JPH02129982A - Laser device - Google Patents
Laser deviceInfo
- Publication number
- JPH02129982A JPH02129982A JP63282487A JP28248788A JPH02129982A JP H02129982 A JPH02129982 A JP H02129982A JP 63282487 A JP63282487 A JP 63282487A JP 28248788 A JP28248788 A JP 28248788A JP H02129982 A JPH02129982 A JP H02129982A
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- frequency
- power supply
- electrodes
- laser device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003989 dielectric material Substances 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Laser Beam Processing (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の目的〕
（産業上の利用分野）
本発明は、可変周波数の高周波電源を用いたレーザ装置
に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a laser device using a variable frequency high-frequency power source.
（従来の技術）
レーザ装置の一つの型に、レーザガスを通す放電部を誘
電体で作り、その誘電体の外側に一対の電極を配置し、
その面電極の間に高周波電圧を印加することにより、レ
ーザ光を発生させるよう構成したものがある。(Prior art) In one type of laser device, a discharge section through which laser gas passes is made of a dielectric material, and a pair of electrodes are placed outside the dielectric material.
Some devices are configured to generate laser light by applying a high frequency voltage between the surface electrodes.
しかし、この従来のレーザ装置においては、放電部の一
対の電極の間に放電に必要な高周波電界を与えるために
使用される高周波電源は、周波数がぼり一定の値ｆ０と
なるような例えば他励式の高周波電源で、！ 、 ＝
１３．５６ＭＨｚ±２ｋＨｚの周波数範囲で使用されて
いた。However, in this conventional laser device, the high-frequency power source used to provide the high-frequency electric field necessary for discharge between a pair of electrodes in the discharge section is a separately excited type, for example, where the frequency increases to a constant value f0. With high frequency power supply! , =
It was used in the frequency range of 13.56MHz±2kHz.
（発明が解決しようとする課題）
一般にこの種のレーザ装置において、レーザ出力を得る
ためには、高周波電源から電極に周波数ｆ、の高周波電
圧を印加し、その高周波電界のもとに放電部を流れるレ
ーザガスを励起して放電を発生させることになる。(Problems to be Solved by the Invention) In general, in this type of laser device, in order to obtain laser output, a high frequency voltage of frequency f is applied from a high frequency power source to the electrode, and a discharge part is generated under the high frequency electric field. The flowing laser gas is excited to generate a discharge.
しかして、レーザ装置においては、放電入力と放電部の
放電抵抗とが第２図に示すような関係にあるため、放電
入力の変化とともに放電抵抗も変化する。したがって、
放電入力を増加していくと、放電抵抗の増加にともなっ
て放電部から電源への、反射波電力が増すために、電源
から放電部にわたる回路条件の整合が乱れて電源に悪影
響をおよぼす結果となる。In the laser device, the discharge input and the discharge resistance of the discharge section have a relationship as shown in FIG. 2, so the discharge resistance also changes as the discharge input changes. therefore,
As the discharge input increases, the reflected wave power from the discharge section to the power supply increases due to the increase in discharge resistance, which disturbs the matching of the circuit conditions from the power supply to the discharge section and adversely affects the power supply. Become.
本発明の目的は、あらゆる放電入力に対して回路条件の
整合を計ることにより、高周波電源に対する反射波電力
を抑制することのできるレーザ装置を提供することにあ
る。An object of the present invention is to provide a laser device that can suppress reflected wave power from a high frequency power source by matching circuit conditions for all discharge inputs.
（課題を解決するための手段）
本発明のレーザ装置は、レーザ物質が流通する放電部を
誘電体で作り、その放電部の外側に配置した一対の電極
間に高周波電圧を印加することによりレーザ光を発生さ
せるレーザ装置において、前記一対の電極間に可変周波
数の高周波電源を接続したことを特徴とするものである
。(Means for Solving the Problems) The laser device of the present invention has a discharge section through which a laser substance flows, which is made of a dielectric material, and a high-frequency voltage is applied between a pair of electrodes arranged outside the discharge section. The laser device for generating light is characterized in that a high frequency power source with a variable frequency is connected between the pair of electrodes.
（作 用）
本発明においては、放電入力が増加することによって放
電抵抗も増加し１周波数の増加によって放電抵抗が逓減
する関係を利用する。ある放電入力に対して可変高周波
電源の周波数を合わせることにより、一定の放電抵抗を
得ることができる。(Function) The present invention utilizes the relationship that as the discharge input increases, the discharge resistance also increases, and as the frequency increases by one frequency, the discharge resistance gradually decreases. By matching the frequency of the variable high-frequency power source to a certain discharge input, a constant discharge resistance can be obtained.
（実施例）
以下本発明を第１図に示す一実施例を参照して説明する
。第１図において５本発明のレーザ装置の放電部１を誘
電体で作り、この放電部１を紙面に直角にレーザガス２
が流通する。誘電体で作られた放電部１の上下に一対の
電極３ａ、 ３ｂを配置する。(Example) The present invention will be described below with reference to an example shown in FIG. In FIG. 1, a discharge section 1 of a laser device according to the present invention is made of a dielectric material, and a laser gas 2
is distributed. A pair of electrodes 3a and 3b are arranged above and below a discharge section 1 made of a dielectric material.
しかして、レーザ装置においては、電極３ａ、 ３ｂの
間に高周波電圧を印加し、放電部１を通るレーザガスを
励起してレーザ光を発することになるが、本発明におい
ては、その電極３ａ、 ３ｂに印加する電源として、自
励インバータのような周波数ｆが１１からｆ２まで可変
できる高周波電源４を用いたことを特徴とするものであ
る。衆知の如く自励インバータのような可変高周波電源
４は、その出力周波数を中心発振周波数ｆｌｌに対して
±１０％までの周波数に変えることは容易にできる。Thus, in a laser device, a high frequency voltage is applied between the electrodes 3a and 3b to excite the laser gas passing through the discharge section 1 and emit laser light, but in the present invention, the electrodes 3a and 3b are The present invention is characterized in that a high frequency power source 4 such as a self-excited inverter whose frequency f can be varied from 11 to f2 is used as a power source applied to the power source. As is well known, the variable high frequency power source 4, such as a self-excited inverter, can easily change its output frequency to a frequency up to ±10% with respect to the center oscillation frequency fll.
さて、レーザ装置における放電部１の電極３ａ。Now, the electrode 3a of the discharge section 1 in the laser device.
３ｂの間に印加する放電入力と放電抵抗とは、第２図に
示すように放電入力が増加するにしたがって、放電抵抗
も増加する関係を有するものである。−方電極３ａ、３
ｂに印加する放電入力の周波数と放電抵抗とは、第３図
に示すように周波数が増えるにしたがって放電抵抗が逓
減する関係を有するものである。The discharge input applied between 3b and the discharge resistance have a relationship such that as the discharge input increases, the discharge resistance also increases, as shown in FIG. - side electrodes 3a, 3
The frequency of the discharge input applied to b and the discharge resistance have a relationship such that the discharge resistance gradually decreases as the frequency increases, as shown in FIG.
したがって、レーザ装置の放電部１における第２図の特
性および第３図の特性に示す関係を利用し、例えば放電
入力を増加する場合、その増加分に見合って周波数を増
すことにより、放電抵抗が一定になるように整合をとる
ことが可能となる。Therefore, when increasing the discharge input by using the relationship shown in the characteristics shown in FIG. 2 and FIG. It becomes possible to achieve consistency so that it remains constant.
このように放電入力と周波数とを調整することにより、
放電部１から電源４への反射波電力を有効に抑制し得て
電源を保護することができる。By adjusting the discharge input and frequency in this way,
The reflected wave power from the discharge section 1 to the power source 4 can be effectively suppressed, and the power source can be protected.
以上のように本発明においては、放電部の電源に可変周
波数の高周波電源を用いたことにより、放電入力の変化
時にその変化分に応じて周波数を可変することによって
放電抵抗をはシ一定に維持することができ、放電部から
電源への反射波電力を抑制して電源を有効に保護するこ
とができる。As described above, in the present invention, by using a high frequency power source with a variable frequency as the power source of the discharge section, when the discharge input changes, the frequency is varied according to the change, thereby maintaining the discharge resistance constant. Therefore, the reflected wave power from the discharge section to the power source can be suppressed, and the power source can be effectively protected.
第１図は本発明のレーザ装置の放電部と電源との関係を
示す概略構成図、第２図および第３図はレーザ装置の放
電部における放電人力−放電抵抗および周波数−放電抵
抗の関係を示す特性図である。FIG. 1 is a schematic configuration diagram showing the relationship between the discharge section and the power supply of the laser device of the present invention, and FIGS. 2 and 3 show the relationships between the discharge force and the discharge resistance and the frequency and the discharge resistance in the discharge section of the laser device. FIG.
Claims (1)
部の外側に配置した一対の電極間に高周波電圧を印加す
ることによりレーザ光を発生させるレーザ装置において
、前記一対の電極間に可変周波数の高周波電源を接続し
たことを特徴とするレーザ装置。In a laser device in which a discharge part through which a laser substance flows is made of a dielectric material, and a laser beam is generated by applying a high frequency voltage between a pair of electrodes arranged outside the discharge part, a variable frequency voltage is applied between the pair of electrodes. A laser device characterized in that it is connected to a high frequency power source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63282487A JPH02129982A (en) | 1988-11-10 | 1988-11-10 | Laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63282487A JPH02129982A (en) | 1988-11-10 | 1988-11-10 | Laser device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02129982A true JPH02129982A (en) | 1990-05-18 |
Family
ID=17653079
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63282487A Pending JPH02129982A (en) | 1988-11-10 | 1988-11-10 | Laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02129982A (en) |
-
1988
- 1988-11-10 JP JP63282487A patent/JPH02129982A/en active Pending
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