JPH02297919A - Exposure device - Google Patents

Exposure device

Info

Publication number
JPH02297919A
JPH02297919A JP1118213A JP11821389A JPH02297919A JP H02297919 A JPH02297919 A JP H02297919A JP 1118213 A JP1118213 A JP 1118213A JP 11821389 A JP11821389 A JP 11821389A JP H02297919 A JPH02297919 A JP H02297919A
Authority
JP
Japan
Prior art keywords
light
mirror
concave mirror
movable body
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1118213A
Other languages
Japanese (ja)
Inventor
Tomoji Sekiya
関谷 智司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP1118213A priority Critical patent/JPH02297919A/en
Publication of JPH02297919A publication Critical patent/JPH02297919A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To move a light radiating position circularly and to extend the lives of concave and convex mirrors by rotatably providing the mirrors around an optical axis. CONSTITUTION:Concave and convex mirrors 6, 7 are rotated at a constant speed around an optical axis 9 by a motor 19. A light 2 of an arcuate section 3 output from a light source 1 is transmitted perpendicularly to a mask 12 to the mirror 6, rereflected to be radiated perpendicularly to a board 13, and the arcuate pattern of the mask 12 is transferred to the board 13. However, the mirror 7 is disposed near the focus position of the mirror 6, and a movable body is movably disposed in a pane perpendicular to the optical axis. When a movable body motion controller 10 is started, a body 4a is moved in (+) Y-axis direction and a body 4b is moved in (-) Y-axis direction at an equal speed, the two-dimensional pattern of the mask 12 is transferred to the board 13. Since the radiated positions of the light 2 on the mirrors 6, 7 are moved at a constant speed circumferentially, the deterioration of the optical function at the specific position is not accelerated to extend their lives.

Description

【発明の詳細な説明】 [発明のL1的] (産業上の利用分野) 本発明はマスク上に形成された央写元のパターンを凹面
鏡や凸面鏡等の光学系部材を用いて基板(ウェハ)に転
ダする露光装置に係わり、特に、凹面鏡や凸面鏡等の長
寿命化を図ることができる露光装置に関する。
[Detailed description of the invention] [L1 aspect of the invention] (Industrial application field) The present invention is a method for converting a central copy source pattern formed on a mask onto a substrate (wafer) using an optical system member such as a concave mirror or a convex mirror. The present invention relates to an exposure apparatus that is used for various purposes, and particularly relates to an exposure apparatus that can extend the life of concave mirrors, convex mirrors, and the like.

(従来の技術) 凹面鏡、凸面鏡等の反射光学系を用いて、マスク上の所
定のパターンを基板に投影して、パターンを基板に転写
する露光装置は、例えば第4図(a)のように構成され
ている。すなわち、水銀ランプ31から出力される光を
多数の・[面鏡や凹面鏡等の光学部材32を用いて円弧
状断面を釘する先に変換する。そして、この円弧状断面
を有した光をキャリア33上に取付けられたマスク34
に照射して、このマスク34を透過した光を台形ミラー
35で反射させ、その反射光を凹面鏡36及び凸面鏡3
7で再反射させる。凹面鏡37で再反射された光を前記
台形ミラー35で再度下方向に反射させ、この反射光の
光路にキャリア38に裁置された基板(ウェハ)39を
介〆[させる。なお、前記各キャリア33.38は図示
しない機構にて一体構成され、光軸に直交する市内(水
平面内)に図示しない移動機構にて移動自在に支持され
ている。
(Prior Art) An exposure apparatus that projects a predetermined pattern on a mask onto a substrate using a reflective optical system such as a concave mirror or a convex mirror and transfers the pattern onto the substrate is, for example, as shown in FIG. 4(a). It is configured. That is, the light output from the mercury lamp 31 is converted into a point with an arc-shaped cross section using a large number of optical members 32 such as surface mirrors and concave mirrors. Then, the light having an arcuate cross section is transmitted to a mask 34 mounted on the carrier 33.
The light transmitted through the mask 34 is reflected by the trapezoidal mirror 35, and the reflected light is transmitted to the concave mirror 36 and the convex mirror 3.
7 to re-reflect. The light re-reflected by the concave mirror 37 is again reflected downward by the trapezoidal mirror 35, and the optical path of this reflected light is passed through a substrate (wafer) 39 placed on a carrier 38. Each of the carriers 33, 38 is integrally constructed by a mechanism (not shown), and is movably supported within a city (in a horizontal plane) perpendicular to the optical axis by a moving mechanism (not shown).

なお、マスク34の手前には対物レンズ40が挿入退出
自在に設けられ、マスク34に描かれたパターンを複数
の反射v141,42を介して接眼レンズ43にて操作
員が8飲に応じて確認できる構造となっている。
In addition, an objective lens 40 is provided in front of the mask 34 so that it can be inserted and withdrawn freely, and the operator confirms the pattern drawn on the mask 34 through the eyepiece lens 43 via a plurality of reflections V141 and 42. The structure is such that it can be done.

このような構造の露光装置においては、第4図(b)に
示すように、マスク34に形成されたパターン45には
円弧状断面44を/−J゛する光か照射され、その光が
基板39に照射されるので、基板39には円弧状のパタ
ーンか投影される。したがって、キャリア33.38を
水平にかつ一方向に直線的に移動させると、マスク34
に描かれた2次元パターン45が基板39上に順次複写
されてい く 。
In an exposure apparatus having such a structure, as shown in FIG. 4(b), the pattern 45 formed on the mask 34 is irradiated with light that extends /-J' across the arcuate cross section 44, and the light is applied to the substrate. 39, an arc-shaped pattern is projected onto the substrate 39. Therefore, when the carrier 33.38 is moved horizontally and linearly in one direction, the mask 34
The two-dimensional pattern 45 drawn on is sequentially copied onto the substrate 39.

しかしながら、上記のように構成された露光装置におい
てもまた次のような問題があった。すなわち、前記光は
前述したように円弧状断面44をf1゛シており、この
円弧状断面44をHしした光は、台形ミラー35.凹面
鏡36.凸面鏡37.凹面f136 、台形ミラー35
を介してノ↓板3つ上に照り・Jされる。しかも、前記
各鏡35,36.37上における前記光の照射位置は、
前記6鏡35゜3b、37をこの露光装置に組込んだ時
点で固定される。したがって、実際の稼働期間において
は、光は各鏡35,36.37上において常時一定位置
を前月・1する。その結果、照射されている部分が他の
部分に比較してコーティング等における劣化が速くなる
。特に、近年光の強度を増大させて露光時間を短縮化す
ることが行4〕れているが、光強度を増大すると、照射
されている部分の劣化速度がより増大される。
However, the exposure apparatus configured as described above also has the following problems. That is, as described above, the light passes through the arcuate cross section 44 as f1, and the light that passes through the arcuate cross section 44 as H passes through the trapezoidal mirror 35. Concave mirror 36. Convex mirror 37. Concave f136, trapezoidal mirror 35
Teru and J are sent to the top of the ↓ board through . Moreover, the irradiation position of the light on each of the mirrors 35, 36, 37 is
Once the six mirrors 35.degree. 3b and 37 are assembled into this exposure apparatus, they are fixed. Therefore, during the actual operating period, the light always stays at a constant position on each mirror 35, 36, 37. As a result, the coating and the like deteriorate faster in the irradiated area than in other areas. In particular, in recent years, efforts have been made to shorten the exposure time by increasing the intensity of light (4), but increasing the intensity of light further increases the rate of deterioration of the irradiated area.

−h1前記凹而VL36や凸面鏡37は一般的に円盤状
に形成されているので、光が照9・jされない部分は永
久に照射されない。
-h1 Since the concave VL 36 and the convex mirror 37 are generally formed in a disk shape, the portions that are not illuminated with light will not be illuminated permanently.

(発明が解決しようとする課′XU) このように、従来の露光装置においては、凹面鏡や凸面
鏡のある特定部分に集中して光が照射されるので、その
部分の劣化が他の部分に比較して速くなり、凹面鏡や凸
面鏡全体の寿命が短(なり、凹面鏡や凸面鏡を頻繁に交
換しなれけばならず、露光装置全体の点検補修作業が繁
雑になる。
(Problem to be solved by the invention'XU) In this way, in conventional exposure equipment, light is concentrated on a certain part of the concave mirror or convex mirror, so the deterioration of that part is less than that of other parts. This shortens the life of the entire concave mirror or convex mirror, requiring frequent replacement of the concave mirror or convex mirror, and complicating inspection and repair work for the entire exposure apparatus.

また、凹面鏡や凸面鏡を頻繁に交換すれば、維持管理費
か増大する。
Also, if concave mirrors and convex mirrors are replaced frequently, maintenance costs will increase.

本発明はこのような事情に鑑みてなされたものであり、
凹面鏡や凸面鏡をその光軸回りに回転目l〔に設けるこ
とによって、光の照射位置を周上に真って移動でき、凹
ILl鏡や凸面鏡の劣化を周上に負って均一化でき、ひ
いては凹面鏡や凸面鏡の寿命を延長でき、装置全体の維
持管理費を低減できる露光装置を提供することを目的と
する。
The present invention was made in view of these circumstances, and
By providing a concave mirror or a convex mirror at a rotation angle around its optical axis, the light irradiation position can be moved straight on the circumference, and the deterioration of the concave ILl mirror or convex mirror can be uniformized by bearing it on the circumference. An object of the present invention is to provide an exposure apparatus that can extend the life of a convex mirror and reduce the maintenance cost of the entire apparatus.

〔発明の構成〕[Structure of the invention]

(課題を解決するための手段) 上記課題を解消するために本発明は、露光用の光を出力
する光源と、この光源から出力された光が光軸に11行
に入射されこの入射光を反射する凹面鏡と、この凹面鏡
の:([%点位置近傍に配設されこの凹面鏡にて反射さ
れた光を反射して凹面鏡へ内入I、Iさせる凸面鏡と、
光軸に直交する市内に移動日nE lこ設けられた可動
体とを有し、このi+)動体上の光源から凹面鏡への光
路に介挿される位置に取付けられたマスクに形成された
複与元のパターンを、I’lJ動体の凹面鏡にて再反射
された光の光路に介挿される位置に取付けられた基板に
、可動体を光軸に直交する市内に移動させることによっ
て転写する露光装置において、 凹面鏡と凸面鏡との2個の曲面鏡のうち少なくとも凹面
鏡を光軸を中心に回転させる回転駆動機構を備えたもの
である。
(Means for Solving the Problems) In order to solve the above problems, the present invention includes a light source that outputs exposure light, and a light source that outputs light for exposure, and that the light outputted from this light source is incident on the optical axis in 11 rows. A concave mirror that reflects, and a convex mirror disposed near the % point position that reflects the light reflected by the concave mirror and causes it to enter the concave mirror,
A movable body is installed in the city perpendicular to the optical axis, and a complex mask formed on a mask is attached at a position inserted in the optical path from the light source to the concave mirror on the moving body. The original pattern is transferred by moving the movable body into the city orthogonal to the optical axis onto a substrate attached to a position inserted in the optical path of the light re-reflected by the concave mirror of the I'lJ moving body. The exposure apparatus is equipped with a rotation drive mechanism that rotates at least one of two curved mirrors, a concave mirror and a convex mirror, around an optical axis.

(作用) このように構成された露光装置であれば、光源から出力
された露光用の光は可動体に取付けられたマスクに描か
れたパターンを透過して凹面鏡に入射され、この凹面鏡
で反射されて凸面鏡で反射され再度凹面鏡に入射され、
再度この凹面鏡で反射される。そして、最終的に可動体
に取付けられた基板に照射される。よって、マスクに描
かれたパターンは基板上に投影され、基板が露光される
。そして、可動体移動制御部でもって、口1動体を光軸
に直交する面内に移動させると、マスクに描かれたパタ
ーンが基板に転写される。
(Function) With an exposure apparatus configured in this way, the exposure light output from the light source passes through the pattern drawn on the mask attached to the movable body, enters the concave mirror, and is reflected by the concave mirror. is reflected by a convex mirror and then incident on a concave mirror again.
It is reflected again by this concave mirror. Then, the light is finally irradiated onto the substrate attached to the movable body. Therefore, the pattern drawn on the mask is projected onto the substrate, and the substrate is exposed. Then, when the mouth moving body is moved in a plane perpendicular to the optical axis by the movable body movement control section, the pattern drawn on the mask is transferred to the substrate.

そして、このような動作でパターンを基板に転写する露
光装置において、凹面鏡と凸面鏡とのうちの少なくとも
凹面鏡を光軸を中心に回転させると、凹面鏡上における
光の照射位置が周方向に移動する。なお、これらの曲面
鏡は光軸を中心に回転させたとしてもその光学的機能は
何等変化しない。よって、連続的に又は一定周期毎にこ
れらの曲面鏡を回転させることによって、周上に亘って
光の照射量を均一化できる。しかして、凹面鏡や凸面鏡
の寿命を延ばすことが可能なる。
In an exposure apparatus that transfers a pattern onto a substrate through such an operation, when at least one of the concave mirror and the convex mirror is rotated about the optical axis, the light irradiation position on the concave mirror moves in the circumferential direction. Note that even if these curved mirrors are rotated around the optical axis, their optical functions do not change at all. Therefore, by rotating these curved mirrors continuously or at regular intervals, the amount of light irradiation can be made uniform over the circumference. Therefore, it is possible to extend the life of concave mirrors and convex mirrors.

(実施例) 以下本発明の一実施例を図面を用いて説明する。(Example) An embodiment of the present invention will be described below with reference to the drawings.

第1図は実施例の露光装置の概略構成を示す模式図であ
る。図中1は露光用の光を出力する光源であり、この光
源1内には、例えば第4図(a)に示すような水銀ラン
プと、この水銀ランプから放射された光を円弧状断面を
有する光に変換する複数の反射鏡からなる光学系部材が
収納されている。そして、この光源1から出力される光
2は図示するような円弧状断面3を有している。
FIG. 1 is a schematic diagram showing a schematic configuration of an exposure apparatus according to an embodiment. 1 in the figure is a light source that outputs light for exposure, and inside this light source 1 is a mercury lamp as shown in FIG. 4(a), and the light emitted from this mercury lamp is An optical system member consisting of a plurality of reflecting mirrors that converts light into light is housed therein. The light 2 output from this light source 1 has an arcuate cross section 3 as shown.

光源1から出力された円弧状断1j3を有する光2は第
1の+’il動体4aの一方側に形成されたマスク取付
窓5を透過して凹面vL6の一方の周辺部へ入射される
。凹面鏡6の一方の周辺部へ入射された光2はこの凹面
鏡6の焦点位置近傍に配設された凸面鏡7で反射されて
再度凹面鏡6の他方側の周辺部へ入射される。凹面鏡6
で再度反射された光2は第2の可動体4bに形成された
基板取付窓8へ入射される。
The light 2 having an arcuate section 1j3 outputted from the light source 1 is transmitted through the mask attachment window 5 formed on one side of the first +'il moving body 4a, and is incident on one peripheral part of the concave surface vL6. The light 2 incident on one periphery of the concave mirror 6 is reflected by a convex mirror 7 disposed near the focal point of the concave mirror 6, and is again incident on the other periphery of the concave mirror 6. Concave mirror 6
The light 2 reflected again by the second movable body 4b is incident on the board mounting window 8 formed in the second movable body 4b.

はぼ円盤形状を有する凹面鏡6および凸面鏡7は、その
先軸9が光源1から出力される光2に平行するように配
設されている。すなわち、光源1から四面fJ’A6へ
入射する円弧状断面3を有する光2と凹面鏡6から再反
射されて可動体4の基板取付窓8へ入射される円弧状断
面3を有する光2は平行関係を保ち、かつ光軸9に対し
て互いに等しい距1111dだけ離れている。
The concave mirror 6 and the convex mirror 7 each having a circular disk shape are arranged so that their front axes 9 are parallel to the light 2 output from the light source 1. That is, the light 2 having an arcuate cross section 3 that enters the four surfaces fJ'A6 from the light source 1 and the light 2 that has an arcuate cross section 3 that is re-reflected from the concave mirror 6 and enters the board mounting window 8 of the movable body 4 are parallel. relationship, and are spaced from each other by an equal distance 1111d with respect to the optical axis 9.

また、前記光2における円弧状断面3の曲率半径は、こ
の先2が凹面鏡6に入射した状態において、入射位置に
おける凹面vL6の曲率半径に一致するように設定され
ている。よって、円弧状の光2は焦点位置近傍に配設さ
れた凸面ff17で反射され、さらに凹面鏡6で再反射
したとしても、同一円弧状断面3を維持する。
Further, the radius of curvature of the arcuate cross section 3 of the light 2 is set so as to match the radius of curvature of the concave surface vL6 at the incident position when the light 2 is incident on the concave mirror 6. Therefore, even if the arc-shaped light 2 is reflected by the convex surface ff17 disposed near the focal point position and further reflected again by the concave mirror 6, the same arc-shaped cross section 3 is maintained.

また、第1の可動体4aおよび第2の可動体4bは前記
光軸9に直交する面内の上下方向(Y方向)に、かつ光
軸9に対して対称に、移動口(Eに支持されている。そ
して、可動体移動制御部10によって、図中Y方向に等
速度で、第1の可動体4aは上方へ、第2の可動体4b
は下方へ、それぞれ移動制御される。
Further, the first movable body 4a and the second movable body 4b are supported at the moving port (E) in the vertical direction (Y direction) in a plane perpendicular to the optical axis 9 and symmetrically with respect to the optical axis 9. Then, the movable body movement control unit 10 moves the first movable body 4a upward and the second movable body 4b at a constant speed in the Y direction in the figure.
are controlled to move downward, respectively.

第1の可動体4aのマスク取付窓5には、第2図に示す
ような、複写元のパターン11が描かれたマスク12が
取付けられており、第2の可動体4bの基板取付窓8に
はパターンを転写すべき基板(ウェハ)13が取付られ
ている。
A mask 12 on which a copy source pattern 11 is drawn, as shown in FIG. 2, is attached to the mask attachment window 5 of the first movable body 4a, and the board attachment window 8 of the second movable body 4b is attached to the mask attachment window 5 of the first movable body 4a. A substrate (wafer) 13 onto which a pattern is to be transferred is attached.

なお、前記光2の円弧状断面3の幅(長さ)は、マスク
12上のパターン11の幅より広い値に設定されている
Note that the width (length) of the arcuate cross section 3 of the light 2 is set to a value wider than the width of the pattern 11 on the mask 12.

さらに、凹面鏡6および凸面鏡7の6外)、J而に圧接
するようにそれぞれ駆動ローラ14,15が配設され、
駆動ローラ14は駆動軸16に直接取付けられ、駆動ロ
ーラ15はベルト17およびプーリ18を介して前記駆
動軸16に連結されている。そして、この駆動軸16は
モータ19にて回転駆動される。
Further, driving rollers 14 and 15 are arranged so as to press against the concave mirror 6 and the convex mirror 7 (6) and J, respectively,
The drive roller 14 is directly attached to the drive shaft 16, and the drive roller 15 is connected to the drive shaft 16 via a belt 17 and a pulley 18. This drive shaft 16 is rotationally driven by a motor 19.

したがって、モータ19を回転駆動すると、駆動軸16
が回転し、駆動ローラ14,15が回転して、各駆動ロ
ーラ14,15に外周面が当接している凹面鏡6および
凸面鏡7が光軸9回りに回転する。
Therefore, when the motor 19 is rotationally driven, the drive shaft 16
rotates, the drive rollers 14 and 15 rotate, and the concave mirror 6 and convex mirror 7, whose outer peripheral surfaces are in contact with each of the drive rollers 14 and 15, rotate around the optical axis 9.

なお、駆動ローラ15の外径とプーリ18の外径との比
は、凹面鏡6が一回転すると、凸面i7も一回転するよ
うに設定されている。したかって、凹面m6の回転角度
は凸面鏡7の回転角度に一致する状態で回転する。すな
わち、各駆動ローラ14.15、ベルト17.駆動軸1
6およびモータ19は凹面鏡6および凸面鏡7に対する
回転駆動機構を構成する。
The ratio between the outer diameter of the drive roller 15 and the outer diameter of the pulley 18 is set such that when the concave mirror 6 rotates once, the convex surface i7 also rotates once. Therefore, the rotation angle of the concave surface m6 matches the rotation angle of the convex mirror 7. That is, each drive roller 14.15, belt 17. Drive shaft 1
6 and motor 19 constitute a rotational drive mechanism for concave mirror 6 and convex mirror 7.

このように構成された露光装置において、前、;ピモー
タ19を起動して、凹面鏡6および凸面鏡7を光軸9回
りに一定速度で回転させただ状態で、この露光装置を起
動する。すると、光源1から出力された円弧状断面3を
aする光2はマスク12を垂直に透過して、凹面鏡6へ
入射され、この凹面鏡6にて再反射された後、基板13
へ垂直に照射される。したかって、マスク12の円弧状
のパターンが基板13上に投影され、基板13に転写さ
れる。
In the exposure apparatus configured as described above, the exposure apparatus is started with the pivot motor 19 being started and the concave mirror 6 and the convex mirror 7 being rotated around the optical axis 9 at a constant speed. Then, the light 2 outputted from the light source 1 and having an arcuate cross section 3 perpendicularly passes through the mask 12, enters the concave mirror 6, is re-reflected by the concave mirror 6, and then passes through the substrate 13.
is irradiated perpendicularly to Therefore, the arcuate pattern of the mask 12 is projected onto the substrate 13 and transferred onto the substrate 13.

そして、可動体移動制御部10を起動させて、第1の可
動体4aを(+)Y軸方向に、第2の可動体4bを(−
)Y軸方向に、互いに等しい一定速度で移動させれば、
マスク12に描かれた2次元のパターン11が基板13
に2次元的に転写される。
Then, the movable body movement control unit 10 is activated to move the first movable body 4a in the (+) Y-axis direction and move the second movable body 4b in the (-) direction.
) If they are moved at the same constant speed in the Y-axis direction,
The two-dimensional pattern 11 drawn on the mask 12 is the substrate 13
is transferred two-dimensionally.

このように、凹面鏡6および凸面鏡7を回転させながら
露光すると、各曲面f!6.7上の光2の照射位置が周
方向に一定速度で移動するので、周上に亘り均一に照射
され、ある特定位置のみ反射率やコーディング等の光学
的機能の劣化か速くなることはない。よって、全周に亘
り均一に劣化していくので、鏡全体としての寿命が大幅
に伸びる。
In this way, when exposing while rotating the concave mirror 6 and the convex mirror 7, each curved surface f! 6.7 Since the irradiation position of light 2 on the top moves at a constant speed in the circumferential direction, it is irradiated uniformly over the circumference, and optical functions such as reflectance and coding will not deteriorate or accelerate only in a certain position. do not have. Therefore, since the mirror deteriorates uniformly over its entire circumference, the life of the mirror as a whole is significantly extended.

ちなみに、実施例では照射位置を固定した場合に比較し
て寿命を約3倍以上に延ばすことができた。
Incidentally, in the example, the lifespan could be extended by about three times or more compared to the case where the irradiation position was fixed.

また、他の使用法として、6鏡6.7を一定周期毎に回
転させることも可能である。
Moreover, as another usage, it is also possible to rotate the six mirrors 6.7 at regular intervals.

すなわち、前記モータ19を駆動して、凹面鏡6および
凸面鏡7の回転角度位置θを任意の角度位置に設定した
のち、この露光装置を起動する。
That is, after driving the motor 19 to set the rotational angular position θ of the concave mirror 6 and the convex mirror 7 to an arbitrary angular position, the exposure apparatus is started.

そして、予め定められた一定期間この露光装置を稼働し
たのち、モータ19を駆動して、凹面鏡6と凸面m7と
の回転角度位置θを例えば八〇たけ回転させる。そして
、この角度位置で、露光装置を稼働させる。すると、凹
面鏡6および凸面鏡7における光2の照射位置が新しい
位置に移動する。
After operating this exposure apparatus for a predetermined period of time, the motor 19 is driven to rotate the rotation angle position θ of the concave mirror 6 and the convex surface m7 by, for example, 80 degrees. Then, the exposure device is operated at this angular position. Then, the irradiation positions of the light 2 on the concave mirror 6 and the convex mirror 7 move to new positions.

このように、一定期間同一角度位置で稼働させたのち、
Δθずつ回転角度位置θを移動でるので、凹面鏡6と凸
面鏡7の一つのMJ上位置が光2の照射に起因して反射
率やコーティング等の光学的な機能が劣化すると、光の
照射位置を周上の隣接位置へ移動させることによって、
長期間に亘って良好な光学的機能を維持できる。よって
、凹面鏡6および凸面vL7の寿命を、従来装置におけ
る凹面鏡や凸面鏡に比較して大幅に延ばすことが可能と
なる。
In this way, after operating at the same angle position for a certain period of time,
Since the rotational angle position θ is moved by Δθ, if the optical function such as reflectance or coating deteriorates due to the irradiation of the light 2 at the position above the MJ of one of the concave mirror 6 and the convex mirror 7, the irradiation position of the light will be changed. By moving to an adjacent position on the circumference,
Good optical function can be maintained for a long period of time. Therefore, the lifespan of the concave mirror 6 and the convex surface vL7 can be significantly extended compared to the concave mirror and convex mirror in conventional devices.

しかして、凹面m6や凸面鏡7の交換周期を延ばすこと
ができるので、露光装置全体の点検補修が簡単になり、
かつ維持管理費を大幅に低減できる。
As a result, the replacement cycle of the concave mirror m6 and the convex mirror 7 can be extended, making inspection and repair of the entire exposure apparatus easier.
Moreover, maintenance costs can be significantly reduced.

なお、本発明は上述した実施例に限定されるものでない
。実施例においては、凹面鏡6と凸面鏡7との両方の曲
面鏡6,7を回転させたが、凹面vL6のみを回転させ
ても本発明の効宋は十分前られる。また、必ずしも、各
凹面鏡687を同期させて回転させる必要もなく。それ
ぞれ独立に回転させてもよい。
Note that the present invention is not limited to the embodiments described above. In the embodiment, both the concave mirror 6 and the convex mirror 7 are rotated, but even if only the concave surface vL6 is rotated, the effectiveness of the present invention is sufficiently improved. Further, it is not necessarily necessary to rotate each concave mirror 687 in synchronization. Each may be rotated independently.

また、実施例における回転駆動機構は、第1図に示すよ
うに、凹面鏡6と凸面鏡7の外周面を駆動ローラ14,
15で回転させたが、例えば凹面鏡6と凸面gf17と
に共通する光軸9をモータ二つを用いて直接回転させる
ことも可能である。
Furthermore, as shown in FIG.
15, but it is also possible to directly rotate the optical axis 9 common to the concave mirror 6 and the convex surface gf 17 using two motors, for example.

さらに、第3図に示すように、第1図における第1の1
゛1■動体4aと第2のl’lJ動体4bとを一体形成
した111動体4を使用することも1−J能である。こ
の場合、マスク12が取付けられたマスク取付窓5と凹
面v16との間の光路に第1の反射鏡20aを配設し、
凹面vL6と基板付窓8との間の光路に第2の反射鏡2
0bおよび第3の反射鏡20cを介挿させている。
Furthermore, as shown in FIG. 3, the first 1 in FIG.
It is also possible to use a 111 moving body 4 in which the moving body 4a and the second l'lJ moving body 4b are integrally formed. In this case, the first reflecting mirror 20a is arranged in the optical path between the mask attachment window 5 to which the mask 12 is attached and the concave surface v16,
A second reflecting mirror 2 is provided in the optical path between the concave surface vL6 and the window 8 with a substrate.
0b and a third reflecting mirror 20c are inserted.

このように、マスク12から基板13までの光路に光2
を反射させる3枚の反射Vt 20 a 。
In this way, light 2 is placed on the optical path from the mask 12 to the substrate 13.
Three reflections Vt 20 a that reflect.

20b、20cを介挿させるこ0とによって、マスり1
2の像が基板13上で左右正像に結像されるので、マス
ク12および基板13を同一方向へ移動させながらマス
ク12のパターンを基板13に転写できる。
By inserting 20b and 20c, the mass 1
2 are formed as left and right images on the substrate 13, so the pattern of the mask 12 can be transferred to the substrate 13 while moving the mask 12 and the substrate 13 in the same direction.

[発明の効果] 以上説明したように本発明の露光装置によれば、凹面鏡
や凸面鏡を回転駆動機構でその光軸口りに回転できるよ
うに構成している。したがって、凹面鏡や凸面鏡上にお
けるる光の照射位置を周方向に一定速度で又は一定周期
毎に+1hi次移動でき、凹面鏡や凸11LI′ftの
劣化を周上に亘って均一化でき、ひいては凹面鏡や凸面
鏡の寿命を延長でき、装置全体の維持管理費を低減でき
る。
[Effects of the Invention] As explained above, according to the exposure apparatus of the present invention, the concave mirror or the convex mirror is configured to be able to rotate around its optical axis by the rotation drive mechanism. Therefore, the irradiation position of the light on the concave mirror or the convex mirror can be moved by +1hi in the circumferential direction at a constant speed or every constant period, and the deterioration of the concave mirror or the convex 11LI'ft can be made uniform over the circumference. The lifespan of the convex mirror can be extended, and maintenance costs for the entire device can be reduced.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例に係わる露光装置の概略構成
を示す模式図、第2図は同実施例のマスクを示す図、第
3図は本発明の他の実施例に係イ〕る露光装置の要部を
示す模式図、第4図(a)は従来の露光装置の概略構成
を示す図、第4図(b)は同従来装置に用いるるマスク
を示す図である。 〕・・・光源、2・・・光、3・・・円弧状断面、4・
・・1’l)動体、4a・・・第1の可動体、4b・・
・第2に可動体、5・・・マスク取付窓、6・・・凹面
鏡、7・・・凸面鏡、8・・・基板取付窓、9・・・光
軸、1o・・・11動体移動制御部、11・・・パター
ン、12・・・マスク、13・・・基板、14.15・
・・駆動ローラ、19・・・モータ。
FIG. 1 is a schematic diagram showing a schematic configuration of an exposure apparatus according to one embodiment of the present invention, FIG. 2 is a diagram showing a mask of the same embodiment, and FIG. 3 is a diagram showing another embodiment of the present invention.] FIG. 4(a) is a diagram showing a schematic configuration of a conventional exposure device, and FIG. 4(b) is a diagram showing a mask used in the conventional exposure device. ]...Light source, 2...Light, 3...Circular cross section, 4...
...1'l) Moving body, 4a...first moving body, 4b...
- Second movable body, 5... mask mounting window, 6... concave mirror, 7... convex mirror, 8... board mounting window, 9... optical axis, 1o... 11 moving body movement control Part, 11... Pattern, 12... Mask, 13... Substrate, 14.15.
... Drive roller, 19... Motor.

Claims (1)

【特許請求の範囲】  露光用の光を出力する光源と、この光源から出力され
た光が光軸に平行に入射されこの入射光を反射する凹面
鏡と、この凹面鏡の焦点位置近傍に配設されこの凹面鏡
にて反射された光を反射して前記凹面鏡へ再入射させる
凸面鏡と、前記光軸に直交する面内に移動自在に設けら
れた可動体とを有し、この可動体上の前記光源から前記
凹面鏡への光路に介挿される位置に取付けられたマスク
に形成された複写元のパターンを、前記可動体の前記凹
面鏡にて再反射された光の光路に介挿される位置に取付
けられた基板に、前記可動体を前記光軸に直交する面内
に移動させることによって転写する露光装置において、 前記凹面鏡と前記凸面鏡との2個の曲面鏡のうち少なく
とも凹面鏡を前記光軸を中心に回転させる回転駆動機構
を備えた露光装置。
[Scope of Claims] A light source that outputs light for exposure, a concave mirror that receives the light output from the light source parallel to the optical axis and reflects the incident light, and is disposed near the focal point of the concave mirror. It has a convex mirror that reflects the light reflected by the concave mirror and makes it enter the concave mirror again, and a movable body that is movable in a plane perpendicular to the optical axis, and the light source on the movable body. A copy source pattern formed on a mask attached to a position inserted in the optical path from the to the concave mirror to the concave mirror of the movable body is attached to a position inserted in the optical path of the light re-reflected by the concave mirror of the movable body. In an exposure apparatus that transfers images onto a substrate by moving the movable body in a plane orthogonal to the optical axis, at least one of the two curved mirrors, the concave mirror and the convex mirror, is rotated about the optical axis. Exposure equipment equipped with a rotational drive mechanism.
JP1118213A 1989-05-11 1989-05-11 Exposure device Pending JPH02297919A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1118213A JPH02297919A (en) 1989-05-11 1989-05-11 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1118213A JPH02297919A (en) 1989-05-11 1989-05-11 Exposure device

Publications (1)

Publication Number Publication Date
JPH02297919A true JPH02297919A (en) 1990-12-10

Family

ID=14731013

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1118213A Pending JPH02297919A (en) 1989-05-11 1989-05-11 Exposure device

Country Status (1)

Country Link
JP (1) JPH02297919A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999027569A1 (en) * 1997-11-22 1999-06-03 Nikon Corporation Aligner, exposure method and device manufacturing method
US7365826B2 (en) 2002-04-05 2008-04-29 Canon Kabushiki Kaisha Projection optical system, exposure apparatus and method using the same
JP2008103545A (en) * 2006-10-19 2008-05-01 Komatsu Ltd Extreme ultraviolet light source apparatus and collector mirror
JP2008108822A (en) * 2006-10-24 2008-05-08 Komatsu Ltd Extreme ultraviolet-ray source device and collector mirror device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999027569A1 (en) * 1997-11-22 1999-06-03 Nikon Corporation Aligner, exposure method and device manufacturing method
US6894763B2 (en) 1997-11-22 2005-05-17 Nikon Corporation Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same
US7365826B2 (en) 2002-04-05 2008-04-29 Canon Kabushiki Kaisha Projection optical system, exposure apparatus and method using the same
JP2008103545A (en) * 2006-10-19 2008-05-01 Komatsu Ltd Extreme ultraviolet light source apparatus and collector mirror
JP2008108822A (en) * 2006-10-24 2008-05-08 Komatsu Ltd Extreme ultraviolet-ray source device and collector mirror device

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