JPH02234076A - Semiconductor ic device - Google Patents

Semiconductor ic device

Info

Publication number
JPH02234076A
JPH02234076A JP1055369A JP5536989A JPH02234076A JP H02234076 A JPH02234076 A JP H02234076A JP 1055369 A JP1055369 A JP 1055369A JP 5536989 A JP5536989 A JP 5536989A JP H02234076 A JPH02234076 A JP H02234076A
Authority
JP
Japan
Prior art keywords
voltage
impressed
power supply
memory transistor
channel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1055369A
Other languages
Japanese (ja)
Inventor
Minoru Toyoda
豊田 實
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP1055369A priority Critical patent/JPH02234076A/en
Publication of JPH02234076A publication Critical patent/JPH02234076A/en
Pending legal-status Critical Current

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Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Non-Volatile Memory (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)

Abstract

PURPOSE:To display a history of over-voltage impressed even after recovering to a normal value by providing a programable memory transistor storing the abnormal over-voltage impressed on a power source electrode and a light emitting element displaying the stored information. CONSTITUTION:The N-channel programable MOS memory transistor Tr Q1 with a floating gate system, N-channel enhancement type MOS Trs Q2, Q5, Q7, and N-channel depression type MOS Trs Q3, Q4, Q6 are provided. When the abnormal over-voltage (larger than +10V, longer than 10musec) is impressed on the power source pole 1 then the condition impressed with the power source voltage (+5V) for the normal operating time is recovered after that, the Tr Q1 is in the OFF condition since electrons are injected into (written in) the floating gate. So, a point A for an output part of the Tr Q2 is made to be an L-level, consequently a point B for the output part of the Tr Q7 is also made to be the L-level; therefore, a current is made to flow in an LED D to put on the lamp. That is, an existence of the history for the electrode 1 impressed with the over-voltage can be displayed.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体集積回路装置にかかり、特に半導体集積
回路装置の電源電極に供給される電源電圧の異常の記憶
及び記憶表示回路に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor integrated circuit device, and more particularly to a circuit for storing and displaying an abnormality in a power supply voltage supplied to a power supply electrode of a semiconductor integrated circuit device.

〔従来の技術〕[Conventional technology]

従来の半導体集積回路装置(以下I.C!.と記す)は
電源電圧の異常を自動的に記憶して表示する機能を有し
ていなかった. 〔発明が解決しようとする課題〕 上述の従来のI.C.では動作可能範囲を越える過電圧
が電源電極に印加されると、I.C.が誤動作を生じた
り、I.C.内部のトランジスタが破壊されてしまうが
、誤動作や破壊の原因が電源電極に印加された異常過電
圧であるのか、■.C.製造時点から内包していた内部
欠陥であるのかは、電源電圧が正常に復帰した後は限定
できないという欠点があった。
Conventional semiconductor integrated circuit devices (hereinafter referred to as I.C.) did not have a function to automatically store and display abnormalities in the power supply voltage. [Problem to be solved by the invention] The above-mentioned conventional I. C. In this case, when an overvoltage exceeding the operable range is applied to the power supply electrode, the I. C. may malfunction, or the I. C. The internal transistor is destroyed, but is the malfunction or destruction caused by the abnormal overvoltage applied to the power supply electrode?■. C. There was a drawback in that it was impossible to determine whether it was an internal defect that had been present since the time of manufacture after the power supply voltage returned to normal.

〔課題を解決するための手段〕[Means to solve the problem]

本発明にかかる半導体集積回路装置は、電源電極に印加
される異常過電圧.を記憶するプログラマブルメモリト
ランジスタと、記憶された情報を読み出して表示するた
めの制御回路並びに発光素子とを有している。
The semiconductor integrated circuit device according to the present invention is capable of handling an abnormal overvoltage applied to a power supply electrode. It has a programmable memory transistor for storing information, a control circuit and a light emitting element for reading out and displaying the stored information.

したがって、電源電極に印加された異常過電圧の履歴な
I.C.自体で自動的に記憶し、電源電極に印加さhる
電源電圧が正常値に復帰した後でも上記記憶に基づき異
常過電圧印加の履歴を表示することができる。
Therefore, the history of abnormal overvoltage applied to the power supply electrode is C. The device itself automatically stores information, and even after the power supply voltage applied to the power supply electrodes returns to its normal value, it is possible to display the history of abnormal overvoltage application based on the above-mentioned memory.

〔実施例〕〔Example〕

次に、本発明について図面を参照して説明する.第1図
はNチャンネルMOS型半導体集積回路装置における本
発明の一実施例の回路図である。
Next, the present invention will be explained with reference to the drawings. FIG. 1 is a circuit diagram of an embodiment of the present invention in an N-channel MOS type semiconductor integrated circuit device.

Q1はフローティングゲート方式のNチャンネルプログ
ラマブルMOSメモリトランジスタ、Q2及びQ5並び
にQ7はNチャンネルエンハンスメント型MOS}ラン
ジスタ、Q3及びQ4並びにQ6はNチャンネルデプレ
ッション型MOS}ランジスタ、Dは発光ダイオード、
Rは抵抗である。
Q1 is a floating gate type N-channel programmable MOS memory transistor; Q2, Q5, and Q7 are N-channel enhancement type MOS} transistors; Q3, Q4, and Q6 are N-channel depletion type MOS} transistors; D is a light emitting diode;
R is resistance.

同図において、Q2及びQ3は正常動作時は常にNO状
態であり、Q2の出力部A点の電位は、Q1がONの時
はハイレベルQ1がOFFの時はロウレベルとなるよう
にQ1及びQ2並びにQ3の特性を設計しておく。尚、
通常動作時の電源電圧は+5V,プログラマブルMOS
メモリトランジスタQ1は初期状態はONであり、電源
電極1に+10v以上かつ10μ気.以上の異常過電圧
が印加された場合はプログラマブルMOSメモリトラン
ジスタQ1のフローティングゲートに電子が注入されて
Q1はOFFになる特性(書き込み特性)を有するもの
とする。電源電極1に異常過電圧が印加される以前の回
路動作は、Q1がON,Q2及びQ3もONであり、従
ってQ2の出力部A点の電位はハイレベルとなり、Q4
とQ5とで構成されるインバータと、Q6とQ7とで構
成されるインバータの2段のインバータを経たQ7の出
力部B点の電位もハイレベルとなる為、発光ダイオード
Dには電流が流れず、従って発光ダイオードDは消灯状
態を保つ。上述の状態を保っている本回路の電源電極1
に+IOV以上かつ10μ式.以上の異常過電圧が印加
されてその後電源電極1には通常動作時の+5vの電源
電圧が印加された状態に復帰した場合は、プログラマブ
ルMoSメモリトランジスタQ1はフローティングゲー
トに電子が注入されている為(書き込みが行なわれた為
)、OFF状態になっている。Q1がOFFであるとQ
2の出力部A点はロウレベルとなり、従ってQ7の出力
部B点もロウレベルとなる為、発光ダイオードDには電
流が流れ、発光ダイオードDは点灯する。すなわち電源
電極1に異常過電圧が印加された履歴を有することを表
示することができる。尚、抵抗Rは発光ダイオードDに
流れる電流を制限する為に用いる。また本実施例では通
常動作時の電源電圧は+5V,フローティングゲート方
式のNチャンネルプログラマブルMOSメモリトランジ
スタQ1の書き込み特性は電源電極1に印加される+I
OV以上かつ10μ式.以上の電圧としてあるが、上記
の条件はI.C.個別の動作条件及び書き込み条件を所
望の任意の値に設定しても本発明の目的は達成できる。
In the figure, Q2 and Q3 are always in the NO state during normal operation, and the potential at point A of the output part of Q2 is set to high level when Q1 is ON, and low level when Q1 is OFF. Also, design the characteristics of Q3. still,
Power supply voltage during normal operation is +5V, programmable MOS
The memory transistor Q1 is initially ON, and the power supply electrode 1 has a voltage of +10V or more and a voltage of 10μ. When the above abnormal overvoltage is applied, electrons are injected into the floating gate of the programmable MOS memory transistor Q1, and Q1 is turned off (write characteristic). The circuit operation before the abnormal overvoltage is applied to the power supply electrode 1 is that Q1 is ON, and Q2 and Q3 are also ON, so the potential at point A of the output part of Q2 becomes high level, and Q4
The potential at the output point B of Q7, which has passed through the two-stage inverter consisting of Q5 and Q6 and the inverter Q6 and Q7, is also at a high level, so no current flows through the light emitting diode D. , therefore, the light emitting diode D remains off. Power supply electrode 1 of this circuit that maintains the above state
+IOV or more and 10μ type. If the above abnormal overvoltage is applied and then the power supply electrode 1 returns to the state where the +5V power supply voltage during normal operation is applied, the programmable MoS memory transistor Q1 has electrons injected into the floating gate ( (because writing was performed), it is in the OFF state. If Q1 is OFF, Q
Since the output point A of Q2 becomes low level, and therefore the output point B of Q7 also becomes low level, a current flows through the light emitting diode D, and the light emitting diode D lights up. In other words, it is possible to display that there is a history of abnormal overvoltage being applied to the power supply electrode 1. Note that the resistor R is used to limit the current flowing through the light emitting diode D. Further, in this embodiment, the power supply voltage during normal operation is +5V, and the writing characteristics of the floating gate N-channel programmable MOS memory transistor Q1 are determined by +I applied to the power supply electrode 1.
OV or more and 10μ type. However, the above conditions are I. C. The object of the present invention can be achieved even if the individual operating conditions and writing conditions are set to any desired values.

第2図は本発明の他の実施例の回路図である。FIG. 2 is a circuit diagram of another embodiment of the present invention.

本実施例はC−MOS半導体集積回路装置における実施
例であり、Q33及びQ44並びにQ66はPチャンネ
ルエンハンスメント型MOS}ランジスタである。フロ
ーティングゲート方式のNチャンネルプ四グラマプルM
OSメモリトランジスタQl,Nチャンネルエンハンス
メントWMOSトランジスタQ2及びQ5並びにQ7,
発光ダイオードD,電流制限抵抗Rは前述の実施例1と
同様に、電源電極1に異常過電圧が印加される以前は発
光ダイオードDが消灯、電源電極1に異常過電圧が印加
された後は発光ダイオードDが点灯するように各々の特
性を設計しておく。本実施例では2段インバータ部分が
C −MO S構造である為に波形整形効果が高く、従
ってQ2の出力部A点のハイレベル及びロウレベルの電
位設定が電源電圧の二分の一に近い条件でも可能となる
利点がある. 〔発明の効果〕 以上説明したように本発明は、電源電極に印加された異
常過電圧の履歴を自動的にフローティングゲート方式の
プログラマブルメモリトランジスタに記憶し、電源電極
に印加される電圧が正常値に復帰した後に上記異常履歴
を自動的に表示できるという利点がある。
This embodiment is an embodiment of a C-MOS semiconductor integrated circuit device, and Q33, Q44, and Q66 are P-channel enhancement type MOS transistors. Floating gate type N-channel four-grammar M
OS memory transistor Ql, N-channel enhancement WMOS transistors Q2 and Q5 and Q7,
The light emitting diode D and the current limiting resistor R are the same as in the first embodiment described above. Before the abnormal overvoltage is applied to the power supply electrode 1, the light emitting diode D is turned off, and after the abnormal overvoltage is applied to the power supply electrode 1, the light emitting diode D is turned off. Each characteristic is designed so that D lights up. In this example, since the two-stage inverter part has a C-MOS structure, the waveform shaping effect is high. Therefore, even if the high-level and low-level potential settings at point A of the output section of Q2 are close to half of the power supply voltage, the waveform shaping effect is high. This has the advantage of being possible. [Effects of the Invention] As explained above, the present invention automatically stores the history of abnormal overvoltage applied to the power supply electrode in a floating gate type programmable memory transistor, so that the voltage applied to the power supply electrode returns to a normal value. There is an advantage that the above abnormality history can be automatically displayed after recovery.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明にがかる一実施例の回路図、第2図は本
発明にかかる他の実施例の回路図である.1・・・・・
・電源電極、Q1・・・・・・フローティングゲート方
式のNチャンネルプログラマブルMOSメモリトランジ
スタ,Q2,Q5,Q7・・・・・・Nチャンネルエン
ハンスメントffiMOs}ランジスタ、Q3,Q4,
Q6・・・・・・Nチャンネルデブレッシ3ン型MOS
}ランジスタ、D・・・・・・発光ダイオード、R・・
・・・・電流制限抵抗、A点・・・・・・トランジスタ
Q2の出力部、B点・・・・・・トランジスタQ7の出
力部、Q33,Q44,Q55・・・・・・Pチャンネ
ルエンハンスメント型MOS}ランジスタ。 代理人 弁理士  内 原   晋 ,ギ
FIG. 1 is a circuit diagram of one embodiment of the present invention, and FIG. 2 is a circuit diagram of another embodiment of the present invention. 1...
・Power supply electrode, Q1...Floating gate N-channel programmable MOS memory transistor, Q2, Q5, Q7...N-channel enhancement ffiMOs} transistor, Q3, Q4,
Q6...N-channel deblessing 3-inch MOS
}Transistor, D... Light emitting diode, R...
...Current limiting resistor, point A...output section of transistor Q2, point B...output section of transistor Q7, Q33, Q44, Q55...P channel enhancement type MOS} transistor. Agent Patent Attorney Susumu Uchihara, Gi

Claims (1)

【特許請求の範囲】[Claims] 電源電極に印加された異常過電圧を記憶するプログラマ
ブルメモリトランジスタと、前記プログラマブルメモリ
トランジスタの記憶内容を読み出して表示する為の制御
回路及び発光素子を有する電源電圧異常履歴記憶表示回
路とを備えたことを特徴とする半導体集積回路装置。
A programmable memory transistor for storing abnormal overvoltage applied to a power supply electrode; and a power supply voltage abnormality history storage and display circuit having a control circuit and a light emitting element for reading and displaying the stored contents of the programmable memory transistor. Features of semiconductor integrated circuit devices.
JP1055369A 1989-03-07 1989-03-07 Semiconductor ic device Pending JPH02234076A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1055369A JPH02234076A (en) 1989-03-07 1989-03-07 Semiconductor ic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1055369A JPH02234076A (en) 1989-03-07 1989-03-07 Semiconductor ic device

Publications (1)

Publication Number Publication Date
JPH02234076A true JPH02234076A (en) 1990-09-17

Family

ID=12996571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1055369A Pending JPH02234076A (en) 1989-03-07 1989-03-07 Semiconductor ic device

Country Status (1)

Country Link
JP (1) JPH02234076A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6839213B2 (en) 2001-09-18 2005-01-04 Hitachi, Ltd. Power converter of electric car or hybrid car
JP2010043943A (en) * 2008-08-12 2010-02-25 Seiko Instruments Inc Surge detection circuit

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6839213B2 (en) 2001-09-18 2005-01-04 Hitachi, Ltd. Power converter of electric car or hybrid car
US6891214B2 (en) * 2001-09-18 2005-05-10 Hitachi, Ltd. Semiconductor power module and power converter
JP2010043943A (en) * 2008-08-12 2010-02-25 Seiko Instruments Inc Surge detection circuit

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