JPH02173953A - Substrate for optical recording medium - Google Patents
Substrate for optical recording mediumInfo
- Publication number
- JPH02173953A JPH02173953A JP63330210A JP33021088A JPH02173953A JP H02173953 A JPH02173953 A JP H02173953A JP 63330210 A JP63330210 A JP 63330210A JP 33021088 A JP33021088 A JP 33021088A JP H02173953 A JPH02173953 A JP H02173953A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- polyester
- optical recording
- polycarbonate
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 38
- 230000003287 optical effect Effects 0.000 title claims description 27
- 229920000728 polyester Polymers 0.000 claims abstract description 19
- 229920000515 polycarbonate Polymers 0.000 claims abstract description 13
- 239000004417 polycarbonate Substances 0.000 claims abstract description 13
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims abstract description 10
- 229920005668 polycarbonate resin Polymers 0.000 claims abstract description 3
- 239000004431 polycarbonate resin Substances 0.000 claims abstract description 3
- 125000002947 alkylene group Chemical group 0.000 claims abstract 4
- 125000001118 alkylidene group Chemical group 0.000 claims abstract 4
- 238000007334 copolymerization reaction Methods 0.000 claims abstract 3
- 125000000217 alkyl group Chemical group 0.000 claims abstract 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract 2
- 239000011347 resin Substances 0.000 claims description 26
- 229920005989 resin Polymers 0.000 claims description 26
- 238000006116 polymerization reaction Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims 3
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000002993 cycloalkylene group Chemical group 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 20
- 238000010521 absorption reaction Methods 0.000 abstract description 18
- 238000000034 method Methods 0.000 abstract description 17
- 230000035699 permeability Effects 0.000 abstract 2
- 230000000306 recurrent effect Effects 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 29
- 229920000642 polymer Polymers 0.000 description 22
- 230000015572 biosynthetic process Effects 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 14
- 239000000203 mixture Substances 0.000 description 13
- 239000003054 catalyst Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 9
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical group C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 8
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 7
- 150000002009 diols Chemical class 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- -1 diphenyl ester Chemical class 0.000 description 6
- 230000009477 glass transition Effects 0.000 description 6
- 230000000704 physical effect Effects 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- 229910052744 lithium Inorganic materials 0.000 description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 5
- 239000004926 polymethyl methacrylate Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- 239000010408 film Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- ROORDVPLFPIABK-UHFFFAOYSA-N diphenyl carbonate Chemical compound C=1C=CC=CC=1OC(=O)OC1=CC=CC=C1 ROORDVPLFPIABK-UHFFFAOYSA-N 0.000 description 3
- 238000001746 injection moulding Methods 0.000 description 3
- 229910000103 lithium hydride Inorganic materials 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004645 polyester resin Substances 0.000 description 3
- 229920001225 polyester resin Polymers 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 2
- 238000000748 compression moulding Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 150000002642 lithium compounds Chemical class 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- SYSQUGFVNFXIIT-UHFFFAOYSA-N n-[4-(1,3-benzoxazol-2-yl)phenyl]-4-nitrobenzenesulfonamide Chemical class C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)NC1=CC=C(C=2OC3=CC=CC=C3N=2)C=C1 SYSQUGFVNFXIIT-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 1
- FIPWRIJSWJWJAI-UHFFFAOYSA-N Butyl carbitol 6-propylpiperonyl ether Chemical compound C1=C(CCC)C(COCCOCCOCCCC)=CC2=C1OCO2 FIPWRIJSWJWJAI-UHFFFAOYSA-N 0.000 description 1
- GXGJIOMUZAGVEH-UHFFFAOYSA-N Chamazulene Chemical group CCC1=CC=C(C)C2=CC=C(C)C2=C1 GXGJIOMUZAGVEH-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 102100024133 Coiled-coil domain-containing protein 50 Human genes 0.000 description 1
- 101000910772 Homo sapiens Coiled-coil domain-containing protein 50 Proteins 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- SQOIPIWSMPYRCJ-UHFFFAOYSA-N [3-(hydroxymethyl)-5-bicyclo[2.2.1]heptanyl]methanol Chemical compound C1C(CO)C2C(CO)CC1C2 SQOIPIWSMPYRCJ-UHFFFAOYSA-N 0.000 description 1
- RDCRVCNPGSYUCY-UHFFFAOYSA-N [4-(hydroxymethyl)-3-bicyclo[2.2.1]heptanyl]methanol Chemical compound C1CC2(CO)C(CO)CC1C2 RDCRVCNPGSYUCY-UHFFFAOYSA-N 0.000 description 1
- QVYYOKWPCQYKEY-UHFFFAOYSA-N [Fe].[Co] Chemical compound [Fe].[Co] QVYYOKWPCQYKEY-UHFFFAOYSA-N 0.000 description 1
- FOPBMNGISYSNED-UHFFFAOYSA-N [Fe].[Co].[Tb] Chemical compound [Fe].[Co].[Tb] FOPBMNGISYSNED-UHFFFAOYSA-N 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- WZZPVFWYFOZMQS-UHFFFAOYSA-N bicyclo[2.2.1]heptane-3,4-diol Chemical compound C1CC2(O)C(O)CC1C2 WZZPVFWYFOZMQS-UHFFFAOYSA-N 0.000 description 1
- XOYHRNZRFKXMMI-UHFFFAOYSA-N bicyclo[2.2.1]heptane-3,5-diol Chemical compound C1C(O)C2C(O)CC1C2 XOYHRNZRFKXMMI-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- IFVTZJHWGZSXFD-UHFFFAOYSA-N biphenylene Chemical group C1=CC=C2C3=CC=CC=C3C2=C1 IFVTZJHWGZSXFD-UHFFFAOYSA-N 0.000 description 1
- 229920000402 bisphenol A polycarbonate polymer Polymers 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 238000004455 differential thermal analysis Methods 0.000 description 1
- RBSWFNKEWQOEJF-UHFFFAOYSA-N diphenyl cyclohexane-1,4-dicarboxylate Chemical compound C1CC(C(=O)OC=2C=CC=CC=2)CCC1C(=O)OC1=CC=CC=C1 RBSWFNKEWQOEJF-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- IDBFBDSKYCUNPW-UHFFFAOYSA-N lithium nitride Chemical compound [Li]N([Li])[Li] IDBFBDSKYCUNPW-UHFFFAOYSA-N 0.000 description 1
- AZVCGYPLLBEUNV-UHFFFAOYSA-N lithium;ethanolate Chemical compound [Li+].CC[O-] AZVCGYPLLBEUNV-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- SJYNFBVQFBRSIB-UHFFFAOYSA-N norbornadiene Chemical compound C1=CC2C=CC1C2 SJYNFBVQFBRSIB-UHFFFAOYSA-N 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- DKWSBNMUWZBREO-UHFFFAOYSA-N terbium Chemical compound [Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb][Tb] DKWSBNMUWZBREO-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
Landscapes
- Polyesters Or Polycarbonates (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は複屈折が極めて低く、光透過性に優れかつ吸水
による反り、変形の非常に少ない、機械的特性および耐
熱性の良好な光記録媒体用基体に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention provides an optical recording medium with extremely low birefringence, excellent light transmittance, and very little warpage or deformation due to water absorption, and excellent mechanical properties and heat resistance. The present invention relates to a substrate for media.
デジタルオーディオディスクやレーザービジョン等のい
わゆる光デイヌクはその高密度大容量記録・非接触再生
に基づく長寿命等の利点のため急速に広まりつつある。So-called optical discs such as digital audio discs and laser vision are rapidly becoming popular due to their advantages such as long life based on high-density, large-capacity recording and non-contact playback.
近年は追記型や消去可能型等のユーザーが情報を記録で
きるものも登場し、記録方式の発展に伴い基体材料の緒
特性に対する要求のレベルも高くなってきている。特に
低吸水性(低吸水反シ性)・低複屈折性・高耐熱性の3
項目は重要な特性である。現在基体材料として用いられ
ているものには主としてガラスおよびプラスチック材料
があるが、ガラスは量産性が低くコストがかかる、重い
、割れやすいといった短所がアシ、プラスチック材料の
方が主流である。In recent years, write-once types and erasable types that allow users to record information have also appeared, and with the development of recording methods, the level of demand for the properties of the base material has also increased. Especially low water absorption (low water absorption resistance), low birefringence, and high heat resistance.
Items are important characteristics. Currently, glass and plastic materials are mainly used as substrate materials, but glass has disadvantages such as low mass production, high cost, heavy weight, and breakability, so plastic materials are more mainstream.
光記録媒体用基体として現在特に用いられているプラス
チック材料はポリメチルメタクリレート(PMMA)と
ポリカーボネート(PC)であるが、PMMAは複屈折
は極めて低いものの吸水(吸湿)性が高く吸水によって
反りや変形が生じ、光学特性の低下を招きやすいという
欠点を有している。The plastic materials currently particularly used as substrates for optical recording media are polymethyl methacrylate (PMMA) and polycarbonate (PC). Although PMMA has extremely low birefringence, it has high water absorption (moisture absorption) and is susceptible to warping and deformation due to water absorption. This has the disadvantage that it tends to cause deterioration of optical properties.
特にデジタルオーディオディスクのような1枚の基体か
らなる光記録媒体に用いた場合、情報の忠実な再生が困
難となることがある。また、#熱性も今−歩の向上が望
まれている。一方PCは吸水性は低く吸水反りもほとん
どなく耐熱性も問題ないが、複屈折が大きいという難点
がある。デジタルオーディオディスクのような比較的径
の小さいものでは成形条件を高精度に制御することによ
シ複屈折を要求レベル以下に抑えることが可能であるが
、30cm径のレーザービジョンや、光磁気記録媒体の
ような極めて高い光学特性が要求されるものへの対応は
不可能に近い。In particular, when used in an optical recording medium consisting of a single substrate such as a digital audio disc, faithful reproduction of information may be difficult. In addition, further improvement in thermal properties is desired. On the other hand, PC has low water absorption, hardly any water absorption warping, and has no problem with heat resistance, but it has the disadvantage of high birefringence. For relatively small diameter products such as digital audio discs, it is possible to suppress birefringence below the required level by controlling the molding conditions with high precision, but for laser vision with a diameter of 30 cm and magneto-optical recording. It is nearly impossible to support media that require extremely high optical properties.
PMMAやpc以外の樹脂の適用もまた検討されている
が、例えばスチレン系樹脂(特開昭58−83009
)では複屈折が高くまた表面硬度が非常に低く傷が付き
やすいという問題点がある。また、ポリエステル系樹脂
(特開昭58−150147 )では特に複屈折に関し
て難点がある。The application of resins other than PMMA and PC is also being considered;
) has the problem of high birefringence and very low surface hardness, making it easy to scratch. Furthermore, polyester resins (JP-A-58-150147) have particular drawbacks regarding birefringence.
上記のPC1スチレン系樹脂、ポリエステル系樹脂のよ
うに芳香環を有する樹脂においては芳香環の光学的異方
性に基づく複屈折が生じることが指摘されている。従っ
て低複屈折性の樹脂を得るためには芳香環を使用しない
という材料設計方針が考えられるが、芳香環の不使用は
耐熱性の低下という問題点を生じる。It has been pointed out that in resins having aromatic rings, such as the above-mentioned PC1 styrene resins and polyester resins, birefringence occurs due to the optical anisotropy of the aromatic rings. Therefore, in order to obtain a resin with low birefringence, a material design policy that does not use aromatic rings can be considered, but not using aromatic rings causes the problem of reduced heat resistance.
低複屈折性でかつ耐熱性の良好な材料としては脂環式ポ
リエステルあるいはポリカーボネートが考えられる。該
樹脂の例としては英国特許筒962.913号公報や特
公昭38−26798号公報では、2.2.4.4−テ
トラメチル−1,3−シクロブタンジオールから導かれ
るポリエステルあるいはポリカーボネートが提案されて
いる。特開昭63−92644号公報では、上記の特公
昭38−26798号公報で開示されている2、 2.
4.4−テトラメチル−1,3−シクロブタンジオール
から導かれるポリカーボネート樹脂の光学部品成形材料
への可能性が開示されている。また、本発明者らは特願
昭62−293639号明細書において、光記録媒体用
基体として使用する際に要求される特性において優れた
脂環式ポリエステルカーボネートを提案している。さら
に、Journal ofPolymer 5cie
nce 。As a material with low birefringence and good heat resistance, alicyclic polyester or polycarbonate can be considered. As examples of such resins, polyester or polycarbonate derived from 2.2.4.4-tetramethyl-1,3-cyclobutanediol is proposed in British Patent No. 962.913 and Japanese Patent Publication No. 38-26798. ing. Japanese Unexamined Patent Publication No. 63-92644 discloses 2, 2.
The possibility of a polycarbonate resin derived from 4,4-tetramethyl-1,3-cyclobutanediol as a molding material for optical parts is disclosed. Furthermore, the present inventors have proposed, in Japanese Patent Application No. 62-293639, an alicyclic polyester carbonate which is excellent in properties required when used as a substrate for an optical recording medium. Furthermore, Journal of Polymer 5cie
nce.
Polymer Chemiatry Edition
、 10巻、3191頁(1972年)や、米国防衛
特許筒896.033号明細書には、ノルボルナン骨格
やジメタノペルとドロナフタレン骨格を有するポリエス
テルが開示されている。Polymer Chemistry Edition
, Vol. 10, p. 3191 (1972) and US Pat.
さらに、特開昭63−122729号公報においてはノ
ルボルナン骨格を有するポリカーボネートが示されてい
る。Furthermore, JP-A-63-122729 discloses a polycarbonate having a norbornane skeleton.
〔発明が解決しようとする課題〕
上述したように、PMMAやpcは光記録媒体用基体と
して用いた場合に問題点を有しており、また、新規素材
を用いるにしても何等かの問題点があるというのが現状
である。[Problems to be solved by the invention] As mentioned above, PMMA and PC have problems when used as substrates for optical recording media, and even if new materials are used, there are still some problems. The current situation is that there is.
本発明の目的は、光記録媒体用基体として使用する際に
要求される総ての特性において優れた、すなわち複屈折
が極めて小さく、光透過性に優れ、かつ吸水反り(変形
)の極めて少ない、機械的特性および耐熱性の良好な光
記録媒体用基体を提供することにある。The object of the present invention is to provide a substrate that is excellent in all the properties required when used as a substrate for optical recording media, that is, has extremely low birefringence, excellent light transmittance, and has extremely low water absorption warping (deformation). An object of the present invention is to provide a substrate for an optical recording medium having good mechanical properties and heat resistance.
本発明者らは上記の目的に鑑み鋭意検討した結果、特定
のポリエステル系樹脂においては複屈折が極めて小さく
、光透過性に優れ、吸水時の反りが非常に少なく、かつ
耐熱性および機械的強度が良好であるこ゛とを見出し本
発明に至った。すなわち本発明は繰り返し単位が下記一
般式<1)で表わサレるポリエステル、ポリカーボネー
トまたはポリエステルカーボネート樹脂からなることを
特徴とする光記録媒体用基体である。As a result of intensive studies in view of the above objectives, the present inventors found that a specific polyester resin has extremely low birefringence, excellent light transmittance, very little warping when water is absorbed, and has high heat resistance and mechanical strength. The inventors have discovered that this is a good result and have arrived at the present invention. That is, the present invention is a substrate for an optical recording medium characterized in that the repeating unit is made of polyester, polycarbonate, or polyester carbonate resin represented by the following general formula <1).
下記のものが具体的に例示される。The following are specifically exemplified.
これらのうち好ましくは
一般式(I)においてXとyの比については特に限定は
されず、0 : 100から1oo:oの間の任意の値
であってよい。また、nは0,1 または2のいずれで
あってもよいが、耐熱性と低吸水性の面からは1または
2であることが好ましい。Among these, preferably in general formula (I), the ratio of X to y is not particularly limited and may be any value between 0:100 and 1oo:o. Furthermore, n may be 0, 1 or 2, but is preferably 1 or 2 in terms of heat resistance and low water absorption.
前述したようにJ、 Polymer ScilPol
ymer C1+emistryEdiLion 、
10巻、3191頁(1972年)にはがよく、さらに
好ましくは
ジヒドロキシ化合物とテレフタル酸のような芳香族シカ
ルホン酸より導かれるポリエステルにつぃてもよいし、
2種以上の混合物であっても構わない。また、本発明の
効果を損わない範囲の量、例えば全体に対して10モル
%程度以下の量で他の任意の構造を有していてもよい。As mentioned above, J, Polymer ScilPol
ymer C1+emistryEdiLion,
10, p. 3191 (1972), and more preferably a polyester derived from a dihydroxy compound and an aromatic sicarphonic acid such as terephthalic acid.
It may be a mixture of two or more types. Further, it may have any other structure in an amount within a range that does not impair the effects of the present invention, for example, in an amount of about 10 mol % or less based on the total amount.
芳香族あるいは脂環式ジカルボン酸から導かれるポリエ
ステルについて開示されている。しかしながら、これら
の先行文献には上記のポリエステルがフィルム形成が可
能であることが述べられているにすぎずこれらのポリエ
ステルから得られた成形体が特に光記録媒体用基体とし
て要求される諸特性をすべて満足していることは何ら記
載されておらず、示唆すらもされていない。Polyesters derived from aromatic or cycloaliphatic dicarboxylic acids are disclosed. However, these prior documents merely state that the above-mentioned polyesters can be used to form films, and molded products obtained from these polyesters do not have the characteristics particularly required as substrates for optical recording media. Nothing is stated or even suggested that everything is satisfied.
また、特開昭63−122729号公報では、脂環式ジ
オールをカーボネート結合して得られる重合体を含むこ
とを特徴とする光学部品成形用ポリカーボネート樹脂に
おいて脂環式ジオールの例としてビス(ヒドロキシメチ
ル)ノルボルナン、するいはジヒドロキシノルボルナン
が例示されている。Furthermore, in JP-A-63-122729, bis(hydroxymethyl ) Norbornane or dihydroxynorbornane is exemplified.
しかしながら該公報中の実施例で用いられているノルボ
ルナン骨格を有するジオールとしては、2.5−および
2,6−ビス(ヒドロキシメチル)ノルボルナン混合物
ならびに2,5−および2,6−シヒドロキシノルボル
ナン混合物であシ、該公報のノルボルナン骨格を有する
ジオールとしてはノルボルナンの二つの環にそれぞれヒ
ドロキシメチル基およびヒドロキシル基が結合している
化合物を意図しているものと考えられる。これらの化合
物はいずれもノルボルナジェンより誘導されるもので、
通常は2,5−および2,6一体の混合物として得られ
るものである。このため該公報の実施例においても異性
体の混合物として用いられているが、異性体の混合物で
あるために、得られる樹脂のガラス転移点は比較的低い
ものとなる。更に、該樹脂に於てはノルボルナン骨格は
ポリマー主鎖中に位置する。これに対し、本発明におけ
るn = Oの場合に相当する2、3−ビス(ヒドロキ
ンメチル)ノルボルナンに於ては二つのヒドロキンメチ
ル基はノルボルナンの一つの環に結合しておシ、該ジオ
ールから導かれる樹脂は、ノルボルナン環がポリマー主
鎖の側鎖に位置し、主鎖の運動性を低下させるのに有効
に作用するためガラス転移点は、2.5−あるいは2.
6一体を用いた場合よりも上昇する。このガラス転移点
の高さは光記録媒体用基体に望まれる実用的な物性とし
ては必須のものである。However, the diols having a norbornane skeleton used in the examples in the publication include a mixture of 2,5- and 2,6-bis(hydroxymethyl)norbornane and a mixture of 2,5- and 2,6-dihydroxynorbornane. It is thought that the diol having a norbornane skeleton in this publication is intended to be a compound in which a hydroxymethyl group and a hydroxyl group are bonded to the two rings of norbornane, respectively. All of these compounds are derived from norbornadiene,
It is usually obtained as a mixture of 2,5- and 2,6. Therefore, in the Examples of the publication, a mixture of isomers is used, but since it is a mixture of isomers, the glass transition point of the resulting resin is relatively low. Furthermore, in the resin, the norbornane skeleton is located in the polymer main chain. On the other hand, in 2,3-bis(hydroquinemethyl)norbornane, which corresponds to the case where n = O in the present invention, two hydroquinemethyl groups are bonded to one ring of norbornane. In resins derived from diols, the norbornane ring is located in the side chain of the polymer main chain and acts effectively to reduce the mobility of the main chain, so the glass transition point is 2.5 or 2.
6 is higher than when using one piece. This high glass transition point is essential for practical physical properties desired for a substrate for an optical recording medium.
更に本発明においてはカーボネート結合に加え導入する
ことにより、得られる樹脂のガラス転移弘は上昇し望ま
しい。Furthermore, in the present invention, by introducing carbonate in addition to bonding, the glass transition ratio of the resulting resin increases, which is desirable.
本発明の樹脂は、公知の適当な方法に従って製造するこ
とができる。すなわちたとえば炭酸ジフェニルとジカル
ボン酸のジフェニルエステルおよびジオールの混合物か
らの脱フエノール反応、炭酸ジアルキルエステルとジカ
ルボン酸のジアルキルエステルおよびジオールの混合物
からの脱アルコール反応、ホスゲンとジカルボン酸塩化
物およびジオールからの脱塩化水素反応、ホスゲンとジ
カルボン酸塩化物およびジオールのアルカリ金属塩の混
合物からの脱アルカリ金属塩化物反応等の反応を必要に
応じて適当な触媒の存在下で行なわせることにより製造
することができる。反応の形態は反応方法に応じて溶融
法や溶液法等の手法を採用できるが、反応の容易さから
は溶融法がよい。The resin of the present invention can be produced according to any known suitable method. For example, dephenol reaction from a mixture of diphenyl carbonate and diphenyl ester of dicarboxylic acid and diol, dealcoholization reaction from a mixture of dialkyl carbonate and dialkyl ester of dicarboxylic acid and diol, de-alcoholization reaction from phosgene and dicarboxylic acid chloride and diol. It can be produced by carrying out reactions such as hydrogen chloride reaction, dealkali metal chloride reaction from a mixture of phosgene, dicarboxylic acid chloride, and alkali metal salt of diol, etc. in the presence of an appropriate catalyst as necessary. . As for the form of the reaction, methods such as a melt method and a solution method can be adopted depending on the reaction method, but the melt method is preferable from the viewpoint of ease of reaction.
原料として炭酸ジフェニルおよび/もしくはジカルボン
酸のジフェニルエステルを使用して溶融法にて本発明の
樹脂を製造する場合、触媒としては度広性の高さから金
属リチウムや種々のリチウム化合物がよい。好ましくは
金属リチウム、水素化リチウム、窒化リチウム、水酸化
リチウム、リチウムのエトキシドやブトキシド等のりチ
ウムアルコキシドがよく、さらに好ましくは金属リチウ
ムおよび水素化リチウムがよい。また、原料にジフェニ
ルエステルを用いない場合には、上記リチウム化合物以
外にもテトラアルキルオルソチタネート、酸化ジプチル
スズ、酸化ゲルマニウム、酢酸亜鉛等の通常のエステル
交換反応の触媒を使用することができるが、反応性の高
さからテトラアルキルオルソチタネートがよい。When the resin of the present invention is produced by a melting method using diphenyl carbonate and/or diphenyl ester of a dicarboxylic acid as a raw material, metal lithium or various lithium compounds are preferable as catalysts because of their high spreading properties. Preferred are metal lithium, lithium hydride, lithium nitride, lithium hydroxide, and lithium alkoxides such as lithium ethoxide and butoxide, and more preferred are metal lithium and lithium hydride. In addition, when diphenyl ester is not used as a raw material, ordinary transesterification catalysts such as tetraalkylorthotitanate, diptyltin oxide, germanium oxide, zinc acetate, etc. can be used in addition to the lithium compounds mentioned above. Tetraalkyl orthotitanate is preferred because of its high properties.
触媒の使用量は原料全体に対して通常010001〜1
モル%の範囲、好ましくは0.001〜0.1モル%の
範囲である。触媒の使用量が少ないと反応速度が極端に
低下し、また触媒の使用量が多すぎると得られる樹脂の
吸水率が上昇する。The amount of catalyst used is usually 010001 to 1 based on the total raw material.
% by mole, preferably from 0.001 to 0.1 mol%. If the amount of catalyst used is too small, the reaction rate will be extremely reduced, and if the amount of catalyst used is too large, the water absorption rate of the resulting resin will increase.
重縮合反応は、原料と触媒を窒素やアルゴン、二酸化炭
素等の不活性ガス雰囲気中で加熱して撹拌し、発生する
アルコールもしくはフェノールを留出させることにより
進行させることができる。The polycondensation reaction can be advanced by heating and stirring the raw materials and catalyst in an atmosphere of an inert gas such as nitrogen, argon, or carbon dioxide, and distilling off the generated alcohol or phenol.
反応温度は原料や発生するアルコールもしくはフエノー
ルの沸点ならびに要求される反応速度によって異なるが
、通常150〜300℃の範囲である。The reaction temperature varies depending on the raw materials, the boiling point of the alcohol or phenol generated, and the required reaction rate, but is usually in the range of 150 to 300°C.
反応の後半では必要に応じて系を減圧にして反応を追い
込む。この際の圧は0.001〜100mmHyの範囲
である。In the latter half of the reaction, the pressure of the system is reduced as necessary to drive the reaction. The pressure at this time is in the range of 0.001 to 100 mmHy.
本発明の樹脂の分子量については、ゲルパーミエイショ
ンクロマトグラフイー(cpc)による数平均分子i(
ポリスチレン換算)が3,000以上100.000以
下、好ましくは5,000以上100.000以下、よ
シ好ましくは10,000以上100,000以下であ
ることがよい。分子量が低くなると機械的強度が低下す
る。また、分子量が高くなると合成困難となる。Regarding the molecular weight of the resin of the present invention, the number average molecule i (
(in terms of polystyrene) is preferably 3,000 or more and 100,000 or less, preferably 5,000 or more and 100,000 or less, and even more preferably 10,000 or more and 100,000 or less. As the molecular weight decreases, mechanical strength decreases. Furthermore, when the molecular weight becomes high, synthesis becomes difficult.
本発明の樹脂を光記録媒体用基体として用いる場合には
、公知の任意の方法例えば押出成形、射出成形、圧縮成
形、射出圧縮成形等の方法により成形を実施することが
できる。この際樹脂温は通常200〜400℃に、金型
温度は40〜200℃の範囲に設定される。成形の際必
要に応じて公知の添加剤例えば熱安定剤、光安定剤、帯
電防止剤、潤滑剤、無機もしくは有機の充填剤、染料、
顔料等を加えてもよい。また他の樹脂をブレンドするこ
ともできる。When the resin of the present invention is used as a substrate for an optical recording medium, molding can be carried out by any known method such as extrusion molding, injection molding, compression molding, injection compression molding, and the like. At this time, the resin temperature is usually set in the range of 200 to 400°C, and the mold temperature is set in the range of 40 to 200°C. Known additives such as heat stabilizers, light stabilizers, antistatic agents, lubricants, inorganic or organic fillers, dyes, etc. may be added as necessary during molding.
Pigments etc. may also be added. It is also possible to blend other resins.
本発明の光記録媒体用基体は、−旦平板等の簡単な形状
に成形した後に無機または有機の材料と積層するっ接着
あるいは融着により貼シ合わせる、表面にエンボス加工
を施す、といった高次加工を行なうことも可能である。The substrate for optical recording media of the present invention can be formed into a simple shape such as a flat plate, then laminated with an inorganic or organic material, laminated by adhesion or fusion, or embossed on the surface. It is also possible to perform processing.
例えば読み出し専用光記録媒体用基体として本発明の樹
脂を用いる際には、必要に応じてグループや信号等を記
録した金型を用いて射出成形等によシ該基体を得る。こ
れにアルミニウムや白金等の金属を真空蒸着等の方法に
より情報面上に成膜し、次いで保護ポリマー層を形成す
るかもしくは2枚貼り合わせる。情報記録層は本発明の
成形材料を用いた平坦な基体の上に光硬化性の樹脂を用
いていわゆる2P法によって設けてもよい。また、その
他公知の任意の方式によって情報記録部を構成すること
ができる。例えば成形した基体の表面に酸化テルルやテ
ルビウム−鉄−コバルト系合金等の無機物あるいはシア
ニン系色素等の有機物の薄膜を設ける等である。なお、
ここで光記録媒体用基体とは、具体的には光デイヌク基
体、光カード基体等の、基体内部を通過するレーザ光に
よって情報の記録および/もしくは読み出しを物理的も
しくは化学的に行なうための媒体に用いられる基体を指
す。またその形状はシート状、フィルム状、ディスク状
、カード状等任意である。For example, when using the resin of the present invention as a substrate for a read-only optical recording medium, the substrate is obtained by injection molding or the like using a mold in which groups, signals, etc. are recorded as necessary. A film of metal such as aluminum or platinum is then formed on the information surface by a method such as vacuum evaporation, and then a protective polymer layer is formed or two layers are bonded together. The information recording layer may be provided on a flat substrate using the molding material of the present invention using a photocurable resin by the so-called 2P method. Further, the information recording section can be constructed using any other known method. For example, a thin film of an inorganic material such as tellurium oxide or a terbium-iron-cobalt alloy, or an organic material such as a cyanine dye is provided on the surface of a molded substrate. In addition,
Here, the term "substrate for optical recording media" specifically refers to a medium for physically or chemically recording and/or reading information using a laser beam passing through the substrate, such as an optical recording medium substrate or an optical card substrate. refers to the substrate used for Further, the shape thereof may be arbitrary, such as a sheet, a film, a disk, or a card.
以下余白
〔実施例〕
以下実施例によシ本発明をさらに詳細に説明する。なお
、物性値は下記の方法に従って測定した。The following margins [Examples] The present invention will be explained in more detail by way of Examples below. In addition, the physical property values were measured according to the following method.
■数平均分子量:GPC(ポリスチレン換算)によシ求
めた。■Number average molecular weight: Determined by GPC (polystyrene equivalent).
■ガラス転移点:示差熱分析法(窒素中、昇温速度10
°C/ min )によシ測定した。■Glass transition point: Differential thermal analysis method (in nitrogen, heating rate 10
°C/min).
■光透過早:熱プレスにより2rffr+ 厚に成形し
た試料の波長400.600および800 umの光の
透過率を分光光度計により測定した。(2) Light transmission rate: The transmittance of light at a wavelength of 400.600 and 800 um was measured using a spectrophotometer for a sample molded to a thickness of 2rffr+ by heat pressing.
■複屈折(リターデーション) : 直径40 mrn
、 厚さ6mrrIに成形した試料を熱プレスによシ1
mm厚に圧延し、中心から3Qmmの点について偏光顕
微鏡(波長589nm)を用いて測定した。■Birefringence (retardation): Diameter 40 mrn
, A sample molded to a thickness of 6 mrrI was heated through a hot press.
It was rolled to a thickness of mm and measured using a polarizing microscope (wavelength: 589 nm) at a point 3 Q mm from the center.
■光弾性係数:熱プレスによシ2 cmX 10 cm
X 2皿厚に成形した板についてヘリウム−ネオンレー
ザを光源として副島らの方法(高分子学会高分子実験学
編集委員会編「高分子実験学」第10巻、P、296
(1983)共立出版)に準拠して求めた。■Photoelastic coefficient: heat press 2 cm x 10 cm
X Soejima et al.'s method using a helium-neon laser as a light source for a plate formed to a thickness of 2 plates (Komunshi Experimental Science, edited by the Editorial Committee of the Society of Polymer Science and Technology, Vol. 10, P, 296)
(1983) Kyoritsu Shuppan).
■表面硬度:鉛筆硬度試験(J I S K 540
0 )によった。■Surface hardness: Pencil hardness test (J I S K 540
0).
■飽和吸水率:23℃の蒸留水中にて吸水による重量増
加の時間変化が認められなくなった時の重量増加率を求
めることにより測定した。なお、末法によるビスフェノ
ールAポリカーボネートの飽和吸水率は0.40%であ
った。(2) Saturated water absorption rate: Measured by determining the weight increase rate when no time change in weight increase due to water absorption was observed in distilled water at 23°C. Note that the saturated water absorption rate of bisphenol A polycarbonate obtained by the powder method was 0.40%.
■吸水反り: 2crr+×10cmX 2mm厚の板
状試料の片面にアルミニウムを1000人厚に真空蒸着
し、これを23℃の蒸留水に浸漬して発生した反り(中
央部の浮き)の最大値を吸水反りとした。■Water absorption warpage: 2 crr + × 10 cm It absorbs water and becomes warped.
ポリマーのム
合成例1
内径44 Q mm 、内容積70P、、材質がS U
S 316Lで6り、ダブルへリカルリボン型撹拌翼
を有し、反応槽の壁面と該撹拌翼のクリアランスが5皿
である反応槽に2.3−ジ(ヒドロキシメチ/L/)
−ベルヒドロ−1,4:5.8−ジメタノナフタレン1
9.39kg、 ジフェニルカーボネート14.95
kg、1.4−シクロヘキサンジカルボン酸ジフェニル
5、66 kgおよび触媒として水素化リチウム0.6
9.Qを仕込み、系内を窒素ガスで充分置換したのち反
応槽の油浴温度を220°Cとし、60分保持した。Polymer synthesis example 1 Inner diameter 44 Q mm, internal volume 70P, material S U
2.3-di(hydroxymethy/L/) was placed in a reaction tank with a double helical ribbon type stirring blade and a clearance of 5 plates between the wall of the reaction tank and the stirring blade.
-berhydro-1,4:5.8-dimethanonaphthalene 1
9.39kg, diphenyl carbonate 14.95
kg, 5,66 kg of diphenyl 1,4-cyclohexanedicarboxylate and 0.6 kg of lithium hydride as catalyst.
9. After charging Q and sufficiently purging the system with nitrogen gas, the temperature of the oil bath in the reaction tank was set to 220°C and maintained for 60 minutes.
しかるのち毎分70回転の回転速度で撹拌を行ないなが
ら230℃で60分、240”Cで80分、250°C
で90分反応させた。この時点でのフェノール留出量は
15.17kg(理論量の92%)であった。Then, while stirring at a rotational speed of 70 revolutions per minute, the temperature was 230°C for 60 minutes, 240"C for 80 minutes, and 250°C.
The reaction was carried out for 90 minutes. The amount of phenol distilled out at this point was 15.17 kg (92% of the theoretical amount).
次いで温度を250°Cに保持したまま系を28mmH
gの減圧度として15分反応させた。次にこの反応槽の
内容物を、同方向に回転する二軸の円形撹拌翼を有し、
内径が100 mm 、槽長が1000 mmである反
応槽に供給し、250℃、毎分90回の回転速度、減圧
勤m1g 1滞留時間15分の条件下で追い込み重合を
行なった。ポリマーはストランド状で取す出し、ベレッ
ト状に切断した。得られたポリマーは淡黄色透明で、数
平均分子量は39.000 であった。また、ポリマー
収量は21.26kQであった。得られたポリマーの組
成及び各種物性を第1表に示す。The system was then heated to 28 mmH while maintaining the temperature at 250°C.
The reaction was carried out for 15 minutes at a reduced pressure of 1.5 g. Next, the contents of this reaction tank are
The mixture was supplied to a reaction tank having an inner diameter of 100 mm and a tank length of 1000 mm, and forced polymerization was carried out under the conditions of 250°C, a rotation speed of 90 times per minute, and a residence time of 15 minutes per ml of vacuum. The polymer was taken out in the form of strands and cut into pellets. The obtained polymer was pale yellow and transparent, and had a number average molecular weight of 39,000. Moreover, the polymer yield was 21.26 kQ. Table 1 shows the composition and various physical properties of the obtained polymer.
合成例2
合成例1で使用した反応槽に2.3−ジ(ヒドロキシメ
チル)−ベルヒドロ−1,4:5.10:6.9−トリ
メタノアントラセン23,61kg% 114−シクロ
ヘキサンジカルボン酸ジメチ/L’16.39に、およ
び触媒としてテトラブチルオルンチタネー) 4.0
gを仕込み、系内を窒素ガスで充分置換したのち反応槽
の油浴温度を180°Cとし、60分保持した。しかる
のち毎分70回転の回転速度で撹拌を行ないながら20
0°Cで60分、230℃で80分、250°Cで60
分に応させた。この時点でのメタノール留出量は4.7
7kg(理論量の91%)であった。次いで温度を25
0℃に保持したまま系を30 mmHgの減圧度として
15分反応させた。次にこの反応槽の内容物を合成例1
と同様にして次の反応槽に供給し、250℃、毎分90
回の回転速度、減圧度6 rrtnHg 、滞留時間1
5分の条件下で追い込み重合を行なった。ポリマーはス
トランド状で取り出し、ベレット状に切断した。得られ
たポリマ−は淡黄色透明で、数平均分子量は34.00
0であった。また、ポリマー収量は30.92kQであ
った。得られたポリマーの各種物性を第1表に示す。Synthesis Example 2 Into the reaction tank used in Synthesis Example 1, 23,61 kg% of 2,3-di(hydroxymethyl)-berhydro-1,4:5.10:6.9-trimethanoanthracene/dimethylene 114-cyclohexanedicarboxylate/ L'16.39 and tetrabutylorontitane as catalyst) 4.0
After the system was sufficiently purged with nitrogen gas, the temperature of the oil bath in the reaction tank was set to 180°C and maintained for 60 minutes. Then, while stirring at a rotational speed of 70 revolutions per minute,
60 minutes at 0°C, 80 minutes at 230°C, 60 minutes at 250°C
I responded accordingly. The amount of methanol distilled at this point is 4.7
It was 7 kg (91% of the theoretical amount). Then increase the temperature to 25
While maintaining the temperature at 0°C, the system was reduced in pressure to 30 mmHg and allowed to react for 15 minutes. Next, the contents of this reaction tank were synthesized in Synthesis Example 1.
In the same manner as above, it was supplied to the next reaction tank and heated at 250°C and 90% per minute.
rotational speed, degree of vacuum 6 rrtnHg, residence time 1
Drive polymerization was carried out under conditions of 5 minutes. The polymer was taken out in the form of strands and cut into pellets. The obtained polymer was pale yellow and transparent, and the number average molecular weight was 34.00.
It was 0. Moreover, the polymer yield was 30.92 kQ. Table 1 shows various physical properties of the obtained polymer.
合成例3
原料として、2.3−ジ(ヒドロキシン−F−)L/)
−ベルヒドロ−1,4:5.8−ジメタノナフタレン2
0,0572g、ベルヒドロ−4,7−メタノインデン
−2,5−ジカルボン酸ジメチ/L’ 9.11 kQ
、 1.4−シクロヘキサンジカルボン酸ジメチ/l/
10.84kgおよヒ触媒としてテトラブチルオルソ
チタネート4.0 gを用い、合成例1の反応装置にて
合成例2と同一の反応条件下で淡黄色透明のベレット状
ポリマー30.16kgを得た。このポリマーの数平均
分子量は40.000であった。得られたポリマーの組
成及び各種物性を第1表に示す。Synthesis Example 3 As a raw material, 2,3-di(hydroxyne-F-)L/)
-berhydro-1,4:5.8-dimethanonaphthalene 2
0,0572 g, dimethylene perhydro-4,7-methanoindene-2,5-dicarboxylic acid/L' 9.11 kQ
, 1,4-cyclohexanedicarboxylic acid dimethy/l/
Using the reaction apparatus of Synthesis Example 1 and the same reaction conditions as Synthesis Example 2, using 10.84 kg and 4.0 g of tetrabutyl orthotitanate as a catalyst, 30.16 kg of pale yellow transparent pellet-shaped polymer was obtained. . The number average molecular weight of this polymer was 40,000. Table 1 shows the composition and various physical properties of the obtained polymer.
合成例4
原料トして、2.3−ノルボルナンジメタノ−iV 1
4.89 kg 、 シフ x 二)vカーボネート
14.29&g。Synthesis Example 4 Starting materials, 2.3-norbornane dimethanol-iV 1
4.89 kg, Schiff x 2) v carbonate 14.29&g.
2.7−ゾカヒドロナフクレンジカルポン酸ジフエニ/
L’ 10.82 kgおよび触媒として金属リチウム
粉末0.66gを用い、合成例1の反応装置にて合成例
2と同一の反応条件下で淡黄色透明のベレット状ポリマ
ー20.30 kgを得た。このポリマーの数平均分+
1は37.000
であった。2.7-zocahydronafcleandicarponic acid diphenylene/
Using 10.82 kg of L' and 0.66 g of metallic lithium powder as a catalyst, 20.30 kg of pale yellow transparent pellet-shaped polymer was obtained using the reaction apparatus of Synthesis Example 1 under the same reaction conditions as Synthesis Example 2. . Number average of this polymer +
1 was 37.000.
得られたポリマー の組成及び各種物性を第1表に示す。obtained polymer The composition and various physical properties are shown in Table 1.
以下余白
光記録媒体としての特性
実施例1
合成例1の樹脂を用い、テクノプラス社製SIM−47
49A射出成形機により外径13cm、内径1.5cm
、厚さ1.2rrlrr+に射出成形した基体を得た。Characteristics as a blank optical recording medium Example 1 Using the resin of Synthesis Example 1, SIM-47 manufactured by Technoplus Co., Ltd.
Outer diameter 13cm, inner diameter 1.5cm by 49A injection molding machine
A substrate was obtained which was injection molded to a thickness of 1.2rrlrr+.
この基体に窒化アルシミニウムケイ素/テルビムウムー
鉄−コバルト/窒化アルミニウムケイ素を順次スパッタ
リングにより成膜し、光磁気ディスクとしての書き込み
/読み出し/消去特性を評価した結果、読み出し信号の
C/N比は50dBであった。また100万回の書き込
み/読み出し/消去実施後のC/N比は46dBであっ
た。さらに、75’C,85%RHで1000時間保存
後のC/N比は47dBと良好であった。Films of aluminum silicon nitride/terbium iron-cobalt/aluminum silicon nitride were sequentially formed on this substrate by sputtering, and the writing/reading/erasing characteristics as a magneto-optical disk were evaluated. As a result, the C/N ratio of the read signal was 50 dB. there were. Furthermore, the C/N ratio after writing/reading/erasing 1 million times was 46 dB. Furthermore, the C/N ratio after storage for 1000 hours at 75'C and 85% RH was as good as 47 dB.
実施例2
合成例2の樹脂を用い、実施例1と同様にして光磁気デ
ィスクとしての特性評価を実施した結果、C/N比51
dB、100万回繰り返し試験後は48dB、75’C
185%RHで1000時間保存後は、i 6dBと良
好であった。Example 2 Using the resin of Synthesis Example 2, the characteristics as a magneto-optical disk were evaluated in the same manner as in Example 1. As a result, the C/N ratio was 51.
dB, 48dB, 75'C after 1 million repeated tests
After storage for 1000 hours at 185% RH, the i was good at 6 dB.
実施例3
合成例3の樹脂を用い、実施例1と同様にして光磁気デ
ィスクとしての特凶三評価を実施した結果、C/N比5
0dB、100′7i回繰り返し試験、後は47dB、
75°C185%RHで1000時間保存後は45dB
と良好であった。Example 3 Using the resin of Synthesis Example 3, the characteristics of the magneto-optical disk were evaluated in the same manner as in Example 1. As a result, the C/N ratio was 5.
0dB, repeated test 100'7i times, then 47dB,
45dB after 1000 hours storage at 75°C 185%RH
It was good.
比較例
樹脂としてポリカーボネート(音大化成製パンライ)A
D5503)を用い、実施例1と同様にして光磁気ディ
スクとしての特性評価を実施した結果、C/N比45d
B、100万回繰り返し試験後は40dB、75°C1
8596RHで1000時間保存後は40dBであった
。Polycarbonate (Panrai manufactured by Ondai Kasei) A as a comparative example resin
D5503), and as a result of evaluating the characteristics as a magneto-optical disk in the same manner as in Example 1, the C/N ratio was 45d.
B, 40dB after 1 million times repeated test, 75°C1
After being stored for 1000 hours at 8596RH, it was 40 dB.
以上述べてきたように、本発明の樹脂を用いることによ
り光記録媒体用基体として優れた、すなわち以下の緒特
性を有する基体が提供される。As described above, by using the resin of the present invention, a substrate excellent as a substrate for an optical recording medium, that is, a substrate having the following characteristics can be provided.
■光透過率が9096以上(2nu4、波長800ru
n)と高い。■Light transmittance is 9096 or more (2nu4, wavelength 800ru
n) and high.
■ガラス転移点が110°C以上と良好な耐熱性を示す
。■It exhibits good heat resistance with a glass transition point of 110°C or higher.
■飽和吸水率が0.3 %以下と低い。■Saturated water absorption rate is low at 0.3% or less.
■光磁気ディスク基体として使用した際に、読み出し信
号のC7N比がビスフェノ−/I/Aポリカーボネート
からなる基体を使用した場合よりも5dB以上高い。(2) When used as a magneto-optical disk substrate, the C7N ratio of the read signal is 5 dB or more higher than when a substrate made of bispheno-/I/A polycarbonate is used.
特許出願人 株式会社 り ラ しPatent applicant RiRashi Co., Ltd.
Claims (3)
ポリエステル、ポリエステルカーボネートまたはポリカ
ーボネート樹脂からなる光記録謀体用基体。 ▲数式、化学式、表等があります▼( I ) (R_1、R_2は結合もしくは炭素数8以下のアルキ
レン基、アルキリデン基またはシクロアルキレン基であ
り、R_1とR_2の間には結合もしくは炭素数6以下
のアルキレン基、アルキリデン基による橋かけ構造があ
つてもよい。R_1とR_2は同時に結合であることは
ない。R_3、R_4は水素原子または炭素数4以下の
アルキル基である。x、yは共重合比を示す数字であり
、x:y=100:0〜0:100(モル比)の範囲で
ある。また、nは0、1または2である。)(1) A substrate for an optical recording device comprising polyester, polyester carbonate or polycarbonate resin in which repeating units are represented by the following general formula (I). ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (I) (R_1 and R_2 are a bond or an alkylene group, alkylidene group, or cycloalkylene group with 8 or less carbon atoms, and between R_1 and R_2 there is a bond or a carbon number of 6 or less There may be a bridged structure with an alkylene group or an alkylidene group. R_1 and R_2 are not bonds at the same time. R_3 and R_4 are hydrogen atoms or alkyl groups having 4 or less carbon atoms. It is a number indicating the polymerization ratio, and is in the range of x:y = 100:0 to 0:100 (molar ratio). Also, n is 0, 1 or 2.)
るポリエステル、ポリカーボネートまたはポリエステル
カーボネート樹脂からなる光記録媒体用基体。 ▲数式、化学式、表等があります▼( I a) (x、yは共重合比を示す数字であり、x:y=100
:0〜0:100(モル比)の範囲である。 またnは0、1または2である。)(2) A substrate for an optical recording medium comprising polyester, polycarbonate, or polyester carbonate resin in which the repeating unit is represented by the following general formula (Ia). ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (I a) (x, y are numbers indicating the copolymerization ratio, x:y=100
:0 to 0:100 (molar ratio). Further, n is 0, 1 or 2. )
るポリエステル、ポリカーボネートまたはポリエステル
カーボネート樹脂からなる光記録媒体用基体。 ▲数式、化学式、表等があります▼( I b) (x、yは共重合比を示す数字であり、x:y、=10
0:0〜0:100(モル比)の範囲である。 またnは0、1または2である。)(3) A substrate for an optical recording medium comprising polyester, polycarbonate or polyester carbonate resin in which the repeating unit is represented by the following general formula (Ib). ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (I b) (x, y are numbers indicating the copolymerization ratio, x:y, = 10
The range is 0:0 to 0:100 (molar ratio). Further, n is 0, 1 or 2. )
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63330210A JPH02173953A (en) | 1988-12-26 | 1988-12-26 | Substrate for optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63330210A JPH02173953A (en) | 1988-12-26 | 1988-12-26 | Substrate for optical recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02173953A true JPH02173953A (en) | 1990-07-05 |
Family
ID=18230075
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63330210A Pending JPH02173953A (en) | 1988-12-26 | 1988-12-26 | Substrate for optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02173953A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2355267A (en) * | 1999-10-11 | 2001-04-18 | Hyundai Electronics Ind | Photoresist polycarbonates and photoresist compositions containing the same |
-
1988
- 1988-12-26 JP JP63330210A patent/JPH02173953A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2355267A (en) * | 1999-10-11 | 2001-04-18 | Hyundai Electronics Ind | Photoresist polycarbonates and photoresist compositions containing the same |
US6586154B1 (en) | 1999-10-11 | 2003-07-01 | Hyundai Electronics Industries Co., Ltd. | Photoresist polymers and photoresist compositions containing the same |
GB2355267B (en) * | 1999-10-11 | 2004-01-14 | Hyundai Electronics Ind | Novel photoresist polymers and photoresist compositions containing the same |
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