JPH022999A - X-ray exposure device - Google Patents

Abstract

PURPOSE:To enable exposure of small position deviation by partial thermal expansion of a mask when uniform exposure of a large area by the use of synchrotron emitted light by using a convex mirror for performing linear reciprocating movement as an X-ray mirror longitudinally. CONSTITUTION:A convex mirror 11 for performing reciprocating movement in place of a conventional X-ray mirror as an X-ray mirror for reflecting synchrotron emitted light 3 is provided. The emitted light 3 is reflected by the mirror 3 and beam width is enlarged to irradiate an X-ray mask and a workpiece. Further an outgoing angle of the emitted light 3 changes and a beam scans the mask because an irradiating angle 13 is changed by performing reciprocating movement of the mirror, as a driving shaft 12 is made an axis, longitudinally (vertical to a beam direction). Thereby position deviation by thermal expansion can be lessened when the exposure of a large area is performed.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an X-ray exposure apparatus, and more particularly to an X-ray exposure apparatus capable of uniformly transferring a large-area X-ray mask pattern.

[Prior Art] The principle of an X-ray exposure apparatus using synchrotron radiation is as shown in FIG.
X-ray mask 4 with a mask pattern drawn by a ray absorption shrine
The mask pattern is transferred to the resist 1 to film 5 on the workpiece 6 through the mask pattern.

The synchrotron radiation 3 has a uniform intensity in the direction parallel to the electron orbital plane, but has a sharp angular distribution in the vertical direction, so it is approximately 107r1. Even in a remote location,
In the vertical direction, only a uniformly exposed area with a width fI of 1 mm can be obtained. Conventionally, as a method of enlarging and covering the exposed area, there is a method published in 1983 [Journal of Vacuum 1].
Neuens & Techno [1GJ (Journ)
al or Vacuum 5science andr
ecbnology) [Vol. 31, pp. 1262-1266, synchro 1 to long light source 2
Rotate 11 the X-ray mirror 8 installed between the
A method of vibrating around 17 has been implemented.

[Problems to be Solved by the Invention] Although the apparatus described above has achieved the objective of expanding the exposure area, it has the following drawbacks.

In other words, because the X-ray beam with a vertical width of several mm scans vertically over the mask, only the portion of the mask that is irradiated with the X-rays undergoes thermal expansion, and when the mask pattern is transferred to the workpiece, thermal expansion occurs. This may cause misalignment.

[1] The present invention eliminates such conventional problems,
An object of the present invention is to provide an X-ray exposure device capable of transferring over a large area with little positional deviation.

[Means for Solving the Problems] The present invention refracts synchrotron radiation light emitted from a synchrotron radiation light source with an X-ray mirror, and irradiates it onto a workpiece coated with an X-ray resist through an X-ray mask. This X-ray exposure apparatus is characterized in that it uses a convex mirror that covers linear reciprocating motion in the vertical direction as an X-ray mirror.

[Example] Hereinafter, an example of the present invention will be described with reference to the drawings.

FIG. 1 is a schematic diagram of a part of an X-ray mirror of an embodiment of an X-ray exposure apparatus according to the present invention. Since the configuration other than the X-ray mirror section is the same as that of the X-ray exposure apparatus shown in FIG. 3, the explanation thereof will be omitted.

In the present invention, instead of the X-ray mirror 8 in FIG. 3, a convex surface v111 that reciprocates as shown in FIG. 1 is provided. The synchrotron radiation 3 is reflected by an X-ray mirror as shown in FIG. 1 and irradiated onto the X-ray mask and the workpiece, but since the X-ray mirror is a convex mirror 11, the beam width is expanded. Furthermore, by setting the drive shaft 12 to ql (1) and reciprocating the mirror in the vertical direction (direction perpendicular to the beam direction), the beam angle 13 changes, so the output angle of the synchrotron radiation light 3 changes. Then, the beam performs a scanon on the mask.

FIG. 2 is a diagram showing the beam width on the mask, where A shows the beam intensity according to the present invention and B shows the beam intensity according to the conventional method. As can be seen from the figure, it is easy to expand the beam width several times, and the positional shift due to partial thermal expansion of the mask can be significantly reduced. J: Also, in the present invention, the mirror moves only in a straight line, so the device can be simplified by directly driving the drive 111111 using a linear actuator or the like.

[Effects of the Invention] As detailed above, according to the present invention, synchrotron
- It is possible to provide an X-ray exposure apparatus that has the remarkable effect of being able to perform exposure with less positional shift due to local thermal expansion of the mask when uniformly exposing a large area using one beam of light.

[Brief explanation of the drawing]

Fig. 1 is a schematic configuration diagram showing an X-ray mirror according to an embodiment of the present invention, Fig. 2 is a diagram comparing the X-ray intensity distribution of the mask during X-ray exposure according to the present invention with a conventional example, and Fig. 3 The figure is a schematic 4111 diagram of a conventional X-ray exposure apparatus. 1... Storage ring 2... Synchrotron radiation light source 3... Synchrotron radiation light 4... X-ray mask 5... Resist film 6...
・Workpiece 7...Rotation axis 8...X-ray mirror 11...Convex mirror 12...Drive 4qb 13...Sight I,! 1 corner

Claims (1)

[Claims] (1) In an X-ray exposure device that reflects synchrotron radiation light emitted from a synchrotron radiation light source with an X-ray mirror and irradiates it onto a workpiece coated with an X-ray resist through an X-ray mask, An X-ray exposure apparatus characterized in that a convex mirror that makes linear reciprocating motion in the vertical direction is used as a ray mirror.