JPH02180791A - Single crystal pulling up device - Google Patents
Single crystal pulling up deviceInfo
- Publication number
- JPH02180791A JPH02180791A JP14289A JP14289A JPH02180791A JP H02180791 A JPH02180791 A JP H02180791A JP 14289 A JP14289 A JP 14289A JP 14289 A JP14289 A JP 14289A JP H02180791 A JPH02180791 A JP H02180791A
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- crucible
- melt
- cylinder
- partition cylinder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 39
- 238000005192 partition Methods 0.000 claims abstract description 26
- 239000012768 molten material Substances 0.000 claims abstract description 6
- 239000000126 substance Substances 0.000 claims description 5
- 239000002019 doping agent Substances 0.000 abstract description 14
- 238000000034 method Methods 0.000 abstract description 8
- 239000002994 raw material Substances 0.000 description 22
- 239000000155 melt Substances 0.000 description 21
- 238000003756 stirring Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野1
本発明は、チョクラルスキー法によりSiやGaAsな
との半導体あるいは無機化合物などの単結晶を引上げる
装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application 1] The present invention relates to an apparatus for pulling a single crystal of a semiconductor such as Si or GaAs or an inorganic compound by the Czochralski method.
〔従来の技術]
チョクラルスキー法による結晶成長において、例えばP
ドープのSi単結晶を成長させた場合、PtJS溶融物
質(メルト)中へ濃縮されるため、単結晶のトップ部に
比べてボトム部のP濃度が濃くなる。このような単結晶
の長さ方向のドーパント濃度分布を均一にするため、従
来より結晶の成長と並行して原料を追加供給する方法が
行われている。[Prior art] In crystal growth by the Czochralski method, for example, P
When a doped Si single crystal is grown, it is concentrated into the PtJS melt, so the P concentration at the bottom of the single crystal is higher than at the top. In order to make such a dopant concentration distribution uniform in the length direction of a single crystal, a method of additionally supplying raw materials in parallel with crystal growth has been conventionally used.
原料の追加供給は次のような方法で行う。Additional supply of raw materials is carried out in the following manner.
結晶成長開始時のメルトの重量なW、メルト中のドーパ
ント濃度をGo、 ドーパントの偏析係数をkとする
と1重量ΔWだけ結晶成長させた後のメルト中のドーパ
ント濃度Cは次で与えられる。When W is the weight of the melt at the start of crystal growth, Go is the dopant concentration in the melt, and k is the segregation coefficient of the dopant, the dopant concentration C in the melt after crystal growth by 1 weight ΔW is given by the following.
(1)式より、C=Coに保つためにはk・C,の濃度
を有する原料をΔWだけ加えればよい、に−C,、ΔW
とも既知であるからに−C。From equation (1), in order to maintain C=Co, it is only necessary to add ΔW of raw material having a concentration of k・C, to −C,, ΔW
Since it is also known as -C.
のドーパント濃度の原料を予め準備しておき、結晶の引
上重量ΔWと同じ重量だけ連続的に供給すればよい、こ
の場合、メルトの量は常に一定量Wに保たれる。あるい
は、ドーパントを含まない原料を重量Aだけ供給してメ
ルト中のドーパント濃度をGo一定に保つとすると、(
1)式より、A= (1−k) ΔW
となる。It is sufficient to prepare in advance a raw material having a dopant concentration of , and continuously supply the same weight as the pulling weight ΔW of the crystal. In this case, the amount of melt is always kept at a constant amount W. Alternatively, if we keep the dopant concentration in the melt constant Go by supplying a weight A of raw materials that do not contain dopants, (
From equation 1), A=(1-k)ΔW.
従って、ドーパントを含まない原料を(1−k)ΔWず
つ、連続的に供給してもよい0通常k<1であるから、
この場合には、供給量は結晶引上重量より少ない、従っ
て、メルトの量は徐々に減少する。Therefore, the raw material not containing the dopant may be continuously supplied in increments of (1-k)ΔW. Since k<1 normally,
In this case, the feed rate is less than the crystal pulling weight, so the amount of melt gradually decreases.
この時、原料の追加供給時に発生するメルトの振動によ
り成長中の結晶の結晶構造が乱されないよう円筒形の仕
切りを用いることがある。このような方法としては特開
昭62−278188のように、一部縦断面説明図を第
4図に示した切欠14を有する2重るつぼを用いて、仕
切円筒lの外側の原料を供給する部分と、仕切円筒lの
内側の結晶を成長させる部分とを分離してしまう方法が
知られている。しかし、この従来法においては、切欠1
4の形、数により、仕切円筒lの外側と内側とのメルト
の撹拌を制御している。At this time, a cylindrical partition may be used to prevent the crystal structure of the growing crystal from being disturbed by vibrations of the melt that occur when additional raw materials are supplied. As such a method, as disclosed in Japanese Patent Application Laid-open No. 62-278188, a double crucible having a notch 14 whose partial vertical cross-sectional view is shown in FIG. 4 is used to supply the raw material outside the partition cylinder l. A method is known in which the crystal growing portion is separated from the portion inside the partition cylinder l in which the crystal is grown. However, in this conventional method, the notch 1
The shape and number of 4 control the stirring of the melt between the outside and inside of the partition cylinder l.
切欠を有した仕切円筒を用いるような方法では、原料を
追加供給する部分と結晶を成長させる部分とが、切欠を
通じてつながっているだけである。従って、原料が追加
供給された部分と結晶成長させている部分とのメルトが
十分に撹拌されず、ドーパントの濃度分布が生じる問題
があった。In a method that uses a partition cylinder with a notch, the part where the raw material is additionally supplied and the part where the crystals are grown are simply connected through the notch. Therefore, there was a problem in that the melt between the part where the raw material was additionally supplied and the part where the crystals were grown was not sufficiently stirred, resulting in a dopant concentration distribution.
また、切欠の形、数に上り、仕切円筒の外側と内側との
メルトの撹拌が変化するため員適な撹拌状況を得るには
試行錯誤で切欠の形、数を決定せねばならない問題もあ
った。更に、るつぼ形状が複雑なためるつぼの製造コス
トが高い、メルトの暖が変化するとメルト表面から切欠
までの深さも変化し攪拌が変わる等の問題もあった。In addition, because the shape and number of notches change the stirring of the melt between the outside and the inside of the partition cylinder, there is also the problem that the shape and number of notches must be determined by trial and error in order to obtain the appropriate stirring situation. Ta. Furthermore, there were other problems, such as the fact that the crucible had a complicated shape, making the manufacturing cost of the crucible high, and that when the temperature of the melt changed, the depth from the melt surface to the notch also changed, causing changes in stirring.
【発明が解決しようとする課81
本発明は、原料を追加供給する部分と結晶を成長させる
部分とを安価な手段で仕切り、しかも。Issue 81 to be Solved by the Invention The present invention partitions off a portion for additionally supplying raw materials and a portion for growing crystals by an inexpensive means.
常に同じメルトの撹拌状態を作り、メルトの濃度を均一
化するものである。This is to always create the same stirring state of the melt and make the concentration of the melt uniform.
本発明は上記課題を解決するために、溶融物質から単結
晶を引上げる装置において、該溶融物質を収容する容器
の側壁と該単結晶との間に、該容器の鉛直軸と同軸に該
溶融物質に浮遊すると共に、外周に複数の突起を有し、
かつ円筒上端が該溶融物質表面から上方に突出している
立設仕切円筒を備えたことを特徴とする単結晶引上装置
を提供するもので、突起として同形の旋回羽根状突起が
好適に用いられる。In order to solve the above-mentioned problems, the present invention provides an apparatus for pulling a single crystal from a molten substance. It floats in the substance and has multiple protrusions on the outer periphery,
The present invention provides a single crystal pulling device characterized in that it is equipped with an upright partition cylinder whose upper end protrudes upward from the surface of the molten material, and a swirling vane-like projection of the same shape is preferably used as the projection. .
本発明を図面を用いて説明する。第1図は本発明の実施
例の縦断面概要図で、るつぼ2にはメルト3が収容され
、メルト3には立設仕切円筒1がその上端をメルト3の
表面から上方に突出してメルトに浮遊しており、るつぼ
2の鉛直軸と仕切円筒lの鉛直軸がずれないように、仕
切円筒lの外周に複数の突起4が取付けられている。突
起4を例えば第2図に斜視図を示した同形の複数の旋回
羽根状突起等とすると、単結晶13の回転及びるつぼ支
持シャフト12(単結晶13の回転方向とは反対方向の
回転)の回転によって誘起されたメルト3の流動により
、仕切円筒lが回転し、メルト3の撹拌が向上する。The present invention will be explained using the drawings. FIG. 1 is a schematic vertical cross-sectional view of an embodiment of the present invention, in which a melt 3 is accommodated in a crucible 2, and an upright partition cylinder 1 is provided with its upper end protruding upward from the surface of the melt 3, and the melt is A plurality of protrusions 4 are attached to the outer periphery of the partition cylinder l so that the vertical axis of the crucible 2 and the vertical axis of the partition cylinder l do not deviate from each other. If the protrusions 4 are, for example, a plurality of swirling vane-like protrusions of the same shape as shown in a perspective view in FIG. The flow of the melt 3 induced by the rotation causes the partition cylinder l to rotate, improving the stirring of the melt 3.
原料6はるつぼ2と仕切円筒lとの間隙に原料供給用パ
イプ5を用いて供給される。The raw material 6 is supplied to the gap between the crucible 2 and the partition cylinder l using the raw material supply pipe 5.
仕切円筒lをるつぼ2に固定せずにメルト3にKNさせ
ているので、メルト3の深さが変わった場合でも、仕切
円筒lとメルト3の上面との相対位置を一定に保つこと
ができる。Since the partition cylinder l is not fixed to the crucible 2 and is attached to the melt 3, even if the depth of the melt 3 changes, the relative position between the partition cylinder l and the top surface of the melt 3 can be kept constant. .
〔実施例]
第1図に縦断面概要図を示した装置を用い、SiにPを
ドーパントとして加えて単結晶を成長させた。単結晶1
3の直径は約155mmで、仕切円筒1は内径400m
m、厚さ5 m mのものを使用した。るつぼ2の内径
は450mmである。[Example] A single crystal was grown by adding P as a dopant to Si using an apparatus whose vertical cross-sectional schematic diagram is shown in FIG. Single crystal 1
3 has a diameter of approximately 155 mm, and partition cylinder 1 has an inner diameter of 400 mm.
A material with a thickness of 5 mm and a thickness of 5 mm was used. The inner diameter of crucible 2 is 450 mm.
仕切円筒lおよびるつぼ2とも材質は石英ガラスを使用
した。使用した石英ガラスの比重は2.2で、溶融した
Siのメルト3の比重は約2.5であるから、仕切円筒
lはメルト3に浮遊しており。Both the partition cylinder 1 and the crucible 2 were made of quartz glass. The specific gravity of the quartz glass used is 2.2, and the specific gravity of the molten Si melt 3 is approximately 2.5, so the partition cylinder 1 is floating in the melt 3.
突起4によりるつぼ2の鉛直軸と仕切円筒lの鉛直軸が
大きくずれることがない、仕切円筒lの長さは100m
mとし、メルト3の表面より上へ出る部分が約10mm
になるようにした。The vertical axis of the crucible 2 and the vertical axis of the partition cylinder l do not deviate significantly due to the protrusion 4, and the length of the partition cylinder l is 100 m.
m, and the part protruding above the surface of melt 3 is about 10 mm.
I made it so that
原料6は仕切円筒lとるつぼ2との間の20mmの隙間
へ原料供給用バイブ5を用いて追加供給した。The raw material 6 was additionally supplied to the 20 mm gap between the partition cylinder l and the crucible 2 using the raw material supplying vibrator 5.
本実施例では、連続して2本の単結晶を引Fげた。1本
目の結晶引上げは、ドーパント濃度1.5x l O1
5atom/ c rn’の原料を結晶引上重量と同量
ずつ連続供給しながら実施した。この間メルト3のlf
f1は一定であった。引続いて2本目の結晶引上には、
ドーパントを含まない原料を0.65ΔW(ΔWは単位
時間当りの結晶引上側1ずつ、連続供給しながら行った
。In this example, two single crystals were drawn in succession. The first crystal is pulled at a dopant concentration of 1.5x l O1
The experiment was carried out while continuously supplying 5 atoms/crn' of the raw material in an amount equal to the weight of the crystal to be pulled. During this time Melt 3 lf
f1 was constant. Subsequently, for the second crystal pulling,
The raw material containing no dopant was continuously supplied at a rate of 0.65 ΔW (ΔW is 1 crystal pulling side per unit time).
得られた単結晶インゴットの長さとP濃度の関係を第3
図に示した0図中aはE記1本目0もので、bは上紀2
本目0ものである。The relationship between the length of the obtained single crystal ingot and the P concentration is
In the 0 diagram shown in the figure, a is the 0th one of the 1st book of E, and b is the 0th one of the 1st book of Eki.
Honestly, it's zero.
なお、Cおよびdは、第4図に一部縦断面説明図を示し
たるつぼを使用して単結晶の引Eげを行ったもので、C
は原料の追加なしに、dは原料を追加した比較例である
。Note that C and d are single crystal E-drawn using the crucible whose partial longitudinal section is shown in Fig. 4;
is a comparative example in which no raw material was added, and d was a comparative example in which a raw material was added.
従来の装置に比し、本発明の装置を用いることにより、
Pa度はインゴットの全長にわたり均一で目標範囲内と
することができた。Compared to conventional devices, by using the device of the present invention,
The Pa degree was uniform over the entire length of the ingot and could be kept within the target range.
[発明の効果]
本発明の装置は、構造が簡1■で安価なるつぼを用いな
がら、インゴットの全長にわたってドーパント濃度が目
標範囲内で均一な単結晶を引−ヒげることができ、経済
的効果が高い。[Effects of the Invention] The apparatus of the present invention has a simple structure and uses an inexpensive crucible, and can draw a single crystal with a uniform dopant concentration within the target range over the entire length of the ingot, making it economical. Highly effective.
第1図は本発明装置の実施例の縦断面概要図、第2図は
旋回羽根状突起を備えた立設仕切円筒の斜視図、第3図
はインゴット長手方向距離とPa度との関係を示す図、
第4図は従来装置のるつぼの一部縦断面説明図である。
l・−立設仕切円筒
2・・−石英るつぼ
3・・・メルト
4・・・突起
4a−・・旋回羽根状突起
5・・・原料供給用バイブ
ロ・・・原料
7・・・原料供給装置
8・・・グラファイトるつぼ
9・・・ヒータ
lO・・・断熱材
11・・・ケーシング
12・・・るつぼ保持シャフト
13・・・単結晶
14・・・切欠Fig. 1 is a schematic longitudinal cross-sectional view of an embodiment of the device of the present invention, Fig. 2 is a perspective view of an upright partition cylinder equipped with a swirling vane-like protrusion, and Fig. 3 shows the relationship between the longitudinal distance of the ingot and the degree of Pa. diagram showing,
FIG. 4 is a partially vertical cross-sectional explanatory view of a crucible of a conventional device. l・-Upright partition cylinder 2...-Quartz crucible 3...Melt 4...Protrusion 4a-...Swivel vane-like projection 5...Vibro for raw material supply...Raw material 7...Raw material supply device 8...Graphite crucible 9...Heater lO...Insulating material 11...Casing 12...Crucible holding shaft 13...Single crystal 14...Notch
Claims (1)
融物質を収容する容器の側壁と該単結晶との間に、該容
器の鉛直軸と同軸に該溶融物質に浮遊すると共に、外周
に複数の突起を有し、かつ円筒上端が該溶融物質表面か
ら上方に突出している立設仕切円筒を備えたことを特徴
とする単結晶引上装置。 2 複数の突起が同形の旋回羽根状である請求項1記載
の単結晶引上装置。[Scope of Claims] 1. In an apparatus for pulling a single crystal from a molten substance, a crystal that is suspended in the molten substance coaxially with the vertical axis of the vessel is provided between the side wall of a container containing the molten substance and the single crystal. A single crystal pulling apparatus characterized in that the apparatus further comprises an erect partition cylinder having a plurality of protrusions on the outer periphery and an upper end of the cylinder protruding upward from the surface of the molten material. 2. The single crystal pulling device according to claim 1, wherein the plurality of protrusions have the same shape as swirl vanes.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP64000142A JPH0688869B2 (en) | 1989-01-05 | 1989-01-05 | Single crystal pulling device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP64000142A JPH0688869B2 (en) | 1989-01-05 | 1989-01-05 | Single crystal pulling device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02180791A true JPH02180791A (en) | 1990-07-13 |
JPH0688869B2 JPH0688869B2 (en) | 1994-11-09 |
Family
ID=11465774
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP64000142A Expired - Lifetime JPH0688869B2 (en) | 1989-01-05 | 1989-01-05 | Single crystal pulling device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0688869B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19700516B4 (en) * | 1996-01-12 | 2014-03-13 | Mitsubishi Materials Silicon Corp. | Single crystal pulling apparatus |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61158896A (en) * | 1984-12-29 | 1986-07-18 | Sumitomo Electric Ind Ltd | Method for producing compound semiconductor single crystal and apparatus therefor |
-
1989
- 1989-01-05 JP JP64000142A patent/JPH0688869B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61158896A (en) * | 1984-12-29 | 1986-07-18 | Sumitomo Electric Ind Ltd | Method for producing compound semiconductor single crystal and apparatus therefor |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19700516B4 (en) * | 1996-01-12 | 2014-03-13 | Mitsubishi Materials Silicon Corp. | Single crystal pulling apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPH0688869B2 (en) | 1994-11-09 |
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