JPH0224027B2 - - Google Patents
Info
- Publication number
- JPH0224027B2 JPH0224027B2 JP56052032A JP5203281A JPH0224027B2 JP H0224027 B2 JPH0224027 B2 JP H0224027B2 JP 56052032 A JP56052032 A JP 56052032A JP 5203281 A JP5203281 A JP 5203281A JP H0224027 B2 JPH0224027 B2 JP H0224027B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- region
- conductivity type
- high concentration
- concentration impurity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/211—Design considerations for internal polarisation
- H10D89/213—Design considerations for internal polarisation in field-effect devices
- H10D89/215—Design considerations for internal polarisation in field-effect devices comprising arrangements for charge pumping or biasing substrates
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56052032A JPS57166066A (en) | 1981-04-07 | 1981-04-07 | Bias generating system for substrate |
US06/364,639 US4559548A (en) | 1981-04-07 | 1982-04-02 | CMOS Charge pump free of parasitic injection |
DE8282102994T DE3276920D1 (en) | 1981-04-07 | 1982-04-07 | Semiconductor device |
EP82102994A EP0062894B1 (en) | 1981-04-07 | 1982-04-07 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56052032A JPS57166066A (en) | 1981-04-07 | 1981-04-07 | Bias generating system for substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57166066A JPS57166066A (en) | 1982-10-13 |
JPH0224027B2 true JPH0224027B2 (enrdf_load_stackoverflow) | 1990-05-28 |
Family
ID=12903464
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56052032A Granted JPS57166066A (en) | 1981-04-07 | 1981-04-07 | Bias generating system for substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57166066A (enrdf_load_stackoverflow) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55175259U (enrdf_load_stackoverflow) * | 1979-05-31 | 1980-12-16 |
-
1981
- 1981-04-07 JP JP56052032A patent/JPS57166066A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57166066A (en) | 1982-10-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4559548A (en) | CMOS Charge pump free of parasitic injection | |
KR0139873B1 (ko) | 반도체 집적회로장치 | |
KR960012249B1 (ko) | 래치업 방지회로를 가진 cmos 집적회로장치 | |
JP2001352077A (ja) | Soi電界効果トランジスタ | |
JPS62272620A (ja) | 論理回路 | |
CN1825602B (zh) | 半导体装置 | |
KR850005736A (ko) | Cmos 직접회로 | |
KR950020709A (ko) | 소프트에러가 감소된 메모리셀 및 메모리장치와 소프트에러의 감소방법 | |
KR100243496B1 (ko) | 반도체 장치 | |
JP2528794B2 (ja) | ラツチアツプ保護回路付き集積回路 | |
JP2710113B2 (ja) | 相補性回路技術による集積回路 | |
JP2528795B2 (ja) | ラツチアツプ保護回路付き集積回路 | |
JPS6050066B2 (ja) | Mos半導体集積回路装置 | |
KR880004589A (ko) | 기판바이어스 전압발생기를 구비한 상보형 집적회로 배열 | |
US5559356A (en) | Semiconductor device with large substrate contact region | |
JPH0219979B2 (enrdf_load_stackoverflow) | ||
GB2054955A (en) | Monolithic integrated CMOS circuit | |
JPH044755B2 (enrdf_load_stackoverflow) | ||
JPH0224027B2 (enrdf_load_stackoverflow) | ||
KR930009810B1 (ko) | 기판바이어스회로를 구비한 반도체장치 | |
JPH04206960A (ja) | 半導体基板電位発生回路 | |
JPH02129960A (ja) | 半導体メモリ | |
JPS6048905B2 (ja) | 半導体集積回路装置 | |
JP2001267910A (ja) | 多値論理半導体装置 | |
JPS59184560A (ja) | 半導体接点構造体 |