JPH02197579A - Pretreating agent for electroless plating of polyamide resin - Google Patents
Pretreating agent for electroless plating of polyamide resinInfo
- Publication number
- JPH02197579A JPH02197579A JP1680989A JP1680989A JPH02197579A JP H02197579 A JPH02197579 A JP H02197579A JP 1680989 A JP1680989 A JP 1680989A JP 1680989 A JP1680989 A JP 1680989A JP H02197579 A JPH02197579 A JP H02197579A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- soln
- plating
- formaldehyde
- electroless
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007772 electroless plating Methods 0.000 title claims abstract description 16
- 239000003795 chemical substances by application Substances 0.000 title claims description 22
- 229920006122 polyamide resin Polymers 0.000 title abstract description 15
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims abstract description 50
- 229920005989 resin Polymers 0.000 claims abstract description 16
- 239000011347 resin Substances 0.000 claims abstract description 16
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 claims abstract description 6
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000001263 FEMA 3042 Substances 0.000 claims abstract description 5
- LRBQNJMCXXYXIU-PPKXGCFTSA-N Penta-digallate-beta-D-glucose Natural products OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-PPKXGCFTSA-N 0.000 claims abstract description 5
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 claims abstract description 5
- 229940033123 tannic acid Drugs 0.000 claims abstract description 5
- 235000015523 tannic acid Nutrition 0.000 claims abstract description 5
- 229920002258 tannic acid Polymers 0.000 claims abstract description 5
- 150000001875 compounds Chemical class 0.000 claims description 14
- 239000004952 Polyamide Substances 0.000 claims description 6
- 229920002647 polyamide Polymers 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 4
- 238000007747 plating Methods 0.000 abstract description 24
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 16
- 229910052759 nickel Inorganic materials 0.000 abstract description 10
- 229920001778 nylon Polymers 0.000 abstract description 9
- 239000004677 Nylon Substances 0.000 abstract description 8
- 229910052802 copper Inorganic materials 0.000 abstract description 8
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 abstract description 4
- 229910021626 Tin(II) chloride Inorganic materials 0.000 abstract description 4
- 230000003197 catalytic effect Effects 0.000 abstract description 4
- 229910052737 gold Inorganic materials 0.000 abstract description 4
- 229910052709 silver Inorganic materials 0.000 abstract description 4
- 239000001119 stannous chloride Substances 0.000 abstract description 4
- 235000011150 stannous chloride Nutrition 0.000 abstract description 4
- 239000012190 activator Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- 150000002500 ions Chemical class 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract description 3
- 229910000510 noble metal Inorganic materials 0.000 abstract description 3
- 229910052763 palladium Inorganic materials 0.000 abstract description 3
- VXHYVVAUHMGCEX-UHFFFAOYSA-N 2-(2-hydroxyphenoxy)phenol Chemical compound OC1=CC=CC=C1OC1=CC=CC=C1O VXHYVVAUHMGCEX-UHFFFAOYSA-N 0.000 abstract description 2
- 230000004913 activation Effects 0.000 abstract description 2
- KYARBIJYVGJZLB-UHFFFAOYSA-N 7-amino-4-hydroxy-2-naphthalenesulfonic acid Chemical compound OC1=CC(S(O)(=O)=O)=CC2=CC(N)=CC=C21 KYARBIJYVGJZLB-UHFFFAOYSA-N 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 24
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- 239000000243 solution Substances 0.000 description 16
- 239000000835 fiber Substances 0.000 description 13
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 11
- 239000007788 liquid Substances 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 239000004480 active ingredient Substances 0.000 description 4
- -1 diphenyl compound Chemical class 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- 238000006277 sulfonation reaction Methods 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- ZMLDXWLZKKZVSS-UHFFFAOYSA-N palladium tin Chemical compound [Pd].[Sn] ZMLDXWLZKKZVSS-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- NZGQHKSLKRFZFL-UHFFFAOYSA-N 4-(4-hydroxyphenoxy)phenol Chemical compound C1=CC(O)=CC=C1OC1=CC=C(O)C=C1 NZGQHKSLKRFZFL-UHFFFAOYSA-N 0.000 description 1
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000276 potassium ferrocyanide Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 235000002639 sodium chloride Nutrition 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- XOGGUFAVLNCTRS-UHFFFAOYSA-N tetrapotassium;iron(2+);hexacyanide Chemical compound [K+].[K+].[K+].[K+].[Fe+2].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-] XOGGUFAVLNCTRS-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
Landscapes
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、ポリアミド系樹脂用無電解めっき前処理剤に
関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an electroless plating pretreatment agent for polyamide resins.
従来の技術及びその問題点
触媒活性を有しない被めっき物に、銅、ニッケル、コバ
ルトなどの無電解めっきをする為には、被めっき物に触
媒物質を付着させて、触媒活性を付与することが必要で
ある。このような方法としては、以下のようなものが知
られている。Conventional technology and its problems In order to perform electroless plating of copper, nickel, cobalt, etc. on an object to be plated that does not have catalytic activity, it is necessary to attach a catalytic substance to the object to impart catalytic activity. is necessary. The following methods are known as such methods.
(イ)被めっき物の表面を塩酸酸性塩化第一錫溶液から
なるセンシタイザ−液により感受性化し、続いて、パラ
ジウム、金、銀等の貴金属イオンを含有するアクチベー
ター液により活性化する方法。(a) A method in which the surface of the object to be plated is sensitized with a sensitizer solution consisting of an acidic hydrochloric acid solution of stannous chloride, and then activated with an activator solution containing noble metal ions such as palladium, gold, and silver.
(ロ)パラジウム−錫コロイド液であるキャタリスト液
に浸漬した後、アクセレレータ液により活性化する方法
。(b) A method of immersing in a catalyst liquid, which is a palladium-tin colloidal liquid, and then activating it with an accelerator liquid.
しかしながら、上記(イ)または(ロ)の活性化処理を
通常のポリアミド系樹脂に処理した後、無電解めっきを
行なってもめっき皮膜の密着性が悪く、実用には供し得
ない。そこで、ポリアミド系樹脂に無電解めっきを行な
う場合には、樹脂中に酸可溶性粒子を含有させて成形し
ためっきグレードの樹脂を用い、これを塩酸、硫酸等の
酸処理剤でエツチングして樹脂中の酸可溶性粒子を溶解
させて樹脂に穴を生じさせ、その後触媒物質を付着させ
てめっき処理を行なうことによって、いわゆる投錨効果
により、めっき皮膜の密着性を向上させている。However, even if electroless plating is performed after the above activation treatment (a) or (b) is applied to a normal polyamide resin, the adhesion of the plating film is poor and it cannot be put to practical use. Therefore, when performing electroless plating on polyamide resin, a plating-grade resin molded with acid-soluble particles contained in the resin is used, and this is etched with an acid treatment agent such as hydrochloric acid or sulfuric acid to form a plating layer in the resin. The adhesion of the plating film is improved by the so-called anchoring effect by dissolving the acid-soluble particles to form holes in the resin, then attaching a catalyst substance and performing the plating process.
しかしながら、酸可溶性粒子の入っていないめっきグレ
ード以外のポリアミド系樹脂については上記した方法で
は、めっき皮膜の密着性を向上させることはできない。However, for polyamide resins other than plating grade that do not contain acid-soluble particles, the adhesion of the plating film cannot be improved by the above method.
また、ポリアミド系繊維については、めっきグレードの
ものは市販されておらず、たとえあったとしても、酸に
よるエツチングでは、ポリアミド系繊維の脆化や収縮が
ひどく、繊維本来の風合いや強度を損なうという問題が
ある。また、塩酸や硫酸を用いてエツチングを行なう場
合には、pHが低いために、使用する器物にも制限を受
けるなどの問題がある。Furthermore, there are no plating-grade polyamide fibers on the market, and even if they were, acid etching would cause the polyamide fibers to become severely brittle and shrink, impairing the original texture and strength of the fibers. There's a problem. Furthermore, when etching is performed using hydrochloric acid or sulfuric acid, there are problems such as restrictions on the equipment that can be used due to the low pH.
問題点を解決するための手段
本発明者は、上記した如き従来技術の問題点に鑑みて、
鋭意研究を重ねた結果、特定のジフェニル化合物のホル
ムアルデヒド縮合物のスルホン化物、該ジフェニル化合
物とナフタリンスルホン酸とのホルムアルデヒド縮合物
又はそのスルホン化物、及びタンニン酸の少なくとも1
種を含有する水溶液を用いて無電解めっきの前処理を行
なう場合には、ポリアミド系樹脂上に密着性の良好な無
電解めっき皮膜を形成することが可能となることを見出
した。また、特に、上記前処理剤を用いて、ポリアミド
系繊維の前処理を行なう場合には、繊維の収縮、脆化等
をほとんど生ずることなく密着性の良好な無電解めっき
皮膜を形成することが可能となり、非常に有用性が高い
ものことを見出した。Means for Solving the Problems In view of the problems of the prior art as described above, the inventor of the present invention
As a result of extensive research, we have found that at least one of a sulfonated product of a formaldehyde condensate of a specific diphenyl compound, a formaldehyde condensate of the diphenyl compound and naphthalene sulfonic acid or a sulfonated product thereof, and tannic acid.
It has been found that when pretreatment for electroless plating is performed using an aqueous solution containing seeds, it is possible to form an electroless plating film with good adhesion on a polyamide resin. In addition, especially when pre-treating polyamide fibers using the above-mentioned pre-treatment agent, it is possible to form an electroless plating film with good adhesion without causing any shrinkage or embrittlement of the fibers. We have discovered that this is possible and extremely useful.
即ち、本発明は、
(i)一般式
(式中Xは、oSso2又は−C−を示す)H3
で表わされる化合物のホルムアルデヒド縮合物のスルホ
ン化物、
(11)上記一般式(I)の化合物とナフタリンスルホ
ン酸とのホルムアルデヒド縮合物又はそのスルホン化物
、及び
(iii)タンニン酸
の少なくとも1種を含有することを特徴とするポリアミ
ド系樹脂用無電解めっき前処理剤に係る。That is, the present invention provides: (i) a sulfonated formaldehyde condensate of a compound represented by the general formula H3 (wherein X represents oSso2 or -C-); (11) a compound of the above general formula (I); The present invention relates to an electroless plating pretreatment agent for polyamide resin, which contains at least one of a formaldehyde condensate with naphthalene sulfonic acid or a sulfonated product thereof, and (iii) tannic acid.
本発明前処理剤の適用対象であるポリアミド系樹脂とは
、アミド結合(−CONH−)をもつ高分子化合物であ
り、線状ポリアミド例えば、6−ナイロン、6,6−ナ
イロン、11−ナイロンなどを挙げることが出来るが、
その他、ボリアジン合成樹脂のような環状構造や複素環
をもつもの、或いはそれらを含む混合樹脂であってもよ
い。これらは成形品、フィルム等の状態でもよく、また
糸、編物、不織布等の繊維製品の状態でもよい。The polyamide resin to which the pretreatment agent of the present invention is applied is a polymer compound having an amide bond (-CONH-), and includes linear polyamides such as 6-nylon, 6,6-nylon, 11-nylon, etc. can be mentioned, but
In addition, resins having a cyclic structure or a heterocycle such as boriazine synthetic resin, or mixed resins containing these may also be used. These may be in the form of molded products, films, etc., or may be in the form of textile products such as threads, knitted fabrics, nonwoven fabrics, etc.
本発明で用いる無電解めっき用前処理剤は、(i)一般
式
(式中、Xは上記に同じ)で表わされる化合物のホルム
アルデヒド縮合物のスルホン化物、(ii)上記式(I
)の化合物とナフタリンスルホン酸とのホルムアルデヒ
ド縮合物又はそのスルホン化物、及び(iii)タンニ
ン酸の少なくとも1種を有効成分とするものである。上
記(i)〜(iii)の化合物は、各々単独、又は混合
して用いることができる。The pretreatment agent for electroless plating used in the present invention includes (i) a sulfonated formaldehyde condensate of a compound represented by the general formula (wherein,
The active ingredient is a formaldehyde condensate of the compound () and naphthalene sulfonic acid or a sulfonated product thereof, and (iii) tannic acid. The compounds (i) to (iii) above can be used alone or in combination.
本発明において用いる上記式(I)の化合物の具体例と
しては、2,2′−ジハイドロキシジフェニルエーテル
、2,4′ −ジハイドロキシジフェニルエーテル、4
,4′−ジハイドロキシジフェニルエーテル、2,2′
−ジハイドロキシジフェニルスルホン、2.4’ −ジ
ハイドロキシジフェニルスルホン、4.4’ −ジハイ
ドロキシジフェニルスルホン、2.2’ −イソプロピ
リデンジフェノール、2.4′−イソプロピリデンジフ
ェノール、4,4′−イソプロピリデンジフェノール等
を示すことができる。Specific examples of the compound of formula (I) used in the present invention include 2,2'-dihydroxydiphenyl ether, 2,4'-dihydroxydiphenyl ether, 4
, 4'-dihydroxydiphenyl ether, 2,2'
-dihydroxydiphenylsulfone, 2.4'-dihydroxydiphenylsulfone, 4.4'-dihydroxydiphenylsulfone, 2.2'-isopropylidenediphenol, 2.4'-isopropylidenediphenol, 4,4' -isopropylidene diphenol, etc.
上記(1)で示された一般式(1)の化合物のホルムア
ルデヒド縮合物のスルホン化物は、例えば、次のような
方法で得ることができる。即ち、式(I)の化合物1.
0モルに溶剤、例えば、無水酢酸を加え、90〜130
℃程度で、硫酸0.3〜8モル程度を用いて2時間程度
スルホン化する。次いで、75〜110℃程度でホルム
アルデヒド0.5〜3.0モル程度を3時間程度で滴下
し、縮合させた後、アルカリ、例えばアンモニア水、苛
性ソーダ等でpH2〜7程度に調整する。尚、スルホン
化は、ホルムアルデヒドでの縮合後に行なってもよい。The sulfonated formaldehyde condensate of the compound of general formula (1) shown in (1) above can be obtained, for example, by the following method. That is, compound 1 of formula (I).
Add a solvent, for example, acetic anhydride to 0 mol, and make 90-130
Sulfonation is carried out at a temperature of approximately 0.3 to 8 mol of sulfuric acid for approximately 2 hours. Next, about 0.5 to 3.0 mol of formaldehyde is added dropwise at about 75 to 110° C. over about 3 hours to cause condensation, and then the pH is adjusted to about 2 to 7 with an alkali such as aqueous ammonia or caustic soda. Incidentally, sulfonation may be performed after condensation with formaldehyde.
また上記(ii)で示された一般式(I)の化合物とナ
フタリンスルホン酸のホルムアルデヒド縮合物またはそ
のスルホン化物は、例えば、次のような方法で得ること
ができる。即ち、一般式(I)の化合物とβ−ナフタリ
ンスルホン酸の合計1.0モル(前者:後者(モル比)
−1:0.3〜1:5種度)を水に加え、必要に応じて
硫酸0.3〜6モル程度を用いて2時間程度スルホン化
し、次いで、75〜110℃程度でホルムアルデヒド0
.5〜3,0モル程度を3時間程度で滴下し、縮合させ
た後、アルカリ、例えばアンモニア水、苛性ソーダ等で
pH2〜7程度に調整する。Further, the formaldehyde condensate of the compound of general formula (I) and naphthalene sulfonic acid or the sulfonated product thereof shown in (ii) above can be obtained, for example, by the following method. That is, a total of 1.0 mol of the compound of general formula (I) and β-naphthalene sulfonic acid (former: latter (molar ratio)
-1:0.3 to 1:5 degree) to water, sulfonated using about 0.3 to 6 mol of sulfuric acid as necessary for about 2 hours, and then heated to about 75 to 110°C with no formaldehyde.
.. After about 5 to 3.0 mol is added dropwise over about 3 hours and condensed, the pH is adjusted to about 2 to 7 with an alkali such as aqueous ammonia or caustic soda.
尚、スルホン化は、ホルムアルデヒドでの縮合後に行な
ってもよい。Incidentally, sulfonation may be performed after condensation with formaldehyde.
上記(i)又は(ii)の化合物は、重量平均分子量1
000〜30000程度が好ましく、より好ましくは1
500〜15000程度である。また、炭素原子と硫黄
原子の重量比は、前者:後者=0.6:1〜25:1程
度が好ましく、より好ましくは1:1〜15:1種度で
ある。The compound (i) or (ii) above has a weight average molecular weight of 1
It is preferably about 000 to 30,000, more preferably about 1
It is about 500 to 15,000. The weight ratio of carbon atoms to sulfur atoms is preferably about 0.6:1 to 25:1, more preferably about 1:1 to 15:1.
本発明前処理剤は、通常上記した(i)、(ii)及び
(iii)の化合物の少なくとも1種を有効成分とする
水溶液として用いられる。水溶液中の有効成分の濃度は
、用いるポリアミド系樹脂の種類、形態等により、多少
異なるため限定的ではないが、通常は、0.01〜20
0g/ρ程度とすることが適当である。The pretreatment agent of the present invention is usually used as an aqueous solution containing at least one of the above-mentioned compounds (i), (ii), and (iii) as an active ingredient. The concentration of the active ingredient in the aqueous solution is not limited as it varies somewhat depending on the type and form of the polyamide resin used, but it is usually 0.01 to 20.
It is appropriate to set it to about 0 g/ρ.
処理対象のポリアミド系樹脂が、繊維状である場合には
、繊維重量に対する上記有効成分の使用重量%(oow
、f、)を0.1〜200%程度とすることが好ましく
、1〜100%程度とすることがより好ましい。o、w
、f、が0.1%を下回るとめっき物の密着性の向上が
充分ではなく、一方、200%を上回るとめっきが斑付
きとなるスキップ現象が生じ易くなるので好ましくない
。When the polyamide resin to be treated is in the form of fibers, the above-mentioned active ingredient is used in % by weight based on the weight of the fibers (oow
, f,) is preferably about 0.1 to 200%, more preferably about 1 to 100%. o, w
If , f is less than 0.1%, the adhesion of the plated material will not be improved sufficiently, while if it exceeds 200%, a skip phenomenon in which the plating becomes mottled tends to occur, which is not preferable.
浴比(被処理物に対する処理液の重量比)は1:20〜
1 : 1000程度とすることが適当であり、1 :
100〜1 : 500程度とすることが好ましい。Bath ratio (weight ratio of treatment liquid to object to be treated) is 1:20~
It is appropriate to set it to about 1:1000, and 1:
100-1: It is preferable to set it as about 500.
本発明前処理剤を用いる処理方法は、特に限定はなく、
通常の浸漬法、パッディング法、塗布法、スプレー法等
で処理すればよい。前処理剤水溶液はpH2〜7程程度
、好ましくはpH2〜7程度とすることが適当である。The treatment method using the pretreatment agent of the present invention is not particularly limited,
The treatment may be carried out by a conventional dipping method, padding method, coating method, spraying method, etc. It is appropriate that the pretreatment agent aqueous solution has a pH of about 2 to 7, preferably about 2 to 7.
浸漬法による前処理は、例えば、処理温度40〜130
℃程度、好ましくは80〜110℃程度で、前処理剤水
溶液中に1〜120分間程度、好ましくは10〜40分
間程度浸漬することにより行なうことができる。処理温
度が40℃より低い場合には、前処理剤がポリアミド系
樹脂に充分に吸着されず、めっき物の密着性の向上が充
分ではないので好ましくない。Pretreatment by the immersion method is performed at a treatment temperature of 40 to 130℃, for example.
This can be carried out by immersing it in an aqueous pretreatment agent solution at a temperature of about 80 to 110 degrees Celsius for about 1 to 120 minutes, preferably about 10 to 40 minutes. If the treatment temperature is lower than 40° C., the pretreatment agent will not be sufficiently adsorbed to the polyamide resin, and the adhesion of the plated object will not be sufficiently improved, which is not preferable.
パッディング法の一例としては、前処理剤水溶液で10
〜40℃程度でパッド後、マングルを用いて、樹脂に対
する付着液量が30〜200重量%程度となるように絞
ったのち乾燥し、100〜200℃程度で30秒〜60
分間程度乾熱処理又はスチーム処理を行なう方法を示す
ことができる。As an example of a padding method, a pretreatment agent aqueous solution is used to
After padding at ~40°C, squeeze using a mangle so that the amount of liquid attached to the resin is around 30-200% by weight, dry, and dry at around 100-200°C for 30 seconds to 60%.
A method of performing dry heat treatment or steam treatment for about a minute can be shown.
スチーム処理方法としては、通常の常圧スチーム、高圧
スチーム(HP) 、常温過熱蒸気を用いる高温スチー
ム(HT)等を用いる方法を適用できる。As the steam treatment method, methods using ordinary pressure steam, high pressure steam (HP), high temperature steam (HT) using normal temperature superheated steam, etc. can be applied.
塗布法又はスプレー法により処理する場合には、パッデ
ィング法と同様に、処理後100〜200℃程度で30
秒〜60分間程度乾燥処理又はスチーム処理を行なうこ
とが好ましい。When processing by a coating method or a spray method, as in the padding method, the temperature is 30°C at about 100 to 200℃ after treatment.
It is preferable to perform a drying process or a steam process for about seconds to 60 minutes.
上記した方法によってポリアミド系樹脂に前処理を施す
ことにより、前処理剤が樹脂に均一に吸着される。その
後、常法に従って触媒を付与した後、無電解めっき液に
浸漬することによって、密着性のよいめっき皮膜を形成
することができる。By pretreating the polyamide resin by the method described above, the pretreatment agent is uniformly adsorbed onto the resin. After that, a catalyst is applied according to a conventional method, and then the plate is immersed in an electroless plating solution, thereby forming a plated film with good adhesion.
触媒付与工程については、常法に従えばよ(、例えば以
下の方法により行なうことができる。The catalyst application step can be carried out according to a conventional method (for example, it can be carried out by the following method.
(イ)被めっき物の表面を塩酸酸性塩化第一錫溶液から
なるセンシタイザ−液により感受性化し、続いて、パラ
ジウム、金、銀等の貴金属イオンを含有するアクチベー
ター液により活性化する。(a) The surface of the object to be plated is sensitized with a sensitizer solution consisting of an acidic hydrochloric acid solution of stannous chloride, and then activated with an activator solution containing noble metal ions such as palladium, gold, and silver.
(ロ)パラジウム−錫コロイド液であるキャタリスト液
に浸漬した後、アクセレレータ液により活性化する。(b) After being immersed in a catalyst liquid, which is a palladium-tin colloidal liquid, it is activated with an accelerator liquid.
無電解めっき処理は、各種の公知の無電解めっき液を用
いて常法に従って行なえばよい。無電解めっき可能な金
属としては、銅、ニッケル、コバルト、銀、白金、金及
びこれらの合金などを例示することができる。The electroless plating treatment may be carried out according to a conventional method using various known electroless plating solutions. Examples of metals that can be electrolessly plated include copper, nickel, cobalt, silver, platinum, gold, and alloys thereof.
発明の効果
本発明前処理剤を用いることにより、従来、めっき皮膜
の密着性の悪かったポリアミド系樹脂に対して、特殊な
めっきグレードの樹脂を用いることなく、容易に密着性
のよいめっき皮膜を形成することができる。特に、ポリ
アミド系繊維に対して適用する場合には、繊維の収縮、
脆化等を生じることなく密着性のよいめっき皮膜を形成
することが可能となるので、極めて高い有用性がある。Effects of the Invention By using the pretreatment agent of the present invention, it is possible to easily form a plating film with good adhesion to polyamide resins, which conventionally had poor adhesion, without using special plating grade resins. can be formed. In particular, when applied to polyamide fibers, shrinkage of the fibers,
Since it is possible to form a plating film with good adhesion without causing embrittlement, it is extremely useful.
また、塩酸や硫酸を用いる前処理法と比べて、前処理剤
のpHが高いので、装置材料の使用範囲が広くなる点に
おいても有利である。Furthermore, compared to pretreatment methods using hydrochloric acid or sulfuric acid, since the pH of the pretreatment agent is higher, this method is advantageous in that the range of use of equipment materials can be expanded.
実施例 以下、実施例を示して本発明を更に詳細に説明する。Example Hereinafter, the present invention will be explained in more detail by showing examples.
実施例1
6−ナイロンタフタ布1010X10を第1表に示す前
処理剤中に、浴比1 : 100で浸漬した後、100
℃で乾燥した。次いで塩化第一錫16g/Ω、塩化パラ
ジウム0.2g/ρ、塩酸15g/Ω、食塩1!50g
/flからなるキャタリスト処理液に25℃で5分間浸
漬後、水洗し、続いて濃硫酸100m1:’/j2から
なるアクセレレーター液に25℃で2分間浸漬後、水洗
、乾燥した。Example 1 A 6-nylon taffeta cloth 1010×10 was soaked in the pretreatment agent shown in Table 1 at a bath ratio of 1:100, and then 100×10
Dry at °C. Next, stannous chloride 16g/Ω, palladium chloride 0.2g/ρ, hydrochloric acid 15g/Ω, and common salt 1.50g
/fl for 5 minutes at 25°C, followed by washing with water, followed by immersion in an accelerator solution of 100 ml of concentrated sulfuric acid at 25°C for 2 minutes, washing with water, and drying.
つぎに塩化ニッケル2 g / !2 、クエン酸ナト
リウム30g/A、次亜燐酸ナトリウム15g/ρ、塩
化アンモニウム30g/ρ及びアンモニア水15aQ#
からなる無電解ニッケルめっき液を用いて、めっき液中
に40℃で5分間浸漬後、水洗、乾燥した。Next, 2 g/! of nickel chloride! 2. Sodium citrate 30g/A, sodium hypophosphite 15g/ρ, ammonium chloride 30g/ρ and aqueous ammonia 15aQ#
Using an electroless nickel plating solution consisting of the following, it was immersed in the plating solution at 40° C. for 5 minutes, washed with water, and dried.
上記方法で得られた各試料について、ニッケル付着率、
表面抵抗値、繊維収縮率、密着性を測定した結果を第2
表に示す。試験方法は次の通りである。For each sample obtained by the above method, the nickel deposition rate,
The results of measuring the surface resistance value, fiber shrinkage rate, and adhesion are
Shown in the table. The test method is as follows.
Oニッケル付着率(%): ニッケルめっき後の重量増加率を求めた。O nickel adhesion rate (%): The weight increase rate after nickel plating was determined.
0表面抵抗値(Ω):
三菱油化■製 表面抵抗計(L aresta)を用い
て測定した。0 Surface resistance value (Ω): Measured using a surface resistance meter (Laresta) manufactured by Mitsubishi Yuka ■.
0繊維収縮率(%): 前処理液浸漬前後の面積減量率(%)で表わした。0 Fiber shrinkage rate (%): It was expressed as the area loss rate (%) before and after immersion in the pretreatment liquid.
0密着性:
両面テープをめっき布の上に貼った後、スガ試験機械■
製 摩擦試験機で10回こすり、両面テープをはがし・
て剥離具合を調べた。0 Adhesion: After pasting the double-sided tape on the plating cloth, use the Suga Test Machine■
Rub it 10 times with a manufactured friction tester, peel off the double-sided tape, and
The degree of peeling was examined.
×・・・・・・全面剥離、Δ・・・・・・一部剥離、O
・・・・・・良好以上の結果から、本発明前処理剤を用
いることによって、ナイロン繊維の収縮がほとんど生じ
ることなく、該繊維上に密着性の良好なニッケルめっき
皮膜を形成できることがわかる。×・・・Full peeling, Δ・・・Partial peeling, O
...The results of better or better indicate that by using the pretreatment agent of the present invention, a nickel plating film with good adhesion can be formed on the nylon fibers with almost no shrinkage of the fibers.
実施例2
6.6−ナイロンタフタ布10X10cdを第3表に示
す前処理液(浴比1:100)中で、それぞれ100℃
で20分間浸漬した後、100℃で乾燥した。つぎに実
施例1と同じキャタリスト処理液に30℃で10分間浸
漬後、水洗し、続いて濃塩酸100mQ/J2からなる
アクセレレーター液に25℃で2分間浸漬後、水洗、乾
燥した。Example 2 10×10 cd of 6.6-nylon taffeta cloth were heated at 100°C in the pretreatment solution shown in Table 3 (bath ratio 1:100), respectively.
After being immersed in water for 20 minutes, it was dried at 100°C. Next, it was immersed in the same catalyst treatment solution as in Example 1 at 30° C. for 10 minutes, washed with water, then immersed in an accelerator solution consisting of 100 mQ/J2 of concentrated hydrochloric acid at 25° C. for 2 minutes, washed with water, and dried.
次に硫酸銅8g/Ω、ホルマリン8−/Ω、EDTA2
5g/Ω、苛性ソーダ10g/A及びフェロシアン化カ
リウム1 g / Aからなる無電解銅めっき液に50
℃で20分間浸漬後、水洗、乾燥した。Next, copper sulfate 8g/Ω, formalin 8−/Ω, EDTA2
5 g/Ω, caustic soda 10 g/A and potassium ferrocyanide 1 g/A in an electroless copper plating solution.
After immersing at ℃ for 20 minutes, it was washed with water and dried.
上記方法で得られた各試料について、銅付着率、表面抵
抗値、繊維収縮率、密着性を測定した結果を下記第4表
に示す。尚、比較として、前処理液中に浸漬することな
く、その他は上記方法と同様にして無電解銅めっきを施
した試料(比較界6)についての測定結果もあわせて示
す。The copper adhesion rate, surface resistance value, fiber shrinkage rate, and adhesion of each sample obtained by the above method were measured and the results are shown in Table 4 below. For comparison, the measurement results for a sample (Comparison Field 6) which was subjected to electroless copper plating in the same manner as the above method without being immersed in the pretreatment liquid are also shown.
第 4 表
以上の結果から判るように、本発明前処理剤を用いて無
電解銅めっきの前処理を行なうことによって、密着性の
良好な銅めっき皮膜が形成される。As can be seen from the results in Table 4, a copper plating film with good adhesion can be formed by performing a pretreatment for electroless copper plating using the pretreatment agent of the present invention.
実施例3
ナイロン樹脂成形品について、前処理剤として4.4′
−ジハイドロキシジフェニルスルホンスルホン酸ホルム
アルデヒド縮合物(分子量1500、C: S−2,9
: 1) 0.3g/!2水溶液を用いて、実施例1と
同様の方法で無電解ニッケルめっきを行なった。その結
果、該ナイロン樹脂成形品上に、密着性の良好なニッケ
ルめっき皮膜が形成された。これに対して、上記前処理
剤水溶液に浸漬することなく触媒付与及び無電解めっき
を行なって得られる試料では、めっき皮膜の密着性は不
充分であった。Example 3 4.4' as a pretreatment agent for nylon resin molded products
-Dihydroxydiphenylsulfonesulfonic acid formaldehyde condensate (molecular weight 1500, C: S-2,9
: 1) 0.3g/! Electroless nickel plating was performed in the same manner as in Example 1 using 2 aqueous solution. As a result, a nickel plating film with good adhesion was formed on the nylon resin molded product. On the other hand, the adhesion of the plating film was insufficient in the sample obtained by applying the catalyst and performing electroless plating without immersing the sample in the aqueous solution of the pretreatment agent.
(以 上)(that's all)
Claims (1)
あります▼を示す)で表わされる化合物のホルムアルデ
ヒド縮合物のスルホン化物、 (ii)上記一般式( I )の化合物とナフタリンスル
ホン酸とのホルムアルデヒド縮合物又はそのスルホン化
物、及び (iii)タンニン酸 の少なくとも1種を含有することを特徴とするポリアミ
ド系樹脂用無電解めっき前処理剤。(1) (i) Formaldehyde of a compound represented by the general formula ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (I) (In the formula, X represents O, SO_2 or ▲There are mathematical formulas, chemical formulas, tables, etc.▼) A polyamide characterized by containing at least one of a sulfonated product of a condensate, (ii) a formaldehyde condensate of the compound of general formula (I) and naphthalene sulfonic acid or a sulfonated product thereof, and (iii) tannic acid. Electroless plating pretreatment agent for resins.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1680989A JPH02197579A (en) | 1989-01-25 | 1989-01-25 | Pretreating agent for electroless plating of polyamide resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1680989A JPH02197579A (en) | 1989-01-25 | 1989-01-25 | Pretreating agent for electroless plating of polyamide resin |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02197579A true JPH02197579A (en) | 1990-08-06 |
Family
ID=11926483
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1680989A Pending JPH02197579A (en) | 1989-01-25 | 1989-01-25 | Pretreating agent for electroless plating of polyamide resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02197579A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2266318A (en) * | 1992-04-20 | 1993-10-27 | Dipsol Chem | Electroless plating solution containing thiodiglycolic acid and arylsulphonic acid condensate with formalin |
US5738688A (en) * | 1994-02-02 | 1998-04-14 | N. V. Denderland-Martin | Process to improve resistance to stains on fibres and derived products |
JP2003105552A (en) * | 2001-09-28 | 2003-04-09 | Seiren Co Ltd | Pretreatment method for electroless plating and conductive material formed by using the same |
JP2020002450A (en) * | 2018-06-30 | 2020-01-09 | 名古屋メッキ工業株式会社 | Method for plating fiber |
US11440623B2 (en) | 2017-11-06 | 2022-09-13 | Hempel A/S | Method for improving a fluid dynamic profile of a marine vessel, a marine vessel having an improved fluid dynamic profile, and a coating system for improving the fluid dynamic profile |
-
1989
- 1989-01-25 JP JP1680989A patent/JPH02197579A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2266318A (en) * | 1992-04-20 | 1993-10-27 | Dipsol Chem | Electroless plating solution containing thiodiglycolic acid and arylsulphonic acid condensate with formalin |
GB2266318B (en) * | 1992-04-20 | 1995-09-13 | Dipsol Chem | Electroless plating solution and plating method |
US5738688A (en) * | 1994-02-02 | 1998-04-14 | N. V. Denderland-Martin | Process to improve resistance to stains on fibres and derived products |
JP2003105552A (en) * | 2001-09-28 | 2003-04-09 | Seiren Co Ltd | Pretreatment method for electroless plating and conductive material formed by using the same |
US11440623B2 (en) | 2017-11-06 | 2022-09-13 | Hempel A/S | Method for improving a fluid dynamic profile of a marine vessel, a marine vessel having an improved fluid dynamic profile, and a coating system for improving the fluid dynamic profile |
JP2020002450A (en) * | 2018-06-30 | 2020-01-09 | 名古屋メッキ工業株式会社 | Method for plating fiber |
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