JPH02127029U - - Google Patents

Info

Publication number
JPH02127029U
JPH02127029U JP3707089U JP3707089U JPH02127029U JP H02127029 U JPH02127029 U JP H02127029U JP 3707089 U JP3707089 U JP 3707089U JP 3707089 U JP3707089 U JP 3707089U JP H02127029 U JPH02127029 U JP H02127029U
Authority
JP
Japan
Prior art keywords
wafer table
power source
high frequency
frequency power
plasma etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3707089U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0741154Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989037070U priority Critical patent/JPH0741154Y2/ja
Publication of JPH02127029U publication Critical patent/JPH02127029U/ja
Application granted granted Critical
Publication of JPH0741154Y2 publication Critical patent/JPH0741154Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP1989037070U 1989-03-30 1989-03-30 プラズマエッチング用ウェハーテーブル Expired - Lifetime JPH0741154Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989037070U JPH0741154Y2 (ja) 1989-03-30 1989-03-30 プラズマエッチング用ウェハーテーブル

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989037070U JPH0741154Y2 (ja) 1989-03-30 1989-03-30 プラズマエッチング用ウェハーテーブル

Publications (2)

Publication Number Publication Date
JPH02127029U true JPH02127029U (de) 1990-10-19
JPH0741154Y2 JPH0741154Y2 (ja) 1995-09-20

Family

ID=31543852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989037070U Expired - Lifetime JPH0741154Y2 (ja) 1989-03-30 1989-03-30 プラズマエッチング用ウェハーテーブル

Country Status (1)

Country Link
JP (1) JPH0741154Y2 (de)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58206125A (ja) * 1982-05-26 1983-12-01 Hitachi Ltd プラズマ処理装置
JPS63177520A (ja) * 1987-01-19 1988-07-21 Matsushita Electric Ind Co Ltd ドライエッチング方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58206125A (ja) * 1982-05-26 1983-12-01 Hitachi Ltd プラズマ処理装置
JPS63177520A (ja) * 1987-01-19 1988-07-21 Matsushita Electric Ind Co Ltd ドライエッチング方法

Also Published As

Publication number Publication date
JPH0741154Y2 (ja) 1995-09-20

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term