JPH02209473A - Film forming device - Google Patents

Abstract

PURPOSE:To form a film having a good adhesive property at a high film forming speed by providing a container for housing a material to be deposited by evaporation, a holder member for a substrate, a laser light irradiating means, a gas injecting means and an ion forming and accelerating means in a vacuum chamber. CONSTITUTION:Gas, such as N2, is injected from a cylinder 17 toward the inside surface of a window 14 for transmission of laser light 24 from the ejection hole on the inner peripheral surface of an annular gas ejecting member 15 and a glow discharge is generated between an electrode 19 and the holder member 3 to ionize the gas supplied into a vacuum chamber 1. The powdery material 23 to be deposited by evaporation in the container 4 is irradiated with the laser light 24 through the transmission window 14 to melt and evaporate the mateiral. The gas of the material 23 is sucked and deposited on the substrate 22 on the holder member 3 by the voltage gradient between the holder member 3 and the electrode 19. by which the film is formed. The gaseous N2 or the like is injected from the above-mentioned member 15 to the inside surface of the window 14, by which the deposition of the material 23 on the inside surface of the window 14 is suppressed and the deposition rate of the material 23 on the substrate 22 is maintained in a high state over a long period of time.

Description

[Detailed description of the invention] [Purpose of the invention] (Industrial application field) The present invention relates to a film forming apparatus.

(Prior Art) A conventional film forming apparatus includes a vacuum chamber, a container disposed within the chamber and containing a powdered vapor deposition material, and disposed facing above the container in the chamber, a holder member for holding a substrate on which a film is to be formed; and a holder member for melting and vaporizing the powdered deposition material in the container by irradiating laser light through a laser light transmission window provided on the wall of the chamber. There are known devices that are composed of a laser beam oscillator. According to such a film forming apparatus, a substrate or the like is held on the lower surface of the holder part shrine, and a laser beam is irradiated to the powdered vapor deposition material in the container through the transmission window to melt and vaporize the vapor deposition material on the substrate. It deposits a thin film.

However, there is a problem in that the thin film deposited on the substrate by the above-mentioned film forming apparatus has poor adhesion to the substrate. Further, when laser light is irradiated into the chamber through a transmission window provided in the wall of the vacuum chamber, the vaporized substance is also deposited on the inner surface of the transmission window, reducing the degree of transmission of the laser light. As a result, there is a problem in that the melting and vaporization of the vapor deposited material by the laser beam is inhibited, and as a result, the deposition rate of the vapor deposited material on the substrate surface is reduced.

(Problems to be Solved by the Invention) The present invention has been made to solve the above-mentioned conventional problems, and provides a film forming apparatus that can form a film with good adhesion to a substrate at a high film formation rate. This is what we are trying to provide.

[Configuration of the Invention (Means for Solving the Problems) The present invention includes a vacuum chamber, a container disposed within the chamber and containing a powdered vapor deposition material, and a vacuum chamber disposed within the chamber containing a powdered vapor deposition material. a holder member for holding a substrate, and a laser beam irradiation for melting and vaporizing the powdered vapor deposition material in the container by irradiating the powdered material in the container with a laser beam through a laser beam transmission window provided on the wall of the chamber. a gas injection means provided on the chamber wall near the transmission window for injecting gas toward the inner surface of the transmission window; and a gas injection means disposed within the chamber for causing melting and vaporization by irradiation with the laser beam. The film forming apparatus is characterized by comprising an ion generation/acceleration means for ionizing the evaporated substance between the holder member and the holder member, and accelerating the ion substance to the substrate on the holder member. .

(Function) According to the present invention, the deposition material melted and vaporized in the vacuum chamber by laser light irradiation is ionized in the space with the holder member, and the ionic material is accelerated to the substrate on the holder member. By arranging an ion generating/accelerating means for this purpose, the melted and vaporized deposition material can be formed with good adhesion to the substrate. Further, by providing a gas injection means on the chamber wall near the laser beam transmission window and injecting gas from the injection means toward the inner surface of the transmission window, the laser beam passes through the transmission window provided on the vacuum chamber wall. When irradiating the inside of the chamber, it is possible to suppress vaporized deposition substances from being deposited on the inner surface of the transmission window. As a result, it is possible to suppress a decrease in the degree of transmission of the laser light that is irradiated into the chamber through the transmission window, so that a film can be formed on the surface of the substrate at a high deposition rate.

(Example) Hereinafter, an example of the present invention will be described in detail with reference to the drawings.

1 in the figure is a vacuum chamber. A holder member 3 rotatably supported by a pipe-shaped rotating shaft 2 is arranged within this chamber. This holder member 3 has a built-in heater and cooling pipe (not shown). Further, a container 4 for accommodating a powdered vapor deposition material is fixed at the center of the holder member 3. Note that the container 4
When a vapor deposition substance having a high boiling point is housed in the container and a film is to be formed, a heat insulating layer is interposed between the holder member 3 and the container 4. The lower end of the rotating shaft 2 extends into a chamber 5 provided at the bottom of the chamber 1, and a bevel gear 6 is pivotally attached to a portion of the rotating shaft 2 within the chamber 5. A bevel gear 7 is meshed with the bevel gear 6, and a drive shaft 9 rotated by a motor 8 is rotatably attached to the bevel gear 7. Note that the holder member 3
A built-in heater (not shown) is connected to a heater power source 10 via a lead wire from the vacuum chamber 1 via the chamber 5, and a cooling pipe (not shown) built into the holder member 3 is connected to the heater power source 10 through a lead wire from the vacuum chamber 1 through the chamber 5. It is connected to the cooling system 11.

Further, 12 in the figure is an argon gas laser oscillator for emitting laser light, and a reflecting mirror 13 is arranged on the optical path of the laser light emitted from this oscillator 12. A laser transmission window 14 is provided in the upper wall of the chamber 1 on the optical path of the laser light reflected by the reflection mirror 13. An annular gas injection part hole 15 is disposed in the transmission window 14 provided in the wall of the chamber 1, and a gas injection hole is formed in the inner peripheral surface of the gas injection part hole 15. ing. One end of a gas supply pipe 16 is connected to the gas injection member work 5, and
, N2, etc. are connected to Nohonhe 17. A valve 18 is provided in the supply pipe 16 near the cylinder 17.

Further, an electrode 19 is suspended from support columns 20a and 20b near the upper part (=j) of the chamber 1.A DC voltage is applied to the electrode 19 to
A DC power source (not shown) is connected between the holder member 3 and the holder member 3 to cause glow discharge. An exhaust pipe 21 is connected to a wall near the bottom of the chamber 1, and a vacuum pump (not shown) is connected to the other end of the exhaust pipe 21.

Next, the operation of the film forming apparatus described above will be explained.

First, a plurality of substrates 22 are held on the holder member 3 away from the container 4 fixed on the member 3, and after accommodating the vapor deposition substance 23 in the container 4, a vacuum pump (not shown) is operated to create a vacuum. Unnecessary gases such as mainly air and water vapor in the chamber 1 are exhausted through the exhaust pipe 21, and the inside of the chamber 1 is brought to a predetermined degree of vacuum.

Next, the motor 8 is driven to rotate the bevel gear 6 meshed with the bevel gear 7 of the drive shaft 9, and the holder member 3 supported by the rotating shaft 2 to which the gear 6 is attached is rotated. Power is supplied from the power supply 10 to a heater (not shown) built in the holder member 3 to heat the substrate 22 on the member 3 to a desired temperature. At the same time, open the valve 18 and release Ar from the cylinder 17.
. Applying a voltage between the electrode 19 in the chamber 1 and the holder member 3 functioning as an electrode to cause glow discharge between the electrode 19 and the holder member 3;
The gas supplied into the chamber 1 is activated and ionized. In this state, the laser beam 24 emitted by the oscillation of the laser oscillator 12 is reflected by the reflection mirror 13 and passes through the transmission window 14 to the container 4 in the chamber 1.
The vapor deposition substance 23 contained therein is irradiated, melted, and vaporized. The gas of the vaporized vapor deposition substance is transferred to the holder member 3 and the electrode 1.
9 on the substrate 22 on the holder member 3 due to the voltage gradient between
is absorbed and deposited to form a film.

Therefore, according to the present invention, the vapor deposition material 23 is irradiated with the laser beam 24, melted, and vaporized, and a glow discharge is caused between the holder member 3 holding the substrate 22 and the electrode 19, so that the chamber 1 By activating and ionizing the gas supplied into the holder member 3, a vaporized deposition substance activated by ions can be deposited on the substrate 22 held by the holder member 3, so that it has excellent adhesion to the substrate 22. It is possible to form a film that is

Further, irradiation of the powdered vapor shield material 23 with the laser beam 24,
Transmission window 1 through which laser light 24 passes during melting and vaporization
By injecting gas from the gas injection part 15 onto the inner surface of the transmission window 14, it is possible to suppress the deposition of the vapor deposition material on the inner surface of the transmission window 14, and to reduce the decrease in the transmittance of the laser beam 24. Laser light with a predetermined output can be irradiated, and the rate of deposition of the vapor deposited substance onto the substrate 22 can be maintained at a high state for a long period of time. Further, a gas is supplied to the holder member 3 and the electrode 19 to suppress the deposition of the vapor deposition substance on the inner surface of the transmission window 14.
It is ionized during glow discharge during the process and can be used as a gas for activating the deposition material or as a reaction gas with the deposition material.

Due to the features of the film forming apparatus of the present invention described above, the following films can be formed at a high deposition rate.

(2) Mo powder was used as the powder vapor deposition material, DC voltage was applied to the electrodes at 1 to 2 kV, and the laser output (CW) was 800 W.
By performing laser irradiation as
It can be formed at a speed of in.

(2) By using AΩ powder as the powder vapor deposition material, applying a DC voltage of 1 to 2 kV to the electrode, oxygen gas as the gas supplied into the chamber, and laser output (CW) of 800 W, the glass on the holder member is or AJ on a stainless steel board.
7203 film can be formed at a rate of several 100 people/min.

(2) By applying T1 powder as the powdered vapor deposition material, applying a DC voltage of 1 to 2 kV to the electrode, nitrogen gas as the gas supplied into the chamber, and a laser output (CW) of 800 W, the glass on the holder member is heated. or Ti on a stainless steel substrate.
N films can be formed at a rate of several 100 people/1n.

(2) Applying a DC voltage of 1 to 2 kV to the YBCO-based superconducting material conductive material powder electrode as a powdered vapor deposition material.

The gases supplied into the chamber are oxygen gas and CO. By setting the laser output to LOW, MgO on the holder member
A YBCO-based oxygen-deficient perovskite superconducting film can be formed on a substrate.

In the above embodiment, when irradiating the vapor deposition material with laser light, the reflection mirror may be rotated at high speed to irradiate the entire surface of the vapor deposition material with the laser light.

Further, the film forming apparatus of the present invention is not limited to the structure shown in the above embodiment, but may have a structure shown in FIG. 2, for example. That is, in the film forming apparatus shown in FIG. 2, a container 4 containing a powdered vapor deposition material is fixed to a holding table 26 supported by a rotatable support rod 25 in a chamber 1, and a rotating shaft is installed in the chamber 1. A holder member 3 rotatably supported by a support member 2 is disposed parallel to a side wall of the chamber 1, and a support 19a is installed in the chamber 1 so that an electrode 19 is opposed to the holder member 3.
, 1.9b. According to the film forming apparatus having such a structure, the glow lightning between the holder member 3 and the electrode 19 is caused by the injection of gas from the gas injection part 15 onto the inner surface of the transmission window 14 and the application of high voltage to the electrode 19. By generating, irradiating, melting, and vaporizing the vapor deposition material 23 with the laser beam 24, a highly adhesive coating is deposited on the substrate 22 held by the holder member 3, as in the embodiment shown in FIG. It becomes possible to form at high speed.

Furthermore, as shown in FIG. 3, an ion beam generation source 27 as an ion generation/acceleration means is provided at the bottom of the vacuum chamber l, and a controller 28 and a gas cylinder 29 are connected to the ion generation source 27. You can also use it as

[Effects of the Invention] As described in detail below, according to the present invention, it is possible to provide a film forming apparatus capable of forming a film with good adhesion to a substrate at a high film forming rate.

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram of a film forming apparatus showing an embodiment of the present invention;
FIGS. 2 and 3 are schematic diagrams of film forming apparatuses showing other embodiments of the present invention. l... Vacuum chamber, 2... Rotating shaft, 3... Holder part shrine, 4... Container, 8... Motor, 10... Heater power supply, 12... Laser oscillator, 14... ... Transmission window, ■5... Gas injection member, 17... Cylinder, ]9.
...Electrode, 21...Exhaust pipe, 22...Substrate, 23.
... Powdered vapor deposition substance, 24... Laser light, 26... Holding stand, 2-ion source, 28... Controller. Applicant's agent Patent attorney Takehiko Suzue Figure 1

Claims (1)

[Claims] a vacuum chamber; a container disposed within the chamber and containing a powdered vapor deposition material; a holder member disposed within the chamber for holding a substrate on which a film is to be formed; a laser beam irradiation means for irradiating the powdered vapor deposition material in the container with a laser beam through the laser beam transmission window to melt and vaporize the substance; a gas injection means for injecting the gas toward the inner surface of the transmission window; and the holder member, which is arranged in the chamber and melts and vaporizes the vaporized substance by irradiation with the laser beam, and ionizes the vapor deposition substance between the gas injection means and the holder member. A film forming apparatus comprising ion generation/acceleration means for accelerating ionic substances to a substrate on a holder member.