JPH02304417A - Liquid crystal display device - Google Patents
Liquid crystal display deviceInfo
- Publication number
- JPH02304417A JPH02304417A JP1125897A JP12589789A JPH02304417A JP H02304417 A JPH02304417 A JP H02304417A JP 1125897 A JP1125897 A JP 1125897A JP 12589789 A JP12589789 A JP 12589789A JP H02304417 A JPH02304417 A JP H02304417A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- film
- polymer film
- substrates
- gas barrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 44
- 239000000758 substrate Substances 0.000 claims abstract description 48
- 229920006254 polymer film Polymers 0.000 claims abstract description 23
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000001301 oxygen Substances 0.000 claims abstract description 10
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 10
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 8
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 8
- 210000002858 crystal cell Anatomy 0.000 claims description 11
- 239000000470 constituent Substances 0.000 claims description 4
- 239000002120 nanofilm Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 abstract description 18
- 230000004888 barrier function Effects 0.000 abstract description 13
- 238000007789 sealing Methods 0.000 abstract description 8
- -1 ITO Inorganic materials 0.000 abstract description 5
- 238000002347 injection Methods 0.000 abstract description 5
- 239000007924 injection Substances 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 4
- 238000002834 transmittance Methods 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 abstract 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 abstract 1
- 238000000034 method Methods 0.000 description 14
- 210000004027 cell Anatomy 0.000 description 10
- 239000003566 sealing material Substances 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 239000004990 Smectic liquid crystal Substances 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 229920006332 epoxy adhesive Polymers 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920006393 polyether sulfone Polymers 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は高分子フィルム基板を用いた液晶表示装置に関
するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a liquid crystal display device using a polymer film substrate.
〔従来の技術及び発明が解決しようとする課題〕一般に
液晶セルへの液晶の注入には気圧差を利用した真空封入
方式が使用されている。この真空封入方式は、真空ペル
ジャー内にセルと液晶をセットし、ペルジャー内を真空
度が０．１ｔｏｒｒ以下になるまで減圧し、セルの注入
口部を液晶中に浸した後、ペルジャー内を大気圧に戻し
て液晶注入を行なう方法である。[Prior Art and Problems to be Solved by the Invention] Generally, a vacuum sealing method using a pressure difference is used to inject liquid crystal into a liquid crystal cell. This vacuum sealing method involves setting the cell and liquid crystal in a vacuum Pel jar, reducing the pressure inside the Pel jar until the degree of vacuum is 0.1 torr or less, and immersing the cell inlet into the liquid crystal. This method returns the pressure to atmospheric pressure and injects liquid crystal.
一方、最近では液晶表示素子の薄型化、軽量化、加工の
容易性、低コスト化等の点から、液晶セルの構成基板と
してポリエステル、ポリエチレンテレフタレート、ポリ
エーテルサルフオン等の高分子フィルム基板が盛んに使
用されてきている。On the other hand, in recent years, polymer film substrates such as polyester, polyethylene terephthalate, and polyether sulfon have become popular as constituent substrates for liquid crystal cells in order to make liquid crystal display elements thinner, lighter, easier to process, and lower in cost. It has been used in
ところが、高分子フィルム基板はガラス基板に比べてガ
ス透過性が高いため、上記のように真空封入方式を用い
て液晶を注入する場合、ペルジャー内を大気圧に戻す時
、セル内に液晶が封入される前に基板面から気体がリー
クし気泡が発生するという問題が生じる。液晶セルが時
計表示用等の小さいセルの場合には基板面から気体がリ
ークする前に液晶が封入され気泡が発生することはなく
、また発生したとしても一日後には気泡が拡散し、消失
してしまう、しかし、セルが大きくなると気泡も大きく
なり、セル番放置しても気泡は消失しなくなる。However, since polymer film substrates have higher gas permeability than glass substrates, when liquid crystal is injected using the vacuum sealing method as described above, when the inside of the Pelger is returned to atmospheric pressure, the liquid crystal is sealed inside the cell. A problem arises in that gas leaks from the substrate surface and bubbles are generated before the substrate is exposed. If the liquid crystal cell is a small cell such as a cell for a clock display, the liquid crystal is sealed before gas leaks from the substrate surface, and bubbles will not occur, and even if they do occur, the bubbles will diffuse and disappear after a day. However, as the cells get bigger, the bubbles also get bigger, and the bubbles will not disappear even if you leave the cell number alone.
このような気泡゛の発生は液晶表示装置の表示品質低下
の原因となるため、これまで気泡の発生を防止するため
にいくつかの提案がなされている。Since the generation of such bubbles causes a deterioration in the display quality of a liquid crystal display device, several proposals have been made to prevent the generation of bubbles.
例えば、特開昭６１−６９０２７号公報、同６１−６９
０２８号公報には、高分子フィルム基板のガス透過性を
改良するために、高分子フィルムの表面に低透過性の有
機膜をコーティングしたり、別の有機フィルムを貼り合
わせたりすることにより、ガスバリヤ−性を向上させる
技術が提案されている。しかしながら、有機膜コーティ
ング、有機フィルム貼り合せの方法では、セルの熱衝撃
時の気泡発生、高温・高温保存テスト時の気泡混入、電
流値増加等の問題は改善されるが、大面積セルの注入気
泡（液晶注入時における基板面からの透過による気泡発
生）は改善されない。For example, JP-A-61-69027, JP-A-61-69
Publication No. 028 discloses that in order to improve the gas permeability of a polymer film substrate, a gas barrier is created by coating the surface of the polymer film with a low-permeability organic film or bonding another organic film. - Techniques have been proposed to improve performance. However, with organic film coating and organic film bonding methods, problems such as generation of bubbles during thermal shock of the cell, inclusion of bubbles during high temperature/high temperature storage tests, and increase in current value can be improved; Bubbles (bubbles generated due to transmission from the substrate surface when liquid crystal is injected) are not improved.
また、特公昭６２−６１１２４号公報には、高分子フィ
ルム基板と透明導電膜の間に絶縁性酸化物被膜を形成す
ることにより、透明導電膜の密着補強あるいは水分や各
種ガスの透過性を改良する技術が提案されている。しか
しながら、この方法では、高分子フィルム基板の片面に
のみ複数の膜が形成されることになり、製造プロセス上
の熱によってカールが発生し、生産性が低下するという
問題がある。In addition, Japanese Patent Publication No. 62-61124 discloses that by forming an insulating oxide film between a polymer film substrate and a transparent conductive film, the adhesion of the transparent conductive film is reinforced and the permeability of moisture and various gases is improved. A technique to do this has been proposed. However, in this method, a plurality of films are formed only on one side of the polymer film substrate, and there is a problem that curling occurs due to heat during the manufacturing process, reducing productivity.
本発明は、以上のような従来技術の問題点を解決すべく
なされたものであって、液晶セルを大きくしても液晶注
入時に発生する基板面からのリークによる気泡発生が極
めて少なく表示品質の優れた、高分子フィルム基板を用
いた液晶表示装置を提供することを目的とする。The present invention has been made to solve the problems of the prior art as described above, and it is possible to improve the display quality by minimizing the generation of bubbles due to leakage from the substrate surface that occurs when liquid crystal is injected, even if the liquid crystal cell is enlarged. The purpose of the present invention is to provide an excellent liquid crystal display device using a polymer film substrate.
上記目的を達成するため、本発明によれば、内面に透明
導電膜を有する構成基板のうち少なくとも１枚以上が高
分子フィルム基板からなり、基板間に液晶が封入された
液晶セルを具備して構成される液晶表示装置において、
前記高分子フィルム基板の外面に２００Å以上の膜厚を
有する金属酸化物被膜が形成され、該高分子フィルム基
板の酸素透過量がｌｃｃ／ｒ＆／２４ｈｏｕｒ／１ａｔ
ｏｓ／２０℃以下であることを特徴とする液晶表示装置
が提供される。In order to achieve the above object, according to the present invention, at least one of the constituent substrates having a transparent conductive film on the inner surface is made of a polymer film substrate, and a liquid crystal cell is provided in which liquid crystal is sealed between the substrates. In a liquid crystal display device composed of
A metal oxide film having a thickness of 200 Å or more is formed on the outer surface of the polymer film substrate, and the oxygen permeation rate of the polymer film substrate is lcc/r&/24hour/1at.
A liquid crystal display device characterized in that the temperature is below os/20° C. is provided.
以下本発明を図面を参照して詳述する。The present invention will be described in detail below with reference to the drawings.
第１図は本発明による液晶表示装置の一構成例を模式的
に示す断面図である１図中ｔ、ｉ’は高分子フィルム基
板であり、例えば、−軸延伸もしくは二軸延伸のポリエ
チレンテレフタレートフィルム。FIG. 1 is a cross-sectional view schematically showing an example of the structure of a liquid crystal display device according to the present invention. In FIG. film.
ポリサルフォンフィルム、ポリエーテルサルフォンフィ
ルム、ポリカーボネートフィルム、セルローストリアセ
テートフィルム等が使用される。高分子フィルム基板１
，１′は上記のようなフィルムを単独で用いたものでも
よいし、密着性を改善するためにアンダーコート層、保
護膜等を設けた複合基板としてもよい。高分子フィルム
基板１，１′の内面には表示電極用の透明導電膜（ＩＴ
Ｏ膜）２．２’が形成され、さらにその上には配向膜４
，４′が形成され配向処理が施しである。高分子フィル
ム基板１，１′の外面には金属酸化物からなり２００Å
以上の膜厚を有するガスバリヤ一層３，３′が形成され
、ａ未透過量がｌｅｅ／ｒｆ／２４ｈｏｕｒ／１ａｔｏ
＋ｍ／２０℃以下となるようにしである。このガスバリ
ヤ−ｒｔ１３．３’の構成材料としでは、 ５ｉｎ２．
ＳｎＯ，、１，，０３，ＩＴＯ，Ｔｉｅ、、Ａｌ１１
．０．、２ｎＯ，Ｔ、、Ｏ，等の金属酸化物が用いられ
る。Polysulfone film, polyether sulfone film, polycarbonate film, cellulose triacetate film, etc. are used. Polymer film substrate 1
, 1' may use the above film alone, or may be a composite substrate provided with an undercoat layer, a protective film, etc. to improve adhesion. The inner surfaces of the polymer film substrates 1 and 1' are covered with transparent conductive films (IT) for display electrodes.
O film) 2.2' is formed, and an alignment film 4 is further formed on it.
, 4' are formed and orientation treatment is performed. The outer surface of the polymer film substrates 1 and 1' is made of metal oxide and has a thickness of 200 Å.
A single gas barrier layer 3, 3' having a film thickness of more than
+m/20°C or less. The constituent material of this gas barrier rt13.3' is 5in2.
SnO,,1,,03,ITO,Tie,,Al11
．． 0. , 2nO, T, , O, and other metal oxides are used.
ガスバリヤ一層３，３′の膜厚は使用する材料の透過率
との兼合いで２００Å以上の適宜の値に設定される。厚
膜が２００人より小さくなると十分なガスバリヤ−性が
得られなくなってしまう。一方の面に透明導電膜２，２
′及び配向膜４，４′が形成され他方の面にガスバリヤ
一層３，３′が形成された一対の高分子フィルム基板１
．１’は、開基板間にギャップ剤５を分散させた後、周
囲にシール材５を印刷して貼り合わされる。そしてこれ
らにより形成される空間に前述の真空封入・方式により
液晶７が封入され、液晶表示装置が構成される。The thickness of the gas barrier layers 3, 3' is set to an appropriate value of 200 Å or more, taking into consideration the transmittance of the material used. If the thickness of the thick film is less than 200, sufficient gas barrier properties cannot be obtained. Transparent conductive film 2, 2 on one side
a pair of polymer film substrates 1, on which are formed `` and alignment films 4, 4'', and on the other side a gas barrier layer 3, 3'.
．． 1', after dispersing the gap agent 5 between the open substrates, printing the sealing material 5 around the open substrates and bonding them together. Then, the liquid crystal 7 is sealed in the space formed by these using the vacuum sealing method described above, thereby forming a liquid crystal display device.
本発明では、高分子フィルム基板の外面に金属酸化物被
膜が形成され、酸素透過量をｌｃｃ／ｒｒ？／２４ｈｏ
ｕｒ／ｌａｔｏｍ／２０℃以下としであることから、セ
ルを大型化しても液晶注入時における注入気泡の発生が
効果的に防止され、さらに高分子フィルム基板の片面に
膜が集中してないことから、製造プロセス上の熱による
カールの発生が防止される。したがって、前記課題が解
決され、表示品質に優れ大型化可能な液晶表示装置が提
供できるようになる。In the present invention, a metal oxide film is formed on the outer surface of a polymer film substrate, and the oxygen permeation rate is adjusted to lcc/rr? /24ho
ur/latom/20°C or less, which effectively prevents the generation of injection bubbles when liquid crystal is injected even if the cell is enlarged.Furthermore, the film is not concentrated on one side of the polymer film substrate. , curling caused by heat during the manufacturing process is prevented. Therefore, the above-mentioned problems are solved, and a liquid crystal display device that has excellent display quality and can be made larger can be provided.
次に、本発明を実施例により更に詳しく説明する。 Next, the present invention will be explained in more detail with reference to Examples.
実施例１
基板１，１′として酸素透過量が１２ｃｃ／ ｒｒ？／
２４ｈｏｕｒ／１ａｔｏｍ／２０℃の一軸延伸ポリエチ
レンテレフタレートフィルムを用い、該基板１，１′の
一方の面上にＤＣスパッタリング法で厚さ５００人の工
τ０膜（表示電極膜）２．２’をそれぞれ形成し、他方
の面上に同法で厚さ３００人のＩＴＯ膜（ガスバリヤ一
層）３．３’をそれぞれ形成した。これにより、酸素透
過量は０．７ｃｃ／ｍ／ ２４ｈｏｕｒ／ Ｌａｔｏｓ
／ ２０℃となった。次に２，２′のＩＴＯ膜のみをフ
ォトリソグラフィー法で加工し、１００ｘ１６０ドツト
用の表示電極とした。さらに配向剤（商品名：ＨＬ−１
１１０；日立化成社製）を用い配向膜４，４′を形成し
た後、ラビング処理を施し、上下電極間のツイスト角を
２２０°とした。次に一方の基板にギャップ剤５として
平均粒径６．２μｌのプラスチックビーズを１５０−２
００個／ｌ１Ｉ１１２の分散密度で分散した。そして他
方の基板に可撓性エポキシ系接着剤からなるシール材６
を印刷し１両基板を貼り合せし、８０’Ｃ５９０分間で
該シール材６を硬化させ、有効表示領域が５５ｎｎＸ６
０ａｎの液晶セルを得た。この液晶セル内にカイラルネ
マチック含有スメクチック液晶７を真空封入方式で注入
した。この時の真空到達度は０．０５ｔｏｒｒであった
。注入直後に直径０．５ｍａφ火の気泡が１個シール材
６周辺に発生したが、−目移には消失していた。Example 1 Oxygen permeation amount is 12cc/rr for substrates 1 and 1'? /
Using a uniaxially stretched polyethylene terephthalate film at 24 hours/1 atom/20°C, a 500-thick τ0 film (display electrode film) 2.2' was deposited on one side of the substrates 1 and 1' by DC sputtering, respectively. An ITO film (gas barrier single layer) 3.3' with a thickness of 300 mm was formed on the other surface by the same method. As a result, the oxygen permeation amount is 0.7cc/m/24hour/Latos
/ It became 20℃. Next, only the 2 and 2' ITO films were processed by photolithography to obtain display electrodes for 100 x 160 dots. Furthermore, alignment agent (product name: HL-1
110; manufactured by Hitachi Chemical Co., Ltd.), the alignment films 4 and 4' were formed, and then subjected to a rubbing treatment, so that the twist angle between the upper and lower electrodes was set to 220°. Next, plastic beads with an average particle size of 6.2 μl were placed on one substrate as a gap agent 5 at a rate of 150-2.
It was dispersed at a dispersion density of 00 pieces/l1I112. A sealing material 6 made of flexible epoxy adhesive is attached to the other substrate.
The sealing material 6 was cured for 590 minutes at 80'C, and the effective display area was 55 nn x 6.
A liquid crystal cell of 0an was obtained. A chiral nematic-containing smectic liquid crystal 7 was injected into this liquid crystal cell using a vacuum sealing method. The degree of vacuum attainment at this time was 0.05 torr. Immediately after the injection, one bubble with a diameter of 0.5 maφ was generated around the sealing material 6, but it had disappeared by the time the bubble was poured.
実施例２
基板１，１′として酸素透過量が１ｉｃｅ／ ｒｒｒ／
２４ｈｏｕｒ／１ａｔｏｓ／２０℃の一軸延伸ポリエチ
レンテレフタレートフィルムを用い、該基板１，１′の
一方の面上にＤＣスパッタリング法で厚さ５００人のＩ
ＴＯ膜（表示電極膜）２．２’をそれぞれ形成し、他方
の面上に同じくＤＣスパッタリング法で厚さ５００人の
５ｉｎ２膜（ガスバリヤ一層）３．３’をそれぞれ形成
した。これにより、酸素透過量は０．９ｃｃ／ ｒｒｒ
／２４ｈｏｕｒ／１ａｔｏ１１／２０℃となった。次に
ＩＴＯ膜２，２′をフォトリソグラフィー法で加工し、
６４０ Ｘ ４００ドツト用の表示電極とした。さらに
配向剤（商品名：）ＩＬ−１１１０；日立化成社製）を
用い配向膜４，４′を形成した後、ラビング処理を施し
、上下電極間のツイスト角を２２０°とした。°次に一
方の基板にギャップ剤５として平均粒径６．２趨のプラ
スチックビーズを１５０〜２００個／ｌ１１１２の分散
密度で分散した。そして他方の基板に可撓性エポキシ系
接着剤からなるシール材６を印刷し１両基板を貼り合せ
て、 ８０℃、９０分間で該シール材６を硬化させ、有
効表示領域が２５０＋＋ａ Ｘ １５０ｍの液晶セルを
得た。Example 2 When the substrates 1 and 1' have an oxygen permeation rate of 1ice/rrr/
Using a uniaxially stretched polyethylene terephthalate film at 24 hours/1 atos/20° C., a 500 mm thick film was deposited on one side of the substrates 1 and 1' by DC sputtering.
A TO film (display electrode film) 2.2' was formed respectively, and a 5in2 film (gas barrier single layer) 3.3' having a thickness of 500 was formed on the other surface by the same DC sputtering method. As a result, the amount of oxygen permeation is 0.9cc/rrr
/24 hours/1ato11/20°C. Next, the ITO films 2, 2' are processed by photolithography,
It was used as a display electrode for 640 x 400 dots. Furthermore, after forming alignment films 4 and 4' using an alignment agent (trade name: IL-1110; manufactured by Hitachi Chemical Co., Ltd.), a rubbing treatment was performed to set the twist angle between the upper and lower electrodes to 220°. Next, plastic beads having an average particle size of 6.2 were dispersed as a gap agent 5 on one of the substrates at a dispersion density of 150 to 200 pieces/l. Then, a sealing material 6 made of flexible epoxy adhesive was printed on the other substrate, the two substrates were bonded together, and the sealing material 6 was cured at 80°C for 90 minutes, resulting in an effective display area of 250++a x 150m. A liquid crystal cell was obtained.
この液晶セル内にカイラルネマチック含有スメクチック
液晶７を真空封入方式で注入した。この時の真空到達度
は０．０３ｔｏｒｒであった。注入直後に直径１■φ大
の気泡が２個シール材６周辺に発生したが、−目移には
消失していた。A chiral nematic-containing smectic liquid crystal 7 was injected into this liquid crystal cell using a vacuum sealing method. The degree of vacuum attainment at this time was 0.03 torr. Immediately after the injection, two bubbles each having a diameter of 1 φ were generated around the sealing material 6, but they disappeared by the time the sealing material 6 was transferred.
比較例
基板１，１′として酸素透過量が１２ｃｃ／ｒｒｒ／２
４ｈｏｕｒ／１ａｔｏｓ／２０℃の一軸延伸ポリエチレ
ンテレフタレートフィルムを用い、該基板１，１′の一
方の面上にＤＣスパッタリング法で厚さ５００人のＩＴ
Ｏ膜（表示電極膜）２．２’をそれぞれ形成したが、他
方の面上にはガスバリヤ一層は形成しなかった。以下実
施例２と同様に液晶セルを作成し、真空封入方式で液晶
注入を行った。注入直後に直径５ｍ大の気泡が４個発生
し、１日放置したところ気泡の大きさは小さくなったが
、消失することはなかった。Comparative example substrates 1 and 1' have an oxygen permeation rate of 12cc/rrr/2
Using a uniaxially stretched polyethylene terephthalate film at 4 hours/1 atos/20°C, an IT film with a thickness of 500 mm was deposited on one side of the substrates 1 and 1' by DC sputtering.
An O film (display electrode film) 2.2' was formed on each surface, but no gas barrier layer was formed on the other surface. Thereafter, a liquid crystal cell was prepared in the same manner as in Example 2, and liquid crystal was injected using a vacuum sealing method. Immediately after injection, four bubbles with a diameter of 5 m were generated, and after being left for one day, the bubbles decreased in size but did not disappear.
本発明によれば、セルが大型化しても液晶封入時におけ
る気泡発生が極めて少ない高品質の液晶表示装置の提供
が可能となる。According to the present invention, it is possible to provide a high-quality liquid crystal display device in which the generation of bubbles during liquid crystal filling is extremely small even when the cell size is increased.
第１図は本発明による液晶表示装置の一構成例を示す断
面図である。
１．１’・・・高分子フィルム基板
２．２′・・・透明電極膜
３．３′・・・ガスバリヤ一層
４．４′・・・配向膜
５・・・・・・ギャップ剤
６・・・・・・シール材
７・・・・・・液晶
特許出願人 株式会社 リ コ −
代理人弁理士 池浦敏明（ほか１名）
第１図FIG. 1 is a sectional view showing an example of the configuration of a liquid crystal display device according to the present invention. 1.1'...Polymer film substrate 2.2'...Transparent electrode film 3.3'...Gas barrier single layer 4.4'...Alignment film 5...Gap agent 6. ... Sealing material 7 ... Liquid crystal patent applicant Rico Co., Ltd. - Representative patent attorney Toshiaki Ikeura (and one other person) Figure 1
Claims (1)
とも１枚以上が高分子フィルム基板からなり、基板間に
液晶が封入された液晶セルを具備して構成される液晶表
示装置において、前記高分子フィルム基板の外面に２０
０Å以上の膜厚を有する金属酸化物被膜が形成され、該
高分子フィルム基板の酸素透過量が１ｃｅ／ｍ＾２／２
４ｈｏｕｒ／１ａｔｏｍ／２０℃以下であることを特徴
とする液晶表示装置。(1) In a liquid crystal display device comprising a liquid crystal cell in which at least one of the constituent substrates having a transparent conductive film on the inner surface is made of a polymer film substrate, and liquid crystal is sealed between the substrates, the high 20 on the outer surface of the molecular film substrate
A metal oxide film having a thickness of 0 Å or more is formed, and the oxygen permeation rate of the polymer film substrate is 1ce/m^2/2.
A liquid crystal display device characterized in that the temperature is 4 hours/1 atom/20°C or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1125897A JP2796573B2 (en) | 1989-05-18 | 1989-05-18 | Liquid crystal display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1125897A JP2796573B2 (en) | 1989-05-18 | 1989-05-18 | Liquid crystal display |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02304417A true JPH02304417A (en) | 1990-12-18 |
| JP2796573B2 JP2796573B2 (en) | 1998-09-10 |
Family
ID=14921615
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1125897A Expired - Lifetime JP2796573B2 (en) | 1989-05-18 | 1989-05-18 | Liquid crystal display |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2796573B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5291323A (en) * | 1990-10-01 | 1994-03-01 | Sharp Kabushiki Kaisha | Liquid crystal display device with positive and negative compensating films each with its optical axis parallel to the surface |
| JPH0675209A (en) * | 1991-08-01 | 1994-03-18 | Seiko Epson Corp | Liquid crystal display element, method for regenerating and storing the element and electronic device carrying the element |
| JP2001221998A (en) * | 1991-08-01 | 2001-08-17 | Seiko Epson Corp | Liquid crystal display element and electronic instrument |
| CN102191460A (en) * | 2010-03-04 | 2011-09-21 | 三菱综合材料株式会社 | Vapor phase deposition material for forming film, film sheet with the film, and laminated sheet |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60190342A (en) * | 1984-03-12 | 1985-09-27 | 住友ベークライト株式会社 | High gas barrier property transparent conductive film |
| JPS6488425A (en) * | 1987-09-29 | 1989-04-03 | Fujimori Kogyo Co | Photoisotropic laminated body |
-
1989
- 1989-05-18 JP JP1125897A patent/JP2796573B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60190342A (en) * | 1984-03-12 | 1985-09-27 | 住友ベークライト株式会社 | High gas barrier property transparent conductive film |
| JPS6488425A (en) * | 1987-09-29 | 1989-04-03 | Fujimori Kogyo Co | Photoisotropic laminated body |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5291323A (en) * | 1990-10-01 | 1994-03-01 | Sharp Kabushiki Kaisha | Liquid crystal display device with positive and negative compensating films each with its optical axis parallel to the surface |
| JPH0675209A (en) * | 1991-08-01 | 1994-03-18 | Seiko Epson Corp | Liquid crystal display element, method for regenerating and storing the element and electronic device carrying the element |
| JP2001221998A (en) * | 1991-08-01 | 2001-08-17 | Seiko Epson Corp | Liquid crystal display element and electronic instrument |
| CN102191460A (en) * | 2010-03-04 | 2011-09-21 | 三菱综合材料株式会社 | Vapor phase deposition material for forming film, film sheet with the film, and laminated sheet |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2796573B2 (en) | 1998-09-10 |
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