composition is dispersed in paint or resin, etc. and then formed into various molded bodies or coatings, the particles do not easily peel off, and a stable and reliable conductor with low environmental dependence is obtained. can get.
更に、ヘテロポリ酸構造から由来する種々の特異的な化
学的、電気的等の物性機能も保有し、工業的に意義ある
ものである。Furthermore, it also possesses various specific chemical, electrical, and other physical properties derived from its heteropolyacid structure, and is of industrial significance.
本発明に使用しうるヘテロポリ酸およびその塩を構成す
るヘテロポリ酸としては、その結晶構造において中心と
なりうる元素(以下Δ群元素とよぶ。)と、A群元素の
酸素酸と複合酸素酸をつくりうる元素(以下2群元素と
よぶ。)とからなるもので、例えば次に記載の第1〜3
表のヘテ0ボ第1表 (Z群元素がモリブデンの場合
)第3表 (2群元素が複数の場合)
ヘテロポリ酸塩としては、上記したヘテロポリM(表で
はアニオンの型で記述)のリチウム、ナトリウム、カリ
ウム、ルビジウム、セシウムなどのIa族:銅、銀など
のIb族;ベリリウム、マグネシウム、カルシウム、ス
トロンチウム、バリウムなどのIra族;亜鉛、カドミ
ウム、水銀などのub族:スカンジウム、イツトリウム
などの■b族コニホウ素アルミニウム、ガリウム、イン
ジウム、タリウム等のll[a族;鉄、コバルト、ニッ
ケルなどの■族;ランタン、セリウムなどのランタニド
の金属イオン又はアンモニウムイオン又は四級アンモニ
ウムイオン、ピリジニウムイオン、有機アミン類などの
有機塩基との塩が使用されるが、特に好ましくは、上記
したヘテロポリ酸のアンモニウムイオン又は四級アンモ
ニウムイオンおよびアルキル基の炭素数が1〜20であ
るアルキルアミン類やアルキル基の炭素数が1〜20で
あるアルカノールアミン類などの有機アミン類などとの
塩が使用される。The heteropolyacids constituting the heteropolyacids and their salts that can be used in the present invention include elements that can be central in the crystal structure (hereinafter referred to as Δ group elements), oxyacids of group A elements, and complex oxyacids. elements (hereinafter referred to as group 2 elements), such as the following elements 1 to 3.
Table 1 (When the Z group element is molybdenum) Table 3 (When the 2 group elements are multiple) , Ia group such as sodium, potassium, rubidium, cesium; Ib group such as copper, silver; Ira group such as beryllium, magnesium, calcium, strontium, barium; Ub group such as zinc, cadmium, mercury; Scandium, yttrium, etc. ■Group B Coniboron Il such as aluminum, gallium, indium, and thallium [Group A; Group II such as iron, cobalt, and nickel; Metal ions of lanthanides such as lanthanum and cerium, or ammonium ions or quaternary ammonium ions, pyridinium ions, Salts with organic bases such as organic amines are used, and particularly preferably, ammonium ions or quaternary ammonium ions of the above-mentioned heteropolyacids and alkyl amines or alkyl groups in which the alkyl group has 1 to 20 carbon atoms are used. Salts with organic amines such as alkanolamines having 1 to 20 carbon atoms are used.
また、ヘテロポリ酸およびその塩は一般にヘテロポリ酸
塩を構成するA群元素やZ群元素の種類と比率、ヘテロ
ポリ酸と塩を形成するカチオンの種類と比率あるいはヘ
テロポリ酸塩の製法によって、固有の結晶水を有してい
るが、乾燥を行って固有値以下の任意の結晶水を有する
ものや無水のヘテロポリ酸およびその塩としてから本発
明に用いることもできる。In addition, heteropolyacids and their salts generally have unique crystals depending on the type and ratio of group A elements and group Z elements constituting the heteropolyacid salt, the type and ratio of cations forming the salt with the heteropolyacid, or the manufacturing method of the heteropolyacid salt. Although it contains water, it can also be used in the present invention after being dried to have any water of crystallization below the characteristic value, or anhydrous heteropolyacids and salts thereof.
上述したヘテロポリ酸およびその塩の製法は、例えば日
本結晶学会誌Vo1.17.P127(1975)、l
nd。The method for producing the above-mentioned heteropolyacid and its salt is described, for example, in the Journal of the Japanese Crystallographic Society Vol. 1.17. P127 (1975), l
nd.
Eng、ChetProd、Res、Develop、
、Vol、13.m4.P267〜274 (197
4)、触媒、Vol、18. k6.P2S5〜179
(1976)などに示されている従来公知の方法がとり
うる。その他、例えば先に本発明者らが開示した特開昭
61−83609号、特開昭61−101407号の方
法により得られた球状ヘテロポリ酸塩微粒子も好適に使
用しうる。Eng, ChetProd, Res, Develop,
, Vol. 13. m4. P267-274 (197
4), Catalyst, Vol. 18. k6. P2S5~179
(1976) etc. can be used. In addition, spherical heteropolyacid acid fine particles obtained by the methods of JP-A-61-83609 and JP-A-61-101407 previously disclosed by the present inventors can also be suitably used.
上記の一般式
%式%()
(但し、一般式(I)中、XはQ<x<1の任意の数、
yは構成元素によってきまる0≦y〈1の任意の数、2
はモリブデン、タングステンおよびバナジウムよりなる
群から選ばれた少なくとも一種の元素をそれぞれ表わす
)
で示される化合物は「ブロンズ」と呼ばれる不定比化合
物の一種で、外見が金属のようなブロンズ光沢を示し、
しかも電導性があるなど特異な性質を示すが、化学的に
は安定な化合物である。The above general formula % formula % () (However, in the general formula (I), X is any number satisfying Q<x<1,
y is any number in the range 0≦y<1 determined by the constituent elements, 2
(represents at least one element selected from the group consisting of molybdenum, tungsten, and vanadium) is a type of non-stoichiometric compound called "bronze", and has a bronze luster similar to metal in appearance.
Although it exhibits unique properties such as electrical conductivity, it is a chemically stable compound.
本発明に開示する心電性無機酸化物組成物は、上述した
化合物を主成分とすれば、その他の物質、例えば上記一
般式HxZO3−V(I)の式中、Hの一部または全部
をNa、に等のアルカリ金属類やAQ、Cu等の遷移金
属類の原子で置きかえた化合物やP2O5、S i 0
2 、WO3、MOO3、■205等の無機酸化物等、
またはポリマー等の有機物等が混在してもかまわない。The electrocardiographic inorganic oxide composition disclosed in the present invention contains the above-mentioned compound as a main component, and contains other substances such as a part or all of H in the above general formula HxZO3-V(I). Compounds in which atoms of alkali metals such as Na and Ni or transition metals such as AQ and Cu are replaced, P2O5, S i 0
2, inorganic oxides such as WO3, MOO3, ■205, etc.
Alternatively, organic substances such as polymers may be mixed.
本発明者らは、上記のヘテロポリ酸および/またはその
塩を還元雰囲気下で、各物質の分解温度付近で加熱し、
その一部を還元分解することにより還元分解生成物(I
)を含有させることにより、処理前のヘテロポリ酸およ
びその塩よりも導電性が向上することを見い出した。The present inventors heated the above heteropolyacid and/or its salt in a reducing atmosphere near the decomposition temperature of each substance,
By reductively decomposing a part of it, reductive decomposition products (I
) was found to improve the conductivity compared to the heteropolyacid and its salt before treatment.
還元雰囲気とは、窒素、ヘリウム、その他の不活性気体
の雰囲気又は少なくとも水素、アンモニアガス、その他
の還元性気体が存在する雰囲気をいう。The reducing atmosphere refers to an atmosphere of nitrogen, helium, or other inert gas, or an atmosphere in which at least hydrogen, ammonia gas, or other reducing gas is present.
加熱温度は還元雰囲気の種類によって変化しつるが、1
00℃以上の温度、好ましくは各物質の空気中での分解
温度(to)に対して加熱温度(1)はto −200
℃≦(≦to+100℃の温度範囲で、より好ましくは
to−・ 100℃≦t≦to 450℃の温ffS囲
である。各種のヘテロポリ酸およびその塩の分解温度は
、例えば江口ら日本化学会誌、1981゜(3) P3
3B〜342、等に記載されている。The heating temperature varies depending on the type of reducing atmosphere, but 1
00°C or higher, preferably the heating temperature (1) is to -200 relative to the decomposition temperature (to) of each substance in air.
The temperature range is ℃≦(≦to+100℃, more preferably to -, 100℃≦t≦to 450℃. , 1981゜(3) P3
3B-342, etc.
加熱時間については、雰囲気および温度により変化する
が、30分〜20時間行えばよい。The heating time varies depending on the atmosphere and temperature, but may be 30 minutes to 20 hours.
還元分解生成物(I)の組成物中の含有率は加熱条件に
よって任意にコントロールができ、その含有率によって
導電性もコントロールが可能である。すなわち、化合物
(I)の含有率が多いほど導電性は向上し、少ないほど
導電性は低下するが、原料として用いたヘテロポリ酸お
よび/またはその塩の11性よりは高められる。The content of the reductive decomposition product (I) in the composition can be arbitrarily controlled by changing the heating conditions, and the conductivity can also be controlled depending on the content. That is, the higher the content of compound (I), the higher the conductivity, and the lower the content, the lower the conductivity, but it is higher than the 11 character of the heteropolyacid and/or its salt used as a raw material.
すなわち、本発明による無ii*化物組成物の導電性は
、体積抵抗値で表わして10〜106Ω・αの範囲で任
意に所望の導電性が得られる。That is, the conductivity of the ii* compound-free composition according to the present invention can be expressed as a volume resistivity in the range of 10 to 10<6 >[Omega].alpha. as desired.
(発明の効果)
ヘテロポリ酸又はその塩より合成した本発明の導電性無
機酸化物組成物は、例えばその微粒子を樹脂および塗料
用基材に容易に混合・分散され、配合但が少なくてもそ
れから得られる成形体又は塗膜に均質な導電性を付与す
ることができる。(Effect of the invention) The conductive inorganic oxide composition of the present invention synthesized from a heteropolyacid or its salt can be easily mixed and dispersed in, for example, resins and paint base materials, and even if the amount of compounding is small, it can be easily mixed and dispersed. Homogeneous conductivity can be imparted to the obtained molded body or coating film.
樹脂分散体として成形体又は塗膜に応用する際は、電池
、電極材料や固体電解質等、また電子写真、複写機の帯
電ローラ、現像ロール、クリーニングローラ等の材料と
して好適であり、更に電荷、電流、電圧および抵抗値等
の制御素子を作成するための塗料、例えば電界緩和塗料
、帯電防止塗料、二次電子放出塗料等としても好適であ
る。When applied as a resin dispersion to molded bodies or coating films, it is suitable as a material for batteries, electrode materials, solid electrolytes, etc., as well as charging rollers, developing rolls, cleaning rollers, etc. of electrophotography and copying machines. It is also suitable as a paint for creating control elements for current, voltage, resistance, etc., such as electric field relaxing paint, antistatic paint, secondary electron emitting paint, etc.
(実 施 例)
以下、実施例により本発明を詳述するが、この実施例に
より本発明のW!囲が何ら制限されるものではない。(Example) Hereinafter, the present invention will be explained in detail with reference to Examples. There are no restrictions on the area.
なお、生成物の分析には粉末X線回折法を用いrJcP
Ds、 Powder Diffraction、 F
ile J (通称ASTHカード)を参考にして生°
成物を同定した。In addition, powder X-ray diffraction method was used to analyze the product.
Ds, Powder Diffraction, F
Created with reference to ile J (commonly known as ASTH card)
The product was identified.
実施例 1
酸化モリブデン72重団部に脱イオン水700重嚢部を
加え、85重口%リン酸4.79重り部を添加し、液を
撹拌しながら95℃で3時間保持した。その後冷却し不
溶物を吸引濾過で除きリンモリブデンM (83PMO
1204o)水溶液を得た。Example 1 700 parts by weight of deionized water were added to 72 parts by weight of molybdenum oxide, 4.79 parts by weight of 85% by weight phosphoric acid was added, and the solution was held at 95° C. for 3 hours while stirring. After that, it is cooled and the insoluble matter is removed by suction filtration. Phosphormolybdenum M (83PMO
1204o) An aqueous solution was obtained.
得られたリンモリブデン酸水溶液を濃縮乾固し、得られ
た粉末を450℃で5時間水素10%を含む窒素雰囲気
下で還元して組成物試料(イ)を製造した。The obtained phosphomolybdic acid aqueous solution was concentrated to dryness, and the obtained powder was reduced at 450° C. for 5 hours in a nitrogen atmosphere containing 10% hydrogen to produce a composition sample (a).
該組成物試料(イ)は、X線回折の結果、リンモリブデ
ン酸およびその還元分解生成物を含む組成物であり、還
元生成物はHo、 so M o Osと特定され、組
成物中の含有率は60%であり、熱債量分析により、若
干の結晶水を有していることがわかった。As a result of X-ray diffraction, the composition sample (a) is a composition containing phosphomolybdic acid and its reduction decomposition products, and the reduction products are identified as Ho, so Mo Os, and the content in the composition is The percentage was 60%, and thermal bond analysis revealed that it contained some crystal water.
該組成物の物性を測定した結果を第4表に示した。Table 4 shows the results of measuring the physical properties of the composition.
実施例 2
ケイモリブデンi! (H4S iMo1204o・2
9H20)の粉末を350℃で3時間水素10%を含む
窒素雰囲気下で還元して組成物試料(ロ)を製造した。Example 2 Keimolybdenum i! (H4S iMo1204o・2
A composition sample (b) was prepared by reducing the powder of 9H20) at 350° C. for 3 hours in a nitrogen atmosphere containing 10% hydrogen.
該組成物試料(ロ)は、X線回折の結果、ケイモリブデ
ン酸およびその還元生成物を含む組成物であり、還元生
成物は80.30 M OO3と特定され、組成物中の
含有率は40%であり、熱重a分析により、若干の結晶
水を有していることがわかった。As a result of X-ray diffraction, the composition sample (b) is a composition containing silicon molybdic acid and its reduction product, and the reduction product is identified as 80.30 M OO3, and the content in the composition is 40%, and thermogravimetric a analysis revealed that it contained some crystal water.
該組成物の物性を測定した結果を第4表に示した。Table 4 shows the results of measuring the physical properties of the composition.
実施例 3および4
実施例2のケイモリブデン酸をリンタングステン酸(H
3PW12o4o・29H20)およびケイタングステ
ン酸(Ha S 1M0t20.so・29H20)に
代え還元条件を第4表に示したごとくにした以外は、実
施例2と同様にして、組成物試料(ハ)および(ニ)を
製造した。Examples 3 and 4 The silicon molybdic acid of Example 2 was converted to phosphotungstic acid (H
Composition samples (C) and ( D) was manufactured.
該組成物の物性を測定した結果を第4表に示した。Table 4 shows the results of measuring the physical properties of the composition.
実施例 5
脱イオン水800重囲部にリンタングステン酸(H3P
W1204o・29)−120>15Nm部を添加して
溶解した。更に1m下に撹拌しながら10重量%水酸化
ナトリウムを添加しpHを10に調整したあと、塩化ア
ンモニウム1.7重量部を添加して均一溶液を得た。次
いで、該溶液中に濃塩酸を添加して溶液のDHを最終的
に2とし、室温で更に2時間撹拌(1000rpmを続
けて反応を行い、リンタングステン酸アンモニウム塩の
懸濁液を得た。その後、濾過して微粒子を分離した。Example 5 Phosphortungstic acid (H3P) was added to 800 layers of deionized water.
W1204o.29)-120>15 Nm parts were added and dissolved. Further, 10% by weight of sodium hydroxide was added under stirring while stirring to adjust the pH to 10, and then 1.7 parts by weight of ammonium chloride was added to obtain a homogeneous solution. Next, concentrated hydrochloric acid was added to the solution to finally adjust the DH of the solution to 2, and the reaction was continued with stirring (1000 rpm) at room temperature for an additional 2 hours to obtain a suspension of ammonium phosphotungstate salt. Thereafter, it was filtered to separate fine particles.
この微粒子に対し2回の水洗いと炉別を繰り返した後、
アセトンでフラッシングし、風乾してリンタングステン
酸アンモニウム塩微粒子を製造した。After repeating water washing and furnace separation for these fine particles twice,
It was flushed with acetone and air-dried to produce ammonium phosphotungstate salt fine particles.
該微粒子を550℃で5時間窒素気流下で還元して組成
物試料(ホ)を製造した。The fine particles were reduced at 550° C. for 5 hours under a nitrogen stream to produce a composition sample (e).
該組成物試料(ホ)は、X線回析の結果、リンタングス
テン酸アンモニウムおよびその還元分解生成物を含む組
成物であり、還元生成物はHo、 5sWO3と同定さ
れ、組成物中の含有率は75%であり、熱重量分析によ
り、若干の結晶水を有していることがわかった。As a result of X-ray diffraction, the composition sample (E) is a composition containing ammonium phosphotungstate and its reduction decomposition product, and the reduction product is identified as Ho, 5sWO3, and the content in the composition is was 75%, and thermogravimetric analysis revealed that it contained some water of crystallization.
該組成物の物性を測定した結果を第4表に示した。Table 4 shows the results of measuring the physical properties of the composition.
なお、該組成物のX線回折チャートを図1に示す。Incidentally, an X-ray diffraction chart of the composition is shown in FIG.
実施例 6〜8
実施例5においてリンタングステン酸をリンモリブデン
酸、ケイモリブデン酸またはケイタングステン酸に代え
、第4表に示すごとくの分解還元条件に代えた以外は、
実施例5と同様にして組成物試料(へ)、(ト)、(チ
)を製造した。Examples 6 to 8 Except that phosphotungstic acid in Example 5 was replaced with phosphomolybdic acid, silicomolybdic acid, or silicotungstic acid, and the decomposition and reduction conditions were changed as shown in Table 4,
Composition samples (f), (t), and (h) were produced in the same manner as in Example 5.
各試料の製造における還元条件および物性を測定した結
果を第4表に示した。Table 4 shows the results of measuring the reduction conditions and physical properties in the production of each sample.
なお、実施例6で得られた組成物のX線回折チャートを
図2に示す。Note that an X-ray diffraction chart of the composition obtained in Example 6 is shown in FIG.
実施例 9
実施例5において塩化アンモニウムの代わりにトリエタ
ノールアミンを用いた以外は実施例5と同様にして、組
成物試料(す)を製造した。Example 9 A composition sample was produced in the same manner as in Example 5, except that triethanolamine was used instead of ammonium chloride.
該試料の製造における還元条件および試料の物性を測定
した結果を第4表に示した。Table 4 shows the reduction conditions in the production of the sample and the results of measuring the physical properties of the sample.
実施例 10〜13
大塵例5において、分解還元条件を第5表に示すごとく
に代えた以外は実施例5と同様にして組成物試料(ヌ)
、(ル)、(オ)、(ワ)を製造した。Examples 10-13 Composition samples (nu) were prepared in the same manner as in Example 5, except that the decomposition and reduction conditions in Large Dust Example 5 were changed as shown in Table 5.
, (L), (O), and (W) were manufactured.
該組成物の物性を測定した結果を第5表に示・した。Table 5 shows the results of measuring the physical properties of the composition.
(以下余白)
第 5 表
実施例 14
実施例5で得られた組成物試料(ホ)30重量部をアロ
ロン50(商品名;中油性アルキッド樹脂、樹脂固形分
50%、日本触媒化学工業側製)200重ff1部に添
加し、ペイントシェーカーで30分間混合し、導電性塗
料とした。この導電性塗料をポリエチレンテレフタレー
トフィルムにドクターブレード法により、乾燥後の塗膜
の厚さが5μmになるように塗布した。(Leaving space below) Table 5 Example 14 30 parts by weight of the composition sample (e) obtained in Example 5 was added to Aloron 50 (trade name: medium oil-based alkyd resin, resin solid content 50%, manufactured by Nippon Shokubai Chemical Industry Co., Ltd.) ) was added to 1 part of 200 weight ff and mixed for 30 minutes using a paint shaker to obtain a conductive paint. This conductive coating material was applied to a polyethylene terephthalate film by a doctor blade method so that the thickness of the coating film after drying was 5 μm.
得られた塗膜の表面抵抗値を20℃、50%RHで測定
すると、3.0X1010Ω/口であった。When the surface resistance value of the obtained coating film was measured at 20° C. and 50% RH, it was 3.0×10 10 Ω/mouth.
比較例 1
分解還元処理を施さないリンタングステン酸アンモニウ
ム[(NH4)3 PW1204o・4H20]の体積
固有抵抗値を第4表に示した条件下に測定した結果、2
.4X104Ω・CIMであった。Comparative Example 1 The volume resistivity value of ammonium phosphotungstate [(NH4)3 PW1204o・4H20] which was not subjected to decomposition and reduction treatment was measured under the conditions shown in Table 4.
.. It was 4×104Ω・CIM.
図1は、実施例5で得られた組成物試料(ホ)のX線回
折チャートであり、図2は実施例6で得られた組成物試
料(へ)のX線回折チャートである。
手 続 補 正 書 (自発)平成元年2月
23日FIG. 1 is an X-ray diffraction chart of the composition sample (E) obtained in Example 5, and FIG. 2 is an X-ray diffraction chart of the composition sample (E) obtained in Example 6. Procedural amendment (voluntary) February 23, 1989
Claims (6)
yは0≦y<3の任意の数、Zはモリブデン、タングス
テンおよびバナジウムよりなる群から選ばれた少なくと
も一種の元素をそれぞれ表わす)で示される化合物とを
主成分とする導電性無機酸化物組成物。(1) Heteropolyacid and/or its salt and the general formula HxZO_3-y...(I) (However, in the general formula (I), x is any number satisfying 0<x<1,
A conductive inorganic oxide composition containing as a main component a compound represented by: y is an arbitrary number of 0≦y<3, and Z represents at least one element selected from the group consisting of molybdenum, tungsten, and vanadium. thing.
の中から選ばれる少なくとも一種の元素(a)およびモ
リブデン、タングステンおよびバナジウムよりなる群か
ら選ばれた少なくとも一種の元素(b)の複合酸素酸お
よび/またはその塩である請求項(1)記載の導電性無
機酸化物組成物。 (記) A群:ホウ素、アルミニウム、ガリウム、ケイ素、ゲル
マニウム、セリウム、チタ ン、ジルコニウム、アンチモン、ビス マス、ロジウム、銅、白金、リン、鉄、 コバルトおよびニッケル(2) Complex oxygen in which the heteropolyacid and/or its salt is composed of at least one element (a) selected from Group A below and at least one element (b) selected from the group consisting of molybdenum, tungsten, and vanadium. The conductive inorganic oxide composition according to claim 1, which is an acid and/or a salt thereof. (Note) Group A: boron, aluminum, gallium, silicon, germanium, cerium, titanium, zirconium, antimony, bismuth, rhodium, copper, platinum, phosphorus, iron, cobalt and nickel
塩を分解還元して得られたものである請求項(1)また
は(2)記載の導電性無機酸化物組成物。(3) The conductive inorganic oxide composition according to claim (1) or (2), wherein the compound (I) is obtained by decomposing and reducing a heteropolyacid and/or a salt thereof.
ミンの塩である請求項(1)、(2)または(3)記載
の導電性無機酸化物組成物。(4) The conductive inorganic oxide composition according to claim (1), (2) or (3), wherein the heteropolyacid salt is an ammonium salt or an organic amine salt.
下に加熱してその一部を分解還元することを特徴とする
ヘテロポリ酸および/またはその塩と一般式 HxZO_3−y・・・・・・(I) (但し、一般式(I)中xは0<x<1の 任意の数、yは0≦y<3の任意の数、Z はモリブデン、タングステンおよびバナジ ウムよりなる群から選ばれた少なくとも一 種の元素をそれぞれ表わす) で示される化合物とを主成分とする導電性無機酸化物組
成物の製法。(5) A heteropolyacid and/or a salt thereof characterized by heating the heteropolyacid and/or its salt in a reducing atmosphere to decompose and reduce a portion thereof and the general formula HxZO_3-y...( I) (However, in general formula (I), x is any number satisfying 0<x<1, y is any number satisfying 0≦y<3, and Z is at least one selected from the group consisting of molybdenum, tungsten, and vanadium. A method for producing a conductive inorganic oxide composition containing as a main component a compound represented by (each representing a type of element).
の中から選ばれる少なくとも一種の元素(a)およびモ
リブデン、タングステンおよびバナジウムよりなる群か
ら選ばれた少なくとも一種の元素(b)の複合酸素酸お
よび/またはその塩である請求項(5)記載の導電性無
機酸化物組成物の製法。 (記) A群:ホウ素、アルミニウム、ガリウム、ケイ素、ゲル
マニウム、セリウム、チタ ン、ジルコニウム、アンチモン、ビス マス、ロジウム、銅、白金、リン、鉄、 コバルトおよびニッケル(6) Complex oxygen in which the heteropolyacid and/or its salt is composed of at least one element (a) selected from Group A below and at least one element (b) selected from the group consisting of molybdenum, tungsten, and vanadium. The method for producing a conductive inorganic oxide composition according to claim (5), which is an acid and/or a salt thereof. (Note) Group A: boron, aluminum, gallium, silicon, germanium, cerium, titanium, zirconium, antimony, bismuth, rhodium, copper, platinum, phosphorus, iron, cobalt and nickel
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13128589A JPH02312106A (en) | 1989-05-26 | 1989-05-26 | Conductive inorganic oxide composite and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13128589A JPH02312106A (en) | 1989-05-26 | 1989-05-26 | Conductive inorganic oxide composite and manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02312106A true JPH02312106A (en) | 1990-12-27 |
Family
ID=15054379
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13128589A Pending JPH02312106A (en) | 1989-05-26 | 1989-05-26 | Conductive inorganic oxide composite and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02312106A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109437305A (en) * | 2018-11-05 | 2019-03-08 | 中南大学 | A method of natural gas desulfurizing agent sodium phosphomolybdate is prepared using nickel-molybdenum ore |
JP2019163199A (en) * | 2017-08-08 | 2019-09-26 | 国立大学法人山形大学 | Reduced heteropolyoxomethalate and production process therefor, coating ink containing said reduced heteropolyoxomethalate, and organic electronic device using same |
JP2021523863A (en) * | 2018-05-11 | 2021-09-09 | エルジー エレクトロニクス インコーポレイティド | Method for producing transition metal oxide fine particles |
-
1989
- 1989-05-26 JP JP13128589A patent/JPH02312106A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019163199A (en) * | 2017-08-08 | 2019-09-26 | 国立大学法人山形大学 | Reduced heteropolyoxomethalate and production process therefor, coating ink containing said reduced heteropolyoxomethalate, and organic electronic device using same |
JP2021523863A (en) * | 2018-05-11 | 2021-09-09 | エルジー エレクトロニクス インコーポレイティド | Method for producing transition metal oxide fine particles |
US11420258B2 (en) | 2018-05-11 | 2022-08-23 | Lg Electronics Inc. | Method for manufacture of transition metal oxide fine particles |
CN109437305A (en) * | 2018-11-05 | 2019-03-08 | 中南大学 | A method of natural gas desulfurizing agent sodium phosphomolybdate is prepared using nickel-molybdenum ore |
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