JPH02239637A - Manufacturing device for semiconductor device - Google Patents
Manufacturing device for semiconductor deviceInfo
- Publication number
- JPH02239637A JPH02239637A JP6158089A JP6158089A JPH02239637A JP H02239637 A JPH02239637 A JP H02239637A JP 6158089 A JP6158089 A JP 6158089A JP 6158089 A JP6158089 A JP 6158089A JP H02239637 A JPH02239637 A JP H02239637A
- Authority
- JP
- Japan
- Prior art keywords
- stage
- semiconductor device
- semiconductor element
- semiconductor
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 56
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000000758 substrate Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 abstract description 3
- 239000010703 silicon Substances 0.000 abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 230000002950 deficient Effects 0.000 abstract 2
- 210000000078 claw Anatomy 0.000 description 11
- 239000000853 adhesive Substances 0.000 description 9
- 230000001070 adhesive effect Effects 0.000 description 9
- 239000000463 material Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000001125 extrusion Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
- H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49171—Fan-out arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
Landscapes
- Die Bonding (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体装置の製造装置に関し,半導体素子を半
導体装置の搭載部位に搭載する装置の構造に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an apparatus for manufacturing a semiconductor device, and more particularly to a structure of an apparatus for mounting a semiconductor element on a mounting portion of a semiconductor device.
従来、この種の半導体素子を搭載する装置は装置上に並
べてある素子の位置を自動認識し,その位置決定が正確
にできるようなテーブルを有し、そこで位置決定された
素子をテーブルから拾いあげ、搬送アームの一部に固着
して再位置決めステージに搬送後、4方向からつめ等で
押えることにより、再度位置決めを行い、再び搬送アー
ムの一部に固着して素子搭載部位へ搬送,搭載するよう
になっていた。Conventionally, equipment that mounts this type of semiconductor element has a table that automatically recognizes the position of the elements lined up on the equipment and can accurately determine the position, and then picks up the element whose position has been determined from the table. After it is fixed to a part of the transfer arm and transferred to the repositioning stage, it is repositioned by pressing with claws from four directions, and it is fixed to a part of the transfer arm again and transferred to the element mounting site and mounted. It was like that.
上述した従来の半導体装置の製造装置は、半導体素子を
真空吸着等の手段により搬送アームの一部分に固着して
搬送する構造であり、第6図に示すようにテーブル2か
ら搬送アーム4の一部分に固着する際に半導体素子1の
位置がずれるため、素子1を並べてあるテーブル2と素
子搭載部7の間に再位置決めステージ5を設け、そこに
,素子1を一度置いて再度位置決めを行った後に素子搭
載部7に搭載するが、再位置決めステージ5では第6図
,第7図のように4方向から再位置決め用つめ15で機
械的に押えて位置決めを行う構造となっているので、シ
リコンのくず(ゴミ)が多発し、半導体素子1上に付着
して結線、接触不良が発生することがある。また,素子
1を押えるつめ等により、素子にワレ,カケ,キズ,マ
イクロクラック等が生じることがあり,品質が低下する
.このため再位置決めも素子になるべく悪影響を与えな
いように行わなければならないので,再位置決め用つめ
l5の押し出し量、押し出す力の加減等調整が難しく、
設備調整に時間がかかる。さらに、半導体素子lの外周
はダイシングのカット及びブレーキング等により側面が
粗くなっているので、つめのあたりにばらつきが出て位
置決めが不正確となる.その上,位置決定後,つめが戻
るとき及び戻った直後か、ら搬送アーム4の一部に固着
するまでの間につめが戻るときの反動や装置の振動等に
より素子の位置がズレ、そのまま素子を搭載すると,樹
脂封止型半導体装置の場合は、素子が装置内部の端に近
づき、その部分の樹脂厚が薄くなるため,そこからクラ
ックが入りやすくなり.耐湿性が低下する.しかも,素
子がズレると、第4図(b)に示すように素子1と内部
リード12との距離に長短差ができ,次工程のワイヤー
ボンディング工程ではワイヤー結線が難しくなり、結線
されたボンディングワイヤー13が第5図(b)のよう
に素子1の端に接触したり長くなり過ぎて垂れ、ワイヤ
ーショート不良が発生することがあり、歩留りが低下す
るし,高品質品には適用できない。さらに半導体装置内
の素子搭載部と半導体素子とを接着するのにエポキシ樹
脂等の接着材料11を使用するときは,素子の裏面の面
積分だけの接着材料を素子搭載部の中心に塗布するので
素子の位置がズレると、第3図(b),第5図(b)の
ように接着材l1が付いていない部分ができ、良好な裏
面濡れ性が得られず,接着強度が低下するのみでなく,
部分的には素子の横から接着材料がはみ出して、素子な
どの表面に付着し、次のワイヤーボンディングエ程でワ
イヤー結線不良を引き起こしたり,素子表面の回路を腐
食させたりすることもあり,品質が低下するという欠点
がある.
本発明の目的は前記課題を解決した半導体装置の製造装
置を提供することにある。The conventional semiconductor device manufacturing apparatus described above has a structure in which the semiconductor element is fixed to a part of the transport arm by means such as vacuum suction and transported, and as shown in FIG. Since the position of the semiconductor element 1 shifts when it is fixed, a repositioning stage 5 is provided between the table 2 on which the elements 1 are arranged and the element mounting part 7, and after the element 1 is placed there and repositioned, The silicon is mounted on the element mounting section 7, but the repositioning stage 5 has a structure in which positioning is performed by mechanically holding it down with repositioning pawls 15 from four directions as shown in FIGS. 6 and 7. A large amount of debris (dust) may adhere to the semiconductor element 1, resulting in poor wiring or poor contact. In addition, cracks, chips, scratches, microcracks, etc. may occur on the element due to the claws holding down the element 1, resulting in a decrease in quality. For this reason, repositioning must be performed in a manner that does not adversely affect the element as much as possible, so it is difficult to adjust the amount of extrusion of the repositioning pawl l5, the amount of extrusion force, etc.
It takes time to adjust equipment. Furthermore, the sides of the outer periphery of the semiconductor element 1 are roughened due to cutting and braking during dicing, which causes variations in the area around the claws, making positioning inaccurate. Furthermore, after determining the position, the position of the element may shift due to reaction when the claw returns, vibration of the device, etc. when the claw returns, immediately after returning, or until it is fixed to a part of the transfer arm 4. When an element is mounted, in the case of a resin-sealed semiconductor device, the element approaches the internal edge of the device, and the resin thickness in that area becomes thinner, making it easier for cracks to form there. Moisture resistance decreases. Moreover, if the element is misaligned, there will be a difference in length between the element 1 and the internal lead 12 as shown in Figure 4(b), which will make wire connection difficult in the next wire bonding process, and the bonding wire As shown in FIG. 5(b), the wire 13 may come into contact with the end of the element 1 or become too long and sag, resulting in a wire short-circuit failure, which lowers the yield and cannot be applied to high-quality products. Furthermore, when an adhesive material 11 such as epoxy resin is used to bond the element mounting part in the semiconductor device and the semiconductor element, the adhesive material 11 corresponding to the area of the back surface of the element is applied to the center of the element mounting part. If the position of the element shifts, there will be parts where the adhesive l1 is not attached, as shown in Figures 3(b) and 5(b), and good wettability of the back side will not be obtained, which will only reduce the adhesive strength. Not,
In some cases, the adhesive material may protrude from the side of the element and adhere to the surface of the element, causing wire connection defects in the next wire bonding process or corroding the circuit on the element surface, resulting in poor quality. The disadvantage is that it decreases. An object of the present invention is to provide a semiconductor device manufacturing apparatus that solves the above problems.
上述した従来の半導体装置の製造装置に対し,本発明は
素子の位置を自動認識する手段を通じて、その位置ずれ
量により,直交する2軸方向及び回転方向のずれ補正が
つめ等のメカを使わずにできるという相違点を有する。In contrast to the above-mentioned conventional semiconductor device manufacturing equipment, the present invention uses means to automatically recognize the position of an element, and corrects deviations in two orthogonal axes and in the rotational direction based on the amount of positional deviation without using mechanisms such as claws. The difference is that it can be
前記目的を達成するため、本発明はテーブル上から半導
体素子を拾いあげて真空吸着等の手段により搬送アーム
の一部に固着させ、半導体素子搭載部位へ供給する途中
で再位置決めを行い,再び前記手段により搬送アームの
一部に半導体素子を固着させて素子搭載部位へ供給し、
素子の搭載を完了する半導体装置の製造装置において,
再位置.決めを行う半導体素子を載置して直交する2軸
方向及び回転方向に動作する再位置決めステージと、再
位置決めステージ上の半導体素子の位置ズレ量を画像に
て詔識し、そのズレ量に基づく駆動指令を前記再位置決
めステージに発する認識制御手段とを有するものである
.
〔実施例〕
次に本発明について図面を参照して説明する。In order to achieve the above object, the present invention picks up a semiconductor device from a table, fixes it to a part of a transfer arm by means such as vacuum suction, repositions it while supplying it to a semiconductor device mounting area, and then picks up the semiconductor device from a table and fixes it on a part of a transfer arm by means of vacuum suction or the like. The semiconductor device is fixed to a part of the transfer arm by a means, and the semiconductor device is supplied to the device mounting area.
In semiconductor device manufacturing equipment that completes the mounting of elements,
Reposition. A repositioning stage that places a semiconductor element to be determined and operates in two orthogonal axes directions and a rotational direction, and the amount of positional deviation of the semiconductor element on the repositioning stage is determined based on the amount of deviation. and recognition control means for issuing a drive command to the repositioning stage. [Example] Next, the present invention will be described with reference to the drawings.
(実施例1) 第1図は本発明の実施例1を示す説明図である。(Example 1) FIG. 1 is an explanatory diagram showing Embodiment 1 of the present invention.
図において、半導体素子1はテーブル2上に並べてあり
、テーブル用カメラ3にて素子の位置を自動検出認識し
た後,それと連動しているテーブル2が0方向に動作し
て並べてある半導体素子1の位置決めが行われる。10
はディスプレイである。In the figure, semiconductor elements 1 are arranged on a table 2, and after the table camera 3 automatically detects and recognizes the position of the elements, the table 2 that is linked to it moves in the 0 direction to remove the semiconductor elements 1 arranged on the table. Positioning is performed. 10
is a display.
搬送アーム4は位置決めされた半導体素子1を真空吸着
等の固定手段により固着し、前記テーブル2から、直交
する2軸方向(左右)及び回転(θ)方向に動作する再
位置決めステージ5に置く。素子1はそこで,再位置決
めステージ用カメラ6aにより、素子の固着部に対する
位置ズレ量を自動検出され、制御部6bはその検出信号
に基づき位置ズレ分に対応させて,直交する2軸方向(
左右)及び回転(0)方向の移動量を再位置決めステー
ジ5に発する。ここに、再位置決めステージ用カメラ6
a,制御部6b等により、再位置決めステージ5に位置
ズレ補正指令を発する認識制御手段が構成される。The transport arm 4 fixes the positioned semiconductor element 1 by a fixing means such as vacuum suction, and places it from the table 2 on a repositioning stage 5 that operates in two orthogonal axes directions (left and right) and in a rotational (θ) direction. There, the element 1 is automatically detected by the repositioning stage camera 6a to detect the amount of positional deviation with respect to the fixed part of the element, and based on the detection signal, the control unit 6b adjusts the positional deviation in two orthogonal axes directions (
The amount of movement in the left/right) and rotational (0) directions is transmitted to the repositioning stage 5. Here, the repositioning stage camera 6
A, the control section 6b, and the like constitute a recognition control means that issues a positional deviation correction command to the repositioning stage 5.
この補正指令を受けて再位置決めステージ5が左右,θ
回転方向に移動し半導体素子1の位置ずれの補正が行わ
れた後、再び搬送アーム4で素子搭載部7へ搭載する。In response to this correction command, the repositioning stage 5 moves left and right, θ
After the semiconductor element 1 is moved in the rotational direction and the positional deviation of the semiconductor element 1 is corrected, the semiconductor element 1 is again mounted on the element mounting section 7 by the transfer arm 4.
(実施例2)
第2図は本発明の実施例2を示す構成図である.本実施
例は、搬送アーム8がテーブル2から半導体素子1を拾
いあげ,再位置決めステージ5上に置く。そして,搬送
アーム8が次の半導体素子を拾いあげに行く途中に,最
初の半導体素子1は、カメラ6aと制御部6bによる再
位置決めステージ5の駆動制御に基づき位置ズレが補正
される。次に搬送アーム8が次の半導体素子を拾い上げ
たときに、搬送アーム9が再位置決めステージ5上の最
初の半導体素子を拾い上げ、搬送アーム8が次の半導体
素子を再位置決めステージ5上に置いたときに、搬送ア
ーム9が最初の半導体素子を素子搭載部7に搭載する。(Embodiment 2) Figure 2 is a configuration diagram showing Embodiment 2 of the present invention. In this embodiment, the transfer arm 8 picks up the semiconductor device 1 from the table 2 and places it on the repositioning stage 5. Then, while the transport arm 8 goes to pick up the next semiconductor element, the positional deviation of the first semiconductor element 1 is corrected based on drive control of the repositioning stage 5 by the camera 6a and the control section 6b. Next, when the transfer arm 8 picks up the next semiconductor device, the transfer arm 9 picks up the first semiconductor device on the repositioning stage 5, and the transfer arm 8 places the next semiconductor device on the repositioning stage 5. At times, the transport arm 9 mounts the first semiconductor element on the element mounting section 7.
この実施例では搬送アームが2本あるので、装置のイン
デックスが飛躍的に速くなり、生産性が向上するという
利点がある。In this embodiment, since there are two transfer arms, the indexing of the device becomes dramatically faster, which has the advantage of improving productivity.
以上説明したように本発明は半導体素子を搭載部位へ搭
載する前に、再位置決めステージに半導体素子を置き、
そのステージの上方のカメラにて素子の位置ズレ景を自
動認識し、それと連プJして前記再位置決めステージ自
体が動き、左右,θ回転方向の補正を行うことにより、
従来のつめ等による機械的な再位置決めが不要となるた
め、つめによるシリコンのくず(ゴミ)が発生しなくな
り、くず(ゴミ)付着による結線,接触不良がなくなる
。As explained above, the present invention places the semiconductor device on a repositioning stage before mounting the semiconductor device on the mounting site.
A camera above the stage automatically recognizes the positional deviation of the element, and the repositioning stage itself moves in tandem with this to correct the left/right and θ rotational directions.
Since mechanical repositioning using conventional claws or the like is no longer necessary, there is no generation of silicone debris (dust) caused by the claws, and connection and contact failures due to debris (dust) adhesion are eliminated.
また、ワレ,カケ,マイクロクラック等の発生もなくな
り、回路特性不良,耐湿性不良なども減少し、歩留り及
び品質が向上する。さらに,従来使用していたつめの押
し出し量、押し出す力の加減等の調整もいらなくなり,
設備調整時間が大幅に短縮され,生産性が向上する.ダ
イシングのカット,ブレーキング等による半導体素子の
外周の側面の粗さも位置決めに悪影響を与えず,従来の
位置決定後からつめが戻るとき及び戻った直後から搬送
アームの一部に固着するまでの間に、つめが戻るときの
反動や装置の振動等によって起こる位置ずれもなくなる
.従って,樹脂封止型半導体装置の場合でも半導体素子
が装置の中心部にくるので、樹脂厚の差の分布もなくな
り、クラックが発生しにくくなって耐湿性が向上するば
かりか、素子と内部リードとの距離の長短差もなくなる
ため、次工程のワイヤーボンデイング工程ではワイヤー
結線が容易になり、また、結線されたワイヤーの素子端
への接触不良、ワイヤーショート不良も発生しないため
,歩留りが向上し、多ピン、高品質品にも適用可能とな
る.しかも、半導体装置内の素子搭載部と半導体素子と
を接着するのに接着材料等を使用するときには良好な裏
面濡れ性が得られ、接着強度が向上し、接着材料のはみ
出し、表面付着もなくなり,それに伴うワイヤー結線不
良、表面回路の腐食等もなくなり品質も向上するという
効果がある。Furthermore, the occurrence of cracks, chips, microcracks, etc. is eliminated, and defects in circuit characteristics and moisture resistance are reduced, resulting in improved yield and quality. Furthermore, it is no longer necessary to adjust the amount of extrusion of the pawl used in the past, the amount of extrusion force, etc.
Equipment adjustment time is greatly reduced and productivity is improved. Roughness on the outer periphery of the semiconductor element due to cutting, braking, etc. during dicing does not adversely affect positioning. In addition, positional displacement caused by recoil when the claw returns or vibration of the device is eliminated. Therefore, even in the case of a resin-sealed semiconductor device, since the semiconductor element is located at the center of the device, there is no distribution of differences in resin thickness, making it difficult for cracks to occur and improving moisture resistance. Since there is no difference in length between the wires and the wires, it becomes easier to connect the wires in the next wire bonding process, and there is no problem of poor contact of the wires to the element ends or wire shorts, which improves the yield. It can also be applied to high-quality products with a large number of pins. Furthermore, when using an adhesive material to bond the element mounting area in the semiconductor device and the semiconductor element, good back surface wettability is obtained, adhesive strength is improved, and there is no need for the adhesive material to protrude or adhere to the surface. This has the effect of eliminating defects in wire connections and corrosion of surface circuits, and improving quality.
第1図は本発明の実施例1を示す構成図、第2図は本発
明の実施例2を示す構成図、第3図(a)は本発明で半
導体素子を半導体装置に搭載した直後の平面図、(b)
は従来技術で半導体素子を半導体装置に搭載した直後の
平面図,第4図(a)は第3図(a)をワイヤーボンデ
ィングした後の平面図、(b)は第3図(b)をワイヤ
ーボンディングした後の平面図、第5図(a)は第4図
(a)のA−A線部分断面図、(b)は第4図(b)の
B−B線部分断面図、第6図は従来技術の説明図、第7
図は従来技術の再位置決めステージの平面図である。
1・・・半導体素子 2・・・テーブル3・・
・テーブル用カメラ 4,8.9・・・搬送アーム5
・・・再位置決めステージ
6a・・・再位置決めステージ用カメラ 6b・・・制
御部7・・・素子搭載部 10・・・ディスプ
レイ11・・・素子接着材料 l2・・・内部リ
ードl3・・・ボンディングワイヤー
l4・・・つめ付再位置決めステージ
l5・・・再位置決め用つめFIG. 1 is a block diagram showing a first embodiment of the present invention, FIG. 2 is a block diagram showing a second embodiment of the present invention, and FIG. Plan view, (b)
4(a) is a plan view of FIG. 3(a) after wire bonding, and FIG. 4(b) is a plan view of FIG. A plan view after wire bonding, FIG. 5(a) is a partial sectional view taken along the line A-A in FIG. 4(a), and FIG. Figure 6 is an explanatory diagram of the prior art, Figure 7
The figure is a top view of a prior art repositioning stage. 1... Semiconductor element 2... Table 3...
・Table camera 4, 8.9...Transport arm 5
...Repositioning stage 6a...Camera for repositioning stage 6b...Control section 7...Element mounting section 10...Display 11...Element adhesive material l2...Internal lead l3... Bonding wire l4...Repositioning stage with claw l5...Repositioning claw
Claims (1)
等の手段により搬送アームの一部に固着させ、半導体素
子搭載部位へ供給する途中で再位置決めを行い、再び前
記手段により搬送アームの一部に半導体素子を固着させ
て素子搭載部位へ供給し、素子の搭載を完了する半導体
装置の製造装置において、再位置決めを行う半導体素子
を載置して直交する2軸方向及び回転方向に動作する再
位置決めステージと、再位置決めステージ上の半導体素
子の位置ズレ量を画像にて認識し、そのズレ量に基づく
駆動指令を前記再位置決めステージに発する認識制御手
段とを有することを特徴とする半導体装置の製造装置。(1) Pick up the semiconductor device from the table, fix it to a part of the transfer arm by means such as vacuum suction, reposition it while supplying it to the semiconductor device mounting area, and then use the above-mentioned means again to fix the semiconductor device to a part of the transfer arm. In semiconductor device manufacturing equipment, which fixes a semiconductor element to a substrate and supplies it to an element mounting site to complete the mounting of the element, a repositioning device that places a semiconductor element to be repositioned and operates in two orthogonal axes directions and a rotational direction is used. A semiconductor device comprising: a positioning stage; and recognition control means that recognizes the amount of positional deviation of a semiconductor element on the repositioning stage in an image and issues a drive command to the repositioning stage based on the amount of deviation. Manufacturing equipment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6158089A JPH02239637A (en) | 1989-03-14 | 1989-03-14 | Manufacturing device for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6158089A JPH02239637A (en) | 1989-03-14 | 1989-03-14 | Manufacturing device for semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02239637A true JPH02239637A (en) | 1990-09-21 |
Family
ID=13175212
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6158089A Pending JPH02239637A (en) | 1989-03-14 | 1989-03-14 | Manufacturing device for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02239637A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55165643A (en) * | 1979-06-12 | 1980-12-24 | Fujitsu Ltd | Device for bonding pellet |
-
1989
- 1989-03-14 JP JP6158089A patent/JPH02239637A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55165643A (en) * | 1979-06-12 | 1980-12-24 | Fujitsu Ltd | Device for bonding pellet |
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