JP2749937B2 - Exposure equipment - Google Patents

Description

Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus using a reflector for reflecting highly directional light used in a semiconductor exposure apparatus or the like.

In the present application, light, light flux, and beam include electromagnetic waves such as infrared light, ultraviolet light, and X-rays in addition to visible light.

[Prior Art] An illumination optical system using synchrotron radiation as an irradiation light source has been proposed as an exposure apparatus using X-rays. In such an illumination optical system, a reflection mirror is used to reduce short wavelength components that have a detrimental effect on exposure and to enlarge an exposure area.

In an exposure apparatus that irradiates a mask with synchrotron radiation having high directivity and then irradiates the mask, light applied to one point on the mask is light reflected from a small area on the mirror. Therefore, if a defect such as a flaw, dust, dirt, or the like is attached to the mirror, the exposure beam is absorbed or scattered without being reflected, and the exposure beam is not reflected at a point on the mask corresponding to the mirror reflection point. Irradiation is not performed or the irradiation power is reduced, resulting in poor exposure. That is, on the mask, an illuminance difference occurs between the reflected light from the normal portion on the mirror and the reflected light from the defective portion, which causes exposure unevenness.

FIG. 3 shows the configuration of a conventional exposure apparatus. 1 is an X-ray source such as SOR (synchrotron radiation), 2 is an X-ray mirror, 3 is a master (photomask or reticle), and 8 is a wafer. This apparatus uses a plane mirror as the X-ray mirror, and changes the reflection angle of the illumination light by using the axis 18 as the center of rotation, thereby canceling the necessary exposure area.

[Problems to be Solved by the Invention] In this example, if there is a defect such as a flaw on the surface of the mirror 2, the regular reflectance of the portion is reduced. The formation of a long slit-like dark portion causes uneven exposure.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned drawbacks of the related art, and has as its first object to provide an exposure apparatus that prevents exposure unevenness caused by defects such as flaws and dust adhesion on a reflection mirror.

Other objects of the present invention will become apparent in the following description of the detailed embodiments of the present invention.

[Means for Solving the Problems] The present invention for solving the above problems is an exposure apparatus that exposes a predetermined area by reflecting a light beam on a reflecting surface, and changes an incident angle of the light beam on the reflecting surface. First driving means for rotating and moving the reflecting surface so as to cause the reflecting surface to move in parallel in the in-plane direction such that the incident position of the light beam on the reflecting surface changes during driving of the first driving means. And a second driving means.

[Embodiment] FIG. 1 is a configuration diagram of a reflection unit of an exposure apparatus according to a first embodiment of the present invention.

In FIG. 1, 28 is a mirror that reflects X-rays,
The reflection surface 28a is a flat surface. The mirror 28 is held by the mirror holder 21. Reference numeral 22 denotes a guide mechanism, and the mirror holder 21 can be moved relative to the swing frame 23 in a direction parallel to the reflection surface 28a of the mirror, specifically, in a direction parallel to a rotation axis direction described later. It has become. Reference numeral 24 denotes a drive mechanism for driving the direction mirror holder 21.

The swing frame 23 is further rotatably attached to the entire frame 25. Reference numeral 26 denotes a rotation shaft, and the swing frame 23 is rotatable around the rotation shaft 26. Reference numeral 27 denotes a drive mechanism for driving the swing frame 23 to rotate about the rotation shaft 26. The extension of the rotation center of the rotation shaft 26 is designed to be within the reflection surface 28a of the mirror. Whole frame 2
5 is fixed.

FIG. 2 shows a schematic diagram of the overall configuration of the present embodiment. The same members as those in FIG. 3 are denoted by the same reference numerals. In the drawing, 3a is a mask chuck for holding the mask 3, and 8a is a wafer chuck for holding the wafer 8. In such a configuration, by rotating the swing frame 23 by the driving mechanism 27 during exposure, the mirror reflecting surface 28a can be rotated about the rotation shaft 26, and as a result, as described in FIG. The required exposure area can be scanned with X-rays by changing the reflection angle of the illumination X-rays. During this scanning, the mirror holder 21 is moved by the drive mechanism 24 with respect to the swing frame 23 to the reflecting surface 28.
By driving in a direction parallel to a, here, a direction parallel to the rotation axis direction, the rotating mirror reflection surface 28a can be simultaneously moved in parallel to the rotation axis direction. In this case, even if the anti-axis surface 28a moves in a direction parallel to the rotation axis direction,
The position where the X-ray scans on the exposure area is the same as when the reflection surface 28a does not move in this direction. However, since the X-ray incident portion on the reflection surface 28a changes during exposure, if the mirror reflection surface has a flaw or the like, the influence can be dispersed. It is possible to prevent a long slit-shaped dark part from being formed in the direction.

In this case, it is desirable to vibrate in a direction parallel to the rotation axis direction by a sufficiently large number during one scan. The vibration direction may be a direction other than the direction parallel to the rotation axis direction, for example, a vertical direction as long as the direction is parallel to the reflection surface 28a of the mirror.

It is assumed that the driving unit 27 rotates and oscillates the swing frame 23 to scan one exposure area, for example, a pattern area of a mask, a plurality of times. In this case, the driving means 24 does not operate while scanning the exposure area, and the reflection surface 28a is not shown while the X-rays have finished scanning the exposure area and are at an angle of incidence outside the exposure area. The drive means 24 is operated by the control means of
Reflection surface 28 so that the X-ray incidence part on the top is different from the previous scan
Move the reflective surface 28a to the angle where the next scan starts.
Before the control means (not shown) stops the driving means 24,
The same effect can be obtained by repeating this if necessary.

Although the above embodiment has described the exposure apparatus for X-rays,
Needless to say, the present invention can be applied to other electromagnetic waves such as visible light and ultraviolet light.

Further, the mirror need not be a flat surface. For example, when the mirror has a cylindrical shape, the drive mechanism 24 may move the mirror holder 21 in the in-plane direction of the cylinder, for example, in the generatrix direction or the circumferential direction.

[Effects] According to the present invention, it is possible to provide a scanning type exposure apparatus in which the influence of exposure unevenness caused by a defect on the reflection surface is reduced.

[Brief description of the drawings]

FIG. 1 is a diagram showing the configuration of a reflection device section of an exposure apparatus according to a first embodiment of the present invention, FIG. 2 is a schematic diagram showing the overall configuration of the exposure apparatus, and FIG. In the figure, 24 and 27 are drive mechanisms and 28 is a mirror.

Claims (3)

(57) [Claims] An exposure apparatus for exposing a predetermined area by reflecting a light beam on a reflecting surface, wherein the first driving means rotates and moves the reflecting surface to change an incident angle of the light beam on the reflecting surface. An exposure apparatus, comprising: a second driving unit that translates the reflection surface in a direction parallel to the in-plane direction so that a light incident position on the reflection surface changes during driving of the first driving unit. . 2. The exposure apparatus according to claim 1, wherein said reflection surface has a planar shape, and said second driving means linearly drives said reflection surface in one direction parallel to said reflection surface. apparatus. 3. The reflection surface is translated by the second driving means after the scanning of the predetermined area by the first driving means and before the scanning of the next predetermined area is started. 2. The exposure apparatus according to claim 1.