JPH02146426U - - Google Patents
Info
- Publication number
- JPH02146426U JPH02146426U JP5655989U JP5655989U JPH02146426U JP H02146426 U JPH02146426 U JP H02146426U JP 5655989 U JP5655989 U JP 5655989U JP 5655989 U JP5655989 U JP 5655989U JP H02146426 U JPH02146426 U JP H02146426U
- Authority
- JP
- Japan
- Prior art keywords
- reactor
- cap
- plasma processing
- closes
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 claims description 3
- 230000017525 heat dissipation Effects 0.000 claims 2
- 238000007789 sealing Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
図面はこの考案の一実施例を示すもので、第１
図は断面図、第２図は平面図、第３図はプラズマ
処理機全体の断面図である。
Ｗ……ウエハー、１……リアクター、２……フ
レーム、３……チヤンバ下部バルクヘツド、４…
…外部電極、５……内部電極、６……昇降装置、
７……可動バルクヘツド、８……ウエハー支持具
、９……天窓、１０……放熱機構、１１……放熱
口、１２……キヤツプ、１３……シール手段、１
４……シリンダサポート、１５……開閉シリンダ
、２１……ガス導入管、２２……排気管。
The drawing shows one embodiment of this invention.
The figure is a sectional view, FIG. 2 is a plan view, and FIG. 3 is a sectional view of the entire plasma processing machine. W...Wafer, 1...Reactor, 2...Frame, 3...Chamber lower bulkhead, 4...
...external electrode, 5...internal electrode, 6...lifting device,
7... Movable bulkhead, 8... Wafer support, 9... Skylight, 10... Heat radiation mechanism, 11... Heat radiation port, 12... Cap, 13... Sealing means, 1
4...Cylinder support, 15...Opening/closing cylinder, 21...Gas introduction pipe, 22...Exhaust pipe.
Claims (1)
ズマによつてプラズマ処理を行なう縦型のプラズ
マ処理用リアクターの天窓に放熱口を開口し、こ
の放熱口を閉塞するキヤツプをリアクター上方に
配し、天窓上に固定したシリンダサポートに支持
した開閉シリンダのシリンダロツドに前記キヤツ
プを連結してあつて、開閉シリンダの作動によつ
てキヤツプが放熱口を開閉するようにしたことを
特徴とする縦型プラズマ処理機のリアクター。 A heat dissipation port is opened in the skylight of a vertical plasma processing reactor that performs plasma processing using plasma generated by applying a high frequency voltage, and a cap that closes this heat dissipation port is placed above the reactor. A vertical plasma processing machine characterized in that the cap is connected to a cylinder rod of an opening/closing cylinder supported on a cylinder support fixed above, and the cap opens and closes the heat radiation port by the operation of the opening/closing cylinder. reactor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989056559U JPH0754999Y2 (en) | 1989-05-17 | 1989-05-17 | Reactor of vertical plasma processor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989056559U JPH0754999Y2 (en) | 1989-05-17 | 1989-05-17 | Reactor of vertical plasma processor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02146426U true JPH02146426U (en) | 1990-12-12 |
| JPH0754999Y2 JPH0754999Y2 (en) | 1995-12-18 |
Family
ID=31580495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989056559U Expired - Lifetime JPH0754999Y2 (en) | 1989-05-17 | 1989-05-17 | Reactor of vertical plasma processor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0754999Y2 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5860552A (en) * | 1981-10-05 | 1983-04-11 | Tokyo Denshi Kagaku Kabushiki | Vertical-type automatic plasma processing device |
| JPS6226028U (en) * | 1985-07-29 | 1987-02-17 |
-
1989
- 1989-05-17 JP JP1989056559U patent/JPH0754999Y2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5860552A (en) * | 1981-10-05 | 1983-04-11 | Tokyo Denshi Kagaku Kabushiki | Vertical-type automatic plasma processing device |
| JPS6226028U (en) * | 1985-07-29 | 1987-02-17 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0754999Y2 (en) | 1995-12-18 |
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