JPH02229402A - Manufacture of voltage dependent nonlinear resistor - Google Patents
Manufacture of voltage dependent nonlinear resistorInfo
- Publication number
- JPH02229402A JPH02229402A JP1048450A JP4845089A JPH02229402A JP H02229402 A JPH02229402 A JP H02229402A JP 1048450 A JP1048450 A JP 1048450A JP 4845089 A JP4845089 A JP 4845089A JP H02229402 A JPH02229402 A JP H02229402A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- bismuth
- zinc
- terms
- resistance layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 230000001419 dependent effect Effects 0.000 title abstract 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract description 39
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000000203 mixture Substances 0.000 claims abstract description 27
- 239000011787 zinc oxide Substances 0.000 claims abstract description 20
- 150000003752 zinc compounds Chemical class 0.000 claims abstract description 16
- 150000001463 antimony compounds Chemical class 0.000 claims abstract description 14
- 150000001622 bismuth compounds Chemical class 0.000 claims abstract description 13
- 239000004110 Zinc silicate Substances 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims abstract description 9
- XSMMCTCMFDWXIX-UHFFFAOYSA-N zinc silicate Chemical compound [Zn+2].[O-][Si]([O-])=O XSMMCTCMFDWXIX-UHFFFAOYSA-N 0.000 claims abstract description 9
- 235000019352 zinc silicate Nutrition 0.000 claims abstract description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052797 bismuth Inorganic materials 0.000 claims abstract description 7
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 7
- 239000010703 silicon Substances 0.000 claims abstract description 7
- 239000011029 spinel Substances 0.000 claims abstract description 5
- 229910052596 spinel Inorganic materials 0.000 claims abstract description 5
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 4
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000011248 coating agent Substances 0.000 claims abstract description 3
- 238000000576 coating method Methods 0.000 claims abstract description 3
- 238000009413 insulation Methods 0.000 claims 1
- 229910052681 coesite Inorganic materials 0.000 abstract description 5
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 5
- 229910052682 stishovite Inorganic materials 0.000 abstract description 5
- 229910052905 tridymite Inorganic materials 0.000 abstract description 5
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 3
- 229910002059 quaternary alloy Inorganic materials 0.000 abstract description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 abstract 4
- YEAUATLBSVJFOY-UHFFFAOYSA-N tetraantimony hexaoxide Chemical compound O1[Sb](O2)O[Sb]3O[Sb]1O[Sb]2O3 YEAUATLBSVJFOY-UHFFFAOYSA-N 0.000 abstract 2
- 239000000126 substance Substances 0.000 abstract 1
- 238000010304 firing Methods 0.000 description 7
- 239000002245 particle Substances 0.000 description 5
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 2
- 239000001856 Ethyl cellulose Substances 0.000 description 2
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910052810 boron oxide Inorganic materials 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 2
- 229920001249 ethyl cellulose Polymers 0.000 description 2
- 235000019325 ethyl cellulose Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910001923 silver oxide Inorganic materials 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- -1 First Substances 0.000 description 1
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical group C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 240000000018 Gnetum gnemon Species 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005649 metathesis reaction Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Thermistors And Varistors (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は酸化亜鉛を主成分とする電圧非直線抵抗体の製
造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for manufacturing a voltage nonlinear resistor containing zinc oxide as a main component.
?従来の技術)
従来から酸化亜鉛を主成分とし旧tch. Sbt03
,sso., COJ4+ MnO■等の少量の添加物
を含有した抵抗体は、優れた電圧非直線性を示すことが
広く知られており、その性質を利用して避雷器等に使用
されている.
この電圧非直線抵抗体では、雷サージ電流が素子に印加
された場合に主として素子側面に沿った放電いわゆる沿
面放電が生じ素子が破壊することがあるため、円周側面
にDi−Sb−Si系化合物または81−Sb−Si−
Zn系化合物よりなる側面高抵抗層を設けるのが一般的
である。? Conventional technology) Conventionally, zinc oxide is the main component and the former tch. Sbt03
, sso. It is widely known that resistors containing small amounts of additives, such as , COJ4+ MnO■, exhibit excellent voltage nonlinearity, and are used in lightning arresters and the like by taking advantage of this property. In this voltage nonlinear resistor, when a lightning surge current is applied to the element, discharge mainly occurs along the side of the element, so-called creeping discharge, which may destroy the element. compound or 81-Sb-Si-
It is common to provide a side high resistance layer made of a Zn-based compound.
(発明が解決しようとする課題)
これらの電圧非直線抵抗体において、抵抗体のバリスタ
電圧(V+−a)を高くしてアレスタ等の機器の小型化
を図ろうとする試みがあり、焼成温度を低下させるとバ
リスタ電圧が高くなることが一般に知られている。しか
しながら、焼成温度を低下させると側面高抵抗層と抵抗
体本体との密着性が低下し、雷サージ耐量等が低下する
問題があ?た。(Problem to be Solved by the Invention) In these voltage nonlinear resistors, there have been attempts to increase the varistor voltage (V+-a) of the resistor to miniaturize devices such as arresters. It is generally known that lowering the varistor voltage increases the varistor voltage. However, when the firing temperature is lowered, the adhesion between the side high-resistance layer and the resistor body decreases, resulting in a decrease in lightning surge resistance. Ta.
この点を改良するため、本出願人は特開昭631366
03号公報において、側面高抵抗層として所定組成のZ
nO−SiOz−BtzO.−Sb.02系混合物を用
いるとともに、素体中のSi01を7〜11モル%と高
くすることにより、焼成温度を低下させてもバリスタ電
圧が400V/1m以上で良好な特性を有する電圧非直
線抵抗体を得ることができることを開示している。In order to improve this point, the present applicant has published Japanese Patent Application Laid-Open No. 631366
In Publication No. 03, Z of a predetermined composition is used as a side high resistance layer.
nO-SiOz-BtzO. -Sb. By using a 02-based mixture and increasing the Si01 content in the element body to 7 to 11 mol%, we have created a voltage nonlinear resistor that has good characteristics with a varistor voltage of 400 V/1 m or higher even when the firing temperature is lowered. Disclose what you can get.
しかしながら、上述した特開昭63−136603号公
報記載の技術では、素体中のSift添加量を増加させ
る必要があるため、素子中のケイ酸亜鉛相の均一分散が
難しく、開閉サージ耐量等が低下する問題があった。ま
た、側面高抵抗層中へのSt成分付与として結晶賞のS
iO■等を粉砕せずそのまま使用していたため粒度も粗
く、均一に生成してはじめてその効果のあるケイ酸亜鉛
相が不均一に生成する場合があった。そのような場合は
、雷サージ耐量も向上せずそのバラツキが大となるとと
もに、側面高抵抗層も吸湿を示し長期信頼性に欠ける等
?好な特性を有する電圧非直線抵抗体を得られない問題
があった。However, in the technique described in JP-A-63-136603 mentioned above, it is necessary to increase the amount of Sift added in the element, which makes it difficult to uniformly disperse the zinc silicate phase in the element, and the switching surge resistance etc. There was a problem with the decline. In addition, the crystal award S
Since iO■ and the like were used as they were without being crushed, the particle size was coarse, and the zinc silicate phase, which is effective only if it is formed uniformly, was sometimes formed unevenly. In such a case, the lightning surge resistance does not improve and its variation becomes large, and the high resistance layer on the side also absorbs moisture, resulting in a lack of long-term reliability. There was a problem in that it was not possible to obtain a voltage nonlinear resistor with good characteristics.
本発明の目的は上述した課題を解消して、良好な雷サー
ジ耐量等の電気特性を高いバリスタ電圧においても得る
ことができるとともに、側面高抵抗層の吸湿性をも改善
できる電圧非直線抵抗体の製造方法を提供しようとする
ものである。The purpose of the present invention is to solve the above-mentioned problems and provide a voltage nonlinear resistor that can obtain electrical characteristics such as good lightning surge resistance even at high varistor voltages, and can also improve the hygroscopicity of the side high resistance layer. The present invention aims to provide a method for manufacturing.
(課題を解決するための手段)
本発明の電圧非直線抵抗体の製造方法は、酸化亜鉛を主
成分とし、ビスマス成分、アンチモン成分、ケイ素成分
を含有する電圧非直線抵抗体素体の側面に、少なくとも
非晶質シリカ、アンチモン化合物、ビスマス化合物、亜
鉛化合物を、非晶質シリカをSiO■に換算して65〜
91モル%、アンチモン化合物をsb,o,に換算して
2〜15モル%、ビスマス化合物をBi!Oiに換算し
て7〜20モル%、亜鉛化合物をZnOに換算してZn
O / ( Sing + SbzOz+Biz(h
) =0.1〜1.0となる組成の絶縁被覆用の混合物
を塗布し、焼成体の側面にケイ酸亜鉛(ZnzSiO4
)およびスピネル(Zn7SbzO+ z)を含有する
高抵抗層を形成することを特徴とするものである。(Means for Solving the Problems) The method for manufacturing a voltage nonlinear resistor of the present invention includes a method for manufacturing a voltage nonlinear resistor element that contains zinc oxide as a main component, a bismuth component, an antimony component, and a silicon component. , at least amorphous silica, an antimony compound, a bismuth compound, a zinc compound, and the amorphous silica is converted to SiO■ from 65 to
91 mol%, antimony compound sb, o, 2 to 15 mol%, bismuth compound Bi! 7 to 20 mol% in terms of Oi, Zn in terms of zinc compound to ZnO
O / (Sing + SbzOz+Biz(h
) = 0.1 to 1.0 is applied, and zinc silicate (ZnzSiO4) is applied to the side surface of the fired body.
) and spinel (Zn7SbzO+ z).
(作 用)
上述した構成において、側面高抵抗層を構成する組成を
所定量のSi02−SbzO+−Bit03−ZnOの
四元系とするとともに、Si02源原料として非晶質シ
リカをSi01に換算して65〜91モル%好ましくは
73〜86モル%、アンチモン化合物をSb!03に換
算して2〜15モル%好ましくは4〜10モル%、ビス
マス化合物をBi.O.に換算して7〜20モル%好ま
しくは10〜17モル%、亜鉛化合物をZnOに換算し
てZoo/ ( SiOz + SbzOi + Bi
zOi)が0.1〜1.0好ましくは0.2〜0.7と
なるよう混合することにより、良好な雷サージ耐量等の
電気的特性を高いバリスタ電圧においても得ることがで
きるとともに、側面高抵抗層の吸湿性をも改善できるこ
とを見出した。(Function) In the above structure, the composition of the side high resistance layer is a quaternary system of Si02-SbzO+-Bit03-ZnO in a predetermined amount, and amorphous silica is used as the Si02 source material in terms of Si01. 65 to 91 mol%, preferably 73 to 86 mol%, of the antimony compound Sb! 03, preferably 4 to 10 mol%, the bismuth compound is Bi. O. 7 to 20 mol%, preferably 10 to 17 mol%, in terms of ZnO, Zoo/(SiOz + SbzOi + Bi
By mixing so that the zOi) is 0.1 to 1.0, preferably 0.2 to 0.7, electrical characteristics such as good lightning surge resistance can be obtained even at high varistor voltage, and the side It has been found that the hygroscopicity of the high-resistance layer can also be improved.
ここで、非晶質シリカをSin.に換算して65〜91
モル%、アンチモン化合物をSb203に換算して2〜
15モル%、ビスマス化合物をBigO.に換算して7
〜20モル%、亜鉛化合物をZnOに換算してZn0/
( SiOt+Sb!Off+Bi,03)が0.1〜
1.0となる組成に数値限定したのは、いずれかの組成
がこの範囲以外であると、後述する実施例から明らかな
ように雷サージ耐量等の電気的特性が悪化するためであ
る。Here, amorphous silica is used as Sin. Converting to 65-91
Mol%, antimony compound converted to Sb203: 2~
15 mol% of the bismuth compound was added to BigO. Converting to 7
~20 mol%, Zn0/ in terms of zinc compound as ZnO
(SiOt+Sb!Off+Bi,03) is 0.1~
The reason for numerically limiting the composition to 1.0 is that if any composition is outside this range, electrical characteristics such as lightning surge resistance will deteriorate, as will be clear from the examples described later.
ここで非晶質シリカは焼成により亜鉛化合物と反応して
ケイ酸亜鉛を生成する。また、アンチモン化合物は亜鉛
化合物と反応してスピネルを生成する。これらケイ酸亜
鉛およびスピネルは側面高抵抗層と抵抗体本体との密着
性向上および素子の雷サージ耐量特性等に重要な働きを
すると考えられる.なお、亜鉛化合物は焼成により非晶
質シリカまたはアンチモン化合物と反応する必要があり
、焼成後亜鉛化合物として残存することは好ましくない
。また、ケイ酸亜鉛は連続的に生成すると好ましい。ま
た、ビスマス化合物はフランクスとして上記反応を円滑
に進めるとともに、抵抗体本体中にも拡散し、開閉サー
ジ耐量等の特性向上に重要な働きをしていると考えられ
る。Here, the amorphous silica reacts with the zinc compound by firing to produce zinc silicate. Antimony compounds also react with zinc compounds to produce spinel. These zinc silicate and spinel are thought to play an important role in improving the adhesion between the side high-resistance layer and the resistor body, and in improving the lightning surge resistance characteristics of the device. Note that the zinc compound needs to react with the amorphous silica or antimony compound during firing, and it is not preferable for the zinc compound to remain as a zinc compound after firing. Moreover, it is preferable that zinc silicate be produced continuously. In addition, the bismuth compound acts as a Franks to facilitate the above reaction, and also diffuses into the resistor body, playing an important role in improving characteristics such as opening/closing surge resistance.
また、Si02源原料として非晶質シリカを使用するの
は、側面高抵抗層中に均一で良好なケイ酸亜鉛相が得ら
れ、雷サージ耐量が向上しそのバラツキが減少するとと
もに、側面高抵抗層の吸湿性も改善されるためである。In addition, the use of amorphous silica as the Si02 source material allows a uniform and good zinc silicate phase to be obtained in the side high resistance layer, which improves lightning surge resistance and reduces its dispersion. This is because the hygroscopicity of the layer is also improved.
なお、使用する非晶質シリカの製造方法については特に
限定するものではないが、ケイ酸ナトリウムの複分解反
応から得られたものまたは四塩化ケイ素の熱分解により
得られたものを使用すると、各種特性が良好になるため
好ましい。また、その純度はSin.とじて95%以上
であると好ましい。There are no particular limitations on the manufacturing method of the amorphous silica used, but if one obtained from the metathesis reaction of sodium silicate or the one obtained from the thermal decomposition of silicon tetrachloride is used, various properties will be obtained. This is preferable because it improves. Moreover, its purity is Sin. It is preferable that it is 95% or more.
さらにまた、使用する非晶質シリカ、アンチモン化合物
、ビスマス化合物、亜鉛化合物の平均粒径は、10l!
m以下であることが好ましい。Furthermore, the average particle size of the amorphous silica, antimony compound, bismuth compound, and zinc compound used is 10 liters!
It is preferable that it is below m.
ここで非晶質シリカ以外の絶縁被覆用混合物の組成とし
て、アンチモン化合物、ビスマス化合物、亜鉛化合物を
規定したが、各化合物とも1000゜C以下、好ましく
は800゜C以下で酸化物に変化するものであればよい
。具体的には炭酸塩、硝酸塩、水酸化物等があげられる
が、酸化物が最も好ましい.また、電圧非直線抵抗体素
体の組成については限定するものでなく、従来から公知
のどのような組成でも使用できるが、特にケイ素成分を
Sin.に換算して0.1〜7モル%さらに好ましくは
0.5〜4モル%とすると好ましい。ケイ素成分はビス
マス成分とともに粒界相に析出しバリスタ電圧(V+−
A)が向上する作用を有する。0.1モル%未満では粒
成長抑制効果が不充分でバリスタ電圧は向上せず、しか
も課電寿命・制限電圧特性が悪化する場合があるととも
に、7モル%を越えると雷サージ耐量が悪化するととも
に雷サージ印加後のバリスタ電圧が低下する場合もある
ためである。Here, an antimony compound, a bismuth compound, and a zinc compound are specified as the composition of the insulating coating mixture other than amorphous silica, but each compound is one that changes to an oxide at a temperature of 1000°C or less, preferably 800°C or less. That's fine. Specific examples include carbonates, nitrates, hydroxides, etc., but oxides are most preferred. Further, the composition of the voltage nonlinear resistor element is not limited, and any conventionally known composition can be used, but in particular, a silicon component of Sin. The content is preferably 0.1 to 7 mol%, more preferably 0.5 to 4 mol%. The silicon component precipitates in the grain boundary phase together with the bismuth component, and the varistor voltage (V+-
A) has the effect of improving. If it is less than 0.1 mol%, the grain growth suppressing effect will be insufficient and the varistor voltage will not improve, and the charging life and limiting voltage characteristics may deteriorate, and if it exceeds 7 mol%, the lightning surge resistance will deteriorate. This is because the varistor voltage may also decrease after the lightning surge is applied.
より好ましくは、反応を円滑に進めるため非晶質がよい
。More preferably, it is amorphous so that the reaction proceeds smoothly.
(実施例)
酸化亜鉛を主成分とする電圧非直線抵抗体を得るには、
まず所定の粒度に調整した酸化亜鉛原料と所定の粒度に
調整した酸化ビスマス、酸化コバルト、酸化マンガン、
酸化アンチモン、酸化クロム、酸化ケイ素、酸化ニッケ
ル、酸化銀、酸化ホウ素等よりなる添加物の所定量を混
合する。酸化銀、酸化ホウ素の代りに硝酸銀、ホウ酸を
用いてもよい。好ましくは銀を含むホウケイ酸ビスマス
ガラスを用いる。この際、これらの原料粉末に対して所
定量のポリビニルアルコール水溶液および酸化アルミニ
ウム源として硝酸アルミニウム溶液の所定量等を加え、
好ましくはディスパーミルにより混合した後、好ましく
はスプレードライヤにより造粒して造粒物を得る。造粒
後、成形圧力800〜1000kg / cm zO下
で所定の形状に成形する。(Example) To obtain a voltage nonlinear resistor whose main component is zinc oxide,
First, zinc oxide raw material adjusted to a predetermined particle size, bismuth oxide, cobalt oxide, manganese oxide, adjusted to a predetermined particle size,
A predetermined amount of additives such as antimony oxide, chromium oxide, silicon oxide, nickel oxide, silver oxide, boron oxide, etc. are mixed. Silver nitrate or boric acid may be used instead of silver oxide or boron oxide. Preferably, bismuth borosilicate glass containing silver is used. At this time, a predetermined amount of polyvinyl alcohol aqueous solution and a predetermined amount of aluminum nitrate solution as an aluminum oxide source are added to these raw material powders,
After mixing preferably using a disper mill, the mixture is preferably granulated using a spray dryer to obtain a granulated product. After granulation, it is molded into a predetermined shape under a molding pressure of 800 to 1000 kg/cm zO.
その成形体を昇降温速度50〜70゜C/hrで800
〜l000゜C保持時間1〜5時間という条件で仮焼成
する。The molded body was heated to 800°C at a heating and cooling rate of 50 to 70°C/hr.
Temporary firing is carried out under conditions of holding time at ~1000°C for 1 to 5 hours.
なお、仮焼の前に成形体を昇降温速度10〜100”C
/hrで400 〜600 ’Cで1〜10時間保持し
、結合剤を飛散除去することが好ましい。ここで、本発
明の素体とは成形体または該成形体を前記条件で熱処理
した脱脂体、または仮焼体をいう。In addition, before calcination, the molded body is heated and cooled at a rate of 10 to 100"C.
It is preferable to hold at 400 to 600'C for 1 to 10 hours to remove the binder by scattering. Here, the element body of the present invention refers to a molded body, a degreased body obtained by heat-treating the molded body under the above-mentioned conditions, or a calcined body.
次に、素体の側面に側面高抵抗層を形成する。Next, a side high resistance layer is formed on the side surface of the element body.
本発明では、ビスマス化合物を旧go3に換算して7〜
20モル%、アンチモン化合物をSbzOzに換算して
2〜15モル%、非晶質シリカをSiO2に換算して6
5〜91モル%、亜鉛化合物をZnOに換算してZnO
/SiO.+ Sb.O*+BizOs ) =0.
1 〜1.0の所定量に有機結合剤としてエチルセルロ
ース、プチルカルビトール、酢酸nブチル等を加えた側
面高抵抗層用の混合物ペーストを、60〜300 ,l
/II1の厚さに素体の側面に塗布する。この際、本発
明では、平均粒径が10μ涌以下の非晶質シリカを使用
する。In the present invention, the bismuth compound is calculated from 7 to 7 in terms of old go3.
20 mol%, antimony compound 2 to 15 mol% in terms of SbzOz, amorphous silica 6 in terms of SiO2
5 to 91 mol%, ZnO based on zinc compound converted to ZnO
/SiO. + Sb. O*+BizOs) =0.
60 to 300 l of a mixture paste for the side high resistance layer, which is prepared by adding ethyl cellulose, butyl carbitol, n-butyl acetate, etc. as an organic binder to a predetermined amount of 1 to 1.0 l.
Apply to the side of the element to a thickness of /II1. At this time, in the present invention, amorphous silica having an average particle size of 10 μm or less is used.
次に、これを昇降温速度40〜60゜C/hr, 10
00〜1250゜C好ましくは1050〜1190゜C
,3〜7時間という条件で本焼成する。なお、ガラス粉
末に有機結合剤としてエチルセルロース、プチルカルビ
トール、酢酸nブチル等を加えたガラスペーストを前記
の側面高抵抗層上に100〜300μ■の厚さに塗布し
、空気中で昇降温速度100〜200″C/hr、40
0〜iooo゜C保持時間0.5〜2時間という条件で
熱処理することによりガラス層を形成すると好ましい。Next, this temperature was raised and lowered at a rate of 40 to 60°C/hr, 10
00-1250°C preferably 1050-1190°C
, 3 to 7 hours. A glass paste prepared by adding organic binders such as ethyl cellulose, butyl carbitol, n-butyl acetate, etc. to glass powder was applied to the above-mentioned side high-resistance layer to a thickness of 100 to 300 μ■, and the temperature was raised and lowered in the air at a rate of 100~200″C/hr, 40
It is preferable to form the glass layer by heat treatment at 0 to iooo°C for 0.5 to 2 hours.
その後、得られた電圧非直線抵抗体の両端面をSiC,
A j! !Ohダイヤモンド等の#400〜200
0相当?研磨剤により水好ましくは油を使用して研磨す
る。次に、研磨面を洗浄後、研磨した両端面に例えばア
ルミニウムによって電極を例えば溶射により設けて電圧
非直線抵抗体を得ている.以下、実際に本発明範囲内お
よび範囲外の電圧非直線抵抗体について各種特性を測定
した結果について説明する。After that, both end faces of the obtained voltage nonlinear resistor were bonded to SiC,
A j! ! #400-200 of Oh diamond etc.
Equivalent to 0? Polishing with an abrasive agent using water, preferably oil. Next, after cleaning the polished surfaces, electrodes made of aluminum, for example, are provided on both polished end surfaces by thermal spraying, to obtain a voltage nonlinear resistor. Below, the results of actually measuring various characteristics of voltage nonlinear resistors within and outside the range of the present invention will be described.
皇旌班
上述した方法で作成した直径47m、厚さ20amの電
圧非直線抵抗体において、側面高抵抗層用の混合物中の
組成の影響を調べるため、素子本体の組成はBlxOz
1.0 モ/l/%、Co=Q40.7 モ7L/%
、MnO.0.5モル%、Sb103 1.0 モル%
、Cr,Q,, o.s モ/L/%、NiO O.5
モル%、An!gos 0.005 モル%、非晶質
SiO■1.θモル%および残部がZnOとし、さらに
、銀を含むホウケイ酸ビスマスガラス0.01−0.5
重量%を含み、側面高抵抗層の組成はケイ素として非晶
質シリカを使用するとともに、第1表に示す組成を有し
、焼成温度を変えてバリスタ電圧を変化させた本発明範
囲内の試料No. l〜3oと、側面高抵抗層の組成の
うちいずれかの点で本発明の範囲を満たさない比較例の
試料Nal〜22を準備し、それぞれのバリスタ電圧(
■,.^)、雷サージ耐量、開閉サージ耐量、側面高抵
抗層の吸湿性を測定した.結果を第1表に示す。In order to investigate the influence of the composition of the mixture for the side high resistance layer in a voltage nonlinear resistor with a diameter of 47 m and a thickness of 20 am created by the method described above, the composition of the element body was BlxOz.
1.0 mo/l/%, Co=Q40.7 mo7L/%
, MnO. 0.5 mol%, Sb103 1.0 mol%
,Cr,Q,, o. s Mo/L/%, NiO O. 5
Mol%, An! gos 0.005 mol%, amorphous SiO■1. Bismuth borosilicate glass with θ mol% and the balance being ZnO and further containing silver 0.01-0.5
% by weight, the composition of the side high resistance layer uses amorphous silica as silicon, and has the composition shown in Table 1, and the varistor voltage is varied by changing the firing temperature. Samples within the scope of the present invention. No. Comparative samples Nal to 22, which do not satisfy the scope of the present invention in any aspect of the composition of the side high resistance layer, were prepared, and the respective varistor voltages (
■、.. ^), lightning surge withstand capacity, switching surge withstand capacity, and moisture absorption of the side high-resistance layer were measured. The results are shown in Table 1.
第1表において、雷サージ耐量はエネルギー耐量として
表示しており、ここにエネルギー耐量とはバリスタ電圧
の異なる抵抗体の耐量を相対的に評価する手段でありエ
ネルギー{1 (電流×電圧×印加時間)で示す.開閉
サージ耐量は400A, 500Aおよび600Aの電
流を2msの電流波形で20回繰り返し印加した後破壊
したものを×、破壊しなかったものをOと表示した.側
面高抵抗層の吸湿性については、素子を蛍光深傷液中に
圧力200kg/cm”の状態で24時間浸漬した後の
吸湿状態を検査し、側面高抵抗層に滲みのないものにつ
いてはO、滲みのあるものについては×と表示した。In Table 1, the lightning surge withstand capacity is expressed as the energy withstand capacity, and the energy withstand capacity is a means of relatively evaluating the withstand capacity of resistors with different varistor voltages, and is calculated by energy {1 (current x voltage x application time). ). The opening/closing surge withstand capacity is indicated as × for those that break down after 20 repeated applications of currents of 400 A, 500 A, and 600 A with a current waveform of 2 ms, and as O for those that do not break. Regarding the hygroscopicity of the side high-resistance layer, the device was immersed in fluorescent deep wound liquid for 24 hours at a pressure of 200 kg/cm. , those with blurring were indicated as ×.
第1表の結果から、高抵抗層の組成を本発明の範囲内と
した本発明試料No.1〜30の抵抗体は、高いバリス
タ電圧のものでも良好な電気特性を得ることができると
ともに、いずれかの点で本発明を満たさない比較例試料
Nα1〜22と比べて、雷サージ耐量等の良好な電気的
特性および側面高抵抗層の良好な耐湿性を示すことがわ
かった。From the results in Table 1, inventive sample No. 1 whose composition of the high resistance layer was within the range of the present invention. Resistors Nos. 1 to 30 can obtain good electrical characteristics even with high varistor voltage, and have better lightning surge resistance, etc., than comparative samples Nα1 to 22, which do not satisfy the present invention in any respect. It was found to exhibit good electrical properties and good moisture resistance of the side high resistance layer.
(発明の効果)
以上の説明から明らかなように、本発明の電圧非直線抵
抗体の製造方法によれば、高抵抗層中の組成を限定する
ことにより、良好な雷サージ耐量等の電気特性を高いバ
リスタ電圧においても得ることができるとともに、側面
高抵抗層中の吸湿性をも改善できる電圧非直線抵抗体を
得ることができる。(Effects of the Invention) As is clear from the above explanation, according to the method for manufacturing a voltage nonlinear resistor of the present invention, by limiting the composition in the high resistance layer, electrical properties such as good lightning surge resistance can be achieved. It is possible to obtain a voltage non-linear resistor which can obtain the same characteristics even at a high varistor voltage, and which can also improve the hygroscopicity in the side high resistance layer.
一9ー19-
Claims (1)
成分、ケイ素成分を含有する電圧非直線抵抗体素体の側
面に、少なくとも非晶質シリカ、アンチモン化合物、ビ
スマス化合物、亜鉛化合物を、非晶質シリカをSiO_
2に換算して65〜91モル%、アンチモン化合物をS
b_2O_3に換算して2〜15モル%、ビスマス化合
物をBi_2O_3に換算して7〜20モル%、亜鉛化
合物をZnOに換算してZnO/(SiO_2+Sb_
2O_3+Bi_2O_3)=0.1〜1.0となる組
成の絶縁被覆用の混合物を塗布し、焼成体の側面にケイ
酸亜鉛およびスピネルを含有する高抵抗層を形成するこ
とを特徴とする電圧非直線抵抗体の製造方法。1. At least amorphous silica, an antimony compound, a bismuth compound, a zinc compound, and amorphous silica are applied to the side surface of the voltage nonlinear resistor element body, which is mainly composed of zinc oxide and contains a bismuth component, an antimony component, and a silicon component. SiO_
65 to 91 mol% in terms of 2, antimony compound S
2 to 15 mol% in terms of b_2O_3, 7 to 20 mol% in terms of bismuth compounds as Bi_2O_3, and ZnO/(SiO_2+Sb_) in terms of zinc compounds as ZnO.
2O_3+Bi_2O_3)=0.1-1.0 A voltage non-linear method characterized by applying a mixture for insulation coating with a composition of 0.1 to 1.0 and forming a high-resistance layer containing zinc silicate and spinel on the side surface of the fired body. Method of manufacturing a resistor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1048450A JPH0812812B2 (en) | 1989-03-02 | 1989-03-02 | Method of manufacturing voltage non-linear resistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1048450A JPH0812812B2 (en) | 1989-03-02 | 1989-03-02 | Method of manufacturing voltage non-linear resistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02229402A true JPH02229402A (en) | 1990-09-12 |
JPH0812812B2 JPH0812812B2 (en) | 1996-02-07 |
Family
ID=12803685
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Application Number | Title | Priority Date | Filing Date |
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JP1048450A Expired - Lifetime JPH0812812B2 (en) | 1989-03-02 | 1989-03-02 | Method of manufacturing voltage non-linear resistor |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5249491A (en) * | 1975-10-16 | 1977-04-20 | Meidensha Electric Mfg Co Ltd | Non-linear resistor |
JPS59136902A (en) * | 1983-01-26 | 1984-08-06 | 松下電器産業株式会社 | Method of producing voltage nonlinear resistor |
-
1989
- 1989-03-02 JP JP1048450A patent/JPH0812812B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5249491A (en) * | 1975-10-16 | 1977-04-20 | Meidensha Electric Mfg Co Ltd | Non-linear resistor |
JPS59136902A (en) * | 1983-01-26 | 1984-08-06 | 松下電器産業株式会社 | Method of producing voltage nonlinear resistor |
Also Published As
Publication number | Publication date |
---|---|
JPH0812812B2 (en) | 1996-02-07 |
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