JPH02127033U - - Google Patents
Info
- Publication number
- JPH02127033U JPH02127033U JP3438989U JP3438989U JPH02127033U JP H02127033 U JPH02127033 U JP H02127033U JP 3438989 U JP3438989 U JP 3438989U JP 3438989 U JP3438989 U JP 3438989U JP H02127033 U JPH02127033 U JP H02127033U
- Authority
- JP
- Japan
- Prior art keywords
- periphery
- work
- rotation
- workpiece
- guides
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Drying Of Solid Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989034389U JPH0749791Y2 (ja) | 1989-03-28 | 1989-03-28 | 枚葉式スピン乾燥装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989034389U JPH0749791Y2 (ja) | 1989-03-28 | 1989-03-28 | 枚葉式スピン乾燥装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02127033U true JPH02127033U (OSRAM) | 1990-10-19 |
| JPH0749791Y2 JPH0749791Y2 (ja) | 1995-11-13 |
Family
ID=31538817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989034389U Expired - Lifetime JPH0749791Y2 (ja) | 1989-03-28 | 1989-03-28 | 枚葉式スピン乾燥装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0749791Y2 (OSRAM) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5737837A (en) * | 1980-08-20 | 1982-03-02 | Toshiba Corp | Drying device for semiconductor wafer |
| JPS60163436A (ja) * | 1984-02-06 | 1985-08-26 | Seiichiro Sogo | 半導体材料の洗浄乾燥方法 |
| JPS63185029A (ja) * | 1987-01-28 | 1988-07-30 | Hitachi Ltd | ウエハ処理装置 |
-
1989
- 1989-03-28 JP JP1989034389U patent/JPH0749791Y2/ja not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5737837A (en) * | 1980-08-20 | 1982-03-02 | Toshiba Corp | Drying device for semiconductor wafer |
| JPS60163436A (ja) * | 1984-02-06 | 1985-08-26 | Seiichiro Sogo | 半導体材料の洗浄乾燥方法 |
| JPS63185029A (ja) * | 1987-01-28 | 1988-07-30 | Hitachi Ltd | ウエハ処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0749791Y2 (ja) | 1995-11-13 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |