JPH02195538A - Component for optical information recording, reproducing and erasing - Google Patents
Component for optical information recording, reproducing and erasingInfo
- Publication number
- JPH02195538A JPH02195538A JP1013814A JP1381489A JPH02195538A JP H02195538 A JPH02195538 A JP H02195538A JP 1013814 A JP1013814 A JP 1013814A JP 1381489 A JP1381489 A JP 1381489A JP H02195538 A JPH02195538 A JP H02195538A
- Authority
- JP
- Japan
- Prior art keywords
- recording
- heat
- thin film
- mark
- resistant layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 10
- 239000010409 thin film Substances 0.000 claims abstract description 39
- 239000010408 film Substances 0.000 claims abstract description 18
- 238000002844 melting Methods 0.000 claims abstract description 18
- 230000008018 melting Effects 0.000 claims abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 11
- 238000010438 heat treatment Methods 0.000 claims abstract description 10
- 238000001816 cooling Methods 0.000 claims abstract description 6
- 239000003989 dielectric material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 6
- 230000006866 deterioration Effects 0.000 abstract description 3
- 230000001678 irradiating effect Effects 0.000 abstract description 3
- 239000000155 melt Substances 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000000758 substrate Substances 0.000 description 4
- 229910052681 coesite Inorganic materials 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 229910052682 stishovite Inorganic materials 0.000 description 3
- 229910052905 tridymite Inorganic materials 0.000 description 3
- 229910052798 chalcogen Inorganic materials 0.000 description 2
- 150000001787 chalcogens Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910021478 group 5 element Inorganic materials 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229910017000 As2Se3 Inorganic materials 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 229910003069 TeO2 Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052958 orpiment Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000000638 stimulation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- LAJZODKXOMJMPK-UHFFFAOYSA-N tellurium dioxide Chemical compound O=[Te]=O LAJZODKXOMJMPK-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明はレーザービーム等により、情報を高密度、大容
量で記録再生、及び消去できる光学情報記録再生消去部
材に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an optical information recording/reproducing/erasing member capable of recording, reproducing, and erasing information with high density and large capacity using a laser beam or the like.
従来の技術
光デイスクメモリに関しては、TeとTeO2を主成分
とするTeOx (0<x< 2.0)薄膜を用いた追
記型のディスクがある。さらに、レーザ光により薄膜を
加熱し、溶融し、急、冷することにより、非晶質化し情
報を記録しまたこれを加熱し、徐冷することにより結晶
化し、消去することができる材料としては、S、RoO
vshinsky(ニス・アール・オプシンスキー)氏
等のカルコゲン材料Ge 15Te81Sb2S2等が
知られている。また、As2S3やAs2Se3あるい
は5b2Sea等カルコゲン元素と周期律表第V族ある
いはGe等の第V族元素等の組み合せからなる薄膜等が
広く知られている。これらの薄膜にレーザ光で情報を記
録し、その情報を消去する方法としてはあらかじめ薄膜
を結晶化させておき、これに2Φ1μmに絞ったレーザ
光を情報に対応させて強度変調を施し、例えば、円盤状
の記録ディスクを回転せしめて照射し、このレーザ光照
射部位は、薄膜の融点以上に昇温し、かつ急冷し、非晶
質化したマークとして情報の記録がおこなえる。この情
報を消去するに際してはディスクの回転トラック方向に
長いスポット光を照射することにより、薄膜を加熱昇温
させ、長いスポット光による徐冷効果によって再び結晶
化させる方法が知られている。Regarding conventional optical disk memories, there is a write-once type disk using a TeOx (0<x<2.0) thin film containing Te and TeO2 as main components. Furthermore, by heating a thin film with a laser beam, melting it, and rapidly cooling it, it becomes amorphous and records information, and by heating and slowly cooling it, it crystallizes and erases it. ,S.RoO
Chalcogen materials such as Ge 15Te81Sb2S2 by Nis R. Opshinsky et al. are known. Furthermore, thin films made of a combination of a chalcogen element such as As2S3, As2Se3, or 5b2Sea and a group V element of the periodic table or a group V element such as Ge are widely known. In order to record information on these thin films with laser light and erase the information, the thin film is crystallized in advance, and a laser light focused on 2Φ1 μm is intensity-modulated in accordance with the information.For example, A disc-shaped recording disk is rotated and irradiated, and the area irradiated with the laser beam is heated to a temperature higher than the melting point of the thin film and rapidly cooled, so that information can be recorded as an amorphous mark. A known method for erasing this information is to irradiate a long spot light in the direction of the rotating track of the disk to heat the thin film to raise its temperature, and then crystallize it again by the slow cooling effect of the long spot light.
発明が解決しようとする課題
薄膜を加熱昇温し、溶融急冷非晶質化および加熱昇温結
晶化の手段を用いる情報記録および消去可能な記録媒体
における第一の課題は加熱サイクルに対応して信号品質
が変動することである。この変動要因としては、記録ス
ポット光および消去スポット光による400°C以上の
急速な加熱、冷却の多数回のくりかえし刺激による基板
材質の熱的、機械的なti傷がある。さらに、記録薄膜
の熱的、機械的な損傷がある。記録薄膜については、融
点以上の加熱において、溶融による体積膨張および、そ
の構成元素によっては、薄膜構成材料の蒸気圧が上昇し
、構成成分の蒸発により、組成、成分の移動による膜厚
変化が発生する場合もある。同時に、記録薄膜の上面と
下面の耐熱層が昇温し、非対称に膨張し、記録薄膜物質
の移動を助長する。Problems to be Solved by the Invention The first problem with information recording and erasable recording media that uses means of heating a thin film to raise its temperature, melting and quenching it into an amorphous state, and heating and heating it to crystallize it, is to solve the following problem: The signal quality fluctuates. The cause of this variation is thermal and mechanical scratches on the substrate material due to repeated stimulation of rapid heating and cooling of 400° C. or more by the recording spot light and the erasing spot light. Furthermore, there is thermal and mechanical damage to the recording thin film. For recording thin films, when heated above their melting point, the volume expands due to melting, and depending on the constituent elements, the vapor pressure of the thin film's constituent materials increases, and the composition and film thickness change due to the movement of constituents due to evaporation. In some cases. At the same time, the heat-resistant layers on the upper and lower surfaces of the recording thin film rise in temperature and expand asymmetrically, facilitating the movement of the recording thin film material.
基板あるいは記録膜が以上のような変化を生じた場合、
記録再生、消去のサイクルにおいて、ノイズの増大を生
じ、サイクル特性の劣化が発生するという課題があった
。If the substrate or recording film undergoes any of the above changes,
In the recording/reproducing/erasing cycle, there is a problem in that noise increases and cycle characteristics deteriorate.
本発明の目的はサイクル特性の安定な部材を提供するこ
とである。An object of the present invention is to provide a member with stable cycle characteristics.
課題を解決するための手段
本発明は、レーザ光等の照射により熱的に薄膜の状態を
変化させて情報を記録および消去する部材において、下
面の耐熱層と記録薄膜層と、上面の耐熱層からなる構゛
成で、レーザ光による溶融マーク形成時に、耐熱層のマ
ークの前部と後部の熱膨張量を対称する構成を選ぶこと
を特徴とする光学情報記録再生消去部材を提供するもの
である。Means for Solving the Problems The present invention provides a member for recording and erasing information by thermally changing the state of a thin film through irradiation with laser light or the like, which includes a heat-resistant layer and a recording thin film layer on the bottom surface, and a heat-resistant layer on the top surface. The present invention provides an optical information recording/reproducing/erasing member which has a structure in which the amount of thermal expansion of the front and rear parts of the mark on the heat-resistant layer is symmetrical when the melted mark is formed by a laser beam. be.
作用
Teを含む非晶質膜は、その融点は代表的なもので40
0”Cから900’Cと広い温度範囲にある。これらの
膜にレーザ光を照射し、昇温徐冷することにより結晶化
が行える。この温度は、−船釣に融点より低い結晶化温
度領域である。また、この結晶化した膜に高いパワーレ
ベルのレーザ光をあて、その融点以上に加熱すると、そ
の部分は溶融し急冷し、再び非晶質化し、マークが形成
できる。この時、まず記録薄膜が昇温し、溶融膨張する
とともに、記録薄膜層が熱源となって上面および、下面
の耐熱層を加熱する。この耐熱層の膨張量がマークの前
部と後部で非対称な場合、その体積差に相当する記録薄
膜物質の移動が発生する。耐熱層の膨張量を小さくする
とともに、前部と後部の膨張を対称にし、膨張量の差を
な(すように構成および、加熱方法を選ぶことにより、
記録薄膜物質移動による記録部材の劣化を阻止すること
が出来る。The melting point of an amorphous film containing active Te is typically 40
It has a wide temperature range from 0"C to 900'C. Crystallization can be achieved by irradiating these films with laser light and gradually increasing the temperature. This temperature is - crystallization temperature lower than the melting point of boat fishing. In addition, when this crystallized film is irradiated with a high-power laser beam and heated above its melting point, that part melts, rapidly cools, becomes amorphous again, and a mark can be formed.At this time, First, the temperature of the recording thin film rises and it melts and expands, and the recording thin film layer becomes a heat source and heats the heat-resistant layers on the upper and lower surfaces.If the amount of expansion of this heat-resistant layer is asymmetric between the front and rear parts of the mark, A movement of the recording thin film material occurs corresponding to the volume difference.The amount of expansion of the heat-resistant layer is reduced, the expansion of the front and rear parts is symmetrical, and the heating method is configured so as to make a difference in the amount of expansion. By choosing
Deterioration of the recording member due to transfer of recording thin film substances can be prevented.
実施例
以下本発明の一実施例について、図面を用いて詳細に説
明する。EXAMPLE Hereinafter, an example of the present invention will be described in detail with reference to the drawings.
実施例1
記録層である薄膜を形成する基板としては、あらかじめ
、レーザ光案内用の溝あるいは、ピット列を形成したポ
リカーボネイト等の樹脂基板あるいは、ガラス板を用い
る。この表面にあらかじめ耐熱性のすぐれたZnSある
いはSiO2等の第一の無機誘電体層を形成しておく。Example 1 As a substrate on which a thin film serving as a recording layer is formed, a resin substrate made of polycarbonate or the like, or a glass plate, on which grooves or pit rows for guiding laser light are formed in advance is used. A first inorganic dielectric layer of ZnS, SiO2 or the like having excellent heat resistance is formed on this surface in advance.
この誘電体層としてはSiO2を15モル%以上含ませ
たZnS誘電体層が好ましい。例えば線膨張係数は、Z
nSでは7.5X10−67’Cである。SiO2では
、5.5XIO−7/’Cと小さい。This dielectric layer is preferably a ZnS dielectric layer containing 15 mol % or more of SiO2. For example, the coefficient of linear expansion is Z
In nS, it is 7.5X10-67'C. For SiO2, it is as small as 5.5XIO-7/'C.
この上に、Te−Ge−3bからなる合金薄膜を形成す
る。さらにこの記録薄膜層の上に第二の無機誘電体層を
設けることにより耐熱性の向上をはかることができる。A thin alloy film made of Te-Ge-3b is formed on this. Furthermore, heat resistance can be improved by providing a second inorganic dielectric layer on this recording thin film layer.
薄膜形成の方法としては、真空蒸着あるいは、スパッタ
法が使用できる。第二の無機誘電体層の上に反射層を設
けることにより、感度の向上をはかることもできる。As a method for forming a thin film, vacuum evaporation or sputtering can be used. Sensitivity can also be improved by providing a reflective layer on the second inorganic dielectric layer.
この薄膜の膜厚として20nm以下の薄い膜厚領域を選
ぶことが重要である。さらに保護板としてポリカーボネ
イト板を接着剤で密着する。It is important to select a thin film thickness region of 20 nm or less as the film thickness of this thin film. Furthermore, a polycarbonate plate is attached with adhesive as a protective plate.
130mmのディスクとして、1800rpm回転でr
1=3.43MHzの信号と、f 2 =1.0−Hz
の信号のオーバーライド特性を測定する。オーバーライ
ドは、1ケのサークルスポラl−5Φ1μmのレーザ光
により、高いパワーレベル14mW、低いパワーレベル
6mWのパワーレベル間の変調で、高いパワーレベルで
非晶質化マークを形成し、低いパワーレベルで非晶質化
マークを結晶化して消去する同時消録の方法である。As a 130mm disc, r at 1800rpm rotation.
1 = 3.43 MHz signal and f 2 = 1.0-Hz
Measure the override characteristics of the signal. The override is a modulation between a high power level of 14 mW and a low power level of 6 mW using one circle spora l-5Φ1 μm laser beam, forming an amorphous mark at a high power level and forming an amorphous mark at a low power level. This is a simultaneous erasure method that crystallizes and erases amorphous marks.
第1図に記録薄膜の膜厚と記録のサイクル特性の関係を
しめす。記録薄膜の膜厚は80nm、40nm、20n
m、そして10nmである。記録特性はピットエラーレ
イトであられす。1サイクル目つまりピットエラーレイ
トの初期値はすべて10−6台である。記録膜の膜厚が
80nmと厚い場合、ピットエラーレイトは、1000
0サイクルを超えると増大がみられる。FIG. 1 shows the relationship between the thickness of the recording thin film and the recording cycle characteristics. The thickness of the recording thin film is 80nm, 40nm, 20nm.
m, and 10 nm. The recording characteristics are pit error rate. The initial values of the first cycle, that is, the pit error rates, are all in the 10-6 range. When the recording film thickness is as thick as 80 nm, the pit error rate is 1000 nm.
An increase is seen beyond 0 cycles.
40nmの場合、ピットエラーレイトは、100000
サイクルを越えると増大がみられる。20nm、10n
mの記録薄膜層では、熱膨張が小さく、膨張量の差も小
さく、1000000サイクル以上でピットエラーレイ
トの増大はみられない。これらは、記録トラック内に膜
の濃淡の発生を伴う成分移動による劣化は発生しない。In the case of 40 nm, the pit error rate is 100,000
An increase is seen over cycles. 20nm, 10n
In the recording thin film layer of m, the thermal expansion is small, the difference in the amount of expansion is small, and no increase in pit error rate is observed after 1,000,000 cycles or more. These do not suffer from deterioration due to movement of components, which causes shading of the film within the recording track.
実施例2
情報記録消去再生用のレーザ光源として半導体レーザを
用い、記録マーク形成のパルス波形として、第一に高い
パワーレベルとして記録薄膜を溶融スるパワーレベルを
選び、バイアスパワーレベルとして記録薄膜を結晶化す
る低いパワーレベルを選び、少なくとも、この2つのパ
ワーレベルで情報をオーバライドするように選ぶ。さら
に、第二に高いパワーレベルについて、記録マーク形成
のパルス照射開始時のパワーレベルを第二図に示すよう
に、照射終了時のパワーレベルより50%高くしたパル
ス波形を選ぶ。記録部材の構成は、下面と上面に耐熱層
を設けた記録薄膜からなる。記録のサイクル特性は、ビ
ットエラー特性で評価して、記録簿IIりの膜厚40n
m以上の厚い領域で1000000サイクル以上の特性
を得ることができる。矩形のパルス波形では、熱伝導に
より、照射終了部つまり、記録マーク前部の温度は照射
開始部つまり、記録マーク後部の温度より高くなり、熱
膨張の非対称性が大きい。これに対して、パルス波形を
選ぶことにより、熱膨張の対称性が向上し、サイクル特
性が向上する。Example 2 A semiconductor laser was used as a laser light source for recording, erasing and reproducing information, and as a pulse waveform for forming recording marks, the first high power level was selected to melt the recording thin film, and the bias power level was selected to melt the recording thin film. Choose a lower power level to crystallize and choose to override information at least at these two power levels. Furthermore, for the second highest power level, a pulse waveform is selected in which the power level at the start of pulse irradiation for recording mark formation is 50% higher than the power level at the end of irradiation, as shown in FIG. The structure of the recording member consists of a recording thin film with a heat-resistant layer provided on the lower and upper surfaces. The recording cycle characteristics are evaluated by bit error characteristics, and the film thickness of Record Book II is 40 nm.
Characteristics of 1,000,000 cycles or more can be obtained in a thick region of 1,000,000 cycles or more. In the case of a rectangular pulse waveform, due to heat conduction, the temperature at the end of irradiation, that is, the front of the recording mark becomes higher than the temperature at the beginning of irradiation, that is, the rear of the recording mark, and the asymmetry of thermal expansion is large. On the other hand, by selecting a pulse waveform, the symmetry of thermal expansion is improved and cycle characteristics are improved.
発明の効果
以上の構成により、記録薄膜物質の溶融に伴う物質移動
による変化を阻止でき、ビットエラー特性のサイクル特
性が100万サイクル以上に向上する。Effects of the Invention With the configuration described above, it is possible to prevent changes due to material transfer accompanying melting of the recording thin film material, and the cycle characteristics of bit error characteristics are improved to more than 1 million cycles.
第1図は、本発明の構成による記録薄膜の膜厚とサイク
ル特性を示すグラフ、第2図は、本発明の構成における
レーザ照射パルス波形を示す説明図である。
■・・・・・・膜厚80nm、2・・・・・・膜厚40
nm、3・・・・・・膜厚20nm、4・・・・・・高
パワー溶融パワーレベル照射開始部、5・・・・・・高
パワー溶融パワーレベル照射終了部、6・・・・・・低
パワー結晶化パワーレベル、7・・・・・・低パワー再
生パワーレベル。
代理人の氏名 弁理士 粟野重孝 はか1名1 − 1
1 K BOnm
e−rs 厚 40 nmFIG. 1 is a graph showing the film thickness and cycle characteristics of a recording thin film according to the configuration of the present invention, and FIG. 2 is an explanatory diagram showing a laser irradiation pulse waveform in the configuration of the present invention. ■...Film thickness 80 nm, 2...Film thickness 40
nm, 3... Film thickness 20 nm, 4... High power melting power level irradiation start part, 5... High power melting power level irradiation end part, 6... ...Low power crystallization power level, 7...Low power regeneration power level. Name of agent: Patent attorney Shigetaka Awano Haka 1 person 1 - 1
1 KBOnm e-rs Thickness 40 nm
Claims (6)
して昇温し、溶融し、急冷し、アモルファス化する性質
とアモルファスの状態を昇温することにより、結晶化す
る性質を有する記録薄膜を用い、前記レーザー光の強度
変調により情報を記録する部材において、前記記録薄膜
層の上面および下面に耐熱層を有する構成で、溶融マー
ク形成時に、前記耐熱層のマークの前部と後部の熱膨張
量を対称にする構成を選ぶことを特徴とする光学情報記
録再生消去部材。(1) Using a recording thin film that has the property of absorbing the energy of laser light, heating up, melting, rapidly cooling, and becoming amorphous, and the property of crystallizing an amorphous state by heating it. , the member for recording information by modulating the intensity of laser light, which has a heat-resistant layer on the upper and lower surfaces of the recording thin film layer, and when forming the melting mark, the amount of thermal expansion of the heat-resistant layer at the front and rear parts of the mark; An optical information recording/reproducing/erasing member characterized in that a configuration is selected that makes the symmetrical structure.
るように選ぶことを特徴とする請求項(1)記載の光学
情報記録再生消去部材。(2) The optical information recording/reproducing/erasing member according to claim (1), wherein the recording thin film layer is selected to have a thickness of 200 Å or less.
張係数が1×10^−^5/℃以下の誘電体を形成して
なることを特徴とする請求項(1)記載の光学情報記録
再生消去部材。(3) The first heat-resistant layer and the second heat-resistant layer are formed by forming a dielectric material having a coefficient of thermal expansion of 1×10^-^5/°C or less. Optical information recording/reproducing/erasing member.
もちいることを特徴とする請求項(1)記載の光学情報
記録再生消去部材。(4) The optical information recording/reproducing/erasing member according to claim (1), wherein ZnS containing SiO_2 is used as the heat-resistant layer.
を用いることを特徴とする請求項(1)記載の光学情報
記録再生消去部材。(5) The optical information recording/reproducing/erasing member according to claim (1), wherein a material consisting of Te, Ge, and Sb is used for the recording thin film layer.
光の照射パルス波形として、照射開始時のパワーレベル
を照射終了時のパワーレベルより高く選ぶことを特徴と
する請求項(1)記載の光学情報記録再生消去部材。(6) As described in claim (1), the power level at the start of irradiation is selected to be higher than the power level at the end of irradiation as the irradiation pulse waveform of the laser light for melting and rapidly cooling the recording film and forming marks. Optical information recording/reproducing/erasing member.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1013814A JPH02195538A (en) | 1989-01-23 | 1989-01-23 | Component for optical information recording, reproducing and erasing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1013814A JPH02195538A (en) | 1989-01-23 | 1989-01-23 | Component for optical information recording, reproducing and erasing |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02195538A true JPH02195538A (en) | 1990-08-02 |
Family
ID=11843745
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1013814A Pending JPH02195538A (en) | 1989-01-23 | 1989-01-23 | Component for optical information recording, reproducing and erasing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02195538A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5367514A (en) * | 1991-11-26 | 1994-11-22 | Fuji Xerox Co., Ltd. | Phase change optical recording device and method employing a laser beam with differently energized pulse portions |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6192448A (en) * | 1984-10-11 | 1986-05-10 | Nippon Columbia Co Ltd | Optical information recording medium |
JPS61269247A (en) * | 1985-05-24 | 1986-11-28 | Matsushita Electric Ind Co Ltd | Reversible optical information recording and reproducing method |
JPS61280028A (en) * | 1985-06-04 | 1986-12-10 | Matsushita Electric Ind Co Ltd | Optical disk device |
JPS62180538A (en) * | 1986-02-04 | 1987-08-07 | Matsushita Electric Ind Co Ltd | Optical disk |
JPS6356828A (en) * | 1986-08-28 | 1988-03-11 | Matsushita Electric Ind Co Ltd | Optical information recording carrier |
JPS63103453A (en) * | 1986-10-20 | 1988-05-09 | Matsushita Electric Ind Co Ltd | Optical information recording member |
JPS63193330A (en) * | 1987-02-06 | 1988-08-10 | Hitachi Ltd | Information recording and reproducing method |
JPS63259855A (en) * | 1987-04-17 | 1988-10-26 | Matsushita Electric Ind Co Ltd | Optical type information recording member |
-
1989
- 1989-01-23 JP JP1013814A patent/JPH02195538A/en active Pending
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6192448A (en) * | 1984-10-11 | 1986-05-10 | Nippon Columbia Co Ltd | Optical information recording medium |
JPS61269247A (en) * | 1985-05-24 | 1986-11-28 | Matsushita Electric Ind Co Ltd | Reversible optical information recording and reproducing method |
JPS61280028A (en) * | 1985-06-04 | 1986-12-10 | Matsushita Electric Ind Co Ltd | Optical disk device |
JPS62180538A (en) * | 1986-02-04 | 1987-08-07 | Matsushita Electric Ind Co Ltd | Optical disk |
JPS6356828A (en) * | 1986-08-28 | 1988-03-11 | Matsushita Electric Ind Co Ltd | Optical information recording carrier |
JPS63103453A (en) * | 1986-10-20 | 1988-05-09 | Matsushita Electric Ind Co Ltd | Optical information recording member |
JPS63193330A (en) * | 1987-02-06 | 1988-08-10 | Hitachi Ltd | Information recording and reproducing method |
JPS63259855A (en) * | 1987-04-17 | 1988-10-26 | Matsushita Electric Ind Co Ltd | Optical type information recording member |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5367514A (en) * | 1991-11-26 | 1994-11-22 | Fuji Xerox Co., Ltd. | Phase change optical recording device and method employing a laser beam with differently energized pulse portions |
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