JPS63100461A - Illuminating device - Google Patents
Illuminating deviceInfo
- Publication number
- JPS63100461A JPS63100461A JP61245542A JP24554286A JPS63100461A JP S63100461 A JPS63100461 A JP S63100461A JP 61245542 A JP61245542 A JP 61245542A JP 24554286 A JP24554286 A JP 24554286A JP S63100461 A JPS63100461 A JP S63100461A
- Authority
- JP
- Japan
- Prior art keywords
- diffuser plate
- mirror
- light
- laser
- diffusing plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 8
- 238000005286 illumination Methods 0.000 claims description 10
- 238000009792 diffusion process Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 244000025254 Cannabis sativa Species 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005338 frosted glass Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、光源にパルスレーザ例えばエキシマレーザ
を用いた半導体露光装置の照明（系）装置に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an illumination (system) device for a semiconductor exposure apparatus using a pulsed laser, such as an excimer laser, as a light source.
半導体露光装置の光源には従来水銀ランプが用いられて
きたが、より短波長化して光りソグラフイの微細化に対
応するため、エキシマレーザが用いられるようになって
きている。エキシマレーザの中でもインジェクションロ
ッキングレーザに代表される波長幅の狭いレーザを用い
ると、高解像のレンズ光学系を容易に作ることができる
特徴（利点）がある。Conventionally, mercury lamps have been used as light sources for semiconductor exposure apparatuses, but excimer lasers have come to be used to achieve shorter wavelengths and to respond to miniaturization of photolithography. Among excimer lasers, the use of lasers with a narrow wavelength width, such as injection locking lasers, has the characteristic (advantage) of being able to easily create a high-resolution lens optical system.
しかしながら、このようなレーザでは空間的コヒーレン
スによるスペックルが付随し、露光装置の光源としては
不適当なものとなってしまう。However, such a laser is accompanied by speckles due to spatial coherence, making it unsuitable as a light source for an exposure apparatus.
このスペックルを消す方法として、従来、第３図に示す
スペックル低減装置が用いられてきた。As a method for eliminating speckles, a speckle reduction device shown in FIG. 3 has conventionally been used.
図において、レーザ１よυ出射された光は＠１の拡散板
２により拡散されるが、この拡散板２の後方にスペック
ルを生ずる。このスペックルの大きさは、拡散板の拡散
角をαとすると、おおよそλ／α（ユ数ミクロン）であ
る。ここで、λは光の波長である。次に、拡散板２の近
傍に図のように拡散板６を設置し、この拡散板を高速で
移動する。In the figure, the light υ emitted from the laser 1 is diffused by the diffuser plate 2 @1, but speckles are produced behind the diffuser plate 2. The size of this speckle is approximately λ/α (several microns), where α is the diffusion angle of the diffuser plate. Here, λ is the wavelength of light. Next, a diffuser plate 6 is installed near the diffuser plate 2 as shown in the figure, and this diffuser plate is moved at high speed.
この移動方法は、一般に、拡散板６に軸着されたモータ
８によって回転させている。In this moving method, generally, the diffuser plate 6 is rotated by a motor 8 that is pivotally attached to the diffuser plate 6 .
この第２の拡散板６を通過した散乱光によっても、やは
り゛いたる所にスペックルを生ずるが・このスペックル
は定常的なものではなく、拡散板６の移動に応じて変化
するものである。すなわち第１の拡散板２によって第２
の拡散板６上に生じているスペックルの大きさの程度、
第２の拡散板６を移動させると、第２の拡散板６による
スペックルパターンは全く別のパターンに変形してしま
う。The scattered light that passes through the second diffuser plate 6 also causes speckles everywhere, but these speckles are not constant and change as the diffuser plate 6 moves. . In other words, the first diffusion plate 2
The degree of the size of speckles occurring on the diffuser plate 6,
When the second diffuser plate 6 is moved, the speckle pattern created by the second diffuser plate 6 is transformed into a completely different pattern.
したがって、第２の拡散板６を第１の拡散板１によるス
ペックルの大きさのＮ倍（Ｎは正の整数）移動して時間
平均すれば、第２の拡散板６後方のスペックルのコント
ラストは１／Ａに減少する。Therefore, if the second diffuser plate 6 is moved N times the size of the speckles caused by the first diffuser plate 1 (N is a positive integer) and averaged over time, the speckles behind the second diffuser plate 6 will be Contrast is reduced to 1/A.
上記のスペックル低減方法は長時間平均すればする橿有
効であるため連続発振（ＣＷ）レーザに対しては非常に
有効な手段である。The speckle reduction method described above is effective when averaged over a long period of time, so it is a very effective means for continuous wave (CW) lasers.
上記のようなスペックル低減方法は、エキシマレーザの
ようなパルスレーザにそのまま適用しても、パルスの発
光時間が数１Ｏｎ（８）と非常に短いために効果がない
。例えば拡散板６を半径１５０謹のすりガラスで形成し
、１００１００ｒｐ秒当９の回転数）で回転したとする
と、１パルスの３゜ｎ５ｅｅの間で外周部が移動する距
離は２ Ｘ ３．１４ Ｘ １５０ （ｍ）ｘｌ ００
＊３０＜１０→＝２．３×１Ｑ−’、。Even if the speckle reduction method described above is directly applied to a pulsed laser such as an excimer laser, it is not effective because the pulse emission time is very short, several On(8). For example, if the diffuser plate 6 is made of frosted glass with a radius of 150 mm and is rotated at a speed of 100,100 rpm (9 rotations per second), the distance that the outer periphery moves during one pulse of 3°n5ee is 2 x 3.14 x 150 (m)xl 00
*30<10→=2.3×1Q-'.
となる。すなわち２．８μｍの値となり、これは第１の
拡散板の格子によるスペックルの大きさとほぼ同程度で
あって、スペックルのコントラストはほとんど減少しな
い。スペックルをある程度減少するには少くとも１桁以
上拡散板の移動速度を上げる必要がある。しかしこれは
技術的に非常に困却な問題である。例えば、回転数を１
桁上げて１０００ｒＰ８とすると、遠心力のためにすシ
ガラスが破壊してしまう。たとえ強化ガラスを使用した
としても、２ｏｏｒｐｓ程度が限界であり、第６図にお
いて、拡散板を高速で回転するようなスペックル低減法
はパルスレーザに対して適用できない問題点がある。becomes. That is, the value is 2.8 μm, which is approximately the same size as the speckle caused by the grating of the first diffuser plate, and the contrast of the speckle hardly decreases. In order to reduce speckle to some extent, it is necessary to increase the moving speed of the diffuser plate by at least one order of magnitude. However, this is technically a very difficult problem. For example, change the number of rotations to 1
If the value is increased to 1000rP8, the grass crow will be destroyed due to the centrifugal force. Even if tempered glass is used, the limit is about 2oorps, and as shown in FIG. 6, there is a problem that the speckle reduction method in which the diffuser plate is rotated at high speed cannot be applied to pulsed lasers.
この発明は上記のような問題点を解決するためになされ
たもので、パルスレーザに対して有効なスペックル低減
機能を有する照明装置を提供することを目的とするもの
である。This invention was made to solve the above-mentioned problems, and it is an object of the present invention to provide an illumination device having an effective speckle reduction function for pulsed lasers.
本発明に係る照明装置は、パルスレーザ光を光源とする
光路中に第１の拡散板を設置し、この拡散板によって拡
散された光をレンズと変角ミラーによシ第２の拡散板近
傍に結像させてスペックルを低減することを技術的要点
とするものである。In the illumination device according to the present invention, a first diffuser plate is installed in an optical path using pulsed laser light as a light source, and the light diffused by the diffuser plate is transmitted to the second diffuser plate near the second diffuser plate. The technical point is to reduce speckle by focusing the image on the image.
この発明においては、上記の技術的要点において、光源
レーザのパルスと同期して、変角２ラーに用いた多面鏡
を回転するので第１の拡散板の像と第２の拡散板の像の
相対位置を等しくすることができるととも罠、スペック
ル像を拡散板に対して高速に移動することができる。こ
の移動量をスペックルの大きさの数１０倍とすれば、パ
ルスレーザにおいて不可避な空間的コヒーレンスによる
スペックルの低減が可能となる。In this invention, in the above-mentioned technical point, the polygon mirror used for the variable angle 2 mirror is rotated in synchronization with the pulse of the light source laser, so that the image of the first diffuser plate and the image of the second diffuser plate are If the relative positions can be made equal, the trap and speckle images can be moved at high speed with respect to the diffuser plate. If this amount of movement is several tens of times the size of speckles, it becomes possible to reduce speckles due to spatial coherence, which is inevitable in pulsed lasers.
第１図はこの発明の一実施例を示す説明図であ、９，１
ａはパルスレーザ、２は第１の拡散板、３はレンズ、４
は回転多面体鏡、５はレンズ、６＆は第２の拡散板であ
シ、レンズ３及び５による光軸は図のよう（互に直角に
配置される。FIG. 1 is an explanatory diagram showing an embodiment of the present invention.
a is a pulse laser, 2 is a first diffuser plate, 3 is a lens, 4
5 is a rotating polygon mirror, 5 is a lens, and 6 & is a second diffuser plate.The optical axes of lenses 3 and 5 are arranged at right angles to each other as shown in the figure.
上記のように構成された照明装置において、パルスレー
ザ１より出射した光は第１の拡散板２によって散乱され
、レンズ３でほぼ平行に集光された後、高速で回転する
多面体鏡（ポリゴン鏡）４で反射され、レンズ５で第２
の拡散板６ａの位置に、第１の拡散板の像を結像する。In the illumination device configured as described above, the light emitted from the pulsed laser 1 is scattered by the first diffuser plate 2, and after being focused almost in parallel by the lens 3, the light is transferred to a polygon mirror (polygon mirror) that rotates at high speed. )4, and the second light is reflected by lens 5.
An image of the first diffuser plate is formed at the position of the diffuser plate 6a.
ポリゴン鏡４は軸対称の８面体鏡ヲ用い、回転軸のベア
リングはエアベアリングを使用して、約１０００ｒｐｓ
で回転する。なお、ポリゴン鏡は上記の８面体に限
られるものではないが高速回転体であるから、空気の抵
抗や製作工数などを考慮して最適形状のものが製作・使
用されるロ
レンズ６及びレンズ５は焦点距離３００■のものを使用
した。したがって、第１の拡散板２の像は３Ｑｎ式のパ
ルスの間に、
２に３．１４に３００（ｗ） Ｘ １０００Ｘ３０Ｘ１
０−’ ＝０．０５７ｍ移動する。つまシ５７μｍ移動
するので、この量はスペックルの大きさ数μｍの数１０
倍である。The polygon mirror 4 uses an axially symmetrical octahedral mirror, and the rotation axis uses an air bearing, and the rotation speed is approximately 1000 rps.
Rotate with. Note that the polygon mirror is not limited to the octahedron mentioned above, but it is a high-speed rotating body, so the lens 6 and lens 5 are manufactured and used with the optimal shape taking into consideration air resistance and manufacturing man-hours. A lens with a focal length of 300 square meters was used. Therefore, the image of the first diffuser plate 2 during the 3Qn pulse is 2 to 3.14 to 300(w) x 1000X30X1
0-'=move 0.057m. Since the knob moves 57 μm, this amount is several tens of μm, which is the size of the speckle.
It's double.
したがって、この像の近傍に設置した第２の拡散板６ａ
の後方のスペックルはかなり減少し、スペックルの低減
した照明装置が形成される。Therefore, the second diffuser plate 6a installed near this image
The speckle behind the is significantly reduced, forming a reduced-speckle illumination device.
第２図はこの発明の他の実施例を示す説明図である。Ｗ
Ｅ１図の実施例と異なる所はポリゴン鏡４の近傍に、図
のように２個の鏡７及び７＆に設置したことと、第２の
拡散板６ｂをモータ８で回転可能としたことと、レンズ
３及び５の光軸が図のように同一になるよう配置した点
である。なお、上記の鏡は７及び７ａの２個の場合を示
したが、原理的には１枚以上の複数枚の鐘を用いること
で同様の効果をもつものである。FIG. 2 is an explanatory diagram showing another embodiment of the invention. W
The difference from the embodiment shown in Figure E1 is that two mirrors 7 and 7& are installed near the polygon mirror 4 as shown in the figure, and that the second diffuser plate 6b is rotatable by a motor 8. This is because the optical axes of lenses 3 and 5 are arranged to be the same as shown in the figure. Although the above case shows two mirrors 7 and 7a, in principle, the same effect can be obtained by using one or more bells.
第２図の構成においては、ポリゴン鏡４で反射される光
を鏡７及び７ａで反射し再度ポリゴン鏡４に入射しズス
ペックルの移動量を反射回数倍増大してスペックル低減
を可能とするものである。In the configuration shown in FIG. 2, the light reflected by the polygon mirror 4 is reflected by the mirrors 7 and 7a and enters the polygon mirror 4 again, thereby increasing the amount of speckle movement by twice the number of reflections, thereby making it possible to reduce speckles. .
さらに、上記の２つの実施例において、２個の拡散板の
うち、少なくとも１個の拡散板を移動させると、さらに
スペックル低減効果を上げることができる。例えば、第
２図の第２の拡散板６ｂで示したようにモータ８を用い
て回転するものである。（第１図では図示しなかったが
、拡散板６ａＫ回転機構を付加する）。Furthermore, in the above two embodiments, if at least one of the two diffusion plates is moved, the speckle reduction effect can be further improved. For example, as shown in the second diffuser plate 6b in FIG. 2, it is rotated using a motor 8. (Although not shown in FIG. 1, a rotating mechanism for the diffusion plate 6aK is added).
この方法は、一般にエキシマレーザ等のパルスレーザを
用いた半導体露光ｉ置では、１パルスで露光することは
まれであって、通常は２０パルス以上で露光を行う。し
たがって、１パルス毎に拡散板を移動させれば、最終的
にできるスペックルの状態は１パルス毎に異ったものと
なシ、多数パルス露光することにより、スペックルが平
均化されて、スペックル像のコントラストが減少する（
Ｎ’パルスで１ ／ ｉ ’となる）。 この場合、パ
ルス間隔は数ｍ５ｅｃであるので、拡散板は高速に移動
する必要はない。In this method, in general, in semiconductor exposure using a pulsed laser such as an excimer laser, exposure is rarely performed with one pulse, and exposure is usually performed with 20 pulses or more. Therefore, if the diffuser plate is moved for each pulse, the final speckle state will be different for each pulse, but by exposing multiple pulses, the speckles will be averaged out. The contrast of the speckle image decreases (
N' pulses result in 1/i'). In this case, since the pulse interval is several m5ec, the diffuser plate does not need to move at high speed.
また、上記第１図及び第２図に示した実施例に共通して
、レーザ光のパルス毎に第１の拡散板の像と第２の拡散
板の相対的位置をポリゴン鏡に対して等しくするために
は、ポリゴン鏡の回転と同期してレーザ光を発振させる
必要がある。In addition, in common with the embodiments shown in FIGS. 1 and 2 above, the relative positions of the image of the first diffuser plate and the second diffuser plate are set equally with respect to the polygon mirror for each pulse of laser light. In order to do this, it is necessary to oscillate the laser beam in synchronization with the rotation of the polygon mirror.
また、上記実施例では、ポリゴン鏡を高速回転する方法
を用いたものについて説明したが、ポリゴン鏡の代シに
振動ミラーで微小振動させて一定範囲振動走査する方法
罠よっても同様の効果をもたしめ得ることはいうまでも
ない。Further, in the above embodiment, a method using a method of rotating a polygon mirror at high speed was explained, but the same effect can also be obtained by using a method in which a vibrating mirror is used instead of a polygon mirror to vibrate minutely and scan the vibration within a certain range. Needless to say, it can be proven.
また、露光用に限らず、レーザ光のスペックルを低減し
て照明を行なう装置一般に広く応用できるものである。Furthermore, the present invention can be widely applied not only to exposure devices but also to general devices that perform illumination by reducing speckles of laser light.
以上の説明のようにこの発明によれば、ポリゴン鏡なと
の変角ミラーとレンズの組合せによる反射及び集光を利
用して、レーザ光のスペックル像を高速に移動すること
ができるので、拡散板を高速に回転するというような技
術的に困難な手法を用いることなく、レーザ光に対して
有効なスペックル低減を達成することができてレーザ光
、特にパルスレーザ光を用いる露光装置に好適な照明装
置を実現できる効果がある。As described above, according to the present invention, the speckle image of the laser beam can be moved at high speed by using reflection and condensation by a combination of a polygon mirror and a deforming mirror and a lens. It is possible to achieve effective speckle reduction for laser light without using technically difficult methods such as rotating a diffuser plate at high speed, making it suitable for exposure equipment that uses laser light, especially pulsed laser light. This has the effect of realizing a suitable lighting device.
第１図はこの発明の第１の実施例を示す照明装置の主要
説明図、第２図はこの発明の第２の実施例を示す照明装
置の説明図、第３図は従来のスペックル低減法を示す照
明装置の説明図である。
図において、１はレーザ、２は第１の拡散板、３はレン
ズ、４は回転多面体鏡、５はレンズ、６は第２の拡散板
、７はミラー、８はモータである。Fig. 1 is a main explanatory diagram of a lighting device showing a first embodiment of this invention, Fig. 2 is an explanatory diagram of a lighting device showing a second embodiment of this invention, and Fig. 3 is a conventional speckle reduction method. FIG. In the figure, 1 is a laser, 2 is a first diffuser plate, 3 is a lens, 4 is a rotating polygon mirror, 5 is a lens, 6 is a second diffuser plate, 7 is a mirror, and 8 is a motor.
Claims (6)
渉性の低いレーザ光を出力する照明装置において、レー
ザ光を光源とする光路中に第１の拡散板を設置し、光軸
が連続して変動する変角ミラー面により、上記第１の拡
散板によつて拡散された前記レーザ光を反射する少くと
も１個の反射手段と、該反射手段によつて反射されたレ
ーザ光を、第２の拡散板近傍に結像する光学手段とを備
えたことを特徴とする照明装置。(1) In a lighting device that outputs a laser beam with low coherence by installing a plurality of diffusion plates in the optical path of a laser beam, a first diffusion plate is installed in the optical path of the laser beam as a light source, and the at least one reflecting means for reflecting the laser light diffused by the first diffuser plate by a variable angle mirror surface whose axis continuously changes; and the laser reflected by the reflecting means. An illumination device comprising: an optical means for focusing light in the vicinity of a second diffuser plate.
拡散板を移動させて使用されるものである特許請求の範
囲第１項記載の照明装置。(2) The lighting device according to claim 1, wherein the first and second diffusion plates are used by moving at least one of the diffusion plates.
る特許請求の範囲第１項記載の照明装置。(3) The lighting device according to claim 1, wherein a plurality of said angle-changing mirrors are used.
囲第１項及び第３項記載の照明装置。(4) The illumination device according to claims 1 and 3, wherein the angle-changing mirror is a polygon mirror.
る特許請求の範囲第１項及び第３項記載の照明装置。(5) The illumination device according to claims 1 and 3, wherein the angle-changing mirror is at least one vibrating mirror.
ーザの所定の反射方向に同期してパルス発光させるもの
である特許請求の範囲第１項記載の照明装置。(6) The illumination device according to claim 1, wherein the laser emits light in pulses in synchronization with a predetermined direction in which the laser is reflected by the variable angle mirror.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61245542A JPS63100461A (en) | 1986-10-17 | 1986-10-17 | Illuminating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61245542A JPS63100461A (en) | 1986-10-17 | 1986-10-17 | Illuminating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63100461A true JPS63100461A (en) | 1988-05-02 |
Family
ID=17135247
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61245542A Pending JPS63100461A (en) | 1986-10-17 | 1986-10-17 | Illuminating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63100461A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006189700A (en) * | 2005-01-07 | 2006-07-20 | Toppan Printing Co Ltd | Projector and rear projection type display apparatus |
| JP2007305979A (en) * | 2006-04-13 | 2007-11-22 | Asml Netherlands Bv | Moving beam with respect to diffractive optics in order to reduce interference patterns |
| JP2008097030A (en) * | 2007-12-03 | 2008-04-24 | Sony Corp | Illuminating device and image display apparatus |
| JPWO2006098281A1 (en) * | 2005-03-16 | 2008-08-21 | 松下電器産業株式会社 | Image projection device |
| US7859761B2 (en) * | 2007-04-02 | 2010-12-28 | Young Optics Inc. | Illumination system |
| JP2012238657A (en) * | 2011-05-10 | 2012-12-06 | Dainippon Printing Co Ltd | Exposure device and optical device for exposure |
| CN110785708A (en) * | 2017-05-16 | 2020-02-11 | 库力&索法利特克有限公司 | Light beam diffuser system and method |
| WO2022024965A1 (en) * | 2020-07-30 | 2022-02-03 | 日本精機株式会社 | Display device |
-
1986
- 1986-10-17 JP JP61245542A patent/JPS63100461A/en active Pending
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006189700A (en) * | 2005-01-07 | 2006-07-20 | Toppan Printing Co Ltd | Projector and rear projection type display apparatus |
| JP4612043B2 (en) * | 2005-03-16 | 2011-01-12 | パナソニック株式会社 | Image projection device |
| JPWO2006098281A1 (en) * | 2005-03-16 | 2008-08-21 | 松下電器産業株式会社 | Image projection device |
| US7866831B2 (en) | 2005-03-16 | 2011-01-11 | Panasonic Corporation | Image projector |
| JP2007305979A (en) * | 2006-04-13 | 2007-11-22 | Asml Netherlands Bv | Moving beam with respect to diffractive optics in order to reduce interference patterns |
| US7948606B2 (en) | 2006-04-13 | 2011-05-24 | Asml Netherlands B.V. | Moving beam with respect to diffractive optics in order to reduce interference patterns |
| US7859761B2 (en) * | 2007-04-02 | 2010-12-28 | Young Optics Inc. | Illumination system |
| JP2008097030A (en) * | 2007-12-03 | 2008-04-24 | Sony Corp | Illuminating device and image display apparatus |
| JP4661861B2 (en) * | 2007-12-03 | 2011-03-30 | ソニー株式会社 | Illumination device and image display device |
| JP2012238657A (en) * | 2011-05-10 | 2012-12-06 | Dainippon Printing Co Ltd | Exposure device and optical device for exposure |
| CN110785708A (en) * | 2017-05-16 | 2020-02-11 | 库力&索法利特克有限公司 | Light beam diffuser system and method |
| CN110785708B (en) * | 2017-05-16 | 2022-03-18 | 库力&索法利特克有限公司 | Light beam diffuser system and method |
| WO2022024965A1 (en) * | 2020-07-30 | 2022-02-03 | 日本精機株式会社 | Display device |
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