JPH02201447A - Developer for photoresist, developing method with the developer, stamper formed with the developer, substrate and optical disk - Google Patents

Abstract

PURPOSE:To enhance the yield of development and to improve the performance of a stamper formed by development and that of a substrate or an optical disk by improving the wettability of the surface of a resist with a developer and enabling uniform development. CONSTITUTION:A substrate for an optical disk and the optical disk are formed with a stamper formed with a developer contg. an anionic surfactant and spreading on a resist coated surface to be developed within 0.1sec. When the stamper has a group part 1 and a center hole 2, the substrate has a part 3 to be transferred from the group part 1 and a center hole 4. Since the wettability of the surface of the resist with the developer is improved and uniform development is enabled, the yield of development is enhanced and the performance of the stamper formed by development and that of the substrate or the optical disk are improved.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a photoresist developer, a developing method using the developer, and a stamper, a substrate, and an optical disk made using the developer.

[Prior Art] Inorganic alkali or organic alkali has been used as a developer for conventional naphthoquinonediazide-based positive resists.

[Problems and Objects to be Solved by the Invention] However, in the prior art, the wettability between the developing solution and the resist surface is poor, so there is a problem that uneven development tends to occur and the yield tends to decrease.

The present invention is intended to solve such problems, and its purpose is to improve the wettability between the resist surface and the developer, enable uniform development, and improve the development yield. The goal is to improve the performance of stampers, substrates, and optical disks.

[Means for Solving the Problems] An uninvented photoresist developer, a developing method using the developer, a stamper, a substrate, and an optical disk made using the developer are made of a naphthoquinone diazide-based material that can be sensitized by light. In development using a positive type resist, a surfactant is added to the developer, the surfactant is an anionic surfactant, and the developer to which the surfactant is added coats the resist. 0. The present invention is characterized in that a substrate for an optical disc and an optical disc are created using a stamper created by spreading within one second.

In the present invention, an anionic surfactant is used as the surfactant that can be added to the developer, but the molecular weight of the surfactant is preferably 10,000 or less, and those with a molecular weight of 10,000 or more are soluble. The properties become worse and it becomes difficult to achieve uniform development. Since the developer is alkaline, it is necessary to use one that is stable even in alkaline solutions.

Further, in the present invention, the amount of surfactant added to the developer is suitably 1% to 0.0001% based on the developer. If it is more than 1%, it will affect the pH of the developer or accelerate deterioration of the developer, and if it is less than 0.0001%, the performance of the surfactant will not be exhibited and development will likely be incomplete.

Examples of anionic surfactants used in the present invention include sodium lauryl sulfate, triethanolamine lauryl sulfate, ammonium lauryl sulfate, sodium myristyl sulfate, sodium stearyl sulfate, sodium hydrogenated coconut oil fatty acid glyceryl sulfate, sodium lauryl ether sulfate, and lauryl ether sulfate. triethanolamine,
Ammonium lauryl ether sulfate, sodium alkyl ether sulfate, triethanolamine alkyl ether sulfate, sodium nonylphenyl ether sulfate, triethanolamine nonylphenyl ether sulfate, sodium cocoyl sarcosine, lauroyl sarcosine, sodium lauroyl sarcosine, lauroyl sarcocinnarium, sodium myristoyl sarcosine, Balmitoyl sarcosine sodium, oleoyl sarcosine,
Sodium lauroylmethylalanine, sodium N-cocoylmethyltaurate, sodium N-lauroylmethyltaurate, N-myristoylmethylta, sodium urin, sodium N-palmitoylmethyltaurate, sodium N-stearoylmethyltaurate, sodium alkyl ether acetate, di-2- Sodium ethylhexyl succinate, sodium lauryl sulfosuccinate, alpha
- Sodium olefin sulfonate.

Sodium lauryl phosphate, sodium polyoxyethylene lauryl ether phosphate, sodium oleyl phosphate, sodium diethylene alkyl ether phosphate.

Examples include one selected from di-polyoxyethylene nonyl phenyl ether phosphoric acid, lauryl phosphoric acid, polyoxyethylene lauryl ether phosphoric acid, etc., or a mixture of 2F1 or more.

[Example〕 The present invention will be explained in detail below based on the drawings.

FIG. 1 is a basic configuration diagram of a stamper produced using the developer and developing method of the present invention, where 1 is a group forming part and 2 is a center hole part of the stamper.

The manufacturing process of this stamper is as follows.

After coating one side of the glass master disk with resist, it is prebaked, laser cut, developed, processed to make it conductive, and then electroformed.

It was then separated from the glass master disk, carved inside and out, and made into a stamper. The components of the resist include a naphthoquinone diazide compound as a sensitizer, a novolak resin as a base, and a cellosolve-based organic solvent dissolved therein. The prebaking is performed by heating at 80° C. for 8 hours so that the resist applied to the glass master is uniformly heated. Laser cutting was performed using a HeCd laser. The development was carried out using the developer of the present invention, while rotating the glass master disk, so that the development spread over the entire area to be developed in 0.025 seconds from the center of one rotation. The developer used was Hoechst's AZ developer diluted 3 times with water and tooppm of 1 Nikko Chemicals' 0TP-10O8 (sodium di-2-ethylsulfosuccinate) added thereto.

The conductive treatment was performed by sputtering nickel onto the developed glass master disk.

After that, it was electroformed with two flasks, peeled off from the glass master disk, and processed to create the inner and outer diameters.

FIG. 2 is a basic configuration diagram of a substrate produced using the stamper according to the present invention. Reference numeral 3 indicates a transfer section of the group section of the stamper, and reference numeral 4 indicates a center hole section of the substrate.

FIG. 3 is a basic configuration diagram of an optical disc produced using the substrate according to the present invention. 5 and 12 are the substrates shown in FIG. 2, 6 and 13 are 5IAIN layers, and 7 and 14 are TbF.
The eCo recording layers 8 and 15 are 5IAIN layers, 9 and 16 are A1 layers, 10 is an adhesive layer, and 11 and 17 are hard coat layers.

Next, Table 1 shows the C/N kk,... and bit error rate of the optical disk shown in FIG. 3 and the optical disk prepared by the conventional method. As is clear from the results in Table 1, the optical disc according to the present invention has a high C/N and a low bit error rate.

It can be seen that it becomes a high-performance optical disc.

Table 1 BER; bit error rate The writing conditions in Table 1 are 1800 rpm.

4MHz, dut750%.

In addition, when we observed the appearance of stampers created using the developer of the present invention and those developed using the developer without adding a surfactant, we found that The stamper had a lot of uneven development, and there were steps and stain-like areas on the resist surface, but no such defects were found in the stamper made using the developer of the present invention. This tendency was observed in all stampers produced in this manner.

As described above, it can be seen that the stamper according to the present invention has a very beautiful appearance and is uniform.

Table 2 shows the time for the developer to spread in one minute after resist coating and the appearance of the stamper at that time.

Table 2 As is clear from the results in Table 2, in resist development, it is necessary for the developer to spread over the entire surface of the resist coat N within 0.1 seconds.2 The present invention is limited to these examples. This should not be construed as a modification, and various modifications may be made without departing from the spirit of the invention.

For example, in this embodiment, TbFe is used as the recording layer of the optical disc.
Although the Co layer is taken as an example, NdDyFeCo layer, Gd
In addition to magneto-optical recording layers such as DyFe layer, Te-TeOx,
Naturally, the present invention is also effective for systems using optical layer change types such as In5eTe and InTe5eSb, and organic dyes such as cyanine.

[Effects of the Invention] As described above, according to the present invention, the wettability between the resist surface and the developer is improved, uniform development is made possible, and the development yield is improved. Alternatively, it has the effect of improving the performance of the optical disc.

[Brief explanation of the drawing]

Figures 1 to 3 are basic configuration diagrams of the present invention.
The figure shows the stamper, and the second figure shows the board. FIG. 3 shows each optical disc. 1 ・ ・ 2 ・ ・ 3 ・ ・ 4 ・ ・ 5.1 6.1 7, 1 8, 1 9.1 10 ・ 1 1 Center hole of the partial stamper forming the group Center hole of the transfer partial substrate of the group Polycarbonate substrate 5IAIN protective layer TbFeCo recording layer 5IAIN protective layer A1 layer Adhesive layer Hard coat layer Applicant Seiko Epson Corporation Representative Patent Attorney Masayoshi Kamiyanagi (1 other person)! , 7) Sea 7"tfi slope L↑shi (ge 3, γ throat 7゛/I 凋; Ushiko i4T'6n゛Fig. 2

Claims (1)

[Claims] In development using a naphthoquinonediazide-based positive resist that can be sensitized by light, a surfactant is added to the developer, and the surfactant is an anionic surfactant, A substrate for an optical disc and an optical disc are created using a stamper created by spreading the developer containing the surfactant over the area to be developed on the resist-coated surface within 0.1 seconds. A photoresist developer, a developing method using the developer, a stamper, a substrate, and an optical disc made using the developer.