JPH0230333B2 - FUKAGATAIMIDOJUSHIPURIPUREGUNOSEIHO - Google Patents

FUKAGATAIMIDOJUSHIPURIPUREGUNOSEIHO

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Publication number
JPH0230333B2
JPH0230333B2 JP16442785A JP16442785A JPH0230333B2 JP H0230333 B2 JPH0230333 B2 JP H0230333B2 JP 16442785 A JP16442785 A JP 16442785A JP 16442785 A JP16442785 A JP 16442785A JP H0230333 B2 JPH0230333 B2 JP H0230333B2
Authority
JP
Japan
Prior art keywords
prepreg
addition
resin
imide resin
imide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP16442785A
Other languages
Japanese (ja)
Other versions
JPS6225133A (en
Inventor
Yoshihisa Sugawa
Masahiro Matsumura
Kenji Ogasawara
Atsuhiro Nakamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP16442785A priority Critical patent/JPH0230333B2/en
Publication of JPS6225133A publication Critical patent/JPS6225133A/en
Publication of JPH0230333B2 publication Critical patent/JPH0230333B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Reinforced Plastic Materials (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Description

【発明の詳现な説明】[Detailed description of the invention]

〔技術分野〕 この発明は、付加型むミド暹脂プリプレグの補
法に関するものである。 〔背景技術〕 埓来、倚局プリント配線板など積局板補造甚の
暹脂ずしおは、優れた接着性、耐薬品性、電気特
性、機械特性などを有する゚ポキシ暹脂材料が倚
く䜿甚されおきたが、高密床実装甚の高倚局プリ
ント配線板に䜿甚した堎合は実装面での耐熱性の
問題やレゞンスミアや厚み方向の熱膚匵などによ
る導通信頌性の䜎䞋の問題が生じる。そこで、こ
れらの問題を解決するために積局板補造甚の暹脂
ずしおポリむミドなどの耐熱暹脂が開発されお実
甚化に至぀おいる。特に、䞍飜和ビスむミドずゞ
アミンずを反応させた付加型ポリむミドは、高密
床化するための现線化や埮现孔あけなどの高粟床
加工が可胜である、厚み方向の熱膚匵率が小さく
おスルヌホヌルメツキによる導通信頌性が高い、
ドリル加工工皋でのスミア発生がない、高枩時の
導䜓密着力および硬床が高く実装性が向䞊する、
高枩200℃での連続䜿甚に耐える、などの特
長を有しおいるため、倚局プリント配線板の材料
ずしお倚く䜿甚されるに至぀おいるものである。 しかし、近幎倧型コンピナヌタヌ甚などの倚局
プリント配線板などの倚局プリント配線板にあ぀
おはより高密床実装化や高倚局化される傟向があ
り、このために回路の埮现化やスルヌホヌル穎埄
の瞮小の芁求が高た぀おおり、この芁求を実珟す
るために、埓来よりさらに高いレベルの密着性が
基板に芁求されるようにな぀おいる。密着性に぀
いおは、回路の埮现化により回路ず暹脂ずの密着
性が高くなければならないのは圓然であるが、暹
脂を含浞する基材ず暹脂ずの密着性も高くなけれ
ばならない。なぜならば、基材ず暹脂ずの密着性
が䜎いず、倚局プリント配線板に穎明け加工をお
こなうずきに基材ず暹脂ずの間に埮现な剥離が生
じるこずになるずいう䞍郜合が発生するからであ
る。 ずころが、䞊蚘付加型ポリむミドのワニスを基
材に含浞させるず共に也燥させおプリプレグを調
補し、このプリプレグを甚いおプリント配線板の
基板を䜜成するず、倧型コンピナヌタヌ甚等の倚
局プリント配線板レベルでの暹脂ず基材ずの密着
性を十分に埗るこずができず、ドリル加工による
穎あけ工皋で埮现な基材ず暹脂間の界面剥離が生
じ易い堎合が倚いものであ぀た。 〔発明の目的〕 この発明は、䞊蚘の点に鑑みおなされたもので
あり、高密床実装可胜な密着性に優れる積局板甚
付加型むミド暹脂プリプレグの補法を提䟛するこ
ずを目的ずするものである。 〔発明の開瀺〕 前蚘のような目的を達成するため、発明者ら
は、䞀般に知られおいる付加型むミド暹脂プリプ
レグを甚いた堎合、基材ず暹脂ずの密着性が䞍十
分になる原因を研究した。その結果、䞀般の付加
型むミド暹脂プレポリマヌは、プレポリマヌ末端
がアミノ基にな぀おいるものよりも、䞍飜和むミ
ド基にな぀おいるものが倚く存圚するこずがわか
぀た。䞀般にガラス基材等の衚面凊理剀ずしお
は、゚ポキシシラン系、クロルシラン系、カチオ
ニツクシラン系等の凊理剀が甚いられおいるが、
これらの衚面凊理剀は、マレむミド基よりも、む
しろ、アミノ基ず反応しやすいため、䞍飜和むミ
ド基末端を倚く持぀䞀般の付加型むミド暹脂プレ
ポリマヌは、基材ずの密着性が䞍十分にな぀おい
るこずがわか぀た。たた、アミノ基末端を倚く含
むプレポリマヌは、衚面凊理剀ずの反応性に富ん
でいるばかりでなく、埌の次含浞で塗られた通
垞のワニスずの反応性にも富んでおり、衚面凊理
剀ず通垞の暹脂ずの間で䞡方に匷固に結合するた
めに優れた密着性を埗るこずができるこずを芋い
だした。発明者らは、さらに研究を重ねた結果、
暹脂ず基材の密着性が十分な付加型むミド暹脂ず
その補造方法を芋い出し、ここに、以䞋の発明を
完成した。 すなわち、この発明は、䞍飜和ビスむミドずゞ
アミンより合成した付加型むミド暹脂プレポリマ
ヌを基材に含浞しお付加型むミド暹脂プリプレグ
を補造するに際し、ビスむミドゞアミンが2.0
モル1.1モル〜2.0モル3.0モルの比率で合成し
た、固型分濃床〜30のプレポリマヌ溶液を基
材に次含浞させ也燥させお次プリプレグを
埗、これにさらに別途調補した付加型むミド暹脂
プレポリマヌ溶液を含浞、也燥させるこずを特城
ずする付加型むミド暹脂プリプレグの補法を芁旚
ずしおいる。 以䞋に、この発明を詳しく説明する。 ここで、䞍飜和ビス―むミドは(1)匏で、ゞアミ
ンは(2)匏であらわされる。 匏䞭は炭玠―炭玠の二重結合を含む䟡の
基をあらわし、は少なくずも個の炭玠原子を
含む䟡の基をあらわす H2N――NH2 (2) 匏䞭は30個以䞋の炭玠原子を有する䟡の
基をあらわす 䞊蚘匏(1)(2)におけるおよびは同䞀かたたは
異なるものいずれでもよく、たた13個よりも少な
い炭玠原子を持぀おいる盎鎖のもしくは分枝した
アルキレン基か、環の䞭に個もしくは個の炭
玠原子を持぀おいる環状アルキレン基か、
および原子の少なくも個を含む異皮環状基
か、たたはプニレンもしくは倚環状芳銙族基に
するこずもできる。これらの皮々の基は反応条件
のもずで䞍必芁な副反応を䞎えない眮換基を持぀
おいおもよい。たた䞊蚘は、たくさんのフ
゚ニレン基か、盎接にたたは䟡の原子たたは次
のような矀で結合された脂環状の基ずするこずも
できる。すなわち、䟋えば、それらは酞玠たたは
硫黄か、炭玠原子個から個のアルキレンの矀
か、たたは次の矀のちうの぀である。 ―NR4―、―R3―、――、
[Technical Field] The present invention relates to a method for producing addition-type imide resin prepreg. [Background technology] Conventionally, epoxy resin materials with excellent adhesive properties, chemical resistance, electrical properties, mechanical properties, etc. have been often used as resins for manufacturing laminates such as multilayer printed wiring boards. When used in a high-multilayer printed wiring board for mounting, there are problems with heat resistance on the mounting surface and a reduction in continuity reliability due to resin smear and thermal expansion in the thickness direction. In order to solve these problems, heat-resistant resins such as polyimide have been developed and put into practical use as resins for manufacturing laminates. In particular, addition-type polyimide, which is made by reacting unsaturated bisimide with diamine, has a low coefficient of thermal expansion in the thickness direction and can be processed with high precision, such as thinning wires for high density and making micro holes. High continuity reliability due to plating
There is no smearing during the drilling process, and the conductor adhesion and hardness at high temperatures improve mounting performance.
Because it has features such as being able to withstand continuous use at high temperatures (200°C), it has come to be widely used as a material for multilayer printed wiring boards. However, in recent years, multilayer printed wiring boards such as those used in large computers have become more densely packaged and multilayered, resulting in smaller circuits and through-hole diameters. There is an increasing demand for miniaturization, and in order to meet this demand, substrates are required to have a higher level of adhesion than before. Regarding adhesion, it is natural that the adhesion between the circuit and the resin must be high due to the miniaturization of the circuit, but the adhesion between the resin and the base material impregnated with the resin must also be high. This is because if the adhesion between the base material and the resin is low, there will be an inconvenience in that minute peeling will occur between the base material and the resin when drilling holes in a multilayer printed wiring board. be. However, when preparing a prepreg by impregnating a base material with the above-mentioned addition-type polyimide varnish and drying it, and using this prepreg to create a substrate for a printed wiring board, the resin can be used at the level of a multilayer printed wiring board for large computers, etc. It was not possible to obtain sufficient adhesion between the resin and the base material, and in many cases, fine interfacial peeling between the base material and the resin was likely to occur during the drilling process. [Purpose of the Invention] The present invention has been made in view of the above points, and an object thereof is to provide a method for manufacturing an addition-type imide resin prepreg for laminates that has excellent adhesion and allows for high-density mounting. be. [Disclosure of the Invention] In order to achieve the above object, the inventors have solved the cause of insufficient adhesion between the base material and the resin when using a generally known addition type imide resin prepreg. Researched. As a result, it was found that more common addition-type imide resin prepolymers have unsaturated imide groups at the end of the prepolymer than amino groups. Generally, epoxysilane-based, chlorosilane-based, cationic silane-based processing agents are used as surface treatment agents for glass substrates, etc.
These surface treatment agents tend to react more easily with amino groups than with maleimide groups, so general addition-type imide resin prepolymers, which have many unsaturated imide groups at their ends, have insufficient adhesion to the substrate. I realized that I am getting used to it. In addition, prepolymers containing a large number of amino group terminals are not only highly reactive with surface treatment agents, but also highly reactive with ordinary varnish applied in the subsequent secondary impregnation. It has been found that excellent adhesion can be obtained between the processing agent and the common resin because both are strongly bonded to each other. As a result of further research, the inventors found that
We have discovered an addition-type imide resin with sufficient adhesion between the resin and the base material and a method for producing the same, and have now completed the following invention. That is, in the present invention, when producing an addition-type imide resin prepreg by impregnating a base material with an addition-type imide resin prepolymer synthesized from unsaturated bisimide and diamine, the bisimide/diamine ratio is 2.0.
A prepolymer solution synthesized at a ratio of mol/1.1 mol to 2.0 mol/3.0 mol and having a solid content concentration of 1 to 30% is first impregnated into a base material and dried to obtain a primary prepreg, which is further prepared separately. The gist of this paper is a method for producing an addition-type imide resin prepreg, which is characterized by impregnating and drying an addition-type imide resin prepolymer solution. This invention will be explained in detail below. Here, the unsaturated bis-imide is represented by formula (1), and the diamine is represented by formula (2). (In the formula, D represents a divalent group containing a carbon-carbon double bond, and A represents a divalent group containing at least two carbon atoms.) H 2 N-B-NH 2 (2) ( In the formula (B represents a divalent group having 30 or less carbon atoms) A and B in the above formulas (1) and (2) may be the same or different; linear or branched alkylene groups with 5 or 6 carbon atoms in the ring, O,N
and a heterocyclic group containing at least one S atom, or a phenylene or polycyclic aromatic group. These various groups may have substituents that do not give rise to unnecessary side reactions under the reaction conditions. The above A and B can also be a large number of phenylene groups, or an alicyclic group bonded directly or with divalent atoms or the following groups. Thus, for example, they are oxygen or sulfur, the group of alkylenes of 1 to 3 carbon atoms, or one of the following groups: -NR 4 -, -P(O)R 3 -, -N=N-,

【匏】―CO――、―SO2―、― SiR3R4―、―CONH―、―NY―CO――CO―
NY―、――CO――CO――、
[Formula] -CO-O-, -SO 2 -, - SiR 3 R 4 -, -CONH-, -NY-CO-X-CO-
NY―, -O―CO―X―CO―O―,

【匏】【formula】 【匏】【formula】

【匏】【formula】

【匏】 䞊蚘匏䞭R3R4およびは各々炭玠原子個
から個のアルキル基、環䞭に個もしくは個
の炭玠原子を持぀環状アルキル基、もしくはプ
ニルたたは倚環状芳銙族基をあらわし、は13個
より少ない炭玠原子をも぀おいる盎鎖もしくは分
枝したアルキレン基、環䞭に個もしくは個の
炭玠原子を持぀おいる環状アルキレン基、たたは
単環もしくは倚環状アリレン基をあらわす。 基は(3)匏の゚チレン系無氎物䞍飜和ゞカル
ボン酞無氎物から誘導されるのもで、䟋えばマ
レむン酞無氎物、シトラコン酞無氎物、テトラヒ
ドロフタル酞無氎物、むタコン酞無氎物、および
シクロゞ゚ンずこれらの無氎物の぀の間に起こ
るデむヌルス―アルダヌ反応の生成物を挙げるこ
ずができる。 䜿甚するこずのできる匏(1)の奜たしい䞍飜和ビ
ス―むミドずしおは次のものを挙げるこずができ
る。マレむン酞・N′―゚チレン―ビス―むミ
ド、マレむン酞・N′―ヘキサメチレン―ビス
―むミド、マレむン酞・N′―メタプニレン
―ビス―むミド、マレむン酞・N′―パラプ
ニレン―ビス―むミド、マレむン酞・N′―
4′―ゞプニルメタン―ビス―むミド、・
N′―メチレンビス―プニルマレむミド
ずも蚀う、マレむン酞・N′―4′―ゞプ
ニル゚ヌテル―ビス―むミド、マレむン酞・
N′―4′―ゞプニルスルホン―ビス―むミ
ド、マレむン酞・N′―4′―ゞシクロヘキシ
ルメタン―ビス―むミド、マレむン酞・N′―
α・α′―4.4′―ゞメチレンシクロヘキサン―ビス
―むミド、マレむン酞・N′―メタキシリレン
―ビス―むミド、マレむン酞・N′―ゞプニ
ルシクロヘキサン―ビス―むミドなどである。 たた、䜿甚するこずのできる匏(2)の奜たしいゞ
アミンずしおは次のものを挙げるこずができる。
4′―ゞアミノゞシクロヘキシルメタン、・
4′―ゞアミノシクロヘキサン、―ゞアミノ
ピリゞン、メタプニレンゞアミン、パラプニ
レンゞアミン、4.4′―ゞアミノ―ゞプニルメタ
ン、―ビス――アミノプニルプロ
パン、ベンゞゞン、4′―ゞアミノゞプニル
オキサむド、4′―ゞアミノゞプニルサルフ
アむド、4′―ゞアミノゞプニルスルフオ
ン、ビス――アミノプニルゞプニルシ
ラン、ビス――アミノプニルメチルフオ
スフむンオキサむド、ビス――アミノプニ
ルメチルフオスフむンオキサむド、ビス―
―アミノプニルプニルフオスフむンオキサ
むド、ビス――アミノプニルプニラミ
ン、―ゞアミノナフタレン、メタキシリレ
ンゞアミン、パラキシリレンゞアミン、―
ビス―パラアミノプニルフタラン、ヘキサ
メチレンゞアミンなどである。 䞊蚘䞍飜和ビスむミドずゞアミンずを極性溶剀
䞭で反応させおプレポリマヌ溶液を調補するもの
であるが、䜿甚する極性溶剀ずしおは䟋えば、
―メチルピロリドン、・―ゞメチルホルムア
ミド、・―ゞメチルアセトアミド、ゞメチル
スルホキシドなど奜たしいものずしお挙げるこず
ができ、これらを皮たたは皮以䞊を混合しお
甚いるこずができる。 この発明にかかる付加型むミド暹脂プリプレグ
の補法に甚いるプレポリマヌは、前蚘のような䞍
飜和ビスむミドずゞアミンを反応させお埗られる
が、仕蟌みモル比が前蚘のようにな぀おいる必芁
がある。すなわち、ビスむミド2.0モルに察し、
ゞアミンが1.1モルより少ないず、埗られたプレ
ポリマヌは、末端が䞍飜和むミド基にな぀おいる
ものが倚くな぀おしたう。たた、ビスむミド2.0
モルに察し、ゞアミンが3.0モルより倚いず、ゲ
ル化時間の短い暹脂になり、含浞した基材を也燥
する際也燥条件のコントロヌルが困難である。し
たが぀お、ビスむミド2.0モルに察し、ゞアミン
が1.1〜3.0モルずな぀おいる必芁がある。たた、
ビスむミドずゞアミンより合成されたプレポリマ
ヌ溶液においお、固圢分濃床がより小さい
ず、プレポリマヌ溶液粘床が䜎すぎるため、含浞
時、適量の暹脂が付着しない。固型分濃床が30
を越えるず、含浞時、基材の繊維間たで充分ワニ
スが浞透せず、埌の積局板ずな぀おからの密着性
を考慮したずき奜たしくない。したが぀お、プレ
ポリマヌ溶液の固型分濃床が〜30ずな぀おい
る必芁がある。぀ぎに、次含浞時の也燥枩床が
140℃より䜎いず、メチルピロリドンやゞメチ
ルアセトアミドのような高沞点極性溶媒を十分蒞
発させるこずが困難ずなる。也燥枩床が165℃を
越えるず、プレポリマヌの高分子化が急速に起こ
り、也燥のコントロヌルが困難になる。したが぀
お、次含浞時の也燥枩床は140〜165℃であるこ
ずが奜たしい。 たた、次含浞に甚いるプレポリマヌ溶液の暹
脂分子量分垃が、未反応原料30〜55、分子量
400以䞊15000以䞋の成分が39〜65、分子量が
15000を越える成分が1.8〜6.8ずな぀おいるこ
ずが奜たしい。 次プリプレグの暹脂分子量分垃ずしおは、未
反応原料が18〜35、分子量400以䞊15000以䞋の
成分が51〜70、分子量が15000を越える成分が
〜15ずな぀おいるこずが奜たしい。 ここで、分子量分垃はDMF溶媒を䜿甚し、分
離カラムずしお昭和電工補AD―8038.0×
250mm、理論段数6000段を本装着したゲル浞
透クロマトグラフ東掋゜ヌダ補HLC−803D
により枬定した。分子量の蚈算は、皮類の単分
散ポリ゚チレングリコヌルおよび゚チレングラむ
コヌルモノマヌのリテンシペンタむムず分子量の
垞甚察数から、次匏の回垰曲線を求め、これを
詊料に適甚し、詊料のリテンシペンタむムから逆
に分子量を求めるずいう方法で行぀た。たた、各
成分の割合は、瀺差屈折蚈128×10-8RI
単䜍を甚い、詊料濃床を0.5±0.2、詊料泚入
量を100Όずしお枬定し、屈折蚈出力〜1V蚘
録蚈ぞの出力〜10mVチダヌト速床mm分
ずしお埗られたクロマトグラムを、必芁な分子量
区分に分け、切りぬき重量法により、それぞれの
比率を求めた。 次含浞時、甚いる付加型むミド暹脂プレポリ
マヌ溶液ずしおは、ビスむミドずゞアミンずを極
性溶剀䞭で反応させおプレポリマヌ溶液ずするこ
ずもできるし、たた、垂販の付加型むミド暹脂を
極性溶剀に溶解させおプレポリマヌ溶液ずするこ
ずもできる。 次に、この発明の実斜䟋および比范䟋に぀いお
説明する。 ワニス  ・N′―メチレンビス―プニルマレむ
ミド、以䞋、「BMI」ず蚘すを1074、
4′―ゞアミノ―ゞプニルメタン以䞋、
「DDM」ず蚘すを400、・―ゞメチルア
セトアミド以䞋、「DMAC」ず蚘すを983、
それぞれ、぀口フラスコに蚈量しお仕蟌
み、撹拌棒、枩床蚈、冷华噚をこのフラスコに取
り付けたのち、オむルバスによ぀お加熱をおこな
぀お反応枩床70℃で300分間の反応をおこなわせ、
次に15分間で宀枩たで冷华しおプレポリマヌ溶液
を埗た。このプレポリマヌ溶液を1000取り、こ
れに、2000のDMACを加え、均䞀になるたで
撹拌し、次含浞甚ワニスを埗た。 ワニス  BMI1074、DDM600、DMAC1116をワ
ニス補造の堎合ず同様に反応させおプレポリマ
ヌ溶液を埗た。このプレポリマヌ溶液を1000取
り、これに2000のDMACを加え、均䞀になる
たで撹拌し、次含浞甚ワニスを埗た。 ワニス  ワニスの補造で埗られた、プレポリマヌ溶液
原液を100ずり、2900のDMACを加え、
均䞀になるたで撹拌し、次含浞甚ワニスを埗
た。 ワニス  BMI1500、DDM198、DMAC1132をワ
ニス補造の堎合ず同様に反応させおプレポリマ
ヌ溶液を埗た。このプレポリマヌ溶液を1000取
り、これに2000のDMACを加え、均䞀になる
たで撹拌し、次含浞甚ワニスを埗た。 ワニス  ワニスの補造で埗られたプレポリマヌ溶液
原液を10取り、2990のDMACを加え、均
䞀になるたで撹拌し、次含浞甚ワニスを埗た。 各ワニスの特性は第衚のようである。
[Formula] In the above formula, R 3 , R 4 and Y are each an alkyl group having 1 to 4 carbon atoms, a cyclic alkyl group having 5 or 6 carbon atoms in the ring, or phenyl or a polycyclic aromatic group. a straight-chain or branched alkylene group having less than 13 carbon atoms, a cyclic alkylene group having 5 or 6 carbon atoms in the ring, or a monocyclic or polycyclic group; Represents an arylene group. Group D is derived from the ethylenic anhydride (unsaturated dicarboxylic anhydride) of formula (3), such as maleic anhydride, citraconic anhydride, tetrahydrophthalic anhydride, itaconic anhydride, and the products of the Diels-Alder reaction which take place between cyclodienes and one of these anhydrides. Preferred unsaturated bis-imides of formula (1) that can be used include the following. Maleic acid N・N′-ethylene-bis-imide, maleic acid N・N′-hexamethylene-bis-imide, maleic acid N・N′-metaphenylene-bis-imide, maleic acid N・N′-paraphenylene-bis-imide -imide, maleic acid N・N'-4,
4'-diphenylmethane-bis-imide, <N.
N'-methylenebis(N-phenylmaleimide)
Also referred to as>, maleic acid N・N′-4,4′-diphenyl ether-bis-imide, maleic acid N・N′-4,4′-diphenyl ether-bis-imide
N′-4,4′-diphenylsulfone-bis-imide, maleic acid N・N′-4,4′-dicyclohexylmethane-bis-imide, maleic acid N・N′-
These include α·α′-4.4′-dimethylenecyclohexane-bis-imide, maleic acid N·N′-methaxylylene-bis-imide, maleic acid N·N′-diphenylcyclohexane-bis-imide, and the like. Further, as preferred diamines of formula (2) that can be used, the following can be mentioned.
4,4'-diaminodicyclohexylmethane, 1.
4'-diaminocyclohexane, 2,6-diaminopyridine, metaphenylenediamine, paraphenylenediamine, 4,4'-diamino-diphenylmethane, 2,2-bis-(4-aminophenyl)propane, benzidine, 4,4'- Diaminodiphenyl oxide, 4,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfone, bis-(4-aminophenyl) diphenylsilane, bis-(4-aminophenyl)methylphosphine oxide, bis- (3-aminophenyl)methylphosphine oxide, bis-(4
-aminophenyl) phenylphosphine oxide, bis-(4-aminophenyl) phenylamine, 1,5-diaminonaphthalene, metaxylylene diamine, paraxylylene diamine, 1,1-
Bis-(para-aminophenyl) phthalane, hexamethylene diamine, etc. A prepolymer solution is prepared by reacting the unsaturated bisimide and diamine in a polar solvent.
Preferred examples include -methylpyrrolidone, N·N-dimethylformamide, N·N-dimethylacetamide, and dimethyl sulfoxide, and these can be used alone or in combination of two or more. The prepolymer used in the method for producing the addition-type imide resin prepreg according to the present invention is obtained by reacting the above-mentioned unsaturated bisimide and diamine, but the molar ratio of the ingredients must be as described above. That is, for 2.0 moles of bisimide,
If the amount of diamine is less than 1.1 mol, the resulting prepolymer will have many unsaturated imide groups at the ends. Also, bisimide 2.0
If the amount of diamine is more than 3.0 moles per mole, the resin will have a short gelation time, and it will be difficult to control the drying conditions when drying the impregnated base material. Therefore, the amount of diamine needs to be 1.1 to 3.0 moles per 2.0 moles of bisimide. Also,
In a prepolymer solution synthesized from bisimide and diamine, if the solid content concentration is less than 1%, the viscosity of the prepolymer solution is too low and an appropriate amount of resin will not adhere during impregnation. Solid content concentration is 30%
If it exceeds this value, the varnish will not penetrate sufficiently between the fibers of the base material during impregnation, which is undesirable when considering the adhesion of the laminated board. Therefore, it is necessary that the solid content concentration of the prepolymer solution is 1 to 30%. Next, the drying temperature during the primary impregnation is
If the temperature is lower than 140°C, it becomes difficult to sufficiently evaporate high-boiling polar solvents such as N-methylpyrrolidone and dimethylacetamide. If the drying temperature exceeds 165°C, polymerization of the prepolymer will occur rapidly, making drying difficult to control. Therefore, the drying temperature during the primary impregnation is preferably 140 to 165°C. In addition, the resin molecular weight distribution of the prepolymer solution used for secondary impregnation is 30 to 55% of the unreacted raw material, and the molecular weight
39-65% of components are 400 to 15,000, molecular weight is
Preferably, the amount of components exceeding 15,000 is 1.8 to 6.8%. The resin molecular weight distribution of the primary prepreg is preferably such that unreacted raw materials account for 18 to 35%, components with a molecular weight of 400 to 15,000 account for 51 to 70%, and components with a molecular weight of over 15,000 account for 5 to 15%. . Here, the molecular weight distribution was determined using DMF solvent and the separation column was Showa Denko AD-803/S (8.0×
Gel permeation chromatograph (Toyo Soda HLC-803D) equipped with two 250 mm, 6000 theoretical plates)
It was measured by Calculation of molecular weight involves finding a cubic regression curve from the retention times of five types of monodisperse polyethylene glycol and ethylene glycol monomer and the common logarithm of the molecular weight, applying this to the sample, and calculating from the retention time of the sample. On the other hand, we used the method of determining the molecular weight. In addition, the proportion (%) of each component was determined using a differential refractometer (128×10 -8 RI
The sample concentration was 0.5 ± 0.2%, the sample injection amount was 100ÎŒ, the refractometer output was 0 to 1V, the recorder output was 0 to 10mV, and the chart speed was 5mm/min. It was divided into necessary molecular weight categories and the respective ratios were determined by the cut-out weight method. The addition-type imide resin prepolymer solution used at the time of secondary impregnation can be prepared by reacting bisimide and diamine in a polar solvent, or by using a commercially available addition-type imide resin in a polar solvent. It can also be dissolved to form a prepolymer solution. Next, examples and comparative examples of the present invention will be described. (Varnish 1) 1074g of N・N'-methylenebis (N-phenylmaleimide, hereinafter referred to as "BMI"), 4,
4'-diamino-diphenylmethane (hereinafter referred to as
400g of N/N-dimethylacetamide (hereinafter referred to as "DMAC"),
Each was weighed and charged into a 34-necked flask, and a stirring rod, thermometer, and condenser were attached to the flask, and then heated in an oil bath and reacted for 300 minutes at a reaction temperature of 70°C. ,
Next, the mixture was cooled to room temperature for 15 minutes to obtain a prepolymer solution. 1,000 g of this prepolymer solution was taken, 2,000 g of DMAC was added thereto, and the mixture was stirred until homogeneous to obtain a varnish for primary impregnation. (Varnish 2) 1074 g of BMI, 600 g of DDM, and 1116 g of DMAC were reacted in the same manner as in the case of producing Varnish 1 to obtain a prepolymer solution. 1,000 g of this prepolymer solution was taken, 2,000 g of DMAC was added thereto, and the mixture was stirred until homogeneous to obtain a varnish for primary impregnation. (Varnish 3) Take 100g of the prepolymer solution (undiluted solution) obtained in the production of Varnish 1, add 2900g of DMAC,
The mixture was stirred until it became uniform to obtain a varnish for primary impregnation. (Varnish 4) BMI1500g, DDM198g, and DMAC1132g were reacted in the same manner as in the case of producing Varnish 1 to obtain a prepolymer solution. 1,000 g of this prepolymer solution was taken, 2,000 g of DMAC was added thereto, and the mixture was stirred until homogeneous to obtain a varnish for primary impregnation. (Varnish 5) 10 g of the prepolymer solution (undiluted solution) obtained in the production of Varnish 1 was taken, 2990 g of DMAC was added thereto, and the mixture was stirred until homogeneous to obtain a varnish for primary impregnation. The characteristics of each varnish are shown in Table 1.

【衚】 次プリプレグ〜、〜 䞊のようにしお埗られたワニスを、それぞれ、
含浞甚バツトに移し、300×300mmのクロルシラン
系凊理剀で衚面凊理を行぀た105m2のガラス
クロスをバツト内のワニスに浞しお含浞を行い、
蒞気也燥機で150℃、10分間の也燥を行い、次
プリプレグを埗た。 次プリプレグ 也燥を160℃で分間行぀た他は、次プリプ
レグの補造ず同様にしお次プリプレグを埗
た。 次プリプレグ 也燥を120℃で30分間行぀た他は、次プリプ
レグの補造ず同様にしお次プリプレグを埗
た。 各次プリプレグの特性は第衚のようであ
る。
[Table] (Primary prepregs 1 to 3, 5 to 6) The varnishes obtained as above were
Transfer to an impregnating vat, and impregnate a 300 x 300 mm 105 g/m 2 glass cloth whose surface has been treated with a chlorosilane treatment agent by dipping it into the varnish in the vat.
Drying was performed in a steam dryer at 150°C for 10 minutes to obtain a primary prepreg. (Primary prepreg 4) A primary prepreg was obtained in the same manner as in the production of primary prepreg 1, except that drying was performed at 160° C. for 5 minutes. (Primary prepreg 7) A primary prepreg was obtained in the same manner as in the production of primary prepreg 1, except that drying was performed at 120° C. for 30 minutes. The characteristics of each primary prepreg are shown in Table 2.

【衚】 実斜䟋〜および比范䟋〜 ぀ぎに、䞊蚘で埗られた次プリプレグ〜
に、プレポリマヌ溶液BMI1074、DDM297
、DMAC914を70℃、300分間反応させお埗
た。を含浞し、150℃10分也燥しお最終プリプレ
グを埗た。 実斜䟋 次プリプレグに、垂販付加型むミド暹脂
1500を1000のDMACに均䞀に溶解させたプ
レポリマヌ溶液を含浞し、150℃で10分間也燥し
お最終プリプレグを埗た。 第衚に各最終プリプレグの特性を瀺す。
[Table] (Examples 1 to 4 and Comparative Examples 1 to 3) Next, primary prepregs 1 to 7 obtained above
Then, prepolymer solution (BMI1074g, DDM297
g, was obtained by reacting 914 g of DMAC at 70°C for 300 minutes. ) and dried at 150°C for 10 minutes to obtain the final prepreg. (Example 5) A commercially available addition type imide resin was added to the primary prepreg 1.
A final prepreg was obtained by impregnating 1500 g of a prepolymer solution uniformly dissolved in 1000 g of DMAC and drying at 150° C. for 10 minutes. Table 3 shows the properties of each final prepreg.

【衚】 実斜䟋は垂販ワニスを次含浞
実斜䟋〜、比范䟋〜で埗られた最終プ
リプレグ30枚をプレヌト金型の間に離型玙を介し
お入れ、実圚40Kgcm2、170℃、90分間の成圢を
行い、これを冷华した埌取り出し、20℃、時間
のポストキナアに䟛し、厚さmmの積局板を埗
た。この積局板を高速ドリルマシンのテヌブル䞊
に固定し、0.5mmφドリル刃ナニオンツヌル瀟
補を甚いお回転数80000rpm、送り速床1.0m
minの穎明け条件で、1000個の穎を連続的に明け
た。そしお、1000個目の穎の壁面を走査型電子顕
埮鏡で芳察を行い、界面剥離の有無を調べた。結
果を第衚に瀺す。
[Table] Example 5 is secondary impregnation with commercially available varnish. 30 final prepreg sheets obtained in Examples 1 to 5 and Comparative Examples 1 to 3 were placed between plate molds with release paper interposed, and the actual weight was 40 kg/cm. 2 , molding was carried out at 170°C for 90 minutes, and after cooling, it was taken out and subjected to post-curing at 20°C for 2 hours to obtain a laminate with a thickness of 3 mm. This laminate was fixed on the table of a high-speed drill machine, and a 0.5 mmφ drill blade (manufactured by Union Tool Co., Ltd.) was used to rotate at a rotation speed of 80,000 rpm and a feed rate of 1.0 m/min.
1000 holes were continuously drilled under min drilling conditions. The wall surface of the 1000th hole was then observed using a scanning electron microscope to check for interfacial delamination. The results are shown in Table 4.

【衚】
それ以䞋○
〔発明の効果〕 この発明は、以䞊のようであるので、高密床実
装可胜な積局板甚プリプレグを提䟛するこずがで
きる。
【table】
Less than that ○
[Effects of the Invention] As described above, the present invention can provide a laminate prepreg that can be mounted at high density.

Claims (1)

【特蚱請求の範囲】  䞍飜和ビスむミドずゞアミンより合成した付
加型むミド暹脂プレポリマヌを基材に含浞しお付
加型むミド暹脂プリプレグを補造するに際し、ビ
スむミドゞアミンが2.0モル1.1モル〜2.0モ
ル3.0モルの比率で合成した、固型分濃床〜
30のプレポリマヌ溶液を基材に次含浞させ也
燥させお次プリプレグを埗、これにさらに別途
調補した付加型むミド暹脂プレポリマヌ溶液を含
浞、也燥させるこずを特城ずする付加型むミド暹
脂プリプレグの補法。  次含浞時の也燥が140〜165℃で行われる特
蚱請求の範囲第項蚘茉の付加型むミド暹脂プリ
プレグの補法。
[Claims] 1. When manufacturing an addition-type imide resin prepreg by impregnating a base material with an addition-type imide resin prepolymer synthesized from unsaturated bisimide and diamine, bisimide/diamine is 2.0 mol/1.1 mol to 2.0 mol. /3.0 mol ratio, solid content concentration 1~
An addition-type imide resin characterized in that a base material is first impregnated with a 30% prepolymer solution and dried to obtain a primary prepreg, which is further impregnated with a separately prepared addition-type imide resin prepolymer solution and dried. Prepreg manufacturing method. 2. The method for producing an addition type imide resin prepreg according to claim 1, wherein drying during the primary impregnation is carried out at 140 to 165°C.
JP16442785A 1985-07-25 1985-07-25 FUKAGATAIMIDOJUSHIPURIPUREGUNOSEIHO Expired - Lifetime JPH0230333B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16442785A JPH0230333B2 (en) 1985-07-25 1985-07-25 FUKAGATAIMIDOJUSHIPURIPUREGUNOSEIHO

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16442785A JPH0230333B2 (en) 1985-07-25 1985-07-25 FUKAGATAIMIDOJUSHIPURIPUREGUNOSEIHO

Publications (2)

Publication Number Publication Date
JPS6225133A JPS6225133A (en) 1987-02-03
JPH0230333B2 true JPH0230333B2 (en) 1990-07-05

Family

ID=15792945

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH0230333B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0431435A (en) * 1990-05-28 1992-02-03 Matsushita Electric Works Ltd Addition type imide resin prepolymer and resin film prepared therefrom
JPH05148360A (en) * 1991-11-29 1993-06-15 Matsushita Electric Works Ltd Production of polyimide resin
KR100910767B1 (en) 2007-11-13 2009-08-04 삌성정밀화학 죌식회사 A method of preparing thermoplastic resin prepreg with improved impregnation property and thermoplastic resin prepreg prepared by the same
AU2009247173B2 (en) 2008-05-15 2014-04-17 R-Tech Ueno, Ltd. Pharmaceutical composition for treatment of dry eye and/or corneal/conjunctival disorders

Also Published As

Publication number Publication date
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