JPH02238338A - Lens inspecting apparatus - Google Patents

Lens inspecting apparatus

Info

Publication number
JPH02238338A
JPH02238338A JP5774089A JP5774089A JPH02238338A JP H02238338 A JPH02238338 A JP H02238338A JP 5774089 A JP5774089 A JP 5774089A JP 5774089 A JP5774089 A JP 5774089A JP H02238338 A JPH02238338 A JP H02238338A
Authority
JP
Japan
Prior art keywords
plate
light
lens
reaches
position
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5774089A
Inventor
Shunichi Akiba
Kazuto Kinoshita
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5774089A priority Critical patent/JPH02238338A/en
Publication of JPH02238338A publication Critical patent/JPH02238338A/en
Application status is Pending legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
    • G03F7/70591Testing optical components
    • G03F7/706Aberration measurement

Abstract

PURPOSE: To expand the measuring range of aberration in a Hartmann type lens inspecting apparatus by making the output light-ray group from a Hartmann plate pass through a screening plate which is moved up and down and right and left, and making the input and output lights correspond in the vicinity of a focal point.
CONSTITUTION: Laser light from an oscillator 1 becomes parallel luminous flux through a collimate lens 4 and reaches a separating plate (Hartmann plate) 5 having many pinholes. The light reaches a screening plate 6 through the pinhole part. The plate 6 has a mechanism which can move the plate up and down and left and right. The mechanism is controlled with a control circuit and a computer 10. The light which is not shielded with the plate 6 reaches an image sensing plane 8 of a MOS camera through a lens 7 to be measured. At this time, the position of the light point of each pinhole of the separating plate 5 is made to correspond to the position of the light point on the image sensor plane 8. Thus, the position of the light ray can be recognized even for the light-ray group which crosses in the vicinity of the focal point. Therefore, the aberration of any lens can be measured.
COPYRIGHT: (C)1990,JPO&Japio
JP5774089A 1989-03-13 1989-03-13 Lens inspecting apparatus Pending JPH02238338A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5774089A JPH02238338A (en) 1989-03-13 1989-03-13 Lens inspecting apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5774089A JPH02238338A (en) 1989-03-13 1989-03-13 Lens inspecting apparatus

Publications (1)

Publication Number Publication Date
JPH02238338A true JPH02238338A (en) 1990-09-20

Family

ID=13064311

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5774089A Pending JPH02238338A (en) 1989-03-13 1989-03-13 Lens inspecting apparatus

Country Status (1)

Country Link
JP (1) JPH02238338A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999060361A1 (en) * 1998-05-19 1999-11-25 Nikon Corporation Aberration measuring instrument and measuring method, projection exposure apparatus provided with the instrument and device-manufacturing method using the measuring method, and exposure method
US6480267B2 (en) * 1999-12-28 2002-11-12 Kabushiki Kaisha Topcon Wavefront sensor, and lens meter and active optical reflecting telescope using the same
US6548797B1 (en) 2000-10-20 2003-04-15 Nikon Corporation Apparatus and method for measuring a wavefront using a screen with apertures adjacent to a multi-lens array
US6819414B1 (en) 1998-05-19 2004-11-16 Nikon Corporation Aberration measuring apparatus, aberration measuring method, projection exposure apparatus having the same measuring apparatus, device manufacturing method using the same measuring method, and exposure method
JP2006047292A (en) * 2004-06-30 2006-02-16 Olympus Corp System and method for evaluating optical component
JP2006170958A (en) * 2004-12-20 2006-06-29 Olympus Corp Chart for inspection, and lens performance inspection device
JP2008135745A (en) * 2007-11-22 2008-06-12 Nikon Corp Wave front aberration measuring device and projection aligner
JP2008180722A (en) * 1994-06-14 2008-08-07 Marc Abitbol Apparatus for mapping optical elements
JP2009258046A (en) * 2008-04-21 2009-11-05 Fujikoden Corp Eccentricity amount measuring method, eccentricity amount measuring device and eccentricity adjusting device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008180722A (en) * 1994-06-14 2008-08-07 Marc Abitbol Apparatus for mapping optical elements
WO1999060361A1 (en) * 1998-05-19 1999-11-25 Nikon Corporation Aberration measuring instrument and measuring method, projection exposure apparatus provided with the instrument and device-manufacturing method using the measuring method, and exposure method
EP1079223A1 (en) * 1998-05-19 2001-02-28 Nikon Corporation Aberration measuring instrument and measuring method, projection exposure apparatus provided with the instrument and device-manufacturing method using the measuring method, and exposure method
US6819414B1 (en) 1998-05-19 2004-11-16 Nikon Corporation Aberration measuring apparatus, aberration measuring method, projection exposure apparatus having the same measuring apparatus, device manufacturing method using the same measuring method, and exposure method
EP1079223A4 (en) * 1998-05-19 2002-11-27 Nikon Corp Aberration measuring instrument and measuring method, projection exposure apparatus provided with the instrument and device-manufacturing method using the measuring method, and exposure method
US6480267B2 (en) * 1999-12-28 2002-11-12 Kabushiki Kaisha Topcon Wavefront sensor, and lens meter and active optical reflecting telescope using the same
US6548797B1 (en) 2000-10-20 2003-04-15 Nikon Corporation Apparatus and method for measuring a wavefront using a screen with apertures adjacent to a multi-lens array
JP2006047292A (en) * 2004-06-30 2006-02-16 Olympus Corp System and method for evaluating optical component
JP2006170958A (en) * 2004-12-20 2006-06-29 Olympus Corp Chart for inspection, and lens performance inspection device
JP2008135745A (en) * 2007-11-22 2008-06-12 Nikon Corp Wave front aberration measuring device and projection aligner
JP2009258046A (en) * 2008-04-21 2009-11-05 Fujikoden Corp Eccentricity amount measuring method, eccentricity amount measuring device and eccentricity adjusting device

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