JPH02174047A - Scanning type electron microscope - Google Patents
Scanning type electron microscopeInfo
- Publication number
- JPH02174047A JPH02174047A JP32781388A JP32781388A JPH02174047A JP H02174047 A JPH02174047 A JP H02174047A JP 32781388 A JP32781388 A JP 32781388A JP 32781388 A JP32781388 A JP 32781388A JP H02174047 A JPH02174047 A JP H02174047A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- electron beam
- information
- detectors
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims abstract description 28
- 239000000203 mixture Substances 0.000 abstract description 11
- 238000000605 extraction Methods 0.000 abstract description 7
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は走査型電子顕微鏡に関し、ざらに詳しくは、特
に表面の微細構造を観察することを目的とした走査型電
子顕微鏡に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a scanning electron microscope, and more particularly, to a scanning electron microscope particularly intended for observing the fine structure of a surface.
[従来の技術]
従来の走査型電子顕微鏡(以下、SEMと称す)で表面
の微細構造を特に強調して観察したい場合には、電子ビ
ームの加速電圧を低くし、電子の試料中への侵入深さが
浅くなる条件を設定し、その結果放出される電子はより
表面に近い部分から放出される電子が多くなることから
、これを検出し、観察していた。また検出器が試料表面
を見込む軸と試料表面とのなす角(以下、取出し角と称
す)を小さくすることによって表面情報のみを観察する
手法も存在する。[Prior art] When it is desired to observe the fine structure of the surface with particular emphasis using a conventional scanning electron microscope (hereinafter referred to as SEM), the accelerating voltage of the electron beam is lowered to prevent the electrons from penetrating into the sample. By setting conditions where the depth was shallower, more electrons were emitted from areas closer to the surface, and this was detected and observed. There is also a method of observing only surface information by reducing the angle between the sample surface and the axis through which the detector views the sample surface (hereinafter referred to as the take-out angle).
[発明が解決しようとする課題]
SEMで検出される電子のうち反射電子は、試料から放
射される電子のうち比較的エネルギーの大きい電子であ
って、入射電子が試料面で散乱を受けて反射されてきた
電子であり、その発生深さは入射電子の加速電圧にもよ
るがほぼ表面から10nm程度である。[Problem to be solved by the invention] Of the electrons detected by the SEM, reflected electrons are electrons with relatively high energy among the electrons emitted from the sample, and the incident electrons are scattered and reflected by the sample surface. The depth of generation is approximately 10 nm from the surface, although it depends on the accelerating voltage of the incident electrons.
ここで電子線の加速電圧を変えると電子線の侵入深さが
変わり、加速電圧が高い場合には、深い部分からの反射
電子情報が多く、逆に低加速電圧ではより表面に近い情
報が多くなるために、表面微細構造に敏感な象が得られ
る。Changing the accelerating voltage of the electron beam changes the penetration depth of the electron beam; when the accelerating voltage is high, there is a lot of reflected electron information from deep parts, and conversely, when the accelerating voltage is low, there is a lot of information closer to the surface. As a result, an image sensitive to surface microstructure is obtained.
入側電子が試料面に垂直に入射した時、入射電子強度に
対する反射電子強度の割合は、試料の原子番号と対応関
係を持ち、原子番号が増加するとこの割合も増加する。When incoming electrons are incident perpendicularly to the sample surface, the ratio of reflected electron intensity to incident electron intensity has a corresponding relationship with the atomic number of the sample, and as the atomic number increases, this ratio also increases.
このように試料から得られる反射電子強度の割合の情報
から試料の組成の情報を得ることができる。In this way, information on the composition of the sample can be obtained from information on the ratio of reflected electron intensity obtained from the sample.
一方、入射電子線に対して反射電子検出器を傾いた方向
に置いた時、試料面を検出器の方向に傾ければ反射電子
の強度は増し、逆方向に傾ければ減少する。これで試料
表面の幾何学的な凹凸の様子を知ることができる。ここ
で入射電子線に対称に2個の反射電子検出器を備えつけ
、左右2個の検出器の電気信号を電気的に加算あるいは
減算した場合、組成の情報に対しては、左右の検出器に
入る信号は大きざ、極性とも同一であるのに対し、凹凸
の情報は、信号の絶対値の大きさは同じでも、その極性
が逆になる。従って、このようにして反射電子から組成
の情報と凹凸の情報を分離して検出することができる。On the other hand, when the backscattered electron detector is placed in a direction inclined to the incident electron beam, the intensity of the backscattered electrons increases if the sample surface is tilted toward the detector, and decreases if the sample surface is tilted in the opposite direction. This allows us to understand the geometrical unevenness of the sample surface. If two backscattered electron detectors are installed symmetrically to the incident electron beam and electrical signals from the left and right detectors are electrically added or subtracted, composition information can be obtained from the left and right detectors. The incoming signal has the same magnitude and polarity, whereas the information on unevenness has the opposite polarity even if the absolute value of the signal is the same. Therefore, in this way, composition information and unevenness information can be detected separately from reflected electrons.
これは表面の組成および凹凸を観察する方法として広く
用いられている。This is widely used as a method for observing surface composition and irregularities.
しかしながら、これらの組成あるいは凹凸に関する情報
は、反射電子がある一定の発生深さを有するため、これ
らの情報についても一定の深さを有する情報しか1qら
れなかった。このため、表面の微細構造を特に強調して
観察したい場合、上記のように加速電圧を低くさせても
、なおかつ表面構造の情報検出は十分に強調されている
とはいえなかった。However, since the backscattered electrons have a certain generation depth, information regarding these compositions or irregularities can only be obtained at a certain depth. Therefore, when it is desired to observe the fine structure of the surface with particular emphasis, even if the accelerating voltage is lowered as described above, the detection of information on the surface structure cannot be said to be sufficiently emphasized.
本発明は以上述べたような従来の問題点を解決するため
になされたもので、試料のごく表面で発生した反射電子
のみを効果的に検出することのできる走査型電子顕微鏡
を提供することを目的とする。The present invention has been made in order to solve the conventional problems as described above, and aims to provide a scanning electron microscope that can effectively detect only the reflected electrons generated on the very surface of a sample. purpose.
[課題を解決するための手段]
本発明は、細く絞った電子ビームで試料表面を走査する
手段と、前記電子ビームの試料表面への入射軸に対して
対称に配置されて前記試料から放出される反射電子を検
出する2つの検出器と、検出された反射電子を輝度変調
してCRT上に表示する手段とを備えた走査型電子顕微
鏡において、2つの検出器は、この検出器が試料表面を
見込む軸と試料表面とのなす角が5°以下である位置に
いずれも配設されてなることを特徴とする走査型電子顕
微鏡である。[Means for Solving the Problems] The present invention includes a means for scanning a sample surface with a narrowly focused electron beam, and a means for scanning a sample surface with a finely focused electron beam, and a means for scanning a sample surface with a narrowly focused electron beam, and a means for scanning a sample surface with a narrowly focused electron beam, and a means for scanning a sample surface with a narrowly focused electron beam, and a means for scanning a sample surface with a narrowly focused electron beam, and a means for scanning a sample surface with a narrowly focused electron beam, and a means for scanning a sample surface with a narrowly focused electron beam, and a means for scanning a sample surface with a narrowly focused electron beam, and a means for scanning a sample surface with a narrowly focused electron beam, and a means for scanning a sample surface with a narrowly focused electron beam, In a scanning electron microscope, the two detectors are equipped with two detectors for detecting backscattered electrons, and means for modulating the brightness of the detected backscattered electrons and displaying them on a CRT. This is a scanning electron microscope characterized in that each of the microscopes is disposed at a position where the angle between the axis from which the sample is viewed and the surface of the sample is 5 degrees or less.
[作用]
本発明の要旨とするところは、検出器の取出し角を所定
の角度以下に小ざくすることによって、試料のごく表面
で発生した反射電子のみを検出し、より表面の情報が強
調された反射電子像を得ることにある。[Function] The gist of the present invention is to detect only the backscattered electrons generated on the very surface of the sample by reducing the take-off angle of the detector to a predetermined angle or less, thereby emphasizing information on the surface. The objective is to obtain a backscattered electron image.
第2図により、表面の検出感度が増大する作用について
定性的な説明を加える。With reference to FIG. 2, a qualitative explanation will be given of the effect of increasing the detection sensitivity of the surface.
第2図において、電子ビーム3を試料表面に照射するこ
とにより、深さ数期までの部分から反射されてくる反射
電子は、あらゆる方向に等方向に発生すると考えられる
。そのうち、ごく表面で発生し、表面にほぼ平行なAO
D方向に進む反射電子は、検出器1によって検出される
。ところがA1で発生し、A+ D方向に進む反射電子
は、試料表面に到達するまでの距離が長く、その過程で
エネルギーを失い、試料に吸収される確率か大きい。従
って取出し角2を小ざくすることによって、ごく表面で
発生した反則電子のみを効果的に検出器により検出する
ことができる。なお、図中、Zmは電子線侵入深さ、X
は反射電子発生領域の深さである。In FIG. 2, it is considered that by irradiating the sample surface with the electron beam 3, backscattered electrons reflected from a portion up to several depths are generated equidirectionally in all directions. Among these, AO occurs on the very surface and is almost parallel to the surface.
The reflected electrons traveling in the D direction are detected by the detector 1. However, the reflected electrons generated at A1 and traveling in the A+D direction have a long distance to reach the sample surface, lose energy in the process, and have a high probability of being absorbed by the sample. Therefore, by reducing the extraction angle 2, only the foul electrons generated on the very surface can be effectively detected by the detector. In addition, in the figure, Zm is the electron beam penetration depth, and
is the depth of the backscattered electron generation region.
取出し角2をθとすると、深さXで発生した反射電子が
表面に到達するまでに走る距離βは、[=x/sinθ
となる。ここで!≧1伽、X≦0.1珈とするとθ≦5
.7°となる。When the extraction angle 2 is θ, the distance β that the reflected electrons generated at the depth X travel to reach the surface is [=x/sin θ. here! If ≧1, X≦0.1, then θ≦5
.. It becomes 7°.
反射電子発生位置から試料表面までの距離が1期以上あ
れば反射電子はエネルギーを失い、試料に吸収されるこ
と、および深さ0.1#l以下であれば表面情報と言う
に十分であることから、取出し角5°以下の場合に、ご
く表面の反射電子が強調された情報が1昇られることが
わかる。If the distance from the backscattered electron generation position to the sample surface is one period or more, the backscattered electrons lose energy and are absorbed by the sample, and if the depth is 0.1 #l or less, it is sufficient to be considered surface information. From this, it can be seen that when the extraction angle is 5° or less, information in which reflected electrons on the very surface are emphasized is increased by one.
[実施例]
以下、本発明の一実施例について図面を参照して詳細に
説明する。[Example] Hereinafter, an example of the present invention will be described in detail with reference to the drawings.
第1図は本発明の走査型電子顕微鏡の一実施例を示す概
略構成図である。電子銃(図示せず)から発生し、細く
絞られた電子ビーム3は、試料4表面から試料中に入射
し、反射電子5a、5bを発生させる。検出器1aおよ
び1bは入射電子ビーム3に対し対称の位置に配置され
、その取出し角2aおよび2bの大きざは5°以下であ
り、同じ大きざを有する。FIG. 1 is a schematic diagram showing an embodiment of a scanning electron microscope according to the present invention. A finely focused electron beam 3 generated from an electron gun (not shown) enters the sample from the surface of the sample 4 and generates reflected electrons 5a and 5b. The detectors 1a and 1b are arranged at symmetrical positions with respect to the incident electron beam 3, and their extraction angles 2a and 2b have the same magnitude and are less than 5 degrees.
検出器1aおよび1bにより(qられた信号は、組成の
情報および凹凸の情報を含み、電気的に加綽あるいは減
算することにより、組成の情報および凹凸の情報に分離
される。これを輝度変調し、電子ビームと同期させてC
RT上に表示することにより、表面構造に敏感な組成像
および凹凸像が得られた。The signals q'd by the detectors 1a and 1b include composition information and unevenness information, and are separated into composition information and unevenness information by electrical addition or subtraction. Then synchronize with the electron beam and C
By displaying on RT, a composition image and an uneven image sensitive to the surface structure were obtained.
[発明の効果]
以上説明したように、本発明によれば試料のごく表面で
発生した反射電子のみを効果的に検出する機構を有して
いるため、表面微細構造をより確実に反映した情報を得
ることができる。[Effects of the Invention] As explained above, the present invention has a mechanism that effectively detects only the backscattered electrons generated on the very surface of the sample, so information that more reliably reflects the surface microstructure can be obtained. can be obtained.
第1図は本発明の一実施例の概略構成図、第2図は本発
明の原理を定性的に示す説明図である。
1、 la、 lb・・・検出器
2、2a、 2b・・・取出し角
3・・・電子ビーム
4・・・試料
5a、 5b・・・反射電子
7m・・・電子線侵入深さ
X・・・反射電子発生領域の深さFIG. 1 is a schematic configuration diagram of an embodiment of the present invention, and FIG. 2 is an explanatory diagram qualitatively showing the principle of the present invention. 1, la, lb...detector 2, 2a, 2b...extraction angle 3...electron beam 4...sample 5a, 5b...backscattered electron 7m...electron beam penetration depth ...Depth of backscattered electron generation area
Claims (1)
と、前記電子ビームの試料表面への入射軸に対して対称
に配置されて前記試料から放出される反射電子を検出す
る2つの検出器と、検出された反射電子を輝度変調して
CRT上に表示する手段とを備えた走査型電子顕微鏡に
おいて、2つの検出器は、この検出器が試料表面を見込
む軸と試料表面とのなす角が5°以下である位置にいず
れも配設されてなることを特徴とする走査型電子顕微鏡
。(1) A means for scanning the sample surface with a narrowly focused electron beam, and two detectors arranged symmetrically with respect to the axis of incidence of the electron beam on the sample surface to detect reflected electrons emitted from the sample. In a scanning electron microscope equipped with a means for modulating the brightness of the detected backscattered electrons and displaying them on a CRT, the two detectors are configured to measure the angle between the axis of the sample surface and the sample surface. A scanning electron microscope characterized in that both are arranged at positions where the angle is 5° or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32781388A JPH02174047A (en) | 1988-12-27 | 1988-12-27 | Scanning type electron microscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32781388A JPH02174047A (en) | 1988-12-27 | 1988-12-27 | Scanning type electron microscope |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02174047A true JPH02174047A (en) | 1990-07-05 |
Family
ID=18203269
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP32781388A Pending JPH02174047A (en) | 1988-12-27 | 1988-12-27 | Scanning type electron microscope |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02174047A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003522327A (en) * | 2000-02-03 | 2003-07-22 | ザ ユニヴァーシティー オブ バーミンガム | Apparatus and method combining surface topography analysis and spectroscopy analysis |
-
1988
- 1988-12-27 JP JP32781388A patent/JPH02174047A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003522327A (en) * | 2000-02-03 | 2003-07-22 | ザ ユニヴァーシティー オブ バーミンガム | Apparatus and method combining surface topography analysis and spectroscopy analysis |
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