JPH0233845A - Scanning type electronic microscope - Google Patents

Scanning type electronic microscope

Info

Publication number
JPH0233845A
JPH0233845A JP63181507A JP18150788A JPH0233845A JP H0233845 A JPH0233845 A JP H0233845A JP 63181507 A JP63181507 A JP 63181507A JP 18150788 A JP18150788 A JP 18150788A JP H0233845 A JPH0233845 A JP H0233845A
Authority
JP
Japan
Prior art keywords
secondary electrons
sample
detector
angle
generated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63181507A
Other languages
Japanese (ja)
Inventor
Junichiro Nakajima
中島 順一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP63181507A priority Critical patent/JPH0233845A/en
Publication of JPH0233845A publication Critical patent/JPH0233845A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To detect only the secondary electrons effectively by making finely stopped electron beams scan the surface of a sample, and arranging the detector of an electronic microscope which detects secondary electrons emitted from the sample at a position that the angle formed by the axis looking down the sample surface and the sample surface becomes 5 deg. or less. CONSTITUTION:By irradiating sample surface with the electron beams 1 of a scanning type electron microscope, the secondary electrons that arose at the surface to the specified depth are made to arise isotropically in all directions. A detector 1 detects the secondary electrons advancing in the A0D direction almost parallel with the surface of these generated secondary electrons. And the electron beams 3 applied to the position A0 on the sample penetrate to the depth Zm, and the angle to take out the secondary electrons generated in the region shown by a dotted line is confined to within 5 deg.. The detector 1 detects the secondary electrons that the taking-out angle is confined to 5 deg., and only the secondary electrons that arose at the very surface of the sample are taken out effectively, and only the information that reflected the surface fine structure more certainly is taken out.

Description

【発明の詳細な説明】 [産業上の利用分野コ 本発明は走査型電子顕微鏡に関し、さらに詳しくは特に
表面微細構造を観察するための走査型電子顕微鏡に関す
るものでおる。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a scanning electron microscope, and more particularly to a scanning electron microscope for observing surface microstructures.

[従来の技術] 従来の走査型電子顕微鏡(以下、SFMと略す)で表面
微細構造を特に強調して観察したい場合には、電子ヒー
ムの加速電圧を低くし、電子の試料中への侵入深さが浅
くなる条件で放出された電子を検出していた。この場合
、検出器が試料表面を見込む軸と試料表面とのなす角(
以下、取出し角と略す)には特に制限はなかった。
[Prior art] When it is desired to observe the surface microstructure with particular emphasis using a conventional scanning electron microscope (hereinafter abbreviated as SFM), the acceleration voltage of the electron beam is lowered to increase the penetration depth of the electrons into the sample. The electrons emitted under conditions where the depth was shallow were detected. In this case, the angle (
There was no particular restriction on the take-out angle (hereinafter abbreviated as the take-out angle).

[発明が解決しようとする課題] 電子線と試料の相互作用から電子プローブをいくら細く
絞ったとしても、その分解能は2〜3nm稈度が限度と
考えられる。その理由の1つは、試料表面から発生する
二次電子源が有限の大きさを持っているからである。入
射電子は固体内に侵入し、そのエネルギーを完全に失う
まで、散乱し、方向を変える。二次電子は、これらの固
体的散乱電子によって深い領域でも発生しているが、そ
のエネルギーが小さいため、真空中に飛び出るのは試料
のごく表面(〜10nm)で発生したものに限られる。
[Problems to be Solved by the Invention] No matter how narrow the electron probe is, it is thought that the resolution is limited to 2 to 3 nm from the interaction between the electron beam and the sample. One of the reasons for this is that the secondary electron source generated from the sample surface has a finite size. An incident electron enters a solid and is scattered and redirected until it completely loses its energy. Secondary electrons are generated even in deep regions by these solid-state scattered electrons, but because their energy is small, only those generated at the very surface (~10 nm) of the sample jump out into the vacuum.

従ってSEMでは表面から約10nm程度の深さの情報
を得ていると言うことができる。ところが、電子線の加
速電圧を変えると電子線の侵入深さが変わり、相対的に
加速電圧が高い場合には深い部分からの二次電子情報か
多く、逆に低加速電圧では表面情報が多いために、表面
微細構造に敏感な像が得られる。
Therefore, it can be said that SEM obtains information about a depth of about 10 nm from the surface. However, changing the accelerating voltage of the electron beam changes the penetration depth of the electron beam, and when the accelerating voltage is relatively high, there is a lot of secondary electron information from deep parts, whereas when the accelerating voltage is low, there is a lot of surface information. Therefore, images sensitive to surface microstructures can be obtained.

しかしながら、表面の微細構造を特に強調して観察した
い場合、上記のように加速電圧を低くさせても、なおか
つ表面構造の情報検出は十分に強調されているとはいえ
なかった。
However, when it is desired to observe the fine structure of the surface with particular emphasis, even if the accelerating voltage is lowered as described above, the information detection of the surface structure cannot be said to be sufficiently emphasized.

本発明は以上述べたような従来の問題点を解決するため
になされたもので、試料のごく表面で発生した二次電子
のみを効果的に検出することのできる走査型電子顕微鏡
を提供することを目的とする。
The present invention has been made in order to solve the conventional problems as described above, and it is an object of the present invention to provide a scanning electron microscope that can effectively detect only secondary electrons generated on the very surface of a sample. With the goal.

[課題を解決するための手段] 本発明は、細く絞った電子ビームで試料表面を走査覆る
手段と、前記試料から放出される二次電子を検出し、輝
度変調してCRT上に表示する手段とを協えてなる走査
型電子顕微鏡において、検出器が試料表面を見込む軸と
試料表向とのなす角が5°以下である位置に検出器が配
設されていることを特徴とする走査型電子顕微鏡でおる
[Means for Solving the Problems] The present invention provides means for scanning and covering the surface of a sample with a narrowly focused electron beam, and means for detecting secondary electrons emitted from the sample, modulating their brightness, and displaying them on a CRT. A scanning electron microscope, characterized in that the detector is disposed at a position where the angle between the axis of the detector looking into the sample surface and the surface of the sample is 5° or less. Under an electron microscope.

[作用1 本発明の要旨とするところは、取出し角を小さくするこ
とによって、試料のごく表面で発生した電子のみを検出
し、より表面の微細構造の情報が強調されたSEMを得
ることにおる。
[Function 1] The gist of the present invention is to detect only the electrons generated on the very surface of the sample by reducing the extraction angle, and to obtain an SEM in which information on the fine structure of the surface is more emphasized. .

第1図により、表面の検出感度か増大する作用について
定性的な説明を加える。
With reference to FIG. 1, a qualitative explanation will be given regarding the effect of increasing the detection sensitivity of the surface.

第1図において、電子ヒーム3を試料表面に照射するこ
とにより、深さ約10nmまでの表面で発生した二次電
子は、必らゆる方向に等方向に発生すると考えられる。
In FIG. 1, by irradiating the sample surface with the electron beam 3, secondary electrons generated on the surface up to a depth of approximately 10 nm are thought to be generated equidirectionally in all directions.

そのうち、ごく表面で発生し、表面にほぼ平行なAoD
方向に進む二次電子は、検出器1によって検出される。
Among these, AoD occurs on the very surface and is almost parallel to the surface.
The secondary electrons traveling in the direction are detected by the detector 1.

ところがA1で発生し、A1D方向に進む二次電子は試
料表面に到達するまでの距離が長く、その過捏てエネル
ギを失い、試料に吸収される確率か大きい。従って取出
し角2を低くすることによって、ごく表面で発生した二
次電子のみを効果的に検出器により検出することができ
る。なお、図中、7mは電子線侵入深さ、7は二次電子
発生領域の深さである。
However, the secondary electrons generated at A1 and proceeding in the A1D direction have a long distance to reach the sample surface, lose energy due to overmixing, and have a high probability of being absorbed by the sample. Therefore, by lowering the extraction angle 2, only the secondary electrons generated on the very surface can be effectively detected by the detector. In the figure, 7 m is the electron beam penetration depth, and 7 is the depth of the secondary electron generation region.

取出し角2がθとすると、深さAで発生した二次電子が
表面に到達するまでに足る距離では、!−八へSinθ となる。ここで!≧10口m、 A≦1 nmとすると
θ≦5.7° となる。
Assuming that the extraction angle 2 is θ, at a distance sufficient for the secondary electrons generated at depth A to reach the surface, ! −8 becomes Sinθ. here! If ≧10 m and A≦1 nm, θ≦5.7°.

二次電子発生位置から試料表面までの距離か10nm以
上あれば二次電子はエネルギーを失い、試料に吸収され
ること、および深ざInm以下て市れば表面情報と言う
に」−分であることから、取出し角5°以下の場合に、
ごく表面の二次電子か強調された情報が得られることが
わかる。
If the distance from the secondary electron generation position to the sample surface is 10 nm or more, the secondary electrons lose energy and are absorbed by the sample, and if the distance is less than Inm, it is said to be surface information. Therefore, when the extraction angle is 5° or less,
It can be seen that information is obtained that emphasizes the secondary electrons at the very surface.

[実施例] 以下、本発明の一実施例について図面を参照して詳細に
説明する。
[Example] Hereinafter, an example of the present invention will be described in detail with reference to the drawings.

第1図は本発明の走査型電子顕微鏡について作用の説明
を兼ねて概略的に示す説明図である。電子線源から発生
し、細く絞られた電子ビーム3は試料上の△。に照射さ
れる。入射した電子ヒーム3は、図中、Zmで示される
深さに至るまで浸入し、その領域は点線で示す如くなる
。そのうら二次電子が発生するのは、図中、7で示され
る深さまででおる。この領域で発生した二次電子は、取
出し角か5°以内に設定された検出器1にて検出される
か、上記した理由により、検出器1で検出される二次電
子は、試料のごく表面から発生したものに限られる。次
にこの電子ビーム3を移動して別の部分からの二次電子
を検出する。
FIG. 1 is an explanatory diagram schematically showing the scanning electron microscope of the present invention, which also serves as an explanation of the operation. A finely focused electron beam 3 generated from an electron beam source is △ on the sample. is irradiated. The incident electron beam 3 penetrates to a depth indicated by Zm in the figure, and the area becomes as indicated by the dotted line. Secondary electrons are generated up to the depth indicated by 7 in the figure. The secondary electrons generated in this region are detected by detector 1, which is set within 5° of the extraction angle, or, for the reasons mentioned above, the secondary electrons detected by detector 1 are Limited to those originating from the surface. Next, this electron beam 3 is moved to detect secondary electrons from another part.

この操作を連続的に試料表面の分析領域全部について行
うことにより、試料のごく表面の微細構造を観察するこ
とかできる。
By continuously performing this operation on the entire analysis area of the sample surface, it is possible to observe the fine structure of the very surface of the sample.

[発明の効果] 以上説明したように、本発明によれば試料のごく表面で
発生した二次電子のみを効果的に検出する機構を有して
いるため、表面微細構造をより確実に反映した情報を得
ることができる。
[Effects of the Invention] As explained above, the present invention has a mechanism for effectively detecting only the secondary electrons generated on the very surface of the sample, so the surface microstructure can be reflected more reliably. You can get information.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を説明するための説明図であ
る。 1・・・検出器 2・・・取出し角 3・・・電子ビーム 7−m・・・電子線侵入深さ 7・・・二次電子発生領域の深さ 代 理 人
FIG. 1 is an explanatory diagram for explaining one embodiment of the present invention. 1... Detector 2... Extraction angle 3... Electron beam 7-m... Electron beam penetration depth 7... Depth agent of secondary electron generation area

Claims (1)

【特許請求の範囲】[Claims] (1)細く絞った電子ビームで試料表面を走査する手段
と、前記試料から放出される二次電子を検出し、輝度変
調してCRT上に表示する手段とを備えてなる走査型電
子顕微鏡において、検出器が試料表面を見込む軸と試料
表面とのなす角が5゜以下である位置に検出器が配設さ
れていることを特徴とする走査型電子顕微鏡。
(1) In a scanning electron microscope equipped with means for scanning a sample surface with a narrowly focused electron beam, and means for detecting secondary electrons emitted from the sample, modulating the brightness, and displaying it on a CRT. A scanning electron microscope, characterized in that the detector is disposed at a position where the angle between the axis of the detector and the sample surface is 5° or less.
JP63181507A 1988-07-22 1988-07-22 Scanning type electronic microscope Pending JPH0233845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63181507A JPH0233845A (en) 1988-07-22 1988-07-22 Scanning type electronic microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63181507A JPH0233845A (en) 1988-07-22 1988-07-22 Scanning type electronic microscope

Publications (1)

Publication Number Publication Date
JPH0233845A true JPH0233845A (en) 1990-02-05

Family

ID=16101972

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63181507A Pending JPH0233845A (en) 1988-07-22 1988-07-22 Scanning type electronic microscope

Country Status (1)

Country Link
JP (1) JPH0233845A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013037001A (en) * 2011-08-10 2013-02-21 Fei Co Charged-particle microscope providing depth-resolved imagery

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013037001A (en) * 2011-08-10 2013-02-21 Fei Co Charged-particle microscope providing depth-resolved imagery

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