JPH0216147A - Sealing resin composition - Google Patents

Sealing resin composition

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Publication number
JPH0216147A
JPH0216147A JP16648688A JP16648688A JPH0216147A JP H0216147 A JPH0216147 A JP H0216147A JP 16648688 A JP16648688 A JP 16648688A JP 16648688 A JP16648688 A JP 16648688A JP H0216147 A JPH0216147 A JP H0216147A
Authority
JP
Japan
Prior art keywords
resin
silica powder
resin composition
formula
polyfunctional
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16648688A
Other languages
Japanese (ja)
Inventor
Tsutomu Nagata
勉 永田
Kazuhiro Sawai
沢井 和弘
Masatomo Kouzuki
上月 雅友
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Chemical Corp
Original Assignee
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Chemical Corp filed Critical Toshiba Chemical Corp
Priority to JP16648688A priority Critical patent/JPH0216147A/en
Publication of JPH0216147A publication Critical patent/JPH0216147A/en
Pending legal-status Critical Current

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  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Sealing Material Composition (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To form a sealing resin composition less affected by absorbed water, being excellent in, especially, humidity resistance and soldering-heat resistance after being immersed in a soldring bath and having high reliability by mixing a specified polyepoxy resin with a polyphenol resin and a silica powder. CONSTITUTION:This sealing composition essentially consists of a polyepoxy resin of formula I or II (wherein n is 0 or an integer >=1; R is CmH2m+1, and m >=0), a polyphenol resin of formula III or IV (wherein n is 0 or an integer >=1; R is CmH2m+1; and m >=0), and 50-90wt.%, based on the total resin composition, silica powder. As the silica powder, one having a low impurity content and a mean particle diameter <=30mum is desirable.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、耐湿性、半田1tif熱性に優れた封止用樹
脂組成物に関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a sealing resin composition that has excellent moisture resistance and solder heat resistance.

(従来の技術) 近年、半導体集積回路の分野において、高集積化、高信
頼性化の技術開発と同時に半導体装置の組付は工程の自
動化が推進されている。 例えば、フラットパッケージ
をの半導体装置を回路基板に取り1・目する場合は、従
来、リードピン毎に半田付けを行っていたが、最近では
半田浸漬方式や半田リフロ一方式が採用されている。
(Prior Art) In recent years, in the field of semiconductor integrated circuits, along with technological developments for higher integration and higher reliability, automation of processes for assembling semiconductor devices has been promoted. For example, when a semiconductor device in a flat package is attached to a circuit board for the first time, each lead pin has traditionally been soldered, but recently a solder dipping method or a solder reflow method has been adopted.

(発明が解決しようとする課題) 従来のエポキシ樹脂、ノボラック型フェノール樹脂およ
びシリカ粉末からなる樹脂組成物で封止した半導体装置
では、装置全体の半田浴浸漬を行うと半導体装置の信頼
性が低下するという欠点があった。 特に吸湿した半導
体装置を半田浸漬すると封止樹脂と半導体チップあるい
は封止樹脂とリードフレームとの間に剥がれや内部樹脂
クラックが生じ、著しい耐湿性劣化を生じ、電極の腐食
による断線や水分によるリーク電流を生じ、長期間の信
頼性を保証することができないという欠点があった。
(Problem to be Solved by the Invention) In a semiconductor device sealed with a conventional resin composition consisting of an epoxy resin, a novolac type phenol resin, and a silica powder, the reliability of the semiconductor device decreases when the entire device is immersed in a solder bath. There was a drawback to doing so. In particular, if a semiconductor device that has absorbed moisture is immersed in solder, peeling or internal resin cracks may occur between the encapsulating resin and the semiconductor chip or between the encapsulating resin and the lead frame, resulting in significant moisture resistance deterioration, wire breakage due to electrode corrosion, and leakage due to moisture. It has the disadvantage that it generates electric current and cannot guarantee long-term reliability.

本発明は、上記の欠点を解消するためになされたもので
吸湿の影響が少なく、半導体装置全体を半田浴浸漬や半
田リフローしても半導体チップやリードフレームとの剥
がれや内部樹脂クラックの発生がなく、また耐湿性劣化
に伴う電極の腐食による断線や水分によるリーク電流を
生じない、長期間の信頼性の高い耐湿性、半田耐熱性に
優れた封止用樹脂組成物を提供しようとするものである
The present invention has been made to solve the above-mentioned drawbacks, and has little influence of moisture absorption, and even if the entire semiconductor device is immersed in a solder bath or soldered reflowed, it will not peel off from the semiconductor chip or lead frame or cause internal resin cracks. An object of the present invention is to provide a resin composition for sealing that has excellent moisture resistance and soldering heat resistance and is highly reliable over a long period of time, and does not cause disconnection due to electrode corrosion or leakage current due to moisture due to deterioration of moisture resistance. It is.

[発明の構成] (課題を解決するための手段) 本発明者らは、上記の目的を達成しようと鋭意研究を重
ねた結果、特定の多官能エポキシ樹脂と多官能フェノー
ル樹脂を使用すればガラス転移温度が上昇し、熱時の機
械的特性や半田耐熱性が向上した組成物が得られること
を見いだし、本発明を完成したものである。
[Structure of the Invention] (Means for Solving the Problems) As a result of intensive research aimed at achieving the above object, the present inventors have discovered that glass can be produced by using specific polyfunctional epoxy resins and polyfunctional phenolic resins. The present invention was completed based on the discovery that a composition with an increased transition temperature and improved mechanical properties and soldering heat resistance during heating can be obtained.

即ち、本発明は、 (A)次の(I)式又は(n)式で示される多官能エポ
キシ樹脂 ■ (f!F、 L、式中nは0又は1以上の整数、Ctn
 H2m ++ 、  l’n≧Oを表す)(B)次の
(II[)式又は(IV )能フェノール樹脂 式で示される多官 ・・・ ( Rは ■ ・・・ (IV ) (但し、式中nは0又は1以上の整数、RはC,H2□
1,1≧0を表す) (C)シリカ粉末 を必須成分とし、全体の樹脂組成物に対して前記(C)
シリカ粉末を50〜90重量%含有することを特徴とす
る封止用樹脂組成物である。
That is, the present invention provides (A) a polyfunctional epoxy resin represented by the following formula (I) or (n) (f!F, L, where n is an integer of 0 or 1 or more, Ctn
H2m ++ , l'n≧O) (B) A polyfunctional phenolic resin represented by the following formula (II[) or (IV) formula... (R is ■... (IV) (However, In the formula, n is 0 or an integer of 1 or more, R is C, H2□
1,1≧0) (C) silica powder is an essential component, and the above (C) is added to the entire resin composition.
This is a sealing resin composition characterized by containing 50 to 90% by weight of silica powder.

本発明に用いる(A)多官能エポキシ樹脂としては、前
記の(I)又は(II>式で示されるもので、その分子
中に前記の骨格構造を有する限り分子量など特に#I限
されることなく広く包含される。
The polyfunctional epoxy resin (A) used in the present invention is one represented by the above formula (I) or (II>, and as long as it has the above-mentioned skeleton structure in its molecule, the molecular weight is particularly limited to #I. It is widely covered.

そしてこれらのエポキシ樹脂は少なくとも三官能又は四
官能のエポキシ樹脂である。 具体的なエポキシ樹脂と
しては例えば次のようなものが挙げられる。
These epoxy resins are at least trifunctional or tetrafunctional epoxy resins. Examples of specific epoxy resins include the following.

これらの多官能エポキシ樹脂は、単独もしくは2種以上
混合して用いることができる。 上記の(A)多官能エ
ポキシ樹脂には、次の一般式で示されるノボラック系の
エポキシ樹脂を混合して用いることができる。
These polyfunctional epoxy resins can be used alone or in a mixture of two or more. The above polyfunctional epoxy resin (A) may be mixed with a novolak epoxy resin represented by the following general formula.

うな多官能フェノール樹脂が挙げられる。Examples include polyfunctional phenolic resins.

(但し、式中R1は水素原子、ハロゲン原子又はアルキ
ル基を、R2は水素原子又はアルキル基を、nは1以上
の整数を表す) 本発明に用いる(B)多官能フェノール樹脂としては、
前記の(I[)又は(IV )式を有するもので、その
分子中に上記骨格構造を有するかぎり、分子量などに特
に制限されることなく広く包含される。 この多官能フ
ェノール樹脂は少なくとも三官能又は四官能フェノール
樹脂で、これらは囃独もしくは2種以上を混合して使用
することができる。 具体的なものとしては、例えば、
次のよさらに(B)多官能フェノール樹脂には、フェノ
ール、アルキルフェノール等のフェノール類とホルムア
ルデヒドあるいはパラホルムアルデヒドとを反応させて
得られるノボラック型フェノール樹脂およびこれらの変
性樹脂を混合して使用することができる。
(However, in the formula, R1 represents a hydrogen atom, a halogen atom, or an alkyl group, R2 represents a hydrogen atom or an alkyl group, and n represents an integer of 1 or more.) As the polyfunctional phenol resin (B) used in the present invention,
Those having the above formula (I[) or (IV) are broadly included without particular limitation on molecular weight, etc., as long as they have the above-mentioned skeleton structure in their molecules. This polyfunctional phenol resin is at least trifunctional or tetrafunctional phenol resin, and these can be used singly or in combination of two or more types. Specifically, for example,
In addition, (B) the polyfunctional phenol resin may be a mixture of a novolac type phenol resin obtained by reacting phenols such as phenol and alkylphenol with formaldehyde or paraformaldehyde, and modified resins thereof. can.

本発明に用いる(C)シリカ粉末としては、殻に市販さ
れているものが使用されるが、それらの中でも不純物濃
度が低く、平均粒径の30μ翔以下のものが好ましい、
 平均粒径が30μIを超えると耐湿性および成形性が
劣り好ましくない。
As the silica powder (C) used in the present invention, commercially available shells are used, but among them, those with a low impurity concentration and an average particle size of 30 μm or less are preferable.
If the average particle size exceeds 30 μI, moisture resistance and moldability will be poor, which is not preferable.

シリカ粉末の配合として、全体の樹脂組成物に対して5
0〜90重址%含有させる。 その割合が50重量%未
満では、樹脂組成物の吸湿量が高く、半田浸漬後の耐湿
性に劣り好ましくない、 また、90重量%を超えると
極端に流動性が悪く、成形性に劣り好ましくない。 従
って上記範囲内に限定される。
As a blend of silica powder, 5% of the total resin composition is used.
Contain 0 to 90% by weight. If the proportion is less than 50% by weight, the moisture absorption of the resin composition is high, resulting in poor moisture resistance after immersion in solder, which is undesirable. If it exceeds 90% by weight, fluidity is extremely poor, resulting in poor moldability, which is undesirable. . Therefore, it is limited within the above range.

本発明の封止用樹脂組成物は、上記した多官能エポキシ
樹脂、多官能フェノール樹脂、シリカ粉末を必須成分と
するが、本発明の目的に反しない限度において、必要に
応じて、例えば天然ワックス類、合成ワックス類、直鎖
脂肪酸の金属塩、酸アミド、エステル類、パラフィンな
どの離型剤、二酸化アンチモンなどの器燃刑、カーボン
ブラックなどの着色剤、シランカップリング剤、種々の
硬化促進剤、ゴム系やシリコーン系の低応力付与剤等を
適宜添加・配合することができる。
The sealing resin composition of the present invention contains the above-mentioned polyfunctional epoxy resin, polyfunctional phenol resin, and silica powder as essential components, but may optionally contain natural wax, for example, within the scope of the purpose of the present invention. Synthetic waxes, metal salts of linear fatty acids, acid amides, esters, mold release agents such as paraffin, combustion agents such as antimony dioxide, coloring agents such as carbon black, silane coupling agents, various curing accelerators A rubber-based or silicone-based low stress imparting agent can be appropriately added or blended.

本発明の封止用樹脂組成物を成形材料として製造する場
合の一般的方法は、多官能エポキシ樹脂、多官能フェノ
ール樹脂、シリカ粉末、その他を配合し、ミキサー等に
よって十分均一に混合した後、更に熱ロールによって溶
融混合処理又はニーダ等による混合処理を行い、次いで
冷却固1ヒさせ適当な大きさに粉砕して成形材料とする
ことができる。
The general method for manufacturing the sealing resin composition of the present invention as a molding material is to blend polyfunctional epoxy resin, polyfunctional phenol resin, silica powder, and others, mix sufficiently uniformly with a mixer, etc., and then Further, the mixture can be melt-mixed using heated rolls or mixed using a kneader or the like, and then cooled to solidify and pulverized to an appropriate size to form a molding material.

そして、この成形材料を電子部品あるいは電気部品の封
止用として、また被覆、絶縁等に適用し、優れた特性と
信頼性を付与することができる。
This molding material can be applied to seal electronic or electrical components, as well as for coating, insulation, etc., and can provide excellent properties and reliability.

(作用) 本発明の封止用樹脂組成物において、特定の多官能エポ
キシ樹脂および多官能フェノール樹脂を使用することに
よって反応が活発となって三次元網目構造となり、ガラ
ス転移温度が上昇する。
(Function) In the sealing resin composition of the present invention, by using a specific polyfunctional epoxy resin and polyfunctional phenol resin, the reaction becomes active to form a three-dimensional network structure, and the glass transition temperature increases.

そのため、半田浸漬や半田リフロー後の耐樹脂クラック
性が良好となる。 またガラス転移温度の上昇によって
耐熱性が向上し、熱時の機械的特性も向上する。
Therefore, resin crack resistance after solder immersion or solder reflow becomes good. In addition, heat resistance is improved by increasing the glass transition temperature, and mechanical properties under heat are also improved.

(実施例) 本発明を実施例によって説明するが、本発明は以下の実
施例に限定されるものではない6 以下の実施例および
比較例において「%」とは「重量%」を意味する。
(Example) The present invention will be explained by Examples, but the present invention is not limited to the following Examples.6 In the following Examples and Comparative Examples, "%" means "% by weight".

実施例 1 次式に示した多官能エポキシ樹脂17%、次式に示した
示した多官能フェノール樹脂10%、シリカ粉末72%
、硬化促進剤0.3%、エステルワックス0.3%およ
びシランカップリング剤0.4%を常温で混合し、さら
に90〜95℃で混練し冷却した後粉砕して、成形材料
(A)を¥A遺した。
Example 1 17% polyfunctional epoxy resin shown in the following formula, 10% polyfunctional phenolic resin shown in the following formula, 72% silica powder
, 0.3% of curing accelerator, 0.3% of ester wax, and 0.4% of silane coupling agent are mixed at room temperature, further kneaded at 90 to 95°C, cooled, and then crushed to obtain molding material (A). I left ¥A.

実施例 2 実施例1で用いた多官能エポキシ樹脂9%、オルソクレ
ゾール・ノボラック型エポキシ樹脂8%、実施例1で用
いた多官能フェノール樹脂5%、フェノールノボラック
型フェノール樹脂5%、シリカ粉末72%、硬化促進剤
0.3%、エステルワックス0.3%およびシランカッ
プリング剤0.4%を常温で混合し、さらに90〜95
℃で混練・冷却した後粉砕して、成形材料(B)、を製
造した。
Example 2 9% of the polyfunctional epoxy resin used in Example 1, 8% of orthocresol novolak type epoxy resin, 5% of the polyfunctional phenol resin used in Example 1, 5% of phenol novolac type phenol resin, 72% of silica powder %, curing accelerator 0.3%, ester wax 0.3% and silane coupling agent 0.4% are mixed at room temperature, and further 90-95%
A molding material (B) was produced by kneading and cooling at °C and then pulverizing.

比較例 オルソクレゾール・ノボラック型エポキシ樹脂17%、
ノボラック型フェノール樹脂8%、シリカ粉末74%、
硬化促進剤0.3%、エステル系ワックス0.3%およ
びシランカップリング剤0.4%を混合し、実施例1と
同様にして成形材料(C)を製造した。
Comparative example Orthocresol novolac type epoxy resin 17%,
8% novolac type phenolic resin, 74% silica powder,
A molding material (C) was produced in the same manner as in Example 1 by mixing 0.3% of a curing accelerator, 0.3% of an ester wax, and 0.4% of a silane coupling agent.

実施例1〜2および比較例で製造した成形材料<A)〜
(C)を、170℃に加熱した金型内にトランスファー
注入し硬化させて、封止した成形品を得た。 成形品に
ついて吸水率、ガラス転移温度、曲げ強さ、半田浸漬後
のPCTの試験を行い、結果を得たので第1表に示した
。 本発明の顕著な効果を確認することができた。
Molding materials manufactured in Examples 1 and 2 and comparative examples <A) ~
(C) was transfer-injected into a mold heated to 170° C. and cured to obtain a sealed molded product. The molded products were tested for water absorption, glass transition temperature, bending strength, and PCT after solder immersion, and the results are shown in Table 1. It was possible to confirm the remarkable effects of the present invention.

第 ■ 表 (単位) 1:l−ランスファー成形によって直径5011、厚さ
31nの成形品を作り、これを127℃2.5気圧の飽
和水蒸気中に24時間放置し、増加した重量によって測
定した。
Table ■ (Units) 1: A molded product with a diameter of 5011 and a thickness of 31 nm was made by l-transfer molding, and was left in saturated steam at 127°C and 2.5 atm for 24 hours, and the weight increase was measured. .

*2 :吸水率の試験と同じ成形品を作り、これを17
5℃で8時間の後硬化を行った後、適当な大きさの試験
片とし、熱機械特性分析装置を用いて測定した。
*2: Make the same molded product as in the water absorption test, and test this with 17
After post-curing at 5° C. for 8 hours, a test piece of an appropriate size was prepared and measured using a thermomechanical property analyzer.

*3  : J I S−に−6911に準じて測定し
た6*4 :成形材料を用いて、2本以上のアルミニウ
ム配線を有するシリコン製チップを、通常の4270イ
フレームに接着し、115℃で2分間トランスファー成
形した後、175℃。
*3: Measured according to JIS-6911 6 *4: Using a molding material, a silicon chip with two or more aluminum wirings was glued to a normal 4270 frame and heated at 115°C. 175°C after transfer molding for 2 minutes.

8時間の後硬化を行った′、 こうして作った成形品を
予め40℃、90%、100時間の吸湿処理した後、2
50°Cの半田浴に10秒間浸漬をした。 その後、1
27℃、2.5気圧の飽和水蒸気中でプレッシャークッ
カーテス1〜(PCT)を行い、アルミニウムの腐食に
よる断線を不良として評価した6 [発明の効果] 以上の説明および第1表から明らかなように、本発明の
封止用樹脂組成物は、特定の多官能エポキシ樹脂と多官
能フェノール樹脂を用いたから、吸湿の影響が少なく、
耐湿性、半田耐熱性、熱時の機械的特性に優れているた
め、半田浸漬等の後においても、半導体チップとリード
フレームとの剥がれや内部樹脂クラックの発生がなく、
また1り(湿性劣化に伴う電極の18食による断線や水
分によるリーク電流を生じることがなく信頼性の高いも
のである。
After curing for 8 hours, the molded product thus made was subjected to moisture absorption treatment for 100 hours at 40°C, 90%, and then cured for 2 hours.
It was immersed in a solder bath at 50°C for 10 seconds. After that, 1
Pressure Cooker Test 1~ (PCT) was conducted in saturated steam at 27°C and 2.5 atm, and disconnection due to corrosion of aluminum was evaluated as a defect.6 [Effects of the Invention] As is clear from the above explanation and Table 1. In addition, since the sealing resin composition of the present invention uses a specific polyfunctional epoxy resin and a polyfunctional phenol resin, it is less affected by moisture absorption.
It has excellent moisture resistance, soldering heat resistance, and mechanical properties at high temperatures, so even after immersion in solder, the semiconductor chip and lead frame will not peel off or internal resin cracks will occur.
Furthermore, it is highly reliable as it does not cause wire breakage due to corrosion of the electrodes due to moisture deterioration or leakage current due to moisture.

特許出願人 東芝ケミカル株式会社Patent applicant: Toshiba Chemical Corporation

Claims (1)

【特許請求の範囲】 1(A)次の( I )式又は(II)式であ る多官能エポキシ樹脂 ▲数式、化学式、表等があります▼…( I ) ▲数式、化学式、表等があります▼…(II) (但し、式中nは0又は1以上の整数、RはC_m(I
)H_2_m_+_1、m≧0を表す)(B)次の(I
II)式又は(IV)式で示される多官能フェノール樹脂 ▲数式、化学式、表等があります▼…(III) ▲数式、化学式、表等があります▼…(IV) (但し、式中nは0又は1以上の整数、RはC_mH_
2_m_+_1、m≧0を表す)(C)シリカ粉末 を必須成分とし、全体の樹脂組成物に対して前記(C)
シリカ粉末を50〜90重量%含有することを特徴とす
る封止用樹脂組成物。
[Claims] 1(A) A polyfunctional epoxy resin having the following formula (I) or (II) ▲There are mathematical formulas, chemical formulas, tables, etc.▼…(I) ▲There are mathematical formulas, chemical formulas, tables, etc. ▼…(II) (However, in the formula, n is an integer of 0 or 1 or more, R is C_m(I
) H_2_m_+_1, m≧0) (B) Next (I
Polyfunctional phenolic resin represented by formula II) or formula (IV)▲There are mathematical formulas, chemical formulas, tables, etc.▼…(III) ▲There are mathematical formulas, chemical formulas, tables, etc.▼…(IV) (However, in the formula, n is 0 or an integer greater than or equal to 1, R is C_mH_
2_m_+_1, m≧0) (C) silica powder is an essential component, and the above (C) is added to the entire resin composition.
A sealing resin composition containing 50 to 90% by weight of silica powder.
JP16648688A 1988-07-04 1988-07-04 Sealing resin composition Pending JPH0216147A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16648688A JPH0216147A (en) 1988-07-04 1988-07-04 Sealing resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16648688A JPH0216147A (en) 1988-07-04 1988-07-04 Sealing resin composition

Publications (1)

Publication Number Publication Date
JPH0216147A true JPH0216147A (en) 1990-01-19

Family

ID=15832283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16648688A Pending JPH0216147A (en) 1988-07-04 1988-07-04 Sealing resin composition

Country Status (1)

Country Link
JP (1) JPH0216147A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0280424A (en) * 1988-09-16 1990-03-20 Toshiba Corp Epoxy resin composition and resin-sealed semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0280424A (en) * 1988-09-16 1990-03-20 Toshiba Corp Epoxy resin composition and resin-sealed semiconductor device

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