JPH02160395A - High frequency heating device - Google Patents

High frequency heating device

Info

Publication number
JPH02160395A
JPH02160395A JP31367588A JP31367588A JPH02160395A JP H02160395 A JPH02160395 A JP H02160395A JP 31367588 A JP31367588 A JP 31367588A JP 31367588 A JP31367588 A JP 31367588A JP H02160395 A JPH02160395 A JP H02160395A
Authority
JP
Japan
Prior art keywords
heating chamber
heated
power supply
side wall
supply port
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP31367588A
Other languages
Japanese (ja)
Inventor
Katsuyoshi Yamada
勝義 山田
Tsutomu Arai
勉 新井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Home Appliance Co Ltd
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Home Appliance Co Ltd
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Home Appliance Co Ltd, Mitsubishi Electric Corp filed Critical Mitsubishi Electric Home Appliance Co Ltd
Priority to JP31367588A priority Critical patent/JPH02160395A/en
Priority to DE68921050T priority patent/DE68921050T2/en
Priority to EP89122965A priority patent/EP0373608B1/en
Priority to NZ231737A priority patent/NZ231737A/en
Priority to AU46190/89A priority patent/AU625617B2/en
Priority to US07/450,250 priority patent/US5015813A/en
Publication of JPH02160395A publication Critical patent/JPH02160395A/en
Priority to US07/615,969 priority patent/US5057660A/en
Pending legal-status Critical Current

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  • Constitution Of High-Frequency Heating (AREA)
  • Electric Ovens (AREA)

Abstract

PURPOSE:To heat the material to be heated uniformly from the upper, from the side and from the lower and shorten the heating time by providing two feeding openings at the upper and the lower of the side wall of a heating chamber, and feeding the micro wave from the both feeding openings to the heating chamber. CONSTITUTION:The upper feeding opening 5 is provided at the upper of the side wall of a heating chamber 1 and the lower feeding opening 5a is provided at the lower of the side wall of the heating chamber 1, and while a wave guide 4 to which a magnetron 3 is attached is mounted on the outside of the side wall of the heating chamber 1 so as to communicated with the upper and the lower feeding openings 5, 5a. The lower feeding opening 5a is provided under the material to be heated 6 or near a turn table 2, and the upper and the lower feeding openings 5, 5a are provided at the corners of the backward of the heating chamber 1. The micro wave injected from the magnetron 3 is led from the wave guide 4 to the upper and the lower feeding openings 5, 5a, so as to be fed to the heating chamber 1, Thereby, the micro wave is fed from the upper and the lower of the material to be heated, and the material to be heated can be heated uniformly in short time.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、例えば電子レンジの如き高周波加熱装置に係
り、さらに詳しくは加熱ムラを改善した高周波加熱装置
に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a high frequency heating device such as a microwave oven, and more particularly to a high frequency heating device that improves heating unevenness.

[従来の技術] 第5図は従来の高周波加熱装置を利用した電子レンジの
一例を模式的に示した縦断面図である。
[Prior Art] FIG. 5 is a longitudinal cross-sectional view schematically showing an example of a microwave oven using a conventional high-frequency heating device.

第5図(a)において、(1)は加熱室、(2)は加熱
室(1)の下部に設けられ、被加熱物(6)を載置する
ターンテーブルである。(3)はマイクロ波を発生する
マグネトロン、(4)は加熱室(1)の天井外壁に取付
けられ、マグネトロン(3)から発射されたマイクロ波
を加熱室(1)の天井に設けた給電口(5)に導く導波
管である。
In FIG. 5(a), (1) is a heating chamber, and (2) is a turntable provided at the lower part of the heating chamber (1) on which the object to be heated (6) is placed. (3) is a magnetron that generates microwaves, and (4) is a power supply port installed on the ceiling of the heating chamber (1) that is attached to the outer wall of the ceiling of the heating chamber (1), and that transmits the microwaves emitted from the magnetron (3). It is a waveguide that leads to (5).

上記のような構成の電子レンジにおいては、ターンテー
ブル(2)に被加熱物(6)を記載し、ドアを閉じて電
源スィッチ(図示せず)を投入すると、ターンテーブル
(2)が回転すると共に、マグネトロン(3)からマイ
クロ波を発射する。このマイクロ波は導波管(4)から
給電口(5)を経て加熱室に給電され、被加熱物(6)
を加熱する。
In the microwave oven configured as described above, when the object to be heated (6) is placed on the turntable (2), the door is closed, and a power switch (not shown) is turned on, the turntable (2) rotates. At the same time, microwaves are emitted from the magnetron (3). This microwave is supplied to the heating chamber from the waveguide (4) through the power supply port (5), and the heated object (6) is
heat up.

第5図(b)は他の従来技術を示すもので、本例では加
熱室(1)の側壁上方に給電口(5)を設け、側壁の外
側に取付けられた導波管(4)から給電口(5)を経て
加熱室(1)内にマイクロ波を給電するようにしたもの
で、その作用は第1図(a>の場合と同じである。
FIG. 5(b) shows another conventional technique. In this example, a power supply port (5) is provided above the side wall of the heating chamber (1), and a waveguide (4) attached to the outside of the side wall is connected to the power supply port (5). Microwaves are supplied into the heating chamber (1) through the power supply port (5), and its operation is the same as in the case shown in FIG. 1 (a).

[発明が解決しようとする課題] 上記のような従来の高周波加熱装置は、加熱室(1)内
にマイクロ波を給電する給電口(5)が、天井又は側壁
に1か所設けられているだけなので、矢印で示すように
被加熱物(6)にマイクロ波が均一に給電されず、加熱
ムラを生じる場合が多かった。また、このため被加熱物
(6)を置く場所によっては加熱に時間がかかり、多く
の電力を消費するなどの問題があった。
[Problems to be Solved by the Invention] In the conventional high-frequency heating device as described above, a power supply port (5) for supplying microwave power into the heating chamber (1) is provided at one location on the ceiling or side wall. Therefore, the microwaves were not uniformly supplied to the object to be heated (6) as shown by the arrow, and uneven heating often occurred. Furthermore, depending on the location where the object to be heated (6) is placed, it takes time to heat the object, consuming a lot of power.

本発明は、上記の課題を解決するべくなされたもので加
熱ムラが少なく、加熱時間を短縮できる高周波加熱装置
を得ることを目的としたものである。
The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to obtain a high-frequency heating device that can reduce heating unevenness and shorten heating time.

[課題を解決するための手段] 本発明に係る高周波加熱装置は、加熱室の側壁の上方又
は天井に上部給電口を、また側壁の下方又は底面に下部
給電口を設け、1台のマグネトロンによりこれら両給電
口から加熱内にマイクロ波を給電するようにしたもので
ある。
[Means for Solving the Problems] The high-frequency heating device according to the present invention has an upper power supply port provided above the side wall or the ceiling of the heating chamber, and a lower power supply port provided below the side wall or the bottom surface, and uses one magnetron. Microwaves are supplied into the heating chamber from both of these power supply ports.

また、下部給電口を被加熱物の下方又はターンテーブル
の近傍に設け、あねいは上下の給電口を加熱室後方の隅
部に設けたものである。
Further, the lower power supply port is provided below the object to be heated or near the turntable, and the upper and lower power supply ports are provided at the rear corner of the heating chamber.

[作 用] マグネトロンから発射されたマイクロ波を導波管から上
下の給電口に導き、加熱室に給電する。
[Operation] Microwaves emitted from the magnetron are guided from the waveguide to the upper and lower power feed ports, and power is supplied to the heating chamber.

これにより、被加熱物の上下からマイクロ波が給電され
、被加熱物をムラが少なく短時間で加熱する。
As a result, microwaves are supplied from above and below the object to be heated, and the object to be heated is heated in a short time with little unevenness.

また、加熱室後部の隅部に上下給電口を設けた場合は、
ターンテーブルに干渉されない隅部の底板上に被加熱物
を置くことにより、加熱ムラなくより短時間でこれを加
熱することができる。
In addition, if the upper and lower power supply ports are installed in the rear corner of the heating chamber,
By placing the object to be heated on the bottom plate in the corner where it will not be interfered with by the turntable, the object can be heated in a shorter time without uneven heating.

[発明の実施例コ 第1図は本発明の実施例を模式的に示した説明図で、(
a)は平面図、(b)は縦断面図である。なお、第5図
で説明した従来例と同−又は相当部分には同じ符号を付
し、説明を省略する。本発明においては、加熱室(1)
の側壁の上方に上部給電口(5)を、また下方に下部給
電口(5a)を設けると共に、マグネトロン(3)が取
付けられた導波管(4)を上下の給電口(5) 、 (
5a)と連通ずるように加熱室(1)の側壁の外側に装
着したものである。なお、実施例では、下部給電口(5
a)は被加熱物(6)より下方に設けられており、また
、給電口の上下方向の大きさ(高さ)を上部給電口(5
)は1.5 mrs 、下部給電口(5a)は35mm
とし、上部給電口(5)に比べて下部給電口(5a)を
大きく構成した。
[Example of the Invention Figure 1 is an explanatory diagram schematically showing an example of the present invention.
(a) is a plan view, and (b) is a longitudinal cross-sectional view. Note that the same or equivalent parts as those of the conventional example explained in FIG. In the present invention, the heating chamber (1)
An upper power feed port (5) is provided above the side wall of the , and a lower power feed port (5a) is provided below.
It is attached to the outside of the side wall of the heating chamber (1) so as to communicate with the heating chamber (1). In addition, in the example, the lower power feeding port (5
a) is provided below the heated object (6), and the vertical size (height) of the power feed port (5) is
) is 1.5 mrs, and the lower power feed port (5a) is 35 mm.
The lower power feeding port (5a) is configured to be larger than the upper power feeding port (5).

上記のように構成した本実施例においては、上下2個所
の給電口(5) 、(5a)から加熱室(1)内にマイ
クロ波が給電されるので、被加熱物(6)の加熱ムラが
少なくなり、加熱時間を短縮することができる。なお、
下部給電口(5a)を被加熱物り6)の下方に設けた場
合は、被加熱物(6)の上下からマイクロ波が給電され
るので、加熱時間をさらに短縮することができる。
In this embodiment configured as described above, microwaves are supplied into the heating chamber (1) from the upper and lower power supply ports (5) and (5a), so that uneven heating of the object to be heated (6) is prevented. The heating time can be shortened. In addition,
When the lower power supply port (5a) is provided below the object to be heated 6), microwaves are fed from above and below the object to be heated (6), so that the heating time can be further shortened.

第2図は本発明の他の実施例の説明図である。FIG. 2 is an explanatory diagram of another embodiment of the present invention.

本実施例においては、加熱室(1)の側壁の隅部(実施
例では後方)に上部給電口(5)と下部給電口(5a)
を設けると共に、マグネトロン(3)が装着された導波
管(4)を加熱室(1)の側壁外側の隅部に取付けたも
のである。本実施例によれば、例えば銚子、コツプ等に
入れられた酒、牛乳等の如き水分の多い被加熱物(6)
を、ターンテーブル(2)に干渉されない隅部の底板上
に直接置くことにより、被加熱物(6)を上方と側方か
ら加熱することができるので加熱ムラを少なくし、加熱
時間を短縮することができる。この場合、必要に応じて
ターンテーブル(2)の回転を停止できるようにしても
よい。
In this embodiment, an upper power supply port (5) and a lower power supply port (5a) are provided at the corner of the side wall of the heating chamber (1) (at the rear in the embodiment).
In addition, a waveguide (4) equipped with a magnetron (3) is attached to the outer corner of the side wall of the heating chamber (1). According to the present embodiment, the heated object (6) contains a large amount of water, such as sake, milk, etc., placed in a pot, for example.
By placing it directly on the bottom plate in the corner where it will not be interfered with by the turntable (2), the object to be heated (6) can be heated from above and from the sides, reducing uneven heating and shortening the heating time. be able to. In this case, the rotation of the turntable (2) may be stopped as necessary.

第3図の実施例は上部給電口(5)を側壁の上方に設け
ると共に、下部給電口(5a)をターンテーブル(2)
の近傍に設けて導波管(4)を取付けたものである。こ
のように構成したことにより、例えば水分の多い被加熱
物(6)を下部給電口(5a)に近接してターンテーブ
ル(2)上に置けき、ターンテーブル(2)を停止して
加熱すれば、被加熱物(6)には上方及び側方からマイ
クロ波が給電され、加熱ムラが少なくかつ短時間で加熱
することができる。
In the embodiment shown in FIG. 3, the upper power supply port (5) is provided above the side wall, and the lower power supply port (5a) is connected to the turntable (2).
A waveguide (4) is attached to the waveguide (4). With this configuration, for example, the object to be heated (6) containing a lot of moisture can be placed on the turntable (2) in close proximity to the lower power feed port (5a), and the object to be heated can be heated by stopping the turntable (2). For example, microwaves are supplied to the object to be heated (6) from above and from the sides, and heating can be done in a short time with less uneven heating.

第4図の実施例は上部給電口(5)を側壁の上方でかつ
隅部に設けると共に、下部給電口(5a)を加熱室(1
)の底面に設けて導波管(4)を取付けたもので、例え
ば水分の多い被加熱物(6)をこの下部給電口(5a)
上に直接配設することにより、被加熱物(6)に上方及
び下方からマイクロ波が給電される。このため、被加熱
物(6)は上下方向の温度差がきわめて少なく、かつ短
時間で加熱される。
In the embodiment shown in FIG. 4, the upper power supply port (5) is provided above the side wall and at the corner, and the lower power supply port (5a) is provided in the heating chamber (1).
), and a waveguide (4) is attached to it.
By arranging it directly above, microwaves are supplied to the heated object (6) from above and below. Therefore, the object to be heated (6) has very little temperature difference in the vertical direction and is heated in a short time.

上記の説明では上部給電口を加熱室の側壁上方に、また
下部給電口を側壁下方若しくは底面に設けた場合を示し
たが、上部給電口を加熱室の天井に設けてもよい。
In the above description, the upper power supply port is provided above the side wall of the heating chamber, and the lower power supply port is provided below the side wall or on the bottom surface, but the upper power supply port may be provided on the ceiling of the heating chamber.

[発明の効果] 以上の説明から明らかなように、本発明は加熱室の側壁
(又は天井若しくは底面)の上下2か所に給電口を設け
、両給電口から加熱室にマイクロ波を給電するようにし
たので、被加熱物を上方、側方又は下方からムラなく加
熱することができ、その上加熱時間を短縮することがで
きる。
[Effects of the Invention] As is clear from the above description, the present invention provides power supply ports at two locations above and below the side wall (or ceiling or bottom surface) of the heating chamber, and supplies microwave power to the heating chamber from both power supply ports. As a result, the object to be heated can be heated evenly from above, from the side, or from below, and furthermore, the heating time can be shortened.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図〜第4図はそれぞれ本発明実施例の模式図で、(
a)は平断面図、(b)は縦断面図である。 第5図(a) 、(b)はそれぞれ従来の高周波加熱装
置を模式的に示した縦断面図である。 図において、(1)は加熱室、(2)はターンテーブル
、(3)マグネトロン、(4)は導波管、(5)は上部
給電口、(5a)は下部給電口、(8)は被加熱物であ
る。なお、図中同一符号は同−又は相当部分を示す。 代理人 弁理士 佐々木 宗 治 第 図 第2図 (b) ど 44卓トシBξ循「 第 (b) 図 第 図
Figures 1 to 4 are schematic diagrams of embodiments of the present invention, respectively.
(a) is a plan sectional view, and (b) is a longitudinal sectional view. FIGS. 5(a) and 5(b) are vertical cross-sectional views schematically showing conventional high-frequency heating devices, respectively. In the figure, (1) is a heating chamber, (2) is a turntable, (3) is a magnetron, (4) is a waveguide, (5) is an upper power supply port, (5a) is a lower power supply port, and (8) is a It is an object to be heated. Note that the same reference numerals in the figures indicate the same or equivalent parts. Agent Patent Attorney Muneharu Sasaki Figure 2 (b)

Claims (4)

【特許請求の範囲】[Claims] (1)マグネトロンから発射されたマイクロ波を導波管
及び給電口を経て加熱室に給電し、該加熱室内の被加熱
物を加熱する装置において、 上記加熱室の側壁の上方又は天井に上部給電口を設ける
と共に、該側壁の下方又は底面に下部給電口を設け、1
台のマグネトロンによりこれら両給電口から上記加熱室
にマイクロ波を給電することを特徴とする高周波加熱装
置。
(1) In a device that supplies microwaves emitted from a magnetron to a heating chamber via a waveguide and a power supply port to heat an object to be heated in the heating chamber, the top supply is provided above the side wall or ceiling of the heating chamber. In addition to providing an opening, a lower power feeding port is provided below or on the bottom of the side wall;
A high-frequency heating device characterized in that microwaves are supplied to the heating chamber from both of these power supply ports by a magnetron on the base.
(2)下部強電口を被加熱物の下方に設けてなる請求項
(1)記載の高周波加熱装置。
(2) The high-frequency heating device according to claim (1), wherein the lower strong electric port is provided below the object to be heated.
(3)上部給電口と下部給電口を加熱室後方の隅部に設
けてなる請求項(1)記載の高周波加熱装置。
(3) The high-frequency heating device according to claim (1), wherein the upper power supply port and the lower power supply port are provided at a rear corner of the heating chamber.
(4)下部給電口をターンテーブルの近傍に設けてなる
請求項(1)記載の高周波加熱装置。
(4) The high-frequency heating device according to claim (1), wherein the lower power feeding port is provided near the turntable.
JP31367588A 1988-12-14 1988-12-14 High frequency heating device Pending JPH02160395A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP31367588A JPH02160395A (en) 1988-12-14 1988-12-14 High frequency heating device
DE68921050T DE68921050T2 (en) 1988-12-14 1989-12-12 Microwave heater.
EP89122965A EP0373608B1 (en) 1988-12-14 1989-12-12 Microwave heating apparatus
NZ231737A NZ231737A (en) 1988-12-14 1989-12-12 Microwave oven feed by oscillating antenna in side wall
AU46190/89A AU625617B2 (en) 1988-12-14 1989-12-13 Microwave heating apparatus
US07/450,250 US5015813A (en) 1988-12-14 1989-12-13 Power feeding port arrangement for a microwave heating apparatus
US07/615,969 US5057660A (en) 1988-12-14 1990-11-20 Method of making microwave heating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31367588A JPH02160395A (en) 1988-12-14 1988-12-14 High frequency heating device

Publications (1)

Publication Number Publication Date
JPH02160395A true JPH02160395A (en) 1990-06-20

Family

ID=18044157

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31367588A Pending JPH02160395A (en) 1988-12-14 1988-12-14 High frequency heating device

Country Status (1)

Country Link
JP (1) JPH02160395A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4318207A1 (en) * 1992-06-01 1993-12-02 Matsushita Electric Ind Co Ltd Heating and cooking device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5795095A (en) * 1980-12-04 1982-06-12 Hitachi Netsu Kigu Kk High frequency heater
JPS60138897A (en) * 1983-12-26 1985-07-23 松下電器産業株式会社 High frequency heater
JPS625499B2 (en) * 1979-12-17 1987-02-05 Nippon Denki Kk

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS625499B2 (en) * 1979-12-17 1987-02-05 Nippon Denki Kk
JPS5795095A (en) * 1980-12-04 1982-06-12 Hitachi Netsu Kigu Kk High frequency heater
JPS60138897A (en) * 1983-12-26 1985-07-23 松下電器産業株式会社 High frequency heater

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4318207A1 (en) * 1992-06-01 1993-12-02 Matsushita Electric Ind Co Ltd Heating and cooking device
US5371343A (en) * 1992-06-01 1994-12-06 Matsushita Electric Industrial Co., Ltd. Heating cooking device having a wave guide and feeder port disposed perpendicular to a rotary table

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