JPH02165539A - Formation of plasma display panel barrier - Google Patents

Abstract

PURPOSE:To form a barrier with narrow patterns which meets large-screen requirements by forming, on a glass plate, a layer made from photo-soluble resin with a thickness equal to that of the barrier and utilizing photolithography to form lines. CONSTITUTION:A layer 2 having the same thickness as a barrier is formed on a glass plate 1 using photo-soluble resin, and the layer 2 is then subjected to exposure and development to form openings 4 through removal of specific portions. Subsequently, ultraviolet rays are irradiated upon the layer now with the openings 4 to make it developer-soluble, and insulating paste 5a is embedded in the openings 4 to obtain a layer 5b loaded with the insulating paste 5a. When the layer 5b is developed, photo-soluble resin portions are removed to form patterns of the insulating paste 5a, which are then baked into the barrier. This process is useful in meeting both fine-pattern and large-screen requirements.

Description

DETAILED DESCRIPTION OF THE INVENTION A.9 OBJECTS OF THE INVENTION The present invention relates to a method for manufacturing a barrier for a plasma display panel, and relates to a method for manufacturing a barrier that is narrower than the conventional barrier and is compatible with large screens.

1 @tl As shown in Fig. 2, a single-digit plasma display panel consists of a substrate (front plate) 8 for an anode 7, a substrate (back plate) 10 for a cathode 9, and a partition wall 11, with the electrodes facing each other at right angles. Light is emitted by causing a discharge in the space between the intersections. At this time, to prevent optical crosstalk,
Furthermore, a black barrier 11 is provided to create contrast on the screen. The shape of this barrier is approximately 100 μnl wide
, the height is 100 μm or more, and in the case of an A4 size panel, approximately 640 barriers are formed. Conventionally, this barrier has been formed by forming a pattern using a thick film printing method using a paste made by mixing ceramic powder with an organic binder solvent, etc., followed by drying and firing.

Problems to be Solved However, such manufacturing methods generally have the following problems.

(1) In order to form the film using the thick film printing method, the thickness that can be formed in -times of printing is at most 10-odd μm, and the required thickness is 100 μm.
Repeated printing approximately 10 times or more was required to obtain a height of μ- or more. For this reason, positioning every time is very important, which is a factor that deteriorates the yield.

(2) Since it is manufactured by repeated thick film printing, the width of the barrier is limited to about 100 μm, making it difficult to support future fine patterns of 640 or more lines (III wall width of 100 μm or less).

(3) Since it is manufactured by thick-film printing using stainless steel mesh, the printing area is limited by the mesh original plate, making it difficult to support screens larger than A4 size.

The purpose of the present invention is to solve the above-mentioned problems of the prior art, namely, to form a barrier for plasma display that can reliably form a barrier with a narrow width and can also be adapted to larger screens in the future. 90, the composition of the invention is to provide a method for solving the problem! υE stage The present invention involves a step of forming a layer using a photosoluble resin on a glass plate with a thickness equal to or thicker than that of the barrier, and forming a layer using the photosoluble resin in a desired area by exposing and developing the layer using the photosoluble resin. irradiating the layer in which the opening has been formed with ultraviolet rays to make it soluble in a developer; embedding an insulating paste that acts as a barrier in the opening; and filling the layer with the insulating paste. forming a layer filled with the insulating paste, developing the layer filled with the insulating paste to remove the part using the photosoluble resin and forming a pattern of the insulating paste, and baking the insulating paste to form an insulating layer. This is a method for forming a barrier for a plasma display panel, which is characterized by comprising the steps of:

The barrier formation method according to the present invention will be described below as shown in FIGS. 1(a) to (g).
The explanation will be based on.

Fig. 1 (a) shows an example of how to divide 100 to 100 sheets using a photosoluble resin on a glass plate 1 by a doctor blade method or a roll coater method.
A layer 2 with a thickness of 250 μm is formed.

As this photosoluble resin, for example, A24903 photoresist manufactured by Hoechst Javan Co., Ltd. is available. When the thickness of the layer 2 made of a photosoluble resin is 100 μm or less, it is impossible to form a barrier with a thickness of 100 μm or more due to shrinkage during drying and baking. Moreover, when it is 250 μm or more, the formed aspect ratio (height 7 width) becomes high, and moldability and shape retention become poor. The layer 2 using the photo-soluble resin of the present invention may be made of a single photo-soluble resin, but may be made of inorganic powder such as ceramics or the like to the extent that light transmittance and photoreactivity are not impaired.
Since organic powders, organic solutions, etc. may be selected and mixed, these are collectively referred to.

In Figure (b), the layer using the above-mentioned photo-soluble resin is prebaked, and selectively exposed using a glass mask 3 to irradiate ultraviolet rays to areas 4 that will serve as barriers.

In Figure (c), the exposed area is developed using a developer, and the patterning of the layer using the photosoluble resin having the openings 4 is completed.

In Figure (d), the entire surface of the layer having the openings 4 is irradiated with ultraviolet rays to make it soluble in the developer.

Figure (e) shows that, for example, 5iOz 15%, Al2O520%, Fe2O
,10%, Cr2O331MnO1%, Co02%,
An insulating paste containing ceramic powder consisting of 35% PbO and 8% B20q was embedded, and the insulating paste 5a
115b filled with Note that the insulating paste may be any material as long as it contains ceramic powder that turns black after firing and becomes an insulator.

Figure <f> is -E! Develop the layer in which the apertures are filled with insulating paste, and remove the layer using photosoluble resin.
A pattern of insulating paste with a width of 0 μm was formed.

Figure (g) shows the firing process (not shown) for thick film paste at a firing temperature of 580°C for the above-mentioned barrier insulation paste.
The organic binder burns out and the glass-ceramic material is sintered into a black insulating layer, forming a barrier 6 approximately 80 μm wide and approximately 150 μm high. The firing temperature may be any temperature at which the insulating paste becomes black and sufficiently densified.

C1 As described in detail of the invention, according to the barrier manufacturing method according to the present invention, since the photolithography method is used for line formation, there is no restriction of the mesh original plate as in the printing method.
It is also possible to accommodate larger screens. Additionally, alignment, which is performed over ten times in the conventional printing method, is no longer necessary, making it possible to shorten the process. Furthermore, there are excellent effects such as the ability to use conventional processes in subsequent steps after firing.

[Brief explanation of the drawing]

FIG. 1 is an example of 6) to (g) illustrating the manufacturing method of the present invention. FIG. 2 shows an example of the structure of a plasma display. 1. Glass plate, 2. Photosoluble resin J, 3. Glass mask, 4. opening 5a; insulating paste 5b; layer in which the opening is filled with 5a; 6. Barrier, 7, Anode, 8, Front plate, 9. Cathode, No. 1171 back plate, Chapter 1 wall.

Claims (1)

[Claims] A step of forming a layer using a photo-soluble resin on a glass plate with a thickness equal to or greater than that of the barrier, and removing a desired portion of the layer using the photo-soluble resin by exposing and developing to form an opening. a step of irradiating the layer in which the opening is formed with ultraviolet rays to make it soluble in a developer; embedding an insulating paste to serve as a barrier in the opening;
a step of forming a layer filled with an insulating paste; a step of developing the layer filled with the insulating paste to remove a portion using a photosoluble resin and forming a pattern of the insulating paste; and a step of forming a pattern of the insulating paste. A method for forming a barrier for a plasma display panel, which comprises a step of firing to form an insulating layer.