JPH02281133A - Apparatus for detecting short-circuit position - Google Patents

Apparatus for detecting short-circuit position

Info

Publication number
JPH02281133A
JPH02281133A JP1102715A JP10271589A JPH02281133A JP H02281133 A JPH02281133 A JP H02281133A JP 1102715 A JP1102715 A JP 1102715A JP 10271589 A JP10271589 A JP 10271589A JP H02281133 A JPH02281133 A JP H02281133A
Authority
JP
Japan
Prior art keywords
short
circuit
wiring
thin film
short circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1102715A
Other languages
Japanese (ja)
Other versions
JP2645590B2 (en
Inventor
Hiroyuki Murai
博之 村井
Kazuhiro Kobayashi
和弘 小林
Masahiro Hayama
羽山 昌宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP10271589A priority Critical patent/JP2645590B2/en
Publication of JPH02281133A publication Critical patent/JPH02281133A/en
Application granted granted Critical
Publication of JP2645590B2 publication Critical patent/JP2645590B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To detect a short-circuit position definitely by detecting light which is emitted from the short-circuit position when a part between electrodes or a part between wirings in a thin film semiconductor device is short-circuited. CONSTITUTION:A TFT (thin film transistor) array substrate 1 is set on a stage 2. An electric signal is supplied from a driving circuit 20. At this time, when a short circuit position is present on the substrate 1, microplasma light is emitted from the short circuit position. Then, the stage 2 is scanned with X and Y drives 3 and 4. The microplasma light emitted from the short-circuit position on the substrate 1 is detected with a high sensitivity camera 18 and a TV monitor 19. The short-circuit position and the like at a gate electrode and a source electrode in the TFT are detected. When the detected short-circuit occurs in the TFT, the gate electrode is electrically separated from the gate wiring with a laser device 5. When the short-circuit occurs at the intersection part of a source wiring and the gate wiring, the source wiring or the gate wiring is electrically separated on both sides of the intersecting part with the device 5. Thus, the short-circuit defect is repaired.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、薄膜半導体装置の電極間或いは配線間の短
絡箇所を検出する短絡箇所検出装置に関するものである
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a short-circuit detection device for detecting a short-circuit between electrodes or wiring in a thin film semiconductor device.

〔従来の技術〕[Conventional technology]

第5図は薄膜半導体装置の電極間或いは配線間の短絡欠
陥を検出して修復する短絡欠陥修復装置を示す構成図、
第6図は薄膜半導体装置の画素部構造を示す平面図、第
7図は薄膜半導体装置の薄膜トランジスター付近を示す
平面図、第8図は第7図中のトI線に沿った断面図、第
9図及び第1O図は薄膜半導体装置の配線交差部構造を
それぞれ示す平面図及び第9図のI−x#に沿った断面
図である。
FIG. 5 is a configuration diagram showing a short circuit defect repair device for detecting and repairing short circuit defects between electrodes or wirings of a thin film semiconductor device;
FIG. 6 is a plan view showing the pixel structure of the thin film semiconductor device, FIG. 7 is a plan view showing the vicinity of the thin film transistor of the thin film semiconductor device, and FIG. 8 is a sectional view taken along line I in FIG. FIG. 9 and FIG. 1O are a plan view and a cross-sectional view taken along I-x# in FIG. 9, respectively, showing the wiring intersection structure of a thin film semiconductor device.

第5図〜第10図において、1llid薄膜トランスタ
(TPT)アレイ基板或いはその基板を用いた液晶表示
(LCD )パネル等の薄膜半導体装置、(21に薄膜
半導体装置Ill ′に載せるXYステージ、131 
/:iび(4)はXYステージ(21をそれぞれX方向
及びY方向に動かすXドライブ及びXドライブ、!5+
 1d薄膜半導体装置)11の電極間或いは配線間の短
絡箇所會切断する薄膜切断装置で、レーザ装置等が用い
られ′る。161flXドライブ電3:、Xドライブ・
41及び薄膜切断装置telの駆動制御ff1lを行な
うためのプロセッサー、17)ニガラス等から成る絶縁
性基板で、絶縁性基板17)上に薄膜トランジスター(
T F T )+81−構成するゲート電極9’ 、絶
縁tri uo+ 、半導体層ct3 ソース電、t!
に121及びドレイン電極031が積層形成されている
。(14111絶縁性基板(71上に形成され念画素電
極で、ドレイン*極03)と電気的に接続されている。
5 to 10, a thin film semiconductor device such as an 1llid thin film transistor (TPT) array substrate or a liquid crystal display (LCD) panel using the substrate, (21 an XY stage mounted on the thin film semiconductor device Ill', 131
/:i (4) is an XY stage (X drive and X drive that move 21 in the X direction and Y direction, respectively, !5+
1d Thin film semiconductor device) A thin film cutting device that cuts short circuits between electrodes or wirings in thin film semiconductor device 11, and uses a laser device or the like. 161flX drive electric 3:,X drive・
41 and a processor for controlling the drive control ff1l of the thin film cutting device tel, 17) an insulating substrate made of Nigarasu etc.
T F T )+81-Constituting gate electrode 9', insulation triuo+, semiconductor layer ct3 source voltage, t!
121 and a drain electrode 031 are formed in a laminated manner. (It is electrically connected to the 14111 insulating substrate (formed on 71 and the pixel electrode, drain*pole 03).

0均はソース電極(121と電気的に接続されたソース
配線、f+61はゲート電極(9)と電気的に接続され
たゲート配線である。
0 is a source wiring electrically connected to the source electrode (121), and f+61 is a gate wiring electrically connected to the gate electrode (9).

次に動作について説明する。先ず、薄膜半導体装置II
IがTFTアレイ基板の場合、別の電源(面木せず)か
らソース配4IAt151の一本とゲート配線(1Gの
一本に電気信号を送って、ソース配線(15Iとゲート
配線圓に電気的に接続する一個のTP T +81のゲ
ートllE極(9)とソース電極(1力との間。
Next, the operation will be explained. First, thin film semiconductor device II
If I is a TFT array board, send an electrical signal from another power supply (without a face) to one of the source wirings 4IAt151 and one of the gate wirings (1G), and then send an electrical signal to the source wiring (15I and the gate wiring circle). Between the gate electrode (9) and the source electrode (1) of one TPT +81 connected to.

或いは配線!I61とゲート配線Hの間の短絡を電気的
に調べる。この操作を全てのソース配@t+aと全ての
ゲート配線11eの組合せについて順次行い、短絡の有
無を検出する。また、薄膜半導体装置IllがLCDパ
ネルの場合、LCDパネル金点灯してLCDパネルに表
れる表示欠陥から短絡箇所を推定する。次にR模切断装
置6)(r−用いて先ず上記のように検出した短絡部の
存在するソース配線1Jslとゲート配線1eの対にお
いて、短絡の起こる確率の高いT P T +81をソ
ース配線0υまたはゲート配線(10から切り離す。上
記の操作によって短絡が回復しない場合は、再び薄膜切
断装置+51 ft用いてソース配@Uaの交差部両側
を電気的に切断する。この時、ソース配線;圃はこの切
断箇所の両側で電気的VC分断され、ソース配線116
1の片側から供給している′電気信号は切断部以後には
伝わらず、切断したソース配線ll51に対しては電気
信号を供給している端子とは反対側の端子から別途電気
信号全供給して、短絡欠陥の修復を終了する。
Or wiring! Electrically check for short circuit between I61 and gate wiring H. This operation is sequentially performed for all the combinations of the source wires @t+a and all the gate wires 11e, and the presence or absence of a short circuit is detected. Further, when the thin film semiconductor device Ill is an LCD panel, the short circuit location is estimated from the display defect appearing on the LCD panel when the LCD panel is turned on. Next, in the pair of the source wiring 1Jsl and the gate wiring 1e where the short-circuit portion detected as described above exists using the R mock cutting device 6) (r-), the source wiring 0υ Or disconnect it from the gate wiring (10). If the short circuit is not recovered by the above operation, use the thin film cutting device +51 ft to electrically cut both sides of the intersection of the source wiring @Ua. At this time, the source wiring; Electrical VC is separated on both sides of this cut point, and the source wiring 116
The electric signal supplied from one side of 1 is not transmitted after the cut point, and all electric signals are separately supplied to the cut source wiring ll51 from the terminal on the opposite side from the terminal supplying the electric signal. Then, the repair of the short circuit defect is completed.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

従来の短絡箇所の検出は以上のように行われているので
、短絡している配線の対金見い出しても、短絡を起こし
ている位置を明確に判定するこさができず、その後の修
復工程において短絡を起こしていない正常な部位を切断
してしまうことがあるという問題点があった。
Conventional short-circuit detection is performed as described above, so even if a short-circuited wire is found, it is not possible to clearly determine the location where the short-circuit is occurring, and the subsequent repair process is difficult. There is a problem in that a normal part that is not short-circuited may be cut.

この発明は上記のような課題を解決するためになされた
もので、薄膜半導体装置に生じた短絡位置を明確に検出
することのできる短絡箇所検出装置を得ることを目的と
する。
The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to obtain a short circuit detection device that can clearly detect the position of a short circuit that occurs in a thin film semiconductor device.

〔課題を解決するための手段〕[Means to solve the problem]

この発明に係る短絡箇所検出装置は、薄膜半導体装置の
電極間或いは配線間が短絡した場合にその短絡箇所から
発生する光を検知するものである。
A short circuit detection device according to the present invention detects light generated from a short circuit when a short circuit occurs between electrodes or wiring of a thin film semiconductor device.

〔作用〕[Effect]

この発明における短絡箇所検出装置は、薄膜半導体装置
の短絡箇所から発生する光を検知して短絡位置を検出す
る。
The short-circuit detection device according to the present invention detects the short-circuit position by detecting light generated from the short-circuit position of a thin film semiconductor device.

〔発明の実施例〕[Embodiments of the invention]

以下、この発明の一実施例を図について説明でる。第1
図において、田は薄膜半導体装置で、ここではTFTア
レイ基板、+51は薄膜切断装置で、ここではレーザー
装置、同は短絡箇所検出装置で、ここではマイクロプラ
ズマ発光を検出、する高感度カメラlll]iとテレビ
モニター09)から成る。箭は’I’FTアレイ基板+
11に電気信号全供給でる駆動回路を示している。他の
゛構成部分は第5図の相当部分と同様である。
An embodiment of the invention will be described below with reference to the drawings. 1st
In the figure, 1 is a thin film semiconductor device, here is a TFT array substrate, +51 is a thin film cutting device, here is a laser device, here is a short circuit detection device, here is a high-sensitivity camera that detects microplasma emission] It consists of i and TV monitor 09). The bamboo is 'I'FT array board +
11 shows a drive circuit to which all electrical signals are supplied. The other constituent parts are the same as the corresponding parts in FIG.

次に動作について説明する。先ず、TFTアレイ基板+
11 fステージ121 Kセットし1、駆動回路(至
)より′電気信号を供給する。この時、TFTアレイ基
板+41中の電極間或いは配線間に短絡部があると、そ
の短絡部からマイクロプラズマ発光が生じる。Xドライ
ブ13)、Xドライブ14)でステー シ121をスキ
ャンし、高感度カメラ1187とテレビモニター(19
+でTFTアレイ基板III上の短絡箇所からのマイク
ロプラズマ発光を検知し、TPTでのゲート電極とソー
ス電極の短M箇所或いはゲート電極とドレイン電極の短
絡箇所及びソース配線とゲート配線の交差部の短絡箇所
を区別して検出する。次に、検出した短絡箇所がTF’
Tで生じている場合にはゲート電極をゲート配線からレ
ーザー装置161によってm気的VC切り離し、短絡箇
所がソース配線とゲート配線の交差部で生じている場合
には、上記交差部の両側でソース配線又はゲート配線を
レーザー装置+51F(よって電気的に切り離して短絡
欠陥を修復する。
Next, the operation will be explained. First, TFT array substrate +
11 F stage 121 K is set to 1, and an electric signal is supplied from the drive circuit (to). At this time, if there is a short circuit between the electrodes or wiring in the TFT array substrate +41, microplasma light emission is generated from the short circuit. Scan the station 121 with the X drive 13) and
+ detects microplasma emission from the short-circuited point on the TFT array substrate III, and detects the short-circuited point M between the gate electrode and the source electrode in the TPT, the short-circuited point between the gate electrode and the drain electrode, and the intersection between the source wiring and the gate wiring. Distinguish and detect short circuit locations. Next, the detected short circuit point is TF'
If the short circuit occurs at the intersection of the source wiring and the gate wiring, the gate electrode is electrically disconnected from the gate wiring by the laser device 161, and if the short circuit occurs at the intersection of the source wiring and the gate wiring, the source is disconnected from the gate wiring on both sides of the intersection. The wiring or gate wiring is electrically disconnected by the laser device +51F (therefore, the short circuit defect is repaired).

なお、上記実施例において、短絡箇所検出装置1171
トレーサー装置5)はTFT7L/イ基板111 K対
して削対する側に位置しているが、同じ側に位置しても
よく、また基板のTFTアレイ形成面の表側或いは裏側
のどちら側に位置しても同様の効果が期待できる。
Note that in the above embodiment, the short circuit detection device 1171
Although the tracer device 5) is located on the side facing the TFT 7L/I substrate 111K, it may be located on the same side, or it may be located on either the front side or the back side of the TFT array forming surface of the substrate. A similar effect can be expected.

また、上記実施例では短絡箇所検出装置(1ηとしてマ
イクロプラズマ発光を検知することができる高感度カメ
ラを用いているが、短絡部の熱放射丸ヲ検知する赤外光
領域の高感度カメラであってもよく、上記実施例と同様
の効果を奏する。
In addition, in the above embodiment, a high-sensitivity camera capable of detecting microplasma emission is used as a short-circuit detection device (1η), but a high-sensitivity camera in the infrared region that detects heat radiation circles at the short-circuit is used. However, the same effect as in the above embodiment can be obtained.

また、上記実施例において、レーザー装置・151の代
わりにイオンビーム装置を用いてもよい。
Further, in the above embodiment, an ion beam device may be used instead of the laser device 151.

また、上記実施例では、この発明をTFTアレイ基板+
11に対して利用する場合について説明したが、TFT
アレイ基板Illを用いたしcDパネルやその他の薄膜
半導体装置における電極間或いは配線間の短絡箇所検出
に対しても、同様の効果が期待できる。
Further, in the above embodiment, the present invention is applied to a TFT array substrate +
11, but TFT
A similar effect can be expected for detection of short circuits between electrodes or wiring in CD panels and other thin film semiconductor devices using the array substrate Ill.

また、この発明の短絡箇所検出装置07)を用いること
により、次のような効果が得られる。
Further, by using the short-circuit location detection device 07) of the present invention, the following effects can be obtained.

即ち、薄膜半導体装置の電極間に短絡が生じた場合、レ
ーザー装置で電気的に切り畦されたTPTにつながる画
素は作動することなく1点状の表示欠陥を残すが、薄膜
半導体装置の画素部構造を第8図t/c示すような一つ
の画素電極−を複数個の画素電極VC分割して、この発
明の短絡箇所検出装置171で短絡位置會正確に検知し
て短絡の生じたT P T +81を切り離すことによ
り、短絡欠陥の修復にともなう表示欠陥を小さな部分に
留めることがで専る。更に、第3図に示すようVC薄膜
半導体装置の一つの画素電極−に並列に複数のT P 
T +81をつなぐ画素部構造にしてこの発明の短絡箇
所検出装置1171で短絡位置を正確に検知して短絡の
生じたT P T +81全切り離すことにより、残り
の正常なT F T f8+で画素電極(141を駆動
させて、画素の全体或いは一部に欠陥を残すことなく、
短絡欠陥を修復することがでへる。
That is, when a short circuit occurs between the electrodes of a thin film semiconductor device, the pixel connected to the TPT electrically cut by the laser device does not operate and leaves a single point display defect, but the pixel portion of the thin film semiconductor device The structure of one pixel electrode is divided into a plurality of pixel electrodes VC as shown in FIG. By separating T+81, it is possible to limit the display defect caused by the repair of the short circuit defect to a small portion. Furthermore, as shown in FIG. 3, a plurality of T P
By using a pixel structure that connects T F T +81, accurately detecting the short circuit position using the short circuit detection device 1171 of the present invention, and completely cutting off the short circuit T F T +81, the remaining normal T F T f8+ is connected to the pixel electrode. (By driving 141, without leaving any defects in the whole or part of the pixel,
Short circuit defects can be repaired.

また、第4図に示すような薄膜半導体装置のソース配線
l1mとゲート配ff1lj61の交差部でソース配線
a−が複数に分岐した配線構造にして、この発明の短絡
箇所検出装置11ηで短絡の発生したソース配線州の分
岐を正確に検知して、その分岐全ソース配線a0から切
り離して短絡を修復することにより、ソース配線lI〜
が切断部で電気的に分断されることなく、また、同一の
配線上に複数箇所の短絡が生じていても、電気的に分断
された欠陥部分會残すことなく修復が可能である。
Furthermore, the wiring structure in which the source wiring a- branches into a plurality of parts at the intersection of the source wiring l1m and the gate wiring ff1lj61 of the thin film semiconductor device as shown in FIG. By accurately detecting the branch of the source wiring state that has occurred, and repairing the short circuit by disconnecting the branch from all source wiring a0, the source wiring lI~
Even if a plurality of short circuits occur on the same wiring, it can be repaired without leaving electrically disconnected defective parts.

〔発明の効果〕〔Effect of the invention〕

以上のように、この発明によれば短絡箇所検出装置を、
薄膜半導体装幀の電極間或いは配線間が短絡した場合に
その短絡箇所から発生する光を検知し短絡箇所を検出す
るように構成したので、短絡位置が明確に検出できるも
のが得られる効果がある。
As described above, according to the present invention, the short circuit detection device
When there is a short circuit between the electrodes or wiring of the thin film semiconductor device, the light generated from the short circuit point is detected to detect the short circuit point, so there is an effect that the short circuit position can be clearly detected.

【図面の簡単な説明】[Brief explanation of drawings]

第1図にこの発明の一実施例による短絡箇所検出装置を
備テた薄膜半導体装置の短絡欠陥修復装置を示す構成図
、第2図及び第8図は、それぞれ薄膜半導体装置の電極
間に生じた短絡を)ψ後後に、残る表示欠陥を小さな部
分に留めるための画素部構造及び表示欠陥を残さないた
めの画素部構造をそれぞれ示す平面図、第4図は薄膜半
導体装置の配線間に生じた短絡を修復後に、配線に電気
的欠陥部分會残さないための配線交差部構造を示す平面
図、第5図は従来の薄膜半導体装置の短絡欠陥修復装置
を示す構成図、@6図は従来の薄膜半導体装置の画素部
ヤ4造を示す平面図%第7図は薄膜半導体装置の薄膜ト
ランジスター付近を示す平面図、第8図は第7図中のト
」線に沿った断面図、第9図は従来の薄膜半導体装置の
配線交差部構造を示す平面図、第五0図は第9図中の1
−X線に沿った断面図である。 図において、(1ηは短絡箇所検出装置である。 なお、図中、同一符号ばl?jl−1又は相当部分を示
す。
FIG. 1 is a block diagram showing a short circuit defect repairing device for a thin film semiconductor device equipped with a short circuit detection device according to an embodiment of the present invention, and FIGS. Figure 4 is a plan view showing the structure of the pixel part to keep the remaining display defects to a small area after short circuits (short circuits caused by short circuits) ψ and the structure of the pixel part to prevent the display defects from remaining. A plan view showing a wiring intersection structure for not leaving an electrically defective part in the wiring after repairing a short circuit, FIG. 7 is a plan view showing the structure of a pixel section of a thin film semiconductor device, and FIG. 8 is a sectional view taken along line T in FIG. Figure 9 is a plan view showing the structure of a wiring intersection in a conventional thin film semiconductor device, and Figure 50 is 1 in Figure 9.
- It is a sectional view along the X-ray. In the figure, (1η is a short-circuit point detection device. In the figure, the same reference numerals indicate l?jl-1 or equivalent parts.

Claims (1)

【特許請求の範囲】[Claims] 基板上に絶縁層を介して複数の電極或いは複数の配線が
積層される薄膜半導体装置の上記電極間或いは上記配線
間が短絡した場合にその短絡箇所から発生する光を検知
し、上記短絡箇所を検出するようにしたことを特徴とす
る短絡箇所検出装置。
In a thin film semiconductor device in which a plurality of electrodes or a plurality of wirings are laminated on a substrate via an insulating layer, when a short circuit occurs between the electrodes or the wirings, light generated from the short circuit is detected, and the short circuit is detected. A short circuit detection device characterized by detecting a short circuit.
JP10271589A 1989-04-21 1989-04-21 Method for repairing short-circuit defect of liquid crystal display Expired - Lifetime JP2645590B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10271589A JP2645590B2 (en) 1989-04-21 1989-04-21 Method for repairing short-circuit defect of liquid crystal display

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10271589A JP2645590B2 (en) 1989-04-21 1989-04-21 Method for repairing short-circuit defect of liquid crystal display

Publications (2)

Publication Number Publication Date
JPH02281133A true JPH02281133A (en) 1990-11-16
JP2645590B2 JP2645590B2 (en) 1997-08-25

Family

ID=14334964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10271589A Expired - Lifetime JP2645590B2 (en) 1989-04-21 1989-04-21 Method for repairing short-circuit defect of liquid crystal display

Country Status (1)

Country Link
JP (1) JP2645590B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006058820A (en) * 2004-08-24 2006-03-02 Matsushita Electric Ind Co Ltd Lighting inspecting method and lighting inspecting apparatus for display panel
JP2010153552A (en) * 2008-12-25 2010-07-08 Fuji Electric Systems Co Ltd Method for ground fault test of solar cell array

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5994467A (en) * 1982-11-19 1984-05-31 Sumitomo Electric Ind Ltd Removing mehtod for shortcircuit unit of thin film electronic device
JPS61121034A (en) * 1984-11-16 1986-06-09 Matsushita Electric Ind Co Ltd Thin film transistor array
JPS62232144A (en) * 1986-04-02 1987-10-12 Matsushita Electric Ind Co Ltd Correcting method for liquid crystal display device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5994467A (en) * 1982-11-19 1984-05-31 Sumitomo Electric Ind Ltd Removing mehtod for shortcircuit unit of thin film electronic device
JPS61121034A (en) * 1984-11-16 1986-06-09 Matsushita Electric Ind Co Ltd Thin film transistor array
JPS62232144A (en) * 1986-04-02 1987-10-12 Matsushita Electric Ind Co Ltd Correcting method for liquid crystal display device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006058820A (en) * 2004-08-24 2006-03-02 Matsushita Electric Ind Co Ltd Lighting inspecting method and lighting inspecting apparatus for display panel
JP4701657B2 (en) * 2004-08-24 2011-06-15 パナソニック株式会社 Display panel lighting inspection method and lighting inspection apparatus
JP2010153552A (en) * 2008-12-25 2010-07-08 Fuji Electric Systems Co Ltd Method for ground fault test of solar cell array

Also Published As

Publication number Publication date
JP2645590B2 (en) 1997-08-25

Similar Documents

Publication Publication Date Title
JP3246704B2 (en) Wiring board inspection equipment
EP0590524A1 (en) Defect detection and defect removal apparatus of thin film electronic device
KR20020014988A (en) Liquid crystal display device and deficiency correcting method thereof
WO2017161623A1 (en) Repair structure for line defect of amoled display panel and repairing method
JPH05264461A (en) Inspection equipment for liquid crystal display
KR970016719A (en) LCD and its correction method
US6839096B1 (en) Liquid crystal display device with repair structure
JP3381681B2 (en) Liquid crystal display device and repair method of disconnection thereof
EP0407940B1 (en) Method for joining together associated metal conductors of a layer structure with an insulating layer provided therebetween
US11143926B2 (en) Active matrix substrate and display apparatus
US5473452A (en) Liquid crystal display device with repair structure
TW201209494A (en) Liquid crystal display (LCD) panel and repairing method thereof
JPH02281133A (en) Apparatus for detecting short-circuit position
CN100498485C (en) Liquid crystal display panel and its repairing method
EP0430418A2 (en) Liquid crystal display and method of manufacturing the same
JPH05203986A (en) Liquid crystal display device
JPH05333370A (en) Active matrix type liquid crystal display element
JP2624812B2 (en) Liquid crystal display device and method of manufacturing liquid crystal display panel
JPH08101404A (en) Detection of defect of tft substrate and defect inspection apparatus
JPH01185454A (en) Method and apparatus for inspecting shortcircuit failure and shortcircuit failure repairing apparatus
JP3010712B2 (en) Active matrix substrate defect repair method
JP2912189B2 (en) Inspection method of liquid crystal panel
JPH1062474A (en) Method and apparatus for inspecting liquid crystal display substrate
JP3268979B2 (en) Method of correcting electrical connection in liquid crystal display device
JPH0810304B2 (en) Liquid crystal display