JPH0215934A - Holding device - Google Patents

Holding device

Info

Publication number
JPH0215934A
JPH0215934A JP16424788A JP16424788A JPH0215934A JP H0215934 A JPH0215934 A JP H0215934A JP 16424788 A JP16424788 A JP 16424788A JP 16424788 A JP16424788 A JP 16424788A JP H0215934 A JPH0215934 A JP H0215934A
Authority
JP
Japan
Prior art keywords
held
pressing body
wafer
support part
installation plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16424788A
Other languages
Japanese (ja)
Inventor
Satoru Osawa
哲 大沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP16424788A priority Critical patent/JPH0215934A/en
Publication of JPH0215934A publication Critical patent/JPH0215934A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q3/00Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
    • B23Q3/02Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine for mounting on a work-table, tool-slide, or analogous part
    • B23Q3/06Work-clamping means

Abstract

PURPOSE:To ensure the easy mounting and demounting of a retained article and enable reliable holding without any damage to the retained article by providing a means capable of releasing a pressing body from the opposite position of the circumferential part of the retained body via the elastic deformation of an elastic deformation member. CONSTITUTION:When a pneumatic cylinder 5 is actuated and presses the lower center of the support part 3b of a pressing body 5 with the predetermined pressing force, a plate spring 4 between the support part 3b of the pressing body 5 and a placement board 2 is compressed and when the pressing body 3 rises, the top of the support part 3b and the tip of the lower projection 2a of the placement board 2 come in contact with each other. As at least the support part 3b of the pressing body 5 is made of a material capable of elastic deformation, when the pressing body 3 is made to further rise, the center part of the aforesaid support 3b rises as curved. Consequently, the circumferential part of the support part 3b is curved down and the contact part 3a of the pressing body 3 moves in a transverse direction, or retreats from the upper position of the circumferential part of the placement board 2. In this state, a wafer 1 is placed at the predetermined position on the surface of the placement board 2.

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) 本発明は、保持装置に関する。[Detailed description of the invention] [Purpose of the invention] (Industrial application field) The present invention relates to a holding device.

(従来の技術) ゛被保持体例えば半導体ウェハ或いはLCD用ガラス基
板等の保持には、この板状物の裏面を真空吸着して保持
する技術が一般的に使用されている。
(Prior Art) ``To hold an object to be held, such as a semiconductor wafer or a glass substrate for LCD, a technique is generally used in which the back surface of the plate-shaped object is held by vacuum suction.

このような真空吸着技術は例えば特開昭59−2499
0号等に開示されているが、このような真空吸着による
板状物の保持技術は、吸着部に微小な隙間があると急激
に吸着力が低下してしまい、真空吸着を確実に行なうた
めには、上記被保持体を保持するために必要な力の数倍
〜数十倍もの力で吸着する必要があり、このような大き
な外力を与えてしまうと、例えば半導体ウェハの場合、
半導体ウェハの結晶に欠陥を引き起こす事の他、上記真
空吸着技術を真空処理室内で使用することができない等
の問題があり、上記被保持体の周縁部を挟持する技術が
主に用いられる。このような被保持体周縁部を挟持する
技術は、例えば特開昭56−100440号、特開昭6
1−220351号、特開昭62−23102号公報等
に開示されている。
Such vacuum suction technology is disclosed in, for example, Japanese Patent Application Laid-Open No. 59-2499.
As disclosed in No. 0, etc., this technique of holding plate-shaped objects by vacuum suction is such that if there is a minute gap in the suction part, the suction force will decrease rapidly, so it is necessary to ensure vacuum suction. For example, in the case of a semiconductor wafer, it is necessary to adsorb the object with a force several to several tens of times greater than that required to hold the object.
In addition to causing defects in the crystals of semiconductor wafers, there are other problems such as the inability to use the vacuum suction technique in a vacuum processing chamber, and therefore a technique that clamps the peripheral edge of the object to be held is mainly used. Techniques for clamping the peripheral edge of the object to be held are disclosed in, for example, Japanese Patent Laid-Open Nos. 56-100440 and 6
It is disclosed in No. 1-220351, Japanese Unexamined Patent Publication No. 62-23102, etc.

(発明が解決しようとする課題) しかしながら上記特開昭56−100440号、特開昭
61−220351号公報に開示された技術は、被保持
体の下方から周囲に伸びた弾性変形可能な爪により上記
被保持体の周縁部を把持するため、この被保持体周囲か
ら中心方向即ち横方向の力が加わり、この横方向の力に
より上記被保持体及びこの表面に被着した膜に縞状の欠
陥が発生するという問題があった。
(Problem to be Solved by the Invention) However, the techniques disclosed in JP-A-56-100440 and JP-A-61-220351 utilize elastically deformable claws extending from below to the periphery of the held object. In order to grip the peripheral edge of the object to be held, a force is applied from the periphery of the object in the central direction, that is, in a lateral direction, and this lateral force causes stripes to form on the object to be held and the film attached to its surface. There was a problem that defects occurred.

尚、被保持体例えば半導体ウェハを保持する場合、上記
ウェハ表面に対して垂直に押圧することが重要となって
いる。これは、上記ウェハを垂直からずれた角度を持っ
て抑圧した場合、ウェハ表面と抑圧体の微視的に見た接
触においてすべりを生じ、その結果塵が発生して上記ウ
ェハを汚染してしまうこととなる。
Note that when holding an object to be held, such as a semiconductor wafer, it is important to press perpendicularly to the surface of the wafer. This is because if the wafer is held down at an angle that deviates from the vertical, slippage will occur in the microscopic contact between the wafer surface and the holding body, resulting in the generation of dust and contamination of the wafer. That will happen.

また、上記被保持体を保持した状態で回転処理する場合
、装置が大型化してしまう他、先に述べた理由により被
保持体周囲に大きな力を加えられないため、摩擦が小さ
く、回転の加速・減速時に上記被保持体が実際の回転に
ついて行かずに空回りするため所望の回転制御が実行で
きず、そのため回転処理に適用することは困渠となって
いた。
In addition, when rotating the object while holding it, the equipment becomes larger and, for the reasons mentioned above, it is not possible to apply a large force around the object, which reduces friction and accelerates rotation. - During deceleration, the held body does not keep up with the actual rotation and spins idly, making it impossible to perform desired rotation control, making it difficult to apply it to rotation processing.

また、」二記特開昭62−23102号公報に開示され
た技術では、被保持体周縁部を垂直に押圧して保持する
ことは可能であるが、上記被保持体を保持機構内に挿入
する際、この保持機構に上記被保持体が接触して擦れる
恐れがあり、この擦れにより塵が発生して上記被保持体
が汚染されてしまうという問題があった。
Furthermore, with the technique disclosed in JP-A No. 62-23102, it is possible to vertically press and hold the peripheral edge of the object to be held, but it is not possible to insert the object into the holding mechanism. When doing so, there is a risk that the object to be held may come into contact with the holding mechanism and be rubbed, and this rubbing may generate dust and contaminate the object to be held.

本発明は上記点に対処してなされたもので、被保持体の
着脱が容易で、更に上記被保持体にダメージを与えるこ
となく信頼性の高い保持を可能とする保持装置を提供し
ようとするものである。
The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a holding device that allows the object to be held to be easily attached and detached, and also enables highly reliable holding without damaging the object to be held. It is something.

〔発明の構成〕[Structure of the invention]

(m1題を解決するための手段) 本発明は、設置板表面に設置された被保持体の周縁部に
対向配置する押圧体及び上記設置板を相対的に移動する
ことにより、上記被保持体を保持する装置において、上
記抑圧体を弾性変形部材の弾性変形により上記被保持体
周縁部の対向位置から離脱可能とする手段を備えたこと
を特徴とする保持装置を得るものである。
(Means for Solving Problem m1) The present invention provides a means for solving the problem of the held object by relatively moving a pressing body arranged to face the peripheral edge of the held object installed on the surface of the installation plate and the installation plate. The present invention provides a holding device characterized in that the holding device includes means for making the suppressing body detachable from a position facing the peripheral edge of the held object by elastic deformation of an elastic deformation member.

(作 用) 設置板表面に設置された被保持体の周縁部に対向配置す
る抑圧体を弾性変形部材の弾性変形により、上記被保持
体周縁部の対向位置から離脱可能とする手段を備えてい
るため、上記弾性変形部材の弾性変形で上記抑圧体を上
記被保持体周縁部の対向位置から離脱させ、この状態で
上記被保持体の着脱を容易に行なうことができる。また
、上被保持体は、この被保持体周縁部に対向配置する押
圧体により、上記被保持体表面と直交する方向即ち垂直
にのみ押圧力が加わるため、上記被保持体周囲から中心
方向即ち横方向に力が加わることはなく、これにより、
上記被保持体表面に被着している膜に縞状の欠陥が発生
することはない。
(Function) A means is provided for making the suppressor disposed opposite the peripheral edge of the held object installed on the surface of the installation plate detachable from the position facing the peripheral edge of the held object by elastic deformation of the elastic deformation member. Therefore, the elastic deformation of the elastic deformation member causes the suppressing body to be separated from the position facing the peripheral edge of the held object, and in this state, the held object can be easily attached and detached. Moreover, since the upper held body is subjected to a pressing force only in a direction perpendicular to the surface of the held body, that is, perpendicularly, by a pressing body disposed opposite to the peripheral edge of the held body, from the periphery of the held body toward the center, that is, There are no lateral forces applied, which results in
Striped defects do not occur in the film adhering to the surface of the object to be held.

更に、被保持体の着脱を容易に行なうための押圧体の離
脱、つまり抑圧体の押方向に対してほぼ垂直方向の移動
は、抑圧体が被保持体から充分離れた位置で行なわれる
ため、上記被保持体と抑圧体との摩擦による塵の発生を
防止することができる。
Furthermore, since the removal of the pressing body to easily attach and detach the held object, that is, the movement of the pressing body in a direction substantially perpendicular to the pushing direction of the suppressing body, is performed at a position where the pressing body is sufficiently far away from the held object, Generation of dust due to friction between the held body and the suppressing body can be prevented.

(実施例) 以下、本発明装置の一実施例につき、図面を参照して説
明する。
(Example) Hereinafter, an example of the apparatus of the present invention will be described with reference to the drawings.

まず、保持装置の構成を説明する。First, the configuration of the holding device will be explained.

被保持体例えば半導体ウェハ■を表面に設置可能な如く
設置板■が設けられ、この設置板■は図示しない他の機
構に固着されている。この設置板■表面に設置したウェ
ハ(ト)の周縁部を垂直方向即ち上記ウェハ0)表面と
直交する方向に抑圧可能とする抑圧体■が設けられてい
る。この押圧体■は上記ウェハ■及び設置板■を囲繞す
る如く設けられており、この押圧体■は、上記ウェハ(
1)周縁部に当接する複数の当接部(3a)、及びこの
複数の当数部(3a)を上記設置板■下方において一体
的に接続支持する支持部(3b)からなっている。この
ような抑圧体■の少なくとも上記支持部(3b)は、弾
性変形可能な材質例えばアルミニウムにより形成してい
る。この支持部(3b)上面と上記設置板■との間即ち
、この設置板■周縁部下方には弾性体例えば板ばね6)
が設けられている。この板ばねに)により、通常の状態
では上記設置板■と押圧体■の支持部(3b)が離間さ
れ、上記抑圧体■の当接部(3a)が上記設置板■表面
に設置したウェハ■周縁部を押圧し、このウェハ■を保
持状態としている。また、上記設置板■下面には所定の
厚さに突起(2a)が上記設置板■から突出している。
An installation plate (2) is provided so that an object to be held, such as a semiconductor wafer (2), can be placed on the surface thereof, and this installation plate (2) is fixed to another mechanism (not shown). A suppressor (2) is provided that can suppress the peripheral edge of the wafer (7) placed on the surface of the installation plate (1) in a vertical direction, that is, in a direction perpendicular to the surface of the wafer (0). This pressing body (■) is provided so as to surround the above-mentioned wafer (■) and the installation plate (■).
1) Consists of a plurality of contact parts (3a) that abut against the peripheral edge, and a support part (3b) that integrally connects and supports the plurality of equivalent parts (3a) below the installation plate (2). At least the support portion (3b) of the suppressor (3) is made of an elastically deformable material, such as aluminum. Between the upper surface of this support part (3b) and the above-mentioned installation plate (2), that is, below the periphery of this installation plate (2), there is an elastic body such as a leaf spring 6).
is provided. Under normal conditions, the support part (3b) of the installation plate (2) and the pressing body (2) are separated by this leaf spring (2), and the abutting part (3a) of the pressing body (3) is connected to the wafer placed on the surface of the installation plate (2). (2) The peripheral edge is pressed to hold this wafer (2). Furthermore, a protrusion (2a) having a predetermined thickness protrudes from the lower surface of the installation plate (2).

この突起の先端は、上記ウェハ■が保持されている状態
では上記支持部(3b)と非接触状態に設定されている
。また、上記押圧体■の下方即ち支持部(3b)のほぼ
中央部下方には、駆動機構例えばエアシリンダー〇が設
けられており、このエアシリンダー〇の駆動により上記
支持部(3b)下面を抑圧可能としている。
The tip of this protrusion is set in a non-contact state with the support portion (3b) when the wafer (1) is held. Further, a drive mechanism, for example, an air cylinder 〇 is provided below the pressing body ◯, that is, approximately below the center of the support portion (3b), and the drive of this air cylinder 〇 suppresses the lower surface of the support portion (3b). It is possible.

このようにして保持装置0が構成されている。The holding device 0 is configured in this way.

次に、上記保持装置0の動作作用を説明する。Next, the operation of the holding device 0 will be explained.

まず、エアシリンダー■の駆動により抑圧体0の支持部
(3b)下面中心部を所定の押圧力で上方に押圧する。
First, the center of the lower surface of the support part (3b) of the suppressor 0 is pressed upward with a predetermined pressing force by driving the air cylinder (2).

この抑圧により上記支持部(3b)が上昇し、この支持
部(3b)と当接部(3a)が一体的に構成された抑圧
体■がその形状を保持しながら上昇する。この抑圧体■
の上昇に伴ない、この抑圧体■の支持部(3b)と上記
固定された設置板■との間に設けられている板ばね(イ
)が押し縮められ、更に上記抑圧体■が上昇すると、こ
の押圧体■の支持部(3b)上面及び上記設置板■下部
に突出した突起(2a)先端が接触する。更に連続して
上記抑圧体■を上昇させると上記抑圧体■の少なくとも
支持部(3b)が弾性変形可能な材質例えばアルミニウ
ムにより形成されているため、この支持部(3b)の中
心部が湾曲して上昇する。この湾曲により上記支持部(
3b)周縁部が下方に湾曲し、これに伴なって上記抑圧
体■の当接部(3a)が横方向に移動即ち、当接部(3
a)が上記設置板■周縁部上方位置から退去させる(第
3図A)。この状態で上記設置板■表面の予め定められ
た位置に、図示しないハンドリングアーム等によりウェ
ハ■を設置する(第3図B)。このウェハ(υの設置時
には、上記抑圧体0の当接部(3a)は横方向に退去し
ているため、上記ウェハα)と接触することなく容易に
行なうことができる。そして、上記エアシリンダー■を
動作させて上記抑圧体■の支持部(3b)の弾性変形を
解除即ち、上記支持部(3b)の湾曲状態を復元力によ
り元の形状に戻す(第3図C)。これにより上記抑圧体
■の当接部(3a)が、上記設置したウェハ■周縁部上
方に移動する。そして、上記エアシリンダー〇の抑圧力
を減少或いは解除することにより。
This suppression causes the support portion (3b) to rise, and the suppression body (3), in which the support portion (3b) and the contact portion (3a) are integrally constituted, rises while maintaining its shape. This repressive body
As the suppressor ■ rises, the leaf spring (A) provided between the support part (3b) of the suppressor ■ and the fixed installation plate ■ is compressed, and as the suppressor ■ rises further, the leaf spring (A) is compressed. The tips of the protrusions (2a) that protrude from the upper surface of the support part (3b) of this pressing body (2) and the lower part of the installation plate (2) come into contact with each other. When the suppressor (3) is further raised continuously, since at least the support part (3b) of the suppressor (2) is made of an elastically deformable material such as aluminum, the central part of the support (3b) curves. and rise. This curvature causes the support part (
3b) The peripheral edge curves downward, and accordingly, the abutting part (3a) of the suppressor (3) moves laterally, that is, the abutting part (3a)
a) is removed from the above-mentioned position above the periphery of the installation plate (Fig. 3A). In this state, the wafer (2) is placed at a predetermined position on the surface of the installation plate (1) using a handling arm (not shown) (FIG. 3B). When installing this wafer (υ), since the abutting portion (3a) of the suppressor 0 is laterally retracted, this can be easily done without coming into contact with the wafer α). Then, the air cylinder (2) is operated to release the elastic deformation of the support section (3b) of the suppression body (3), that is, the curved state of the support section (3b) is returned to its original shape by the restoring force (Fig. 3C). ). As a result, the abutting portion (3a) of the suppressor (2) moves above the peripheral edge of the installed wafer (1). Then, by reducing or canceling the suppressing force of the air cylinder 〇.

上記抑圧体■を下降させる。これは、上記押圧体■の支
持部(3b)と上記設置板■下面との間に設けられてい
る板ばね(へ)の復元力により、上記支持部(3b)を
下降させる。すると、上記抑圧体■の当接部(3a)が
上記ウニ4■周縁部を下方即ち、ウェハ■表面と直交す
る如く上記設置板■方向に押圧し。
Lower the above suppressor ■. This causes the support part (3b) to be lowered by the restoring force of the leaf spring provided between the support part (3b) of the pressing body (2) and the lower surface of the installation plate (2). Then, the contact portion (3a) of the suppressor (2) presses the peripheral edge of the sea urchin (4) downward, that is, in the direction of the installation plate (2) so as to be perpendicular to the surface of the wafer (2).

この設置板■表面に上記ウェハ■を保持する(第1図)
。このように上記ウェハωを保持状態で。
Hold the above wafer (■) on the surface of this installation plate (Fig. 1)
. While holding the wafer ω in this way.

このウェハ■の所望する処理或いは搬送等を実行する。This wafer (2) is subjected to desired processing or transportation.

また、上記ウェハ■を取外す場合は、上記したウェハ■
設置動作を逆に行なう。これは、上記エアシリンダー■
により上記押圧体■の支持部(3b)を上昇させ、上記
設置板■から下方に突出している突起(2a)に接触さ
せた後に弾性変形即ち湾曲させる。これにより上記抑圧
体■の当接部(3a)が上記ウェハωの押圧保持を解除
し、更に上記ウェハ■周縁部上から退去させて上記ウェ
ハ■を取り外す。
In addition, when removing the above wafer ■,
Perform the installation operation in reverse. This is the air cylinder mentioned above■
The support part (3b) of the pressing body (3) is raised, brought into contact with the protrusion (2a) projecting downward from the installation plate (2), and then elastically deformed, that is, curved. As a result, the abutting portion (3a) of the suppressor (3) releases the pressing hold on the wafer (ω), and further removes the wafer (2) from above the peripheral edge of the wafer (2).

上記実施例ではウェハ(1)を保持する抑圧体■の当接
部(3a)を上記ウェハ■周縁部4箇所に設けた例につ
いて説明したが、これに限定するものではなく1例えば
第4図に示すように、各々が分割されている多数の当接
部(3a)を有するものでも同様な効果を得ることがで
きる。
In the above embodiment, an example was explained in which the contact portions (3a) of the suppressor (3) that holds the wafer (1) were provided at four locations on the peripheral edge of the wafer (1), but the present invention is not limited to this. As shown in FIG. 2, a similar effect can be obtained by having a large number of abutting portions (3a) each of which is divided.

また、保持装置の構成は上記実施例に限定するものでは
なく、例えば第5図Aに示すように、弾性変形可能な材
質により構成され、更に内部に気密な空間0を有する設
置板■表面の予め定められた位置に被保持体例えば半導
体ウェハ(υを設置し、上記実施例と同様に当接部(3
a)及び支持部(3b)を有する。少なくとも上記支持
部(3b)が弾性変形可能な材質により構成された抑圧
体0と、上記設置板■下部に設けられた伸縮可能なコイ
ルスプリング■の伸びる力により、上記ウニ4■周縁部
を上記当接部(3a)に強制的に押圧して上記ウェハ■
の保持を行なう。そして、上記ウェハ■を取り外す場合
、或いは新たなウェハを設置する場合、上記支持部(3
b)の下部に設けられた駆動機構例えば工アシリンダ−
〇の駆動により上記支持部(3b)を上記設置板■下部
に突出した突起(2a)に当接するまで上昇させる。こ
の当接により上記当接部(3a)を上昇させて上記ウェ
ハω周縁部の抑圧を解除し、更に上記エアシリンダー■
により上記支持部(3b)を上昇させて、この支持部(
3b)を変形即ち湾曲させて、上記当接部(3a)をウ
ェハ■上方から退去させる(第5図B)。ここで、上記
設置板■内部の空間0に、ガス導入管■を介してガス例
えばエアを供給し、この設置板■上面を変形即ち湾曲さ
せる(第5図C)ことにより、この設置板■上面に設置
したウェハωの取り外し或いは、上記設置板■上面への
新たなウェハωの設置を容易に実行する構成としても良
い。特に、液体例えば水に濡れた被保持体を上記設置板
■から取外す場合、上記設置板■中心部を押し上げるこ
とで弾性変形させ、この設置板■及び上記被保持体との
吸着力を減じることで容易に実行することができる。ま
た、上記押圧体■を弾性変形させる駆動源をエアシリン
ダー■を使用して説明したが、これに限定するものでは
なく、例えば第6図に示すように、ベローズ0により気
密に設定された空間(10)内を図示しない真空機構に
連設した排気管(11)から減圧し、上記実施例と同様
に支持部(3b)を突起(2a)に当接させ、更に上記
支持部(3b)を変形即ち湾曲させるように構成しても
同様な効果が得られる。
Furthermore, the structure of the holding device is not limited to the above-mentioned embodiment. For example, as shown in FIG. An object to be held, such as a semiconductor wafer (υ), is placed at a predetermined position, and the contact portion (3
a) and a support part (3b). At least the support part (3b) is made of an elastically deformable material, and the stretching force of the extensible coil spring (2) provided at the bottom of the installation plate (2) causes the periphery of the sea urchin (4) to be The above wafer ■ is forcibly pressed against the contact part (3a).
will be maintained. When removing the wafer (3) or installing a new wafer, the support section (3)
b) A drive mechanism provided at the bottom of the
By driving 〇, the support portion (3b) is raised until it comes into contact with the protrusion (2a) projecting from the bottom of the installation plate ①. Due to this contact, the contact portion (3a) is raised to release the suppression of the peripheral edge of the wafer ω, and furthermore, the air cylinder
The support part (3b) is raised by the support part (3b).
3b) is deformed or curved to remove the abutting portion (3a) from above the wafer (FIG. 5B). Here, a gas such as air is supplied to the space 0 inside the installation plate 1 through the gas introduction pipe 2, and the upper surface of the installation plate 2 is deformed or curved (Fig. 5C). It may also be configured to easily remove the wafer ω placed on the top surface or to easily install a new wafer ω on the top surface of the installation plate. In particular, when removing an object wet with liquid, such as water, from the installation plate (■), push up the center of the installation plate (■) to elastically deform it and reduce the adsorption force between this installation plate (■) and the object to be held. can be easily carried out. Furthermore, although the driving source for elastically deforming the pressing body (■) was explained using the air cylinder (■), the present invention is not limited to this. For example, as shown in FIG. (10) is depressurized from the exhaust pipe (11) connected to a vacuum mechanism (not shown), the support part (3b) is brought into contact with the protrusion (2a) as in the above embodiment, and the support part (3b) is brought into contact with the protrusion (2a). A similar effect can be obtained by deforming or curving the structure.

また、上記実施例では抑圧体を移動する構成について説
明したが、相対的に移動する構成であれば何れでもよく
1例えば設置板を移動する構成でも同様な効果を得るこ
とができる。また、上記設置板にセンサーを埋設し、上
記被保持体の有無及び位置を検出する構成としてもよい
。更に、上記設置板■及び抑圧体■の間に弾性変形部材
例えば板ばねに)或いはコイルスプリング■を設けたが
、例えば磁石或いは電磁石を設けて実行しても同様な効
果が得られる。
Further, in the above embodiment, the structure in which the suppressor is moved has been described, but any structure in which the suppressor is moved relatively may be used. For example, a structure in which the installation plate is moved may also be used to obtain the same effect. Alternatively, a sensor may be embedded in the installation plate to detect the presence or absence and position of the held object. Further, although an elastic deformable member such as a plate spring or a coil spring is provided between the installation plate 1 and the suppressor 2, the same effect can be obtained by providing a magnet or an electromagnet, for example.

また、上記実施例では被保持体として半導体ウェハを例
に上げて説明したが、これに限定するものではなく1例
えば液晶TVなどの画面表示装置等に用いられるLCD
基板でも同様に行なうことができる。
Further, in the above embodiments, a semiconductor wafer was used as an example of the object to be held, but the object is not limited to this.
The same can be done with the substrate.

上述した弾性変形部材による被保持体の保持の応用例を
第7図及び第8図に示す。これは、被保持体例えば半導
体ウェハ■の周縁を把持する把持部(12)を、駆動機
構(13)の駆動により一体的に弾性変形させ、上記ウ
ェハ■の着脱を可能とするものである。この機構を第8
図に示すようなハンドリングアーム(14)に使用する
ことにより、真空下におけるハンドリングを安価で容易
に実行することができる。更に第9図に示すような被保
持体例えば半導体ウェハ■のハンドリング装置にも応用
することができる。これは、弾性変形部材で一体的に構
成されたアー、ム(15)の把持体(16)を、駆動部
例えばエアシリンダー(17)の抑圧駆動により、変形
部(18)を弾性変形させて上記把持体(16)をスラ
イド移動させることにより、複数の当接部(19)及び
上記把持体(16)先端の当接部(20)により挟持し
、上記ウェハωの保持を可能とするものである。
An example of how the above-mentioned elastically deformable member is used to hold an object to be held is shown in FIGS. 7 and 8. This allows a gripping part (12) that grips the periphery of a held object, such as a semiconductor wafer (2), to be elastically deformed integrally by driving a drive mechanism (13), thereby making it possible to attach and detach the wafer (2). This mechanism is the 8th
By using the handling arm (14) as shown in the figure, handling under vacuum can be performed easily and at low cost. Furthermore, the present invention can also be applied to a device for handling objects to be held, such as semiconductor wafers, as shown in FIG. This is done by elastically deforming the deforming part (18) of the gripping body (16) of the arm (15), which is integrally formed of an elastically deformable member, by suppressing driving of a driving part, for example, an air cylinder (17). By sliding the gripping body (16), it is possible to hold the wafer ω by holding it between a plurality of contact parts (19) and a contact part (20) at the tip of the gripping body (16). It is.

このような機構にも弾性変形による被保持体の保持を応
用することができる。
Holding of the held object by elastic deformation can also be applied to such a mechanism.

以上述べたようにこの実施例によれば、設置板表面に設
置された被保持体の周縁部に対向配置する抑圧体を弾性
変形部材の弾性変形により、上記被保持体周縁部の対向
位置から離脱可能とする手段を備えているため、上記弾
性変形部材の弾性変形で上記抑圧体を上記被保持体周縁
部の対向位置から離脱させ、この状態で上記被保持体″
の着脱を容易に行なうことができる。そのため、上記被
保持体に大きな外力が加わることはなく、上記被保持体
を破損させることのない信頼性の高い保持装置を得るこ
とができる。また、上記被保持体は、この被保持体周縁
部に対向配置する抑圧体により、上記被保持体表面と直
交する方向即ち垂直にのみ押圧力が加わるため、上記被
保持体周囲から中心方向即ち横方向に力が加わることは
なく、これにより、上記被保持体表面に被着している膜
に縞状の欠陥が発生することはない。
As described above, according to this embodiment, the suppressing body disposed opposite the peripheral edge of the held object installed on the surface of the installation plate is moved from the position facing the peripheral edge of the held object by the elastic deformation of the elastic deformation member. Since it is provided with means for making it detachable, the elastic deformation of the elastic deformation member causes the suppressing body to detach from the position facing the peripheral edge of the held object, and in this state, the held object''
can be easily attached and detached. Therefore, a large external force is not applied to the object to be held, and a highly reliable holding device that does not damage the object to be held can be obtained. Further, since the held object is subjected to a pressing force only in a direction perpendicular to the surface of the held object, that is, perpendicularly, by the suppressing body disposed opposite to the peripheral edge of the held object, from the periphery of the held object toward the center, that is, No force is applied in the lateral direction, and as a result, striped defects will not occur in the film adhering to the surface of the object to be held.

更に、上記抑圧体は、被保持体から充分層れた位置で離
脱するため、上記被保持体と抑圧体との摩擦による塵の
発生を防止することができる。
Further, since the suppressing body is separated from the held body at a position where the holding body is sufficiently layered, generation of dust due to friction between the held body and the suppressing body can be prevented.

また、真空中における被保持体の保持にも対応可能とし
、更に、上記保持装置を回転させることにより、被保持
体の回転処理にも容易に対応することができる。
Further, it is possible to support holding of objects to be held in a vacuum, and furthermore, by rotating the holding device, it is possible to easily cope with rotation processing of objects to be held.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明によれば、設置板表面に設置
された被保持体の周縁部に対向配置する抑圧体を弾性変
形部材の弾性変形により、上記被保持体周縁部の対向位
置から離脱可能とする手段を備えているため、安価で容
易な被保持体の保持を実行することができる。また、上
記被保持体周縁部に、この被保持体表面と直交する方向
即ち垂直方向のみの押圧力が加わるため、上記被保持体
周囲から中心方向への力が加わることはなく、この被保
持体表面の膜等に欠陥を発生させることを防止すること
ができる。
As explained above, according to the present invention, the suppressing body, which is arranged to face the peripheral edge of the held object installed on the surface of the installation plate, is detached from the position facing the peripheral edge of the held object by elastic deformation of the elastic deformation member. Since the holding device is provided with a means for making it possible, the object to be held can be held easily and inexpensively. In addition, since a pressing force is applied to the peripheral edge of the held object only in a direction perpendicular to the surface of the held object, that is, in a vertical direction, no force is applied from the periphery of the held object toward the center. It is possible to prevent defects from occurring in membranes on the body surface.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明装置の一実施例を説明するための保持装
置の構成図、第2図は第1図の上面図、第3図は第1図
保持装置の動作説明図、第4図は第1図の抑圧体の他の
実施例説明図、第5図及び第6図は第1図の他の実施例
説明図、第7図、第8図、第9図は第1図の弾性変形部
材の応用例説明図である。 2・・・設置板       3・・・抑圧体3a・・
・当接部       3b・・・支持部特許出願人 
 東京エレクトロン株式会社第1図 第3図A 第2図 宕3 図B 第 図C 第 図C
Fig. 1 is a configuration diagram of a holding device for explaining one embodiment of the device of the present invention, Fig. 2 is a top view of Fig. 1, Fig. 3 is an explanatory diagram of the operation of the holding device shown in Fig. 1, and Fig. 4 is an explanatory diagram of another embodiment of the suppressor shown in FIG. 1, FIGS. 5 and 6 are explanatory diagrams of other embodiments of the suppressor shown in FIG. 1, and FIGS. It is an explanatory view of an application example of an elastically deformable member. 2... Installation board 3... Suppression body 3a...
・Abutting part 3b...Supporting part Patent applicant
Tokyo Electron Ltd. Figure 1 Figure 3 A Figure 2 3 Figure B Figure C Figure C

Claims (1)

【特許請求の範囲】[Claims] 設置板表面に設置された被保持体の周縁部に対向配置す
る押圧体及び上記設置板を相対的に移動することにより
、上記被保持体を保持する装置において、上記押圧体を
弾性変形部材の弾性変形により上記被保持体周縁部の対
向位置から離脱可能とする手段を備えたことを特徴とす
る保持装置。
In a device for holding the object to be held by relatively moving a pressing body disposed opposite to the peripheral edge of the object to be held installed on the surface of the installation plate and the installation plate, A holding device characterized by comprising means for making it possible to separate from the opposing position of the peripheral edge of the held object by elastic deformation.
JP16424788A 1988-07-01 1988-07-01 Holding device Pending JPH0215934A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16424788A JPH0215934A (en) 1988-07-01 1988-07-01 Holding device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16424788A JPH0215934A (en) 1988-07-01 1988-07-01 Holding device

Publications (1)

Publication Number Publication Date
JPH0215934A true JPH0215934A (en) 1990-01-19

Family

ID=15789471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16424788A Pending JPH0215934A (en) 1988-07-01 1988-07-01 Holding device

Country Status (1)

Country Link
JP (1) JPH0215934A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103481222A (en) * 2013-09-29 2014-01-01 昆山凯诺尔金属制品有限公司 Adjustable caterpillar track section clamping device
CN103624723A (en) * 2013-11-30 2014-03-12 林淑琴 Adjustable open spanner
CN104259909A (en) * 2014-08-27 2015-01-07 成都科信达实业有限公司 Clamp mechanism beneficial to sheet object turning quality
CN106736722A (en) * 2017-03-30 2017-05-31 东莞台盈拓科技股份有限公司 A kind of sheet material workpiece puts middle tool
JP2018130794A (en) * 2017-02-15 2018-08-23 株式会社デンソー Workpiece holding member and workpiece rotating device using the same
US11566118B2 (en) 2016-02-18 2023-01-31 Starlite Co., Ltd. Nanofiber dispersion, method of producing nanofiber dispersion, powdery nanofibers obtainable from the dispersion, resin composition containing the powdery nanofibers ad molding material for 3D printer using the resin composition
CN117231346A (en) * 2023-11-15 2023-12-15 江苏星辰星汽车附件有限公司 High-strength pressure-resistant anti-impact vehicle expansion water tank

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103481222A (en) * 2013-09-29 2014-01-01 昆山凯诺尔金属制品有限公司 Adjustable caterpillar track section clamping device
CN103624723A (en) * 2013-11-30 2014-03-12 林淑琴 Adjustable open spanner
CN104259909A (en) * 2014-08-27 2015-01-07 成都科信达实业有限公司 Clamp mechanism beneficial to sheet object turning quality
US11566118B2 (en) 2016-02-18 2023-01-31 Starlite Co., Ltd. Nanofiber dispersion, method of producing nanofiber dispersion, powdery nanofibers obtainable from the dispersion, resin composition containing the powdery nanofibers ad molding material for 3D printer using the resin composition
JP2018130794A (en) * 2017-02-15 2018-08-23 株式会社デンソー Workpiece holding member and workpiece rotating device using the same
CN106736722A (en) * 2017-03-30 2017-05-31 东莞台盈拓科技股份有限公司 A kind of sheet material workpiece puts middle tool
CN117231346A (en) * 2023-11-15 2023-12-15 江苏星辰星汽车附件有限公司 High-strength pressure-resistant anti-impact vehicle expansion water tank
CN117231346B (en) * 2023-11-15 2024-03-08 江苏星辰星汽车附件有限公司 High-strength pressure-resistant anti-impact vehicle expansion water tank

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