JPH02146175A - Memory cell counter electrode voltage supplying circuit - Google Patents
Memory cell counter electrode voltage supplying circuitInfo
- Publication number
- JPH02146175A JPH02146175A JP63299966A JP29996688A JPH02146175A JP H02146175 A JPH02146175 A JP H02146175A JP 63299966 A JP63299966 A JP 63299966A JP 29996688 A JP29996688 A JP 29996688A JP H02146175 A JPH02146175 A JP H02146175A
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- high voltage
- memory cell
- counter electrode
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 6
- 238000012360 testing method Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 2
- 238000012216 screening Methods 0.000 abstract description 8
- 230000000694 effects Effects 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
Landscapes
- For Increasing The Reliability Of Semiconductor Memories (AREA)
- Dram (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明は半導体記憶回路に間し、特に1トランジスタ型
メモリセルを用いたダイナミック型メモリのメモリセル
対極に印加する電圧供給回路に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor memory circuit, and more particularly to a voltage supply circuit for applying a voltage to a counter electrode of a dynamic memory using a one-transistor type memory cell.
[従来の技術]
従来、メモリセル対極に電圧を印加する方法としては、
直接セル対極を電源に接続する方法があった。しかし近
年、メモリセル容量の飛躍的増大とメモリセルの高密度
化のため、メモリセル容量形成のための絶縁膜は容量値
確保の面からますます薄くなったきた。それで、第3図
に示されているようにセル対極は外部電源の半分の電圧
を出力する1/2VCC発生回路300に接続するのが
一般的である(1/2電源方式)。このようにして絶縁
膜の電界強度を半分に下げ、製品としての耐圧を向上さ
せている。[Prior Art] Conventionally, the method of applying voltage to the opposite electrode of a memory cell is as follows:
There was a method of directly connecting the cell counter electrode to the power supply. However, in recent years, due to the dramatic increase in memory cell capacity and the high density of memory cells, the insulating film for forming memory cell capacitance has become thinner and thinner in order to secure the capacitance value. Therefore, as shown in FIG. 3, the cell counter electrode is generally connected to a 1/2 VCC generating circuit 300 that outputs half the voltage of the external power supply (1/2 power supply system). In this way, the electric field strength of the insulating film is reduced by half, improving the breakdown voltage of the product.
[発明が解決しようとする問題点コ
半導体集積回路の初期不良を除き信頼性品質を向上させ
るために、ある一定期間半導体集積回路を高温、高電圧
下で動作させるテスト(バーンイン)が−船釣に実施さ
れている。[Problems to be solved by the invention] In order to eliminate initial defects in semiconductor integrated circuits and improve their reliability, a test (burn-in) in which semiconductor integrated circuits are operated at high temperatures and high voltages for a certain period of time is carried out. It has been implemented.
これは温度、電圧加速により初期不良の半導体集積回路
を除去する(スクリーニング)ためである。This is to remove (screen) initially defective semiconductor integrated circuits by temperature and voltage acceleration.
上述した従来の1/2電源電源下は電界強度を半分に下
げ耐圧の向上が計れる長所を持つ反面、スクリーニング
するには電圧を必要以上に上げなければならないという
欠点がある。While the above-mentioned conventional 1/2 power source has the advantage of reducing the electric field strength to half and improving the withstand voltage, it has the disadvantage that the voltage must be increased more than necessary for screening.
[発明の従来技術に対する相違点コ
上述した従来の1/2電源電源下セル対極に常に1/2
電源電圧しか係らないのに対し、本発明は1/2電源電
圧と高電圧を切り換えることにより、セル対極には低電
圧、高電圧の2種類の電圧を自由に印加てきるという相
違点を有する。[Differences between the invention and the prior art
Whereas only the power supply voltage is involved, the present invention has the difference that two types of voltages, low voltage and high voltage, can be freely applied to the cell counter electrode by switching between 1/2 power supply voltage and high voltage. .
E問題点を解決するための手段]
本発明の要旨は半導体基板上に形成されたメモリセルに
電圧を供給するメモリセル対極電圧供給回路にして、メ
モリセルの通常動作時に使用される低電圧を発生させる
低電圧発生回路と、メモリセルのテスト時に使用される
高電圧を発生させる高電圧発生回路と、上記低電圧と高
電圧とをメモリセルに選択的に供給するスイッチ回路と
を有することである。Means for Solving Problem E] The gist of the present invention is to provide a memory cell counter-electrode voltage supply circuit that supplies voltage to memory cells formed on a semiconductor substrate, so that the low voltage used during normal operation of the memory cell can be used. A high voltage generation circuit generates a high voltage used during testing of memory cells, and a switch circuit selectively supplies the low voltage and high voltage to the memory cells. be.
[発明の作用および効果コ
以上説明した用に本発明は低電圧発生回路の出力と高電
圧発生回路の出力とをスイッチ回路で切り換えることに
より、通常動作時には耐圧向上を計れると共に、スクリ
ーニング時には電源電圧以上の高電圧印加により一層の
スクリーニングができるという効果がある。[Operations and Effects of the Invention] As explained above, the present invention uses a switch circuit to switch between the output of the low voltage generation circuit and the output of the high voltage generation circuit, thereby improving the withstand voltage during normal operation, and increasing the power supply voltage during screening. Application of the above high voltage has the effect of further screening.
[実施例コ 次に本発明の実施例について図面を参照して説明する。[Example code] Next, embodiments of the present invention will be described with reference to the drawings.
第1図は本発明の第1実施例の回路図である。FIG. 1 is a circuit diagram of a first embodiment of the present invention.
1は1/2VCC発生回路、2はチャージポンプを利用
した高電圧発生回路、3は高電圧1/2vCC切り換え
のためのスイッチ回路である。信号Sは外部入力によっ
て設定されるrC内部信号てあり、通常動作時において
はトランジスタQ1をオンし、Q2をオフさせ出力VC
Lには1/2VCC発生回路出力の1/2V−CC電圧
を発生させる。スクリーニング時には逆にトランジスタ
Q1をオフし、Q2をオンさせ、出力VCLには高電圧
発生回路出力の高電圧を発生させる。クロックφはQ2
のゲート電位をコンデンサC2のブートストラップ効果
により昇圧させる信号であり、発振回路の出力Pを利用
してもよい。1 is a 1/2VCC generation circuit, 2 is a high voltage generation circuit using a charge pump, and 3 is a switch circuit for switching the high voltage 1/2VCC. The signal S is an rC internal signal set by an external input, and during normal operation, it turns on transistor Q1, turns off transistor Q2, and outputs VC.
1/2V-CC voltage of the 1/2VCC generation circuit output is generated at L. Conversely, during screening, transistor Q1 is turned off, transistor Q2 is turned on, and a high voltage output from the high voltage generation circuit is generated at the output VCL. Clock φ is Q2
This is a signal that boosts the gate potential of the capacitor C2 by the bootstrap effect of the capacitor C2, and the output P of the oscillation circuit may be used.
第2図は本発明の第2実施例の回路図である。FIG. 2 is a circuit diagram of a second embodiment of the present invention.
高電圧発生回路2においてトランジスタQ7・・・・Q
Nからなる電圧クランプ回路を設けたのが特徴であり、
セル対極への過大電圧防止という利点がある。In the high voltage generation circuit 2, transistors Q7...Q
It is characterized by the provision of a voltage clamp circuit consisting of N.
This has the advantage of preventing excessive voltage from being applied to the cell counter electrode.
の回路図である。FIG.
1 ・ ・ ・ ・ ・ ・ ・ 2 ・ ◆ ・ ・ Φ ・ ・ 3 ・ ・ ・ ・ ・ Q1〜Q?、 QN C1,C2・1 ・ ・ ・ ・ ・ ・ 2 ・◆ ・ ・ Φ ・ ・ 3 ・ ・・ ・・ Q1~Q? , QN C1, C2・
Claims (1)
メモリセル対極電圧供給回路にして、メモリセルの通常
動作時に使用される低電圧を発生させる低電圧発生回路
と、メモリセルのテスト時に使用される高電圧を発生さ
せる高電圧発生回路と、上記低電圧と高電圧とをメモリ
セルに選択的に供給するスイッチ回路とを有することを
特徴とするメモリセル対極電圧供給回路。A memory cell counter electrode voltage supply circuit that supplies voltage to memory cells formed on a semiconductor substrate, and a low voltage generation circuit that generates the low voltage used during normal operation of the memory cell, and a low voltage generation circuit that is used during memory cell testing. 1. A memory cell counter electrode voltage supply circuit comprising: a high voltage generation circuit that generates a high voltage; and a switch circuit that selectively supplies the low voltage and the high voltage to memory cells.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63299966A JPH02146175A (en) | 1988-11-28 | 1988-11-28 | Memory cell counter electrode voltage supplying circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63299966A JPH02146175A (en) | 1988-11-28 | 1988-11-28 | Memory cell counter electrode voltage supplying circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02146175A true JPH02146175A (en) | 1990-06-05 |
Family
ID=17879125
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63299966A Pending JPH02146175A (en) | 1988-11-28 | 1988-11-28 | Memory cell counter electrode voltage supplying circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02146175A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04209388A (en) * | 1990-11-30 | 1992-07-30 | Nec Corp | Semiconductor integrated circuit |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62252598A (en) * | 1986-04-24 | 1987-11-04 | Mitsubishi Electric Corp | Semiconductor memory device |
JPS63239683A (en) * | 1987-03-27 | 1988-10-05 | Hitachi Ltd | Semiconductor memory |
-
1988
- 1988-11-28 JP JP63299966A patent/JPH02146175A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62252598A (en) * | 1986-04-24 | 1987-11-04 | Mitsubishi Electric Corp | Semiconductor memory device |
JPS63239683A (en) * | 1987-03-27 | 1988-10-05 | Hitachi Ltd | Semiconductor memory |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04209388A (en) * | 1990-11-30 | 1992-07-30 | Nec Corp | Semiconductor integrated circuit |
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