JPH0230767A - Formation of thin oxide film and laminated body - Google Patents
Formation of thin oxide film and laminated bodyInfo
- Publication number
- JPH0230767A JPH0230767A JP8434088A JP8434088A JPH0230767A JP H0230767 A JPH0230767 A JP H0230767A JP 8434088 A JP8434088 A JP 8434088A JP 8434088 A JP8434088 A JP 8434088A JP H0230767 A JPH0230767 A JP H0230767A
- Authority
- JP
- Japan
- Prior art keywords
- alcohol
- metal
- solution
- solvent
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000015572 biosynthetic process Effects 0.000 title description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 80
- 229910052751 metal Inorganic materials 0.000 claims abstract description 31
- 239000002184 metal Substances 0.000 claims abstract description 31
- 150000004703 alkoxides Chemical class 0.000 claims abstract description 24
- 239000002904 solvent Substances 0.000 claims abstract description 24
- 239000012046 mixed solvent Substances 0.000 claims abstract description 18
- 229910052755 nonmetal Inorganic materials 0.000 claims abstract description 13
- 239000010409 thin film Substances 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 14
- 229920000620 organic polymer Polymers 0.000 claims description 9
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 abstract description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 15
- -1 ethanol Chemical compound 0.000 abstract description 11
- 150000004706 metal oxides Chemical class 0.000 abstract description 11
- 150000001298 alcohols Chemical class 0.000 abstract description 9
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 9
- 239000000203 mixture Substances 0.000 abstract description 8
- 239000002253 acid Substances 0.000 abstract description 7
- 229920000642 polymer Polymers 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 5
- 239000000126 substance Substances 0.000 abstract description 4
- 239000000853 adhesive Substances 0.000 abstract 2
- 230000001070 adhesive effect Effects 0.000 abstract 2
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 235000019441 ethanol Nutrition 0.000 description 43
- 239000000243 solution Substances 0.000 description 24
- 239000011248 coating agent Substances 0.000 description 18
- 238000000576 coating method Methods 0.000 description 18
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 13
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 13
- 230000007062 hydrolysis Effects 0.000 description 13
- 238000006460 hydrolysis reaction Methods 0.000 description 13
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 12
- 239000004926 polymethyl methacrylate Substances 0.000 description 12
- 238000009833 condensation Methods 0.000 description 11
- 230000005494 condensation Effects 0.000 description 11
- 239000007788 liquid Substances 0.000 description 9
- 239000011259 mixed solution Substances 0.000 description 9
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920000307 polymer substrate Polymers 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 1
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Chemical class 0.000 description 1
- 229910052778 Plutonium Inorganic materials 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Chemical class 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical class O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000000975 dye Chemical class 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910052730 francium Inorganic materials 0.000 description 1
- KLMCZVJOEAUDNE-UHFFFAOYSA-N francium atom Chemical compound [Fr] KLMCZVJOEAUDNE-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical group 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000000049 pigment Chemical class 0.000 description 1
- OYEHPCDNVJXUIW-UHFFFAOYSA-N plutonium atom Chemical compound [Pu] OYEHPCDNVJXUIW-UHFFFAOYSA-N 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- ZGSOBQAJAUGRBK-UHFFFAOYSA-N propan-2-olate;zirconium(4+) Chemical compound [Zr+4].CC(C)[O-].CC(C)[O-].CC(C)[O-].CC(C)[O-] ZGSOBQAJAUGRBK-UHFFFAOYSA-N 0.000 description 1
- 229910052705 radium Inorganic materials 0.000 description 1
- HCWPIIXVSYCSAN-UHFFFAOYSA-N radium atom Chemical compound [Ra] HCWPIIXVSYCSAN-UHFFFAOYSA-N 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000000935 solvent evaporation Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- WOZZOSDBXABUFO-UHFFFAOYSA-N tri(butan-2-yloxy)alumane Chemical compound [Al+3].CCC(C)[O-].CCC(C)[O-].CCC(C)[O-] WOZZOSDBXABUFO-UHFFFAOYSA-N 0.000 description 1
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は有機高分子基体上に金属又は非金属の酸化物薄
膜を形成させる方法及び該方法により得られる有機高分
子基体と酸化物薄膜とからなる積層体に関する。Detailed Description of the Invention (Industrial Application Field) The present invention relates to a method for forming a metal or nonmetal oxide thin film on an organic polymer substrate, and a method for forming an oxide thin film on an organic polymer substrate and an oxide thin film obtained by the method. The present invention relates to a laminate consisting of.
有機高分子基体と金属又は非金属の酸化物薄膜とからな
る積層体は高分子表面の機械的保護、化学的保護、高分
子表面への強誘電層、イオン伝導層、電子伝導層の形成
等を目的として行なわれている。A laminate consisting of an organic polymer base and a metal or non-metal oxide thin film can be used for mechanical protection, chemical protection, formation of a ferroelectric layer, ion conduction layer, electron conduction layer on the polymer surface, etc. It is carried out for the purpose of
(従来の技術)
このような酸化物薄膜の形成法の1つとして基体上に金
属又は非金属のアルコキシドの薄膜を形成させ、これを
酸化物に転換せしめる方法があり、薄膜の形成、基体と
の密着性に比較的優れる、金属又は非金属元素の選択の
巾が広い等の点から好ましいものとされている。(Prior art) One of the methods for forming such an oxide thin film is to form a thin film of metal or nonmetal alkoxide on a substrate and convert it into an oxide. It is preferable because it has relatively excellent adhesion and a wide selection of metal or nonmetal elements.
例えば、特開昭61−276865号公報にはシリコン
とチタンのアルコキシドの溶液を高分子表面に塗布した
後、これを部分的の加水分解して表面に無機高分子層を
形成させることが記載され、特公昭62−9417号公
報には選択光透過性積層体の製法が記載され、その中に
アルキルチタネ−トの有機溶剤を塗布する工程を含む酸
化チタン薄膜層を形成させる方法が記載されている。前
記特公昭62−9417号公報に記載された方法で用い
る有機溶媒としては溶質に対する溶解度、蒸発性、不活
性性が満されればよいとして、各種炭化水素やエタノー
ル、イソプロパツール、ブタノール等が挙げられ、特開
昭61−276865号公報ではイソプロパツールを好
ましい溶媒としている。For example, Japanese Patent Application Laid-Open No. 61-276865 describes that a solution of silicon and titanium alkoxides is applied to a polymer surface and then partially hydrolyzed to form an inorganic polymer layer on the surface. , Japanese Patent Publication No. 62-9417 describes a method for producing a selectively transparent laminate, and describes a method for forming a titanium oxide thin film layer therein, which includes a step of coating an organic solvent of alkyl titanate. . The organic solvent used in the method described in Japanese Patent Publication No. 62-9417 may be various hydrocarbons, ethanol, isopropanol, butanol, etc. as long as it satisfies solubility, evaporability, and inertness for the solute. JP-A-61-276865 discloses isopropanol as a preferred solvent.
(発明が解決しようとする問題点)
しかし、均一な薄膜の形成、基体との密着性を考慮する
と、用いる溶媒は何でもよいということはなく、例えば
、炭化水素は水との相溶性が悪いので、金属酸化物薄膜
形成用の溶媒としては不適切であってこれを単独で溶媒
として用いることはできず、アルコール等の親水性溶媒
−に添加する補助溶媒としてしか用いることができない
。さらに、炭化水素とアルコールとの混合溶媒としても
製膜性は充分とはいえず、光学材料等の表面に金属酸化
物薄膜を形成させるための溶媒としては好ましくないも
のである。各種溶媒の中ではアルコールが比較的好まし
いものであるが、エタノール等の低級アルコールはその
極性が大きすぎて、その結果として、形成される金属酸
化物薄膜と基体との密着性が充分でなくなるという問題
がある。又、炭素数5 (C5)以上のアルコールは逆
に溶媒の極性が小さすぎて塗布液が均一となり難く、均
一な薄膜の形成が困難となったり、溶液の安定性が悪い
という問題がある。(Problem to be solved by the invention) However, considering the formation of a uniform thin film and the adhesion to the substrate, it is not sufficient to use any solvent; for example, hydrocarbons have poor compatibility with water; , is unsuitable as a solvent for forming metal oxide thin films, and cannot be used alone as a solvent, but only as an auxiliary solvent added to a hydrophilic solvent such as alcohol. Furthermore, even a mixed solvent of hydrocarbon and alcohol does not have sufficient film-forming properties, and is not preferred as a solvent for forming a metal oxide thin film on the surface of an optical material or the like. Among various solvents, alcohol is relatively preferable, but lower alcohols such as ethanol have too high polarity, resulting in insufficient adhesion between the formed metal oxide thin film and the substrate. There's a problem. On the other hand, alcohols having carbon atoms of 5 or more (C5) have problems in that the polarity of the solvent is too low, making it difficult to form a uniform coating solution, making it difficult to form a uniform thin film, and having poor stability of the solution.
特開昭61−276865号公報で指摘しているように
アルコールの中ではイソプロパツールやブタノールが比
較的良好で形成される金属酸化物薄膜の有機基体への密
着性も他の溶媒を用いた場合に比べ優れているが、形成
された薄膜の耐水性、耐溶剤性を考慮して、さらに高い
密着性を有するものに対する要望が高まってきている。As pointed out in JP-A No. 61-276865, isopropanol and butanol are relatively good among alcohols, and the adhesion of the formed metal oxide thin film to the organic substrate is also poor when other solvents are used. However, in consideration of the water resistance and solvent resistance of the formed thin film, there is an increasing demand for a film with even higher adhesion.
本発明者等は、このような状況に鑑み、鋭意検討した結
果、溶媒として特定の組成のアルコール混合溶媒を用い
ると製膜性も密着性も優れた金属酸化物薄膜を形成し得
ることを見出し、本発明に到達した。In view of this situation, the inventors of the present invention have conducted intensive studies and found that a metal oxide thin film with excellent film formability and adhesion can be formed by using an alcohol mixed solvent with a specific composition as a solvent. , arrived at the present invention.
(問題点を解決するための手段)
即ち、本発明の要旨は、金属又は非金属のアルコキシド
のアルコール溶液を有機高分子基体上に塗布し、ついで
溶媒を蒸発させて該基体上に酸化物薄膜を形成させる方
法において、金属又は非金属のアルコキシドの溶媒とし
て炭素数4以下のアルコールと炭素数5以上のアルコー
ルの混合溶媒であって、かつ該混合溶媒中における炭素
数5以上のアルコールの体積分率が5%以上70%以下
であるものを用いることを特徴とする酸化物薄膜の形成
方法にあり、さらに該方法によって得られる有機高分子
基体とその上に形成された酸化物薄膜とからなる積層体
にある。(Means for Solving the Problems) That is, the gist of the present invention is to apply an alcohol solution of a metal or nonmetal alkoxide onto an organic polymer substrate, and then evaporate the solvent to form a thin oxide film on the substrate. A mixed solvent of an alcohol having 4 or less carbon atoms and an alcohol having 5 or more carbon atoms as a solvent for the metal or nonmetal alkoxide, and the volume of the alcohol having 5 or more carbon atoms in the mixed solvent. A method for forming an oxide thin film characterized by using an oxide thin film having a ratio of 5% to 70%, further comprising an organic polymer substrate obtained by the method and an oxide thin film formed thereon. It is in a laminate.
本発明およにおいて用いられる金属アルコキシドの金属
の種類には特に限定はなく、目的に応じて適宜選択する
ことができ、例えば元素周期表におけるランタナイド元
素を除< II B〜VIBの元素、窒素を除< II
I A NV Aの元素、マンガン、鉄、コバルト、ニ
ッケル、銅のいずれをも用いることができ、これらの元
素を適宜組み合わせて用いることもできる。更に、これ
らと水素、フランシウム、ラジウムを除<IA、II
Aの元素、ランタナイド族元;L硫黄、セレン、テルル
、トリウム、プロトアクチニウム、ウラン、プルトニウ
ムから選ばれる1種以上の元素とを組み合わせて用いる
こともできる(以下これらの元素を総称して金属という
)。The type of metal in the metal alkoxide used in the present invention is not particularly limited and can be appropriately selected depending on the purpose. Excluding < II
Any of the IA N V A elements, manganese, iron, cobalt, nickel, and copper can be used, and these elements can also be used in an appropriate combination. Furthermore, excluding these and hydrogen, francium, and radium <IA, II
Element A, a lanthanide group element; L can also be used in combination with one or more elements selected from sulfur, selenium, tellurium, thorium, protactinium, uranium, and plutonium (hereinafter these elements are collectively referred to as metals). ).
金属アルコキシドのアルコール成分のアルキル鎖長とし
ては炭素数1〜5のものが好ましく用いられる。炭素数
6以上のものは有機物が残存し易いという傾向にあり好
ましくない。金属アルコキシドのアルコキシド成分は同
じものであってもよく、異なる鎖長のアルコキシドの組
み合わせであってもよい。The alkyl chain length of the alcohol component of the metal alkoxide preferably has 1 to 5 carbon atoms. Those having 6 or more carbon atoms are not preferred because organic substances tend to remain. The alkoxide components of the metal alkoxides may be the same or may be a combination of alkoxides with different chain lengths.
本発明で用いる金属アルコキシドの溶媒は炭素数4以下
のアルコールと炭素数5以上のアルコールの混合物であ
る必要がある。炭素数4以下のアルコールとしてはメタ
ノール、エタノール、プロパツール、ブタノール及びこ
れらの異性体のいずれをも用いることができるが、この
中ではエチルアルコール、イソプロピルアルコールが極
性、沸点等の関係から好ましい。炭素数5以上のアルコ
ールとしてはアミルアルコール、ヘキシルアルコール、
ヘプチルアルコール、オクチルアルコール及びこれらの
異性体を挙げることができる。炭素数9以上のアルコー
ルは沸点が高く、高分子基体の上に金属アルコキシド溶
液を塗布した後の溶媒蒸発工程において蒸発にそれだけ
多くのエネルギーを要することから炭素数5以上のアル
コールとしては炭素数5〜8のアルコールであることが
好ましい。又、本発明で用いる混合溶媒としては該混合
溶媒中における炭素数5以上のアルコールの体積分率が
5%以上かつ70%以下である必要がある。この体積分
率が5%未満であると該混合溶媒の極性が大きすぎるた
め、生成される金属参加物情膜と基体との密着性が充分
でなくなり、逆にとの体積分率が70%を超えると該混
合溶媒の極性が小さくなりすぎて、金属アルコキシドと
若干の水と加水分解触媒としての酸を加えた塗布液が均
一となり難くなったり安定性に欠けたりするので好まし
くない。The solvent for the metal alkoxide used in the present invention needs to be a mixture of an alcohol having 4 or less carbon atoms and an alcohol having 5 or more carbon atoms. As the alcohol having 4 or less carbon atoms, methanol, ethanol, propatool, butanol, and any of these isomers can be used, but among these, ethyl alcohol and isopropyl alcohol are preferred in terms of polarity, boiling point, etc. Alcohols having 5 or more carbon atoms include amyl alcohol, hexyl alcohol,
Mention may be made of heptyl alcohol, octyl alcohol and their isomers. Alcohols with a carbon number of 9 or more have a high boiling point and require a lot of energy for evaporation in the solvent evaporation process after coating a metal alkoxide solution on a polymer substrate. -8 alcohols are preferred. Further, in the mixed solvent used in the present invention, the volume fraction of alcohol having 5 or more carbon atoms in the mixed solvent must be 5% or more and 70% or less. If this volume fraction is less than 5%, the polarity of the mixed solvent will be too large, resulting in insufficient adhesion between the produced metal particulate film and the substrate, and conversely, the volume fraction will be 70%. Exceeding this is not preferable because the polarity of the mixed solvent becomes too low and the coating solution containing the metal alkoxide, some water, and an acid as a hydrolysis catalyst becomes difficult to be uniform or lacks stability.
金属アルコキシドのアルコール溶液としては金属アルコ
キシドの濃度が5〜40重量%であるものが好ましく用
いられ、この下限未満であると一回の塗布で得られる膜
厚が薄すぎ、所定の膜厚にするため塗布、乾燥を何度も
繰り返す必要が生じて煩雑となり、上限を超える濃度で
は塗布液がゲル化し易く、安定性に欠けるという欠点が
あり好ましくない。As the alcohol solution of metal alkoxide, one in which the concentration of metal alkoxide is 5 to 40% by weight is preferably used; if it is less than this lower limit, the film thickness obtained by one application will be too thin, and it is necessary to adjust the film thickness to a specified value. Therefore, it is necessary to repeat coating and drying many times, which is complicated, and if the concentration exceeds the upper limit, the coating liquid tends to gel, which is undesirable because it lacks stability.
本発明で用いる金属アルコキシドのアルコール溶液には
加水分解のため3〜10重量%の水と0.3〜1重量%
の酸が添加される。この酸としては塩酸等の無機酸、酢
酸等の有機酸を用いることができる。The alcoholic solution of the metal alkoxide used in the present invention contains 3 to 10% by weight of water and 0.3 to 1% by weight for hydrolysis.
of acid is added. As this acid, an inorganic acid such as hydrochloric acid or an organic acid such as acetic acid can be used.
このアルコール溶液としては金属アルコキシドと水と酸
を添加した混合溶媒をそのまま高分子基体表面に塗布し
てもよく、この溶液を充分攪拌してあらかじめある程度
加水分解と部分縮合させたものを塗布してもよい。加水
分解と部分縮合を行なわせる場合は反応後の溶液が均一
かつ塗布可能な粘度に保たれる程度に反応を留めておく
必要があり、粘度としては10センチポアズ以下に留め
ておくことが好ましい。As this alcohol solution, a mixed solvent containing a metal alkoxide, water, and an acid may be applied as is to the surface of the polymer substrate, or this solution may be thoroughly stirred and subjected to some degree of hydrolysis and partial condensation before being applied. Good too. When hydrolysis and partial condensation are carried out, it is necessary to keep the reaction to such an extent that the solution after the reaction is maintained at a uniform and coatable viscosity, and the viscosity is preferably kept at 10 centipoise or less.
このアルコール溶液には実質的に加水分解・縮合を阻害
しないものであれば必要に応じて種々のものを添加する
ことができる。この添加物の例としてはコロイダルシリ
カ、シランカップリング剤、染料、顔料、エポキシ化合
物等を例示できる。Various substances can be added to this alcohol solution as required, as long as they do not substantially inhibit hydrolysis and condensation. Examples of such additives include colloidal silica, silane coupling agents, dyes, pigments, and epoxy compounds.
本発明で用いられる基体としては有機高分子であればど
のようなものも用いることができ、目的に応じて適宜高
分子の種類を選択でき、光学的用途に用いる場合等では
ポリメチルメタクリレート、ポリカーボネート、ポリス
チレン等を挙げることができ、ポリエチレンテレフタレ
ート、ポリプロピレン等も基体として用いられ、その形
状は特に限定されるものではなく、シート、フィルム、
各種成形物等種々の形のものを用いることができる。As the substrate used in the present invention, any organic polymer can be used, and the type of polymer can be selected as appropriate depending on the purpose. When used for optical purposes, polymethyl methacrylate, polycarbonate, etc. , polystyrene, etc., and polyethylene terephthalate, polypropylene, etc. can also be used as the substrate, and the shape is not particularly limited, and may be a sheet, a film,
Various shapes such as various molded products can be used.
本発明で用いる溶液はアルコール混合溶媒に金属アルコ
キシドと水と酸を添加して混合して形成してもよいが、
金属アルコキシドと水及び酸を別々にアルコール混合溶
媒に溶解した後に、この両者を混合するのが反応コント
ロールの点から好ましい。The solution used in the present invention may be formed by adding and mixing metal alkoxide, water, and acid to an alcohol mixed solvent;
From the viewpoint of reaction control, it is preferable to dissolve the metal alkoxide, water and acid separately in an alcohol mixed solvent and then mix the two.
本発明においては上記溶液をそのまま、あるいは(部分
)加水分解、部分縮合を行なわせたのち有機高分子基体
上に塗布し、溶媒を蒸発させ、さらに加熱して金属酸化
物の縮合体を高分子基体上に形成させる。この塗布・乾
燥は必要に応じ複数回繰り返してもよく、繰り返す場合
は同種の溶液を塗布してもよく、その都度具なる金属ア
ルコキシドの溶液を塗布してもよい。金属の異なる溶液
を塗布した場合は層毎に金属の異なる積層体が得られる
。In the present invention, the above solution is coated on an organic polymer substrate as it is or after (partial) hydrolysis or partial condensation, the solvent is evaporated, and the metal oxide condensate is heated to form a polymer. formed on a substrate. This coating and drying may be repeated multiple times as necessary, and when repeated, the same type of solution may be applied, or a different metal alkoxide solution may be applied each time. When solutions of different metals are applied, a laminate of different metals is obtained for each layer.
本発明の積層体としては金属酸化物の厚さは目的に応じ
て種々の値とすることができ、好ましい厚さとして0.
03〜0.3μmのものを例示できる。In the laminate of the present invention, the thickness of the metal oxide can be set to various values depending on the purpose, and the preferred thickness is 0.
Examples include those having a diameter of 0.03 to 0.3 μm.
(実施例) 以下に実施例を用いて本発明を更に説明する。(Example) The present invention will be further explained below using Examples.
なお、実施例において金属酸化物薄膜の厚さはエリプソ
メーター(溝尻光学工業所製)で測定し、密着性は積層
体の表面を1 mmX 11I11のます目を100個
形成するようにカミソリでクロスカットし、その上に粘
着テープにチバン 405)を充分に密着させた後、こ
の粘着テープを剥離することを3回繰り返し、表面の薄
膜の剥離していないます目の数を密着性の尺度とした。In the examples, the thickness of the metal oxide thin film was measured using an ellipsometer (manufactured by Mizojiri Optical Kogyo Co., Ltd.), and the adhesion was measured by cross-cutting the surface of the laminate with a razor to form 100 squares of 1 mm x 11I11. After cutting and adhering Chiban 405) to the adhesive tape, the process of peeling off the adhesive tape was repeated three times, and the number of unpeeled areas in the thin film on the surface was used as a measure of adhesion. did.
実施例1
n−アミルアルコール172.5mIL、エタノール1
5.OmJZを混合しテアルコール混合溶媒を調製し、
この100mItにエチルシリケート31.2gを溶解
し、残りのアルコール混合溶媒に水13.5gと塩酸1
,5gを混合し、この両者を混合して室温で3時間攪拌
混合して加水分解・部分縮合を行なわせ、粘度3.6セ
ンチボアズの塗布用溶液を得た。これをポリメチルメタ
クリレート板上にデイツプ法で塗布し、室温下で5分間
、更に80℃で30分間加熱乾燥して溶媒を蒸発させる
とともに加水分解・縮合を完結させた。Example 1 n-amyl alcohol 172.5ml, ethanol 1
5. Mix OmJZ to prepare a tetraalcohol mixed solvent,
Dissolve 31.2 g of ethyl silicate in this 100 ml, add 13.5 g of water and 1 ml of hydrochloric acid to the remaining alcohol mixed solvent.
, 5 g were mixed, and both were stirred and mixed at room temperature for 3 hours to effect hydrolysis and partial condensation, thereby obtaining a coating solution with a viscosity of 3.6 centiboaz. This was applied onto a polymethyl methacrylate plate by the dip method, and heated and dried at room temperature for 5 minutes and then at 80° C. for 30 minutes to evaporate the solvent and complete hydrolysis and condensation.
得られた積層体の珪酸縮合薄膜の厚さは約800人であ
り、密着性は100%であった。The thickness of the silicic acid condensed thin film of the obtained laminate was approximately 800 mm, and the adhesion was 100%.
実施例2
エチルシリケート31.2gをn−アミルアルコール4
. 5171LL、 エタノール81mILの混合溶液
に溶解した溶液と、水13.5g、塩酸1.5g、n−
アミルアルコール4.5mfl、エタノール81m1L
からなる溶液(塗布液粘度約1.7cp)とを用いた以
外は実施例1と同様にして積層体を得た。得られた積層
体の珪酸縮合薄膜の厚さは約800人であり、密着性は
100%であった。Example 2 31.2 g of ethyl silicate was mixed with 4 g of n-amyl alcohol.
.. 5171LL, a solution dissolved in a mixed solution of ethanol 81ml, water 13.5g, hydrochloric acid 1.5g, n-
Amyl alcohol 4.5mfl, ethanol 81ml 1L
A laminate was obtained in the same manner as in Example 1, except that a solution consisting of (coating liquid viscosity: about 1.7 cp) was used. The thickness of the silicic acid condensed thin film of the obtained laminate was approximately 800 mm, and the adhesion was 100%.
実施例3
ポリメチルメタクリレート板の代りにポリエチレンテレ
フタレートシートを用いた以外は実施例2と同様にした
。得られた積層体の珪酸縮合薄膜の密着性は100%で
あった。Example 3 The same procedure as Example 2 was carried out except that a polyethylene terephthalate sheet was used instead of the polymethyl methacrylate plate. The adhesion of the silicic acid condensed thin film of the obtained laminate was 100%.
比較例1
n−アミルアルコール及びエタノールの代りに各々イソ
プロパツールを用いた以外は実施例2と同様にして厚さ
約1000人の薄膜が表面に形成されたポリメチルメタ
クリレート板を得た(塗布液粘度約2.5cp)。この
薄膜の密着性は45%であった。Comparative Example 1 A polymethyl methacrylate plate on which a thin film of about 1000 mm thick was formed on the surface was obtained in the same manner as in Example 2, except that isopropanol was used instead of n-amyl alcohol and ethanol. Liquid viscosity: approx. 2.5 cp). The adhesion of this thin film was 45%.
比較例2
n−アミルアルコール及びエタノールの代りに各々イソ
プロパツールを用いた以外は実施例3と同様にして厚さ
1800人の薄膜が表面に形成されたポリエチレンテレ
フタレートシートを得た(塗布液粘度約3.0cp)。Comparative Example 2 A polyethylene terephthalate sheet on which a thin film of 1800 mm thick was formed on the surface was obtained in the same manner as in Example 3, except that isopropanol was used instead of n-amyl alcohol and ethanol. Approximately 3.0 cp).
この薄膜の密着性は40%であった。The adhesion of this thin film was 40%.
実施例4.5
エチルシリケートの代りに各々プロピルシリケート、ブ
チルシリケートを用いた以外は実施例2と同様にして薄
膜が表面に形成されたポリメチルメタクリレート板を得
た。(塗布液粘度各々約1.8cp、約1.9cp)こ
れらの薄膜の密着性はいずれも100%であった。Example 4.5 A polymethyl methacrylate plate with a thin film formed on the surface was obtained in the same manner as in Example 2 except that propyl silicate and butyl silicate were used instead of ethyl silicate. (Coating liquid viscosity: about 1.8 cp and about 1.9 cp, respectively) The adhesion of these thin films was 100%.
実施例6.7
エタノールの代りに各々プロパツール、ブタノールを用
いた以外は実施例2と同様にして薄膜が表面に形成され
たポリメチルメタクリレート板を得た。(塗布液粘度各
々約2.6cp、約3.1cp)これらの薄膜の密着性
はいずれも100%であった。Example 6.7 A polymethyl methacrylate plate with a thin film formed on the surface was obtained in the same manner as in Example 2, except that propatool and butanol were used instead of ethanol. (Coating liquid viscosity: about 2.6 cp and about 3.1 cp, respectively) The adhesion of these thin films was 100%.
実施例8
アミルアルコールの代りにn−ヘキサノールを用いた以
外は実施例2と同様にして薄膜が表面に形成されたポリ
メチルメタクリレート板を得た(塗布液粘度約1.8c
p)。これらの薄膜の密着性はいずれも100%であり
た。Example 8 A polymethyl methacrylate plate with a thin film formed on the surface was obtained in the same manner as in Example 2 except that n-hexanol was used instead of amyl alcohol (coating liquid viscosity was approximately 1.8 c).
p). The adhesion of these thin films was 100%.
実施例9.10
水の量を各々6.7g、27.0gとした以外は実施例
2と同様にして薄膜が表面に形成されたポリメチルメタ
クリレート板を得た(塗布液粘度各々約1.5cp、約
1.9cp)。これらの薄膜の密着性はいずれも100
%であった。Example 9.10 A polymethyl methacrylate plate with a thin film formed on the surface was obtained in the same manner as in Example 2, except that the amount of water was 6.7 g and 27.0 g, respectively (coating liquid viscosity was about 1.0 g, respectively). 5 cp, approximately 1.9 cp). The adhesion of these thin films is 100
%Met.
実施例11
塗布ン夜としてチタニウムイソプロポキシド240g、
n−アミルアルコール4.5mjl、 エタノール81
muの混合溶液に水1.9g、塩酸0゜4g、n−アミ
ルアルコール4.5ml2.エタノール81m1の混合
溶液を添加、攪拌して加水分解、部分縮合して粘度を約
1.6センチボアズとしたものを用い、これをポリメチ
ルメタクリレート板上にデイツプ法で塗布し、室温下で
5分間、更に80℃で30分間加熱乾燥して溶媒を蒸発
させるとともに加水分解・縮合を完結させた。得られた
積層体の密着性は100%であった。Example 11 240 g of titanium isopropoxide as a coating solution,
n-amyl alcohol 4.5 mjl, ethanol 81
Add 1.9 g of water, 0.4 g of hydrochloric acid, and 4.5 ml of n-amyl alcohol to the mixed solution of mu2. A mixed solution of 81 ml of ethanol was added, stirred, hydrolyzed, and partially condensed to a viscosity of approximately 1.6 centiboads. This was applied onto a polymethyl methacrylate plate using the dip method, and was heated at room temperature for 5 minutes. Then, the mixture was further heated and dried at 80° C. for 30 minutes to evaporate the solvent and complete the hydrolysis and condensation. The adhesion of the obtained laminate was 100%.
実施例12
塗布液としてジルコニウムイソプロポキシド24.0g
、n−アミルアルコール4.5mJZ、 エタノール8
1mLLそれにキレート化剤としてアセチルアセトン7
.5mILを添加した混合溶液に水7.5g、塩酸0.
4g、n−アミルアルコール4.5ml2.エタノール
81mJZの混合溶液を添加、攪拌して加水分解、部分
縮合して得た塗布液をポリメチルメタクリレート板上に
デイツプ法で塗布し、室温下で5分間、更に80℃で3
0分間加熱乾燥して溶媒を蒸発させるとともに加水分解
・縮合を完結させた。得られた積層体の密着性は100
%であった。Example 12 24.0 g of zirconium isopropoxide as coating liquid
, n-amyl alcohol 4.5mJZ, ethanol 8
1 mL and acetylacetone 7 as a chelating agent.
.. To the mixed solution to which 5 ml was added, 7.5 g of water and 0.0 g of hydrochloric acid were added.
4g, n-amyl alcohol 4.5ml2. The coating solution obtained by adding a mixed solution of 81 mJZ of ethanol, stirring, hydrolysis, and partial condensation was applied onto a polymethyl methacrylate plate by the dip method, and then heated at room temperature for 5 minutes and then at 80°C for 3 minutes.
The mixture was dried by heating for 0 minutes to evaporate the solvent and complete hydrolysis and condensation. The adhesion of the obtained laminate was 100
%Met.
実施例13
塗布液としてアルミニウムブトキシド31.4g、n−
アミルアルコール4.5ml1.エタノール81mfl
、アセト酢酸エチル15.7gの混合溶液に水1.9g
1塩酸0.4g%n−アミルアルコール4.5m丘、エ
タノール81 malの混合溶液を添加、攪拌して加水
分解、部分縮合して得た塗布液をポリメチルメタクリレ
ート板上にデイツプ法で塗布し、室温下で5分間、更に
80℃で30分間加熱乾燥して溶媒を蒸発させるととも
に加水分解・縮合を完結させた。得られた積層体の密着
性は100%であった。Example 13 31.4 g of aluminum butoxide, n-
4.5 ml of amyl alcohol1. Ethanol 81mfl
, 1.9 g of water to a mixed solution of 15.7 g of ethyl acetoacetate
A mixed solution of 0.4 g% 1-hydrochloric acid, 4.5 m of n-amyl alcohol, and 81 m of ethanol was added, stirred, hydrolyzed, and partially condensed, and the resulting coating solution was applied onto a polymethyl methacrylate plate by the dip method. The mixture was heated and dried at room temperature for 5 minutes and then at 80° C. for 30 minutes to evaporate the solvent and complete hydrolysis and condensation. The adhesion of the obtained laminate was 100%.
実施例14
塗布液としてエチルシリケート31.4g、ナトリウム
メトキシド3.0g、n−アミルアルコール4.5mu
、エタノール81muの混合溶液に水13.5g、塩酸
1.5g、n−アミルアルコール4.5rnQ、エタノ
ール81mj!の混合溶液を添加、攪拌して加水分解、
部分縮合して粘度を2.0センチポアズとしたものを用
い、これをポリメチルメタクリレート板上にデイツプ法
で塗布し、室温下で5分間、更に80℃で30分間加熱
乾燥して溶媒を蒸発させるとともに加水分解・縮合を完
結させた。得られた積層体の密着性は100%であった
。Example 14 Coating liquid: 31.4 g of ethyl silicate, 3.0 g of sodium methoxide, 4.5 mu of n-amyl alcohol
, a mixed solution of 81mu of ethanol, 13.5g of water, 1.5g of hydrochloric acid, 4.5rnQ of n-amyl alcohol, and 81mj of ethanol! Add a mixed solution of and stir to hydrolyze.
Using partially condensed material with a viscosity of 2.0 centipoise, this was applied onto a polymethyl methacrylate plate using the dip method, and the solvent was evaporated by heating and drying at room temperature for 5 minutes and then at 80°C for 30 minutes. At the same time, hydrolysis and condensation were completed. The adhesion of the obtained laminate was 100%.
(発明の効果)
本発明の方法によれば種々の金属又は非金属の酸化物皮
膜を種々の基材の上に形成させることができ、そのアル
コキシドの加水分解物の溶液が安定性、均一性に優れる
ため塗布が容易であり、しかも形成された酸化物薄膜が
極めて密着性に優れたものになるという効果を有する。(Effects of the Invention) According to the method of the present invention, various metal or non-metal oxide films can be formed on various base materials, and the solution of the alkoxide hydrolyzate has stability and uniformity. It is easy to apply because of its excellent properties, and has the effect that the formed oxide thin film has extremely excellent adhesion.
Claims (1)
有機高分子基体上に塗布し、ついで溶媒を蒸発させて該
基体上に金属又は非金属の酸化物薄膜を形成させる方法
において、金属又は非金属のアルコキシドの溶媒として
炭素数4以下のアルコールと炭素数5以上のアルコール
の混合溶媒であって、かつ該混合溶媒中における炭素数
5以上のアルコールの体積分率が5%以上70%以下で
あるものを用いることを特徴とする酸化物薄膜の形成方
法。 2)有機高分子基体とその上に請求項1の方法で形成さ
れた酸化物薄膜とからなる積層体。[Claims] 1) A method in which an alcohol solution of a metal or nonmetal alkoxide is applied onto an organic polymer substrate, and then the solvent is evaporated to form a thin film of the metal or nonmetal oxide on the substrate. , a mixed solvent of an alcohol having 4 or less carbon atoms and an alcohol having 5 or more carbon atoms as a solvent for a metal or nonmetal alkoxide, and the volume fraction of the alcohol having 5 or more carbon atoms in the mixed solvent is 5% or more. A method for forming an oxide thin film, characterized in that an oxide thin film having a content of 70% or less is used. 2) A laminate comprising an organic polymer substrate and an oxide thin film formed thereon by the method of claim 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8434088A JPH0230767A (en) | 1988-04-06 | 1988-04-06 | Formation of thin oxide film and laminated body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8434088A JPH0230767A (en) | 1988-04-06 | 1988-04-06 | Formation of thin oxide film and laminated body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0230767A true JPH0230767A (en) | 1990-02-01 |
Family
ID=13827778
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8434088A Pending JPH0230767A (en) | 1988-04-06 | 1988-04-06 | Formation of thin oxide film and laminated body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0230767A (en) |
-
1988
- 1988-04-06 JP JP8434088A patent/JPH0230767A/en active Pending
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