JPH02139709A - Magnetic recording medium and its production - Google Patents
Magnetic recording medium and its productionInfo
- Publication number
- JPH02139709A JPH02139709A JP29107888A JP29107888A JPH02139709A JP H02139709 A JPH02139709 A JP H02139709A JP 29107888 A JP29107888 A JP 29107888A JP 29107888 A JP29107888 A JP 29107888A JP H02139709 A JPH02139709 A JP H02139709A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic recording
- magnetic
- recording layer
- layer
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 3
- 229910052751 metal Inorganic materials 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims abstract description 29
- 239000010409 thin film Substances 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 239000010410 layer Substances 0.000 claims description 43
- 238000002844 melting Methods 0.000 claims description 12
- 230000008018 melting Effects 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 7
- 239000011241 protective layer Substances 0.000 claims description 7
- 230000005415 magnetization Effects 0.000 abstract description 9
- 229910052804 chromium Inorganic materials 0.000 abstract description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract description 5
- 229910045601 alloy Inorganic materials 0.000 abstract description 5
- 239000000956 alloy Substances 0.000 abstract description 5
- 229910052797 bismuth Inorganic materials 0.000 abstract description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052697 platinum Inorganic materials 0.000 abstract description 2
- 229910020630 Co Ni Inorganic materials 0.000 abstract 1
- 229910002440 Co–Ni Inorganic materials 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 229920006395 saturated elastomer Polymers 0.000 abstract 1
- 239000010408 film Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 239000011651 chromium Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000314 lubricant Substances 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- ZGDWHDKHJKZZIQ-UHFFFAOYSA-N cobalt nickel Chemical compound [Co].[Ni].[Ni].[Ni] ZGDWHDKHJKZZIQ-UHFFFAOYSA-N 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000006247 magnetic powder Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 241000219112 Cucumis Species 0.000 description 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- -1 etc. Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001256 stainless steel alloy Inorganic materials 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
し産業上の利用分野］
本発明は、コンピュータ等の外部記憶装置（磁気ディス
ク装置）において、磁気記憶体として用いられる磁気デ
ィスク等に使用される高密度記録用の磁気記録媒体に関
するものである。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a high-density recording magnetic field used in a magnetic disk used as a magnetic storage medium in an external storage device (magnetic disk device) for a computer or the like. It is related to recording media.
［従来の技術］
従来、コンピュータ等の記憶媒体としては磁性粉を塗布
したテープ等が広く用いられている。しかし、この記憶
テープ方式では記憶密度が小さくアクセス時間が長いな
どの欠点がある。このため、最近では、ランダムアクセ
スが可能な円板状の磁気ディスクが広く用いられており
、なかでも、基板にアルミ合金等を用いた磁気ディスク
、いわゆるハードティスフが使用されるようになってき
ている。この磁気ディスクは、一般に、厚さ２１Ｉ＋１
程瓜の堅い基板上に、厚さ１μｍ程度の磁気記録層を形
成することにより構成され、磁気記録層としては、一般
にγ−［’０２０３などの磁性粉をバインダと混合し、
これをディスク基板上にスピンコード等の手法で塗布し
たものが用いられてきた。しかし、この方法で得られる
磁気ディスクは、飽和磁化の大きさに限界があり、高密
度磁気記録媒体としてはほぼ限界に達してきている。そ
こで、より高密度記録の可能な媒体を得るために、最近
大きい飽和磁化を有するＣ０１Ｃｏ−Ｎ１ ％ Ｃｏ−
Ｐｔ 。[Prior Art] Conventionally, tapes coated with magnetic powder have been widely used as storage media for computers and the like. However, this storage tape system has drawbacks such as low storage density and long access time. For this reason, disk-shaped magnetic disks that can be randomly accessed have been widely used recently, and in particular, magnetic disks whose substrates are made of aluminum alloy, so-called hard disks, have come into use. . This magnetic disk generally has a thickness of 21I+1
It is constructed by forming a magnetic recording layer with a thickness of about 1 μm on a hard substrate of melon, and the magnetic recording layer is generally made by mixing magnetic powder such as γ-['0203 with a binder,
This has been applied onto a disk substrate using a technique such as a spin cord. However, the magnetic disk obtained by this method has a limit in the magnitude of saturation magnetization, and has almost reached its limit as a high-density magnetic recording medium. Therefore, in order to obtain a medium capable of higher density recording, recently C01Co-N1% Co-
Pt.
Ｇｏ−Ｒｅ 、 ５ｓ−Ｃｏ等の金属あるいは合金を真
空蒸着、スパッタリング等の真空成膜技術により、ディ
スク基板上あるいは基板上に形成された下地層上に形成
したもの、Ｃｏ−Ｐ、 Ｃｏ−Ｎ１−Ｐ等の合金薄膜を
無電解メツキ等の湿式法により形成したものなどが使用
されはじめている。Metals or alloys such as Go-Re and 5s-Co are formed on a disk substrate or a base layer formed on a substrate by vacuum film forming techniques such as vacuum evaporation and sputtering, Co-P, Co-N1 -Thin films of alloys such as -P formed by wet methods such as electroless plating are beginning to be used.
しかしながら、上記の合金薄膜を用いる磁気記録媒体は
、高分解能に必要な高保磁力を得るためには磁気記録層
の膜厚を薄くする必要があるが、該膜厚を薄くすると高
出力を維持するのが困難となるという問題がある。However, in magnetic recording media using the above alloy thin film, it is necessary to reduce the thickness of the magnetic recording layer in order to obtain the high coercive force required for high resolution, but when the film thickness is reduced, high output can be maintained. The problem is that it is difficult to
すなわち、従来の金属薄膜を用いる磁気記録媒体は、高
分解能を達成するために磁気記録層の膜厚を薄くすると
、残留磁化が小さくなり、外部増幅器を通して再生信号
を増幅しても雑音をも増幅してしまい高出力を得ること
が困難であった。In other words, in conventional magnetic recording media that use metal thin films, when the thickness of the magnetic recording layer is made thinner in order to achieve high resolution, the residual magnetization becomes smaller, and even if the reproduced signal is amplified through an external amplifier, the noise is also amplified. This made it difficult to obtain high output.
［発明が解決しようとする課題］
本発明の目的は、高保磁力、高飽和磁化、すなわち高分
解能を有し、大出力の磁気記録媒体を提供することにあ
る。[Problems to be Solved by the Invention] An object of the present invention is to provide a high-output magnetic recording medium that has high coercive force and high saturation magnetization, that is, high resolution.
［課題を解決するための手段］
本発明者らは、上記課題を解決するために鋭意検討を行
った結果、磁性金属薄膜からなる磁気記録層中に低融点
金属を混入させることにより高保磁力で、かつ高残留磁
化を有する媒体を得ることができることを見出だし、本
発明を完成する１、こ至った。[Means for Solving the Problems] As a result of intensive studies in order to solve the above problems, the present inventors have found that by mixing a low melting point metal into a magnetic recording layer made of a magnetic metal thin film, a high coercive force can be achieved. The present inventors have discovered that it is possible to obtain a medium having a high residual magnetization and a high residual magnetization, thereby completing the present invention.
すなわち本発明は、非磁性下地層を被覆した基板上に磁
性金属薄膜からなる磁気記録層及び該磁気記録層を保護
するための保護層を設けてなる磁気記録媒体において、
磁気記録層が低融点金属を含有することを特徴とする磁
気記録媒体及びその製造方法である。That is, the present invention provides a magnetic recording medium comprising a magnetic recording layer made of a magnetic metal thin film and a protective layer for protecting the magnetic recording layer on a substrate coated with a non-magnetic underlayer.
A magnetic recording medium and a method for manufacturing the same, characterized in that the magnetic recording layer contains a low melting point metal.
本発明の媒体の磁気記録層は例えば、コバルトあるいは
コバルトニッケルなどの合金とプラチナ、クロム、ロジ
ウム、チタン、レニウム、タンタル、タングステン、ニ
ッケル、サマリウムなどから選ばれる少なくとも一種以
上の金属からなる磁性金属薄膜中に、スズ、ビスマス、
カドミウム、鉛、亜鉛、イオウなどから選ばれる少なく
とも一種以上の低融点金属を含有せしめてなるものであ
る。The magnetic recording layer of the medium of the present invention is, for example, a magnetic metal thin film made of an alloy such as cobalt or cobalt-nickel and at least one metal selected from platinum, chromium, rhodium, titanium, rhenium, tantalum, tungsten, nickel, samarium, etc. Inside, tin, bismuth,
It contains at least one low melting point metal selected from cadmium, lead, zinc, sulfur, etc.
この低融点金属の含有量は磁気記録層に対し０．１〜１
０原子％であることが好ましく、更に好ましくは０．１
〜５原子％である。θ、■原子％未満の場合、本発明の
効果が得られないおそれがあり、１０原子％を越える場
合、得られる媒体の磁気特性が悪くなるおそれがある。The content of this low melting point metal is 0.1 to 1 in the magnetic recording layer.
It is preferably 0 atom%, more preferably 0.1
~5 at%. If it is less than θ, ■ atomic %, the effects of the present invention may not be obtained, and if it exceeds 10 atomic %, the magnetic properties of the resulting medium may deteriorate.
磁気記録層の厚さは、１００〜２０００人より好ましく
は ３００〜１５００人である。The thickness of the magnetic recording layer is preferably 100 to 2,000, more preferably 300 to 1,500.
本発明の如く、磁気記録層中に低融点金属を含有せしめ
ることにより、得られる媒体の磁気特性は良好となる。By incorporating a low melting point metal into the magnetic recording layer as in the present invention, the magnetic properties of the resulting medium are improved.
その理由は明らかではないが、磁気記録層の結晶粒間の
磁気的相互作用が低融点金属により分離され、これによ
り磁壁がピンニングされ保磁力か高められることによる
と考えられる。Although the reason for this is not clear, it is thought that the magnetic interaction between the crystal grains of the magnetic recording layer is separated by the low melting point metal, thereby pinning the domain wall and increasing the coercive force.
以下、図面に基づき本発明の詳細な説明する。Hereinafter, the present invention will be explained in detail based on the drawings.
第１図は、本発明の磁気記録媒体を用いて作製した磁気
記録ディスクの一実施態様を示す部分断面図である。下
地体１としては、旧−Ｐメツキ膜、陽極酸化アルマイト
膜などを被覆したアルミ合金、窒化硅素焼結体、酸化ア
ルミ焼結体などのセラミックス、ステンレス、チタン合
金などの金属、ガラス、プラスチックなどが用いられる
。また、下地層２としてクロムなどの非磁性薄膜を５０
０〜５０００への厚さに成膜する。この下地層２上に磁
性金属薄膜からなる磁気記録層３を形成する。この磁気
記録層３を成膜する際、低融点金属を同時スパッタ等の
方法で混入させる。さらにこの層の上に、炭素、ＡＩ
Ｏ、Ｚｒ０２等の無機物質からなる保護層５を形成す
る。この厚みは５０〜４００人が適当である。また、必
要に応じて、磁気記録層３と保護層５の間に表面層４を
加えてもよい。この表面層は、クロム、チタン、バナジ
ウム等の金属薄膜からなりその厚みは、５０〜２００人
が適当である。その後、真空加熱処理を行なうことによ
り、本発明の媒体が得られるが真空加熱処理を行なうこ
とにより、磁気記録層３中に含まれる低融点金属が、記
録層中の結晶粒間中に入りこむために、得られる媒体の
保磁力が高められる。また、この真空加熱処理は１Ｏ−
６Ｔｏｒｒ程度の到達真空度のもとで、含有する低融点
金属の融点以上の温度（通常５０〜２５０℃）で、３０
分以上行なうことが好ましい。FIG. 1 is a partial cross-sectional view showing one embodiment of a magnetic recording disk manufactured using the magnetic recording medium of the present invention. As the base body 1, aluminum alloys coated with old-P plating films, anodized alumite films, etc., ceramics such as silicon nitride sintered bodies, aluminum oxide sintered bodies, metals such as stainless steel and titanium alloys, glass, plastics, etc. is used. In addition, as the underlayer 2, a non-magnetic thin film such as chromium is used.
A film is formed to a thickness of 0 to 5,000. On this underlayer 2, a magnetic recording layer 3 made of a magnetic metal thin film is formed. When forming this magnetic recording layer 3, a low melting point metal is mixed in by a method such as simultaneous sputtering. Furthermore, on top of this layer, carbon, AI
A protective layer 5 made of an inorganic material such as O or Zr02 is formed. The appropriate thickness is 50 to 400 people. Further, a surface layer 4 may be added between the magnetic recording layer 3 and the protective layer 5 if necessary. This surface layer is made of a thin metal film of chromium, titanium, vanadium, etc., and has a thickness of 50 to 200 layers. Thereafter, by performing vacuum heat treatment, the medium of the present invention can be obtained; however, by performing vacuum heat treatment, the low melting point metal contained in the magnetic recording layer 3 enters between the crystal grains in the recording layer. Second, the coercive force of the resulting medium is increased. In addition, this vacuum heat treatment
Under an ultimate vacuum of about 6 Torr, at a temperature higher than the melting point of the low melting point metal (usually 50 to 250°C),
It is preferable to do this for at least 1 minute.
更に、この処理は磁気記録層の成膜後であればいつ行な
ってもよいが、保護層作製後に行なえば、を捏上簡便と
なる。Further, although this treatment may be performed at any time after the formation of the magnetic recording layer, it is easier to knead the film if it is performed after the formation of the protective layer.
以上のとおり得られた磁気記録ディスクの使用にあたっ
ては、必要に応じて保護層５に液体潤滑剤、または固体
潤滑剤、あるいはこれらの複合潤滑剤を塗布して潤滑層
６を形成して使用することができる。When using the magnetic recording disk obtained as described above, a liquid lubricant, a solid lubricant, or a combination of these lubricants may be applied to the protective layer 5 to form a lubricant layer 6, if necessary. be able to.
２〜５の各層はスパッタ、真空蒸着等の真空成膜技術な
どにより成膜され、潤滑層６はスパッタ、真空蒸着、ス
ピン、コート、ディッピング等の方法を用いることがで
きる。Each of the layers 2 to 5 is formed by a vacuum film forming technique such as sputtering or vacuum evaporation, and the lubricant layer 6 can be formed by sputtering, vacuum evaporation, spinning, coating, dipping, or the like.
［実施例コ
以下、本発明の具体的な実施例と比較例について説明す
る。なお、本発明は以下の実施例に限定されるものでは
ない。[Example] Specific examples of the present invention and comparative examples will be described below. Note that the present invention is not limited to the following examples.
実施例１
第１図に示す、本発明の磁気記録媒体を用いた磁気記録
ディスクを作製した。下地体１として、平均表面粗さ約
１００人に研磨したＮ１−Ｐメツキ膜被覆のアルミニウ
ム合金を用い、この下地体１の上に下地層２としてＤＣ
スパッタリング法により厚さ３０００人のクロム膜を形
成した。この上に磁気記録層３として、ＤＣスパッタリ
ング法によりニッケルを２０原子％含むコバルト合金薄
膜を７００人形成した。このときにスズを同時にスパッ
タし、磁気記録層３に混入させた。更にこの層の上に、
表面層４としてクロム膜をＤＣスパッタリンク法により
１００人の厚さで形成し、この上に、保護層５として
炭素膜をＤＣスパッタリング法により ３００人の厚み
に形成した。この後、到達真空度２Ｘ １Ｏ−Ｌｏｒｒ
のもとて１５０℃Ｇｏ分の真空加熱処理を行ない、磁気
記録ディスクを得た。ここで、磁気記ｊｊＡ層３中のス
ズの含有量を変化させ、得られた磁気記録ディスクの磁
気特性を評価比較した。Example 1 A magnetic recording disk using the magnetic recording medium of the present invention as shown in FIG. 1 was produced. As the base body 1, an aluminum alloy coated with an N1-P plating film polished to an average surface roughness of about 100 was used, and on this base body 1, a DC base layer 2 was used.
A chromium film with a thickness of 3000 mm was formed by sputtering. On this, 700 people formed a cobalt alloy thin film containing 20 atom % of nickel as a magnetic recording layer 3 by a DC sputtering method. At this time, tin was simultaneously sputtered and mixed into the magnetic recording layer 3. Furthermore, on top of this layer,
A chromium film was formed as the surface layer 4 to a thickness of 100 nm using a DC sputter link method, and thereon, a carbon film was formed as a protective layer 5 to a thickness of 300 nm using a DC sputtering method. After this, the ultimate vacuum level is 2X 1O-Lorr
A magnetic recording disk was obtained by vacuum heat treatment at 150°C. Here, the tin content in the magnetic recording jjA layer 3 was varied, and the magnetic properties of the obtained magnetic recording disks were evaluated and compared.
その結果を表１に示す。The results are shown in Table 1.
実施例２
実施例１と同様の方法で同じ（１が造の磁気記録ディス
クを作製した。ただし１本実施例の場合、磁気記録層３
中のスズ含有量を５原子％と一定にし、成膜後の真空加
熱処理の条件を変化させて磁気記録ディスクをｉす、磁
気特性を評価比較した。その結果を表２に示す。Example 2 A magnetic recording disk of the same structure as Example 1 was produced using the same method as Example 1. However, in the case of this example, the magnetic recording layer 3
The magnetic properties of magnetic recording disks were evaluated and compared by keeping the tin content constant at 5 at % and varying the vacuum heat treatment conditions after film formation. The results are shown in Table 2.
比較例
磁気記録層３をコバルトニッケルのみとした以外は実施
例１と同様の方法で磁気記録ディスクを得た。このとき
、成膜後の真空加熱処理の条件を変化させて磁気記録デ
ィスクを得、磁気特性を評６１６比較した。その結果を
表３に示す。Comparative Example A magnetic recording disk was obtained in the same manner as in Example 1 except that the magnetic recording layer 3 was made of only cobalt nickel. At this time, magnetic recording disks were obtained by changing the conditions of the vacuum heat treatment after film formation, and the magnetic properties were evaluated and compared. The results are shown in Table 3.
表１〜３より、本発明の媒体を用いて得た磁気記録ディ
スクは、従来のコバルトニッケルのみの磁気記録層を有
する媒体を用いたものより高保磁力、高残留磁化となり
、高出力、高分解能を有することがわかる。From Tables 1 to 3, the magnetic recording disks obtained using the media of the present invention have higher coercive force and higher residual magnetization than those using conventional media having a magnetic recording layer of only cobalt nickel, and have high output and high resolution. It can be seen that it has
［発明の効果］
以上述べたとおり、本発明の磁気記録媒体は、高保磁力
、高残留磁化の特性を有し、高記録密度、高出力及び高
分解能を有するものとなる。また、これを用いることに
より得られる磁気記憶体の特性は優れたものとなる。[Effects of the Invention] As described above, the magnetic recording medium of the present invention has characteristics of high coercive force and high residual magnetization, and has high recording density, high output, and high resolution. Moreover, the characteristics of the magnetic memory obtained by using this material are excellent.
第１図は本発明の磁気記録媒体を用いて得た磁気記録デ
ィスクの一例を示す部分断面図である。
図中
１・・・下地体 ２・・・下地層３・・・磁気
記録層 ４・・・中間層５・・・保訛層
６・・・潤滑層を各々示す。FIG. 1 is a partial cross-sectional view showing an example of a magnetic recording disk obtained using the magnetic recording medium of the present invention. In the figure 1... Base body 2... Base layer 3... Magnetic recording layer 4... Intermediate layer 5... Accent protection layer
6... Indicates each lubricating layer.
Claims (2)
らなる磁気記録層及び該磁気記録層を保護するための保
護層を設けてなる磁気記録媒体において、磁気記録層が
低融点金属を含有することを特徴とする磁気記録媒体。(1) In a magnetic recording medium in which a magnetic recording layer made of a magnetic metal thin film and a protective layer for protecting the magnetic recording layer are provided on a substrate coated with a nonmagnetic underlayer, the magnetic recording layer is made of a low melting point metal. A magnetic recording medium characterized by containing:
真空加熱処理を行ない磁気記録層を得ることを特徴とす
る特許請求の範囲第１項に記載の磁気記録媒体の製造方
法。(2) After forming a magnetic recording layer containing a low melting point metal,
2. The method of manufacturing a magnetic recording medium according to claim 1, wherein the magnetic recording layer is obtained by performing a vacuum heat treatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29107888A JPH02139709A (en) | 1988-11-19 | 1988-11-19 | Magnetic recording medium and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29107888A JPH02139709A (en) | 1988-11-19 | 1988-11-19 | Magnetic recording medium and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02139709A true JPH02139709A (en) | 1990-05-29 |
Family
ID=17764148
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29107888A Pending JPH02139709A (en) | 1988-11-19 | 1988-11-19 | Magnetic recording medium and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02139709A (en) |
-
1988
- 1988-11-19 JP JP29107888A patent/JPH02139709A/en active Pending
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