JPH02149769U - - Google Patents
Info
- Publication number
- JPH02149769U JPH02149769U JP5756989U JP5756989U JPH02149769U JP H02149769 U JPH02149769 U JP H02149769U JP 5756989 U JP5756989 U JP 5756989U JP 5756989 U JP5756989 U JP 5756989U JP H02149769 U JPH02149769 U JP H02149769U
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- epitaxial growth
- type epitaxial
- nozzle
- belgear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 235000012431 wafers Nutrition 0.000 claims 2
- 239000002994 raw material Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP5756989U JPH02149769U (OSRAM) | 1989-05-18 | 1989-05-18 | 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP5756989U JPH02149769U (OSRAM) | 1989-05-18 | 1989-05-18 | 
Publications (1)
| Publication Number | Publication Date | 
|---|---|
| JPH02149769U true JPH02149769U (OSRAM) | 1990-12-21 | 
Family
ID=31582397
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP5756989U Pending JPH02149769U (OSRAM) | 1989-05-18 | 1989-05-18 | 
Country Status (1)
| Country | Link | 
|---|---|
| JP (1) | JPH02149769U (OSRAM) | 
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JP2007524250A (ja) * | 2004-02-25 | 2007-08-23 | アイクストロン、アーゲー | Mocvd反応器のための入口システム | 
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS4844833A (OSRAM) * | 1971-05-21 | 1973-06-27 | ||
| JPS51112263A (en) * | 1975-03-28 | 1976-10-04 | Hitachi Ltd | Semiconductor surface processor base | 
| JPS599084B2 (ja) * | 1977-02-21 | 1984-02-29 | 横河電機株式会社 | 磁気ディスクの予備トラツク切換装置 | 
| JPS61212014A (ja) * | 1985-03-18 | 1986-09-20 | Tokyo Erekutoron Kk | 化学的気相成長法による半導体ウエハ処理装置 | 
| JPS63117417A (ja) * | 1986-11-05 | 1988-05-21 | Nec Corp | 気相成長装置 | 
| JPS63147894A (ja) * | 1986-12-09 | 1988-06-20 | Kyushu Denshi Kinzoku Kk | 気相成長方法と縦型気相成長装置 | 
- 
        1989
        - 1989-05-18 JP JP5756989U patent/JPH02149769U/ja active Pending
 
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS4844833A (OSRAM) * | 1971-05-21 | 1973-06-27 | ||
| JPS51112263A (en) * | 1975-03-28 | 1976-10-04 | Hitachi Ltd | Semiconductor surface processor base | 
| JPS599084B2 (ja) * | 1977-02-21 | 1984-02-29 | 横河電機株式会社 | 磁気ディスクの予備トラツク切換装置 | 
| JPS61212014A (ja) * | 1985-03-18 | 1986-09-20 | Tokyo Erekutoron Kk | 化学的気相成長法による半導体ウエハ処理装置 | 
| JPS63117417A (ja) * | 1986-11-05 | 1988-05-21 | Nec Corp | 気相成長装置 | 
| JPS63147894A (ja) * | 1986-12-09 | 1988-06-20 | Kyushu Denshi Kinzoku Kk | 気相成長方法と縦型気相成長装置 | 
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JP2007524250A (ja) * | 2004-02-25 | 2007-08-23 | アイクストロン、アーゲー | Mocvd反応器のための入口システム | 
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