JPH0230333B2 - FUKAGATAIMIDOJUSHIPURIPUREGUNOSEIHO - Google Patents
FUKAGATAIMIDOJUSHIPURIPUREGUNOSEIHOInfo
- Publication number
- JPH0230333B2 JPH0230333B2 JP16442785A JP16442785A JPH0230333B2 JP H0230333 B2 JPH0230333 B2 JP H0230333B2 JP 16442785 A JP16442785 A JP 16442785A JP 16442785 A JP16442785 A JP 16442785A JP H0230333 B2 JPH0230333 B2 JP H0230333B2
- Authority
- JP
- Japan
- Prior art keywords
- prepreg
- addition
- resin
- imide resin
- imide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920005989 resin Polymers 0.000 claims description 37
- 239000011347 resin Substances 0.000 claims description 37
- 150000003949 imides Chemical class 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 16
- 150000004985 diamines Chemical class 0.000 claims description 14
- 238000005470 impregnation Methods 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 238000001035 drying Methods 0.000 claims description 13
- 239000007787 solid Substances 0.000 claims description 5
- 239000000243 solution Substances 0.000 description 21
- 239000002966 varnish Substances 0.000 description 21
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 11
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 11
- 239000011976 maleic acid Substances 0.000 description 11
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 11
- MHABMANUFPZXEB-UHFFFAOYSA-N O-demethyl-aloesaponarin I Natural products O=C1C2=CC=CC(O)=C2C(=O)C2=C1C=C(O)C(C(O)=O)=C2C MHABMANUFPZXEB-UHFFFAOYSA-N 0.000 description 9
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- 239000000203 mixture Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 4
- 238000005553 drilling Methods 0.000 description 4
- 239000002798 polar solvent Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 125000005462 imide group Chemical group 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000012756 surface treatment agent Substances 0.000 description 3
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 2
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- BLMSGSGJGUHKFW-UHFFFAOYSA-N 4-[(4-aminophenyl)-diphenylsilyl]aniline Chemical compound C1=CC(N)=CC=C1[Si](C=1C=CC(N)=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BLMSGSGJGUHKFW-UHFFFAOYSA-N 0.000 description 1
- KTZLSMUPEJXXBO-UHFFFAOYSA-N 4-[(4-aminophenyl)-phenylphosphoryl]aniline Chemical compound C1=CC(N)=CC=C1P(=O)(C=1C=CC(N)=CC=1)C1=CC=CC=C1 KTZLSMUPEJXXBO-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- YFBMJEBQWQBRQJ-UHFFFAOYSA-N 4-n-(4-aminophenyl)-4-n-phenylbenzene-1,4-diamine Chemical compound C1=CC(N)=CC=C1N(C=1C=CC(N)=CC=1)C1=CC=CC=C1 YFBMJEBQWQBRQJ-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 238000005698 Diels-Alder reaction Methods 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- HEHUZGFZNPSQMW-UHFFFAOYSA-N NC1=CC=C(C=C1)C(C1=CC=C(C=C1)N)[PH2]=O Chemical compound NC1=CC=C(C=C1)C(C1=CC=C(C=C1)N)[PH2]=O HEHUZGFZNPSQMW-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- IWZNWGDJJJKIOC-UHFFFAOYSA-N bis(3-aminophenyl)methyl-oxidophosphanium Chemical compound NC=1C=C(C=CC1)C(C1=CC(=CC=C1)N)[PH2]=O IWZNWGDJJJKIOC-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- SFLGSKRGOWRGBR-UHFFFAOYSA-N phthalane Chemical compound C1=CC=C2COCC2=C1 SFLGSKRGOWRGBR-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- VHNQIURBCCNWDN-UHFFFAOYSA-N pyridine-2,6-diamine Chemical compound NC1=CC=CC(N)=N1 VHNQIURBCCNWDN-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
Landscapes
- Reinforced Plastic Materials (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Description
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[Technical Field] The present invention relates to a method for producing addition-type imide resin prepreg. [Background technology] Conventionally, epoxy resin materials with excellent adhesive properties, chemical resistance, electrical properties, mechanical properties, etc. have been often used as resins for manufacturing laminates such as multilayer printed wiring boards. When used in a high-multilayer printed wiring board for mounting, there are problems with heat resistance on the mounting surface and a reduction in continuity reliability due to resin smear and thermal expansion in the thickness direction. In order to solve these problems, heat-resistant resins such as polyimide have been developed and put into practical use as resins for manufacturing laminates. In particular, addition-type polyimide, which is made by reacting unsaturated bisimide with diamine, has a low coefficient of thermal expansion in the thickness direction and can be processed with high precision, such as thinning wires for high density and making micro holes. High continuity reliability due to plating
There is no smearing during the drilling process, and the conductor adhesion and hardness at high temperatures improve mounting performance.
Because it has features such as being able to withstand continuous use at high temperatures (200°C), it has come to be widely used as a material for multilayer printed wiring boards. However, in recent years, multilayer printed wiring boards such as those used in large computers have become more densely packaged and multilayered, resulting in smaller circuits and through-hole diameters. There is an increasing demand for miniaturization, and in order to meet this demand, substrates are required to have a higher level of adhesion than before. Regarding adhesion, it is natural that the adhesion between the circuit and the resin must be high due to the miniaturization of the circuit, but the adhesion between the resin and the base material impregnated with the resin must also be high. This is because if the adhesion between the base material and the resin is low, there will be an inconvenience in that minute peeling will occur between the base material and the resin when drilling holes in a multilayer printed wiring board. be. However, when preparing a prepreg by impregnating a base material with the above-mentioned addition-type polyimide varnish and drying it, and using this prepreg to create a substrate for a printed wiring board, the resin can be used at the level of a multilayer printed wiring board for large computers, etc. It was not possible to obtain sufficient adhesion between the resin and the base material, and in many cases, fine interfacial peeling between the base material and the resin was likely to occur during the drilling process. [Purpose of the Invention] The present invention has been made in view of the above points, and an object thereof is to provide a method for manufacturing an addition-type imide resin prepreg for laminates that has excellent adhesion and allows for high-density mounting. be. [Disclosure of the Invention] In order to achieve the above object, the inventors have solved the cause of insufficient adhesion between the base material and the resin when using a generally known addition type imide resin prepreg. Researched. As a result, it was found that more common addition-type imide resin prepolymers have unsaturated imide groups at the end of the prepolymer than amino groups. Generally, epoxysilane-based, chlorosilane-based, cationic silane-based processing agents are used as surface treatment agents for glass substrates, etc.
These surface treatment agents tend to react more easily with amino groups than with maleimide groups, so general addition-type imide resin prepolymers, which have many unsaturated imide groups at their ends, have insufficient adhesion to the substrate. I realized that I am getting used to it. In addition, prepolymers containing a large number of amino group terminals are not only highly reactive with surface treatment agents, but also highly reactive with ordinary varnish applied in the subsequent secondary impregnation. It has been found that excellent adhesion can be obtained between the processing agent and the common resin because both are strongly bonded to each other. As a result of further research, the inventors found that
We have discovered an addition-type imide resin with sufficient adhesion between the resin and the base material and a method for producing the same, and have now completed the following invention. That is, in the present invention, when producing an addition-type imide resin prepreg by impregnating a base material with an addition-type imide resin prepolymer synthesized from unsaturated bisimide and diamine, the bisimide/diamine ratio is 2.0.
A prepolymer solution synthesized at a ratio of mol/1.1 mol to 2.0 mol/3.0 mol and having a solid content concentration of 1 to 30% is first impregnated into a base material and dried to obtain a primary prepreg, which is further prepared separately. The gist of this paper is a method for producing an addition-type imide resin prepreg, which is characterized by impregnating and drying an addition-type imide resin prepolymer solution. This invention will be explained in detail below. Here, the unsaturated bis-imide is represented by formula (1), and the diamine is represented by formula (2). (In the formula, D represents a divalent group containing a carbon-carbon double bond, and A represents a divalent group containing at least two carbon atoms.) H 2 N-B-NH 2 (2) ( In the formula (B represents a divalent group having 30 or less carbon atoms) A and B in the above formulas (1) and (2) may be the same or different; linear or branched alkylene groups with 5 or 6 carbon atoms in the ring, O,N
and a heterocyclic group containing at least one S atom, or a phenylene or polycyclic aromatic group. These various groups may have substituents that do not give rise to unnecessary side reactions under the reaction conditions. The above A and B can also be a large number of phenylene groups, or an alicyclic group bonded directly or with divalent atoms or the following groups. Thus, for example, they are oxygen or sulfur, the group of alkylenes of 1 to 3 carbon atoms, or one of the following groups: -NR 4 -, -P(O)R 3 -, -N=N-,
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åã¯ãã¹ã®ç¹æ§ã¯ç¬¬ïŒè¡šã®ããã§ããã[Formula] In the above formula, R 3 , R 4 and Y are each an alkyl group having 1 to 4 carbon atoms, a cyclic alkyl group having 5 or 6 carbon atoms in the ring, or phenyl or a polycyclic aromatic group. a straight-chain or branched alkylene group having less than 13 carbon atoms, a cyclic alkylene group having 5 or 6 carbon atoms in the ring, or a monocyclic or polycyclic group; Represents an arylene group. Group D is derived from the ethylenic anhydride (unsaturated dicarboxylic anhydride) of formula (3), such as maleic anhydride, citraconic anhydride, tetrahydrophthalic anhydride, itaconic anhydride, and the products of the Diels-Alder reaction which take place between cyclodienes and one of these anhydrides. Preferred unsaturated bis-imides of formula (1) that can be used include the following. Maleic acid Nã»Nâ²-ethylene-bis-imide, maleic acid Nã»Nâ²-hexamethylene-bis-imide, maleic acid Nã»Nâ²-metaphenylene-bis-imide, maleic acid Nã»Nâ²-paraphenylene-bis-imide -imide, maleic acid Nã»N'-4,
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Also referred to as>, maleic acid Nã»Nâ²-4,4â²-diphenyl ether-bis-imide, maleic acid Nã»Nâ²-4,4â²-diphenyl ether-bis-imide
Nâ²-4,4â²-diphenylsulfone-bis-imide, maleic acid Nã»Nâ²-4,4â²-dicyclohexylmethane-bis-imide, maleic acid Nã»Nâ²-
These include α·αâ²-4.4â²-dimethylenecyclohexane-bis-imide, maleic acid N·Nâ²-methaxylylene-bis-imide, maleic acid N·Nâ²-diphenylcyclohexane-bis-imide, and the like. Further, as preferred diamines of formula (2) that can be used, the following can be mentioned.
4,4'-diaminodicyclohexylmethane, 1.
4'-diaminocyclohexane, 2,6-diaminopyridine, metaphenylenediamine, paraphenylenediamine, 4,4'-diamino-diphenylmethane, 2,2-bis-(4-aminophenyl)propane, benzidine, 4,4'- Diaminodiphenyl oxide, 4,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfone, bis-(4-aminophenyl) diphenylsilane, bis-(4-aminophenyl)methylphosphine oxide, bis- (3-aminophenyl)methylphosphine oxide, bis-(4
-aminophenyl) phenylphosphine oxide, bis-(4-aminophenyl) phenylamine, 1,5-diaminonaphthalene, metaxylylene diamine, paraxylylene diamine, 1,1-
Bis-(para-aminophenyl) phthalane, hexamethylene diamine, etc. A prepolymer solution is prepared by reacting the unsaturated bisimide and diamine in a polar solvent.
Preferred examples include -methylpyrrolidone, N·N-dimethylformamide, N·N-dimethylacetamide, and dimethyl sulfoxide, and these can be used alone or in combination of two or more. The prepolymer used in the method for producing the addition-type imide resin prepreg according to the present invention is obtained by reacting the above-mentioned unsaturated bisimide and diamine, but the molar ratio of the ingredients must be as described above. That is, for 2.0 moles of bisimide,
If the amount of diamine is less than 1.1 mol, the resulting prepolymer will have many unsaturated imide groups at the ends. Also, bisimide 2.0
If the amount of diamine is more than 3.0 moles per mole, the resin will have a short gelation time, and it will be difficult to control the drying conditions when drying the impregnated base material. Therefore, the amount of diamine needs to be 1.1 to 3.0 moles per 2.0 moles of bisimide. Also,
In a prepolymer solution synthesized from bisimide and diamine, if the solid content concentration is less than 1%, the viscosity of the prepolymer solution is too low and an appropriate amount of resin will not adhere during impregnation. Solid content concentration is 30%
If it exceeds this value, the varnish will not penetrate sufficiently between the fibers of the base material during impregnation, which is undesirable when considering the adhesion of the laminated board. Therefore, it is necessary that the solid content concentration of the prepolymer solution is 1 to 30%. Next, the drying temperature during the primary impregnation is
If the temperature is lower than 140°C, it becomes difficult to sufficiently evaporate high-boiling polar solvents such as N-methylpyrrolidone and dimethylacetamide. If the drying temperature exceeds 165°C, polymerization of the prepolymer will occur rapidly, making drying difficult to control. Therefore, the drying temperature during the primary impregnation is preferably 140 to 165°C. In addition, the resin molecular weight distribution of the prepolymer solution used for secondary impregnation is 30 to 55% of the unreacted raw material, and the molecular weight
39-65% of components are 400 to 15,000, molecular weight is
Preferably, the amount of components exceeding 15,000 is 1.8 to 6.8%. The resin molecular weight distribution of the primary prepreg is preferably such that unreacted raw materials account for 18 to 35%, components with a molecular weight of 400 to 15,000 account for 51 to 70%, and components with a molecular weight of over 15,000 account for 5 to 15%. . Here, the molecular weight distribution was determined using DMF solvent and the separation column was Showa Denko AD-803/S (8.0Ã
Gel permeation chromatograph (Toyo Soda HLC-803D) equipped with two 250 mm, 6000 theoretical plates)
It was measured by Calculation of molecular weight involves finding a cubic regression curve from the retention times of five types of monodisperse polyethylene glycol and ethylene glycol monomer and the common logarithm of the molecular weight, applying this to the sample, and calculating from the retention time of the sample. On the other hand, we used the method of determining the molecular weight. In addition, the proportion (%) of each component was determined using a differential refractometer (128Ã10 -8 RI
The sample concentration was 0.5 ± 0.2%, the sample injection amount was 100ÎŒ, the refractometer output was 0 to 1V, the recorder output was 0 to 10mV, and the chart speed was 5mm/min. It was divided into necessary molecular weight categories and the respective ratios were determined by the cut-out weight method. The addition-type imide resin prepolymer solution used at the time of secondary impregnation can be prepared by reacting bisimide and diamine in a polar solvent, or by using a commercially available addition-type imide resin in a polar solvent. It can also be dissolved to form a prepolymer solution. Next, examples and comparative examples of the present invention will be described. (Varnish 1) 1074g of Nã»N'-methylenebis (N-phenylmaleimide, hereinafter referred to as "BMI"), 4,
4'-diamino-diphenylmethane (hereinafter referred to as
400g of N/N-dimethylacetamide (hereinafter referred to as "DMAC"),
Each was weighed and charged into a 34-necked flask, and a stirring rod, thermometer, and condenser were attached to the flask, and then heated in an oil bath and reacted for 300 minutes at a reaction temperature of 70°C. ,
Next, the mixture was cooled to room temperature for 15 minutes to obtain a prepolymer solution. 1,000 g of this prepolymer solution was taken, 2,000 g of DMAC was added thereto, and the mixture was stirred until homogeneous to obtain a varnish for primary impregnation. (Varnish 2) 1074 g of BMI, 600 g of DDM, and 1116 g of DMAC were reacted in the same manner as in the case of producing Varnish 1 to obtain a prepolymer solution. 1,000 g of this prepolymer solution was taken, 2,000 g of DMAC was added thereto, and the mixture was stirred until homogeneous to obtain a varnish for primary impregnation. (Varnish 3) Take 100g of the prepolymer solution (undiluted solution) obtained in the production of Varnish 1, add 2900g of DMAC,
The mixture was stirred until it became uniform to obtain a varnish for primary impregnation. (Varnish 4) BMI1500g, DDM198g, and DMAC1132g were reacted in the same manner as in the case of producing Varnish 1 to obtain a prepolymer solution. 1,000 g of this prepolymer solution was taken, 2,000 g of DMAC was added thereto, and the mixture was stirred until homogeneous to obtain a varnish for primary impregnation. (Varnish 5) 10 g of the prepolymer solution (undiluted solution) obtained in the production of Varnish 1 was taken, 2990 g of DMAC was added thereto, and the mixture was stirred until homogeneous to obtain a varnish for primary impregnation. The characteristics of each varnish are shown in Table 1.
ãè¡šã
ïŒïŒæ¬¡ããªãã¬ã°ïŒãïŒãïŒãïŒïŒ
äžã®ããã«ããŠåŸãããã¯ãã¹ããããããã
å«æµžçšãããã«ç§»ãã300Ã300mmã®ã¯ãã«ã·ã©ã³
ç³»åŠçå€ã§è¡šé¢åŠçãè¡ã€ã105ïœïŒm2ã®ã¬ã©ã¹
ã¯ãã¹ããããå
ã®ã¯ãã¹ã«æµžããŠå«æµžãè¡ãã
èžæ°ä¹Ÿç¥æ©ã§150âã10åéã®ä¹Ÿç¥ãè¡ããïŒæ¬¡
ããªãã¬ã°ãåŸãã
ïŒïŒæ¬¡ããªãã¬ã°ïŒïŒ
也ç¥ã160âã§ïŒåéè¡ã€ãä»ã¯ãïŒæ¬¡ããªã
ã¬ã°ïŒã®è£œé ãšåæ§ã«ããŠïŒæ¬¡ããªãã¬ã°ãåŸ
ãã
ïŒïŒæ¬¡ããªãã¬ã°ïŒïŒ
也ç¥ã120âã§30åéè¡ã€ãä»ã¯ãïŒæ¬¡ããªã
ã¬ã°ïŒã®è£œé ãšåæ§ã«ããŠïŒæ¬¡ããªãã¬ã°ãåŸ
ãã
åïŒæ¬¡ããªãã¬ã°ã®ç¹æ§ã¯ç¬¬ïŒè¡šã®ããã§ã
ãã[Table] (Primary prepregs 1 to 3, 5 to 6) The varnishes obtained as above were
Transfer to an impregnating vat, and impregnate a 300 x 300 mm 105 g/m 2 glass cloth whose surface has been treated with a chlorosilane treatment agent by dipping it into the varnish in the vat.
Drying was performed in a steam dryer at 150°C for 10 minutes to obtain a primary prepreg. (Primary prepreg 4) A primary prepreg was obtained in the same manner as in the production of primary prepreg 1, except that drying was performed at 160° C. for 5 minutes. (Primary prepreg 7) A primary prepreg was obtained in the same manner as in the production of primary prepreg 1, except that drying was performed at 120° C. for 30 minutes. The characteristics of each primary prepreg are shown in Table 2.
ãè¡šã
ïŒå®æœäŸïŒãïŒããã³æ¯èŒäŸïŒãïŒïŒ
ã€ãã«ãäžèšã§åŸãããïŒæ¬¡ããªãã¬ã°ïŒãïŒ
ã«ããã¬ããªããŒæº¶æ¶²ïŒBMI1074ïœãDDM297
ïœãDMAC914ïœã70âã300åéåå¿ãããŠåŸ
ããïŒãå«æµžãã150â10å也ç¥ããŠæçµããªãã¬
ã°ãåŸãã
ïŒå®æœäŸïŒïŒ
ïŒæ¬¡ããªãã¬ã°ïŒã«ãåžè²©ä»å åã€ããæš¹è
1500ïœã1000ïœã®DMACã«åäžã«æº¶è§£ãããã
ã¬ããªããŒæº¶æ¶²ãå«æµžãã150âã§10åé也ç¥ã
ãŠæçµããªãã¬ã°ãåŸãã
第ïŒè¡šã«åæçµããªãã¬ã°ã®ç¹æ§ã瀺ãã[Table] (Examples 1 to 4 and Comparative Examples 1 to 3) Next, primary prepregs 1 to 7 obtained above
Then, prepolymer solution (BMI1074g, DDM297
g, was obtained by reacting 914 g of DMAC at 70°C for 300 minutes. ) and dried at 150°C for 10 minutes to obtain the final prepreg. (Example 5) A commercially available addition type imide resin was added to the primary prepreg 1.
A final prepreg was obtained by impregnating 1500 g of a prepolymer solution uniformly dissolved in 1000 g of DMAC and drying at 150° C. for 10 minutes. Table 3 shows the properties of each final prepreg.
ãè¡šã
å®æœäŸïŒã¯åžè²©ã¯ãã¹ãïŒæ¬¡å«æµž
å®æœäŸïŒãïŒãæ¯èŒäŸïŒãïŒã§åŸãããæçµã
ãªãã¬ã°30æããã¬ãŒãéåã®éã«é¢åçŽãä»ã
ãŠå
¥ããå®åš40KgïŒcm2ã170âã90åéã®æ圢ã
è¡ãããããå·åŽããåŸåãåºãã20âãïŒæé
ã®ãã¹ãããŠã¢ã«äŸããåãïŒmmã®ç©å±€æ¿ãåŸ
ãããã®ç©å±€æ¿ãé«éããªã«ãã·ã³ã®ããŒãã«äž
ã«åºå®ãã0.5mmÏããªã«åïŒãŠããªã³ããŒã«ç€Ÿ
補ïŒãçšããŠå転æ°80000rpmãéãé床1.0mïŒ
minã®ç©Žæãæ¡ä»¶ã§ã1000åã®ç©Žãé£ç¶çã«æã
ãããããŠã1000åç®ã®ç©Žã®å£é¢ãèµ°æ»åé»åé¡
埮é¡ã§èŠ³å¯ãè¡ããçé¢å¥é¢ã®æç¡ã調ã¹ããçµ
æã第ïŒè¡šã«ç€ºãã[Table] Example 5 is secondary impregnation with commercially available varnish. 30 final prepreg sheets obtained in Examples 1 to 5 and Comparative Examples 1 to 3 were placed between plate molds with release paper interposed, and the actual weight was 40 kg/cm. 2 , molding was carried out at 170°C for 90 minutes, and after cooling, it was taken out and subjected to post-curing at 20°C for 2 hours to obtain a laminate with a thickness of 3 mm. This laminate was fixed on the table of a high-speed drill machine, and a 0.5 mmÏ drill blade (manufactured by Union Tool Co., Ltd.) was used to rotate at a rotation speed of 80,000 rpm and a feed rate of 1.0 m/min.
1000 holes were continuously drilled under min drilling conditions. The wall surface of the 1000th hole was then observed using a scanning electron microscope to check for interfacial delamination. The results are shown in Table 4.
ãè¡šã
ãã以äžâ
ãçºæã®å¹æã
ãã®çºæã¯ã以äžã®ããã§ããã®ã§ãé«å¯åºŠå®
è£
å¯èœãªç©å±€æ¿çšããªãã¬ã°ãæäŸããããšãã§
ããããtableã
Less than that â
[Effects of the Invention] As described above, the present invention can provide a laminate prepreg that can be mounted at high density.
Claims (1)
å åã€ããæš¹èãã¬ããªããŒãåºæã«å«æµžããŠä»
å åã€ããæš¹èããªãã¬ã°ã補é ããã«éããã
ã¹ã€ããïŒãžã¢ãã³ã2.0ã¢ã«ïŒ1.1ã¢ã«ã2.0ã¢
ã«ïŒ3.0ã¢ã«ã®æ¯çã§åæãããåºååæ¿åºŠïŒã
30ïŒ ã®ãã¬ããªããŒæº¶æ¶²ãåºæã«ïŒæ¬¡å«æµžãã也
ç¥ãããŠïŒæ¬¡ããªãã¬ã°ãåŸãããã«ããã«å¥é
調補ããä»å åã€ããæš¹èãã¬ããªããŒæº¶æ¶²ãå«
浞ã也ç¥ãããããšãç¹åŸŽãšããä»å åã€ããæš¹
èããªãã¬ã°ã®è£œæ³ã ïŒ ïŒæ¬¡å«æµžæã®ä¹Ÿç¥ã140ã165âã§è¡ãããç¹
èš±è«æ±ã®ç¯å²ç¬¬ïŒé èšèŒã®ä»å åã€ããæš¹èããª
ãã¬ã°ã®è£œæ³ã[Claims] 1. When manufacturing an addition-type imide resin prepreg by impregnating a base material with an addition-type imide resin prepolymer synthesized from unsaturated bisimide and diamine, bisimide/diamine is 2.0 mol/1.1 mol to 2.0 mol. /3.0 mol ratio, solid content concentration 1~
An addition-type imide resin characterized in that a base material is first impregnated with a 30% prepolymer solution and dried to obtain a primary prepreg, which is further impregnated with a separately prepared addition-type imide resin prepolymer solution and dried. Prepreg manufacturing method. 2. The method for producing an addition type imide resin prepreg according to claim 1, wherein drying during the primary impregnation is carried out at 140 to 165°C.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16442785A JPH0230333B2 (en) | 1985-07-25 | 1985-07-25 | FUKAGATAIMIDOJUSHIPURIPUREGUNOSEIHO |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16442785A JPH0230333B2 (en) | 1985-07-25 | 1985-07-25 | FUKAGATAIMIDOJUSHIPURIPUREGUNOSEIHO |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6225133A JPS6225133A (en) | 1987-02-03 |
JPH0230333B2 true JPH0230333B2 (en) | 1990-07-05 |
Family
ID=15792945
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16442785A Expired - Lifetime JPH0230333B2 (en) | 1985-07-25 | 1985-07-25 | FUKAGATAIMIDOJUSHIPURIPUREGUNOSEIHO |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0230333B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0431435A (en) * | 1990-05-28 | 1992-02-03 | Matsushita Electric Works Ltd | Addition type imide resin prepolymer and resin film prepared therefrom |
JPH05148360A (en) * | 1991-11-29 | 1993-06-15 | Matsushita Electric Works Ltd | Production of polyimide resin |
KR100910767B1 (en) | 2007-11-13 | 2009-08-04 | ìŒì±ì ë°íí 죌ìíì¬ | A method of preparing thermoplastic resin prepreg with improved impregnation property and thermoplastic resin prepreg prepared by the same |
AU2009247173B2 (en) | 2008-05-15 | 2014-04-17 | R-Tech Ueno, Ltd. | Pharmaceutical composition for treatment of dry eye and/or corneal/conjunctival disorders |
-
1985
- 1985-07-25 JP JP16442785A patent/JPH0230333B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS6225133A (en) | 1987-02-03 |
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