JPH02115246U - - Google Patents
Info
- Publication number
- JPH02115246U JPH02115246U JP2496289U JP2496289U JPH02115246U JP H02115246 U JPH02115246 U JP H02115246U JP 2496289 U JP2496289 U JP 2496289U JP 2496289 U JP2496289 U JP 2496289U JP H02115246 U JPH02115246 U JP H02115246U
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- ion
- sample surface
- irradiation device
- scans
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 5
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2496289U JPH02115246U (zh) | 1989-03-03 | 1989-03-03 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2496289U JPH02115246U (zh) | 1989-03-03 | 1989-03-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02115246U true JPH02115246U (zh) | 1990-09-14 |
Family
ID=31245265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2496289U Pending JPH02115246U (zh) | 1989-03-03 | 1989-03-03 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02115246U (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000100748A (ja) * | 1998-09-24 | 2000-04-07 | Sony Corp | 半導体装置の製造方法 |
-
1989
- 1989-03-03 JP JP2496289U patent/JPH02115246U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000100748A (ja) * | 1998-09-24 | 2000-04-07 | Sony Corp | 半導体装置の製造方法 |
| JP4553076B2 (ja) * | 1998-09-24 | 2010-09-29 | ソニー株式会社 | 半導体装置の製造方法 |