JPH02108339U - - Google Patents

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Publication number
JPH02108339U
JPH02108339U JP1675289U JP1675289U JPH02108339U JP H02108339 U JPH02108339 U JP H02108339U JP 1675289 U JP1675289 U JP 1675289U JP 1675289 U JP1675289 U JP 1675289U JP H02108339 U JPH02108339 U JP H02108339U
Authority
JP
Japan
Prior art keywords
attached
boss part
rotating shaft
ring plate
wafers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1675289U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1675289U priority Critical patent/JPH02108339U/ja
Publication of JPH02108339U publication Critical patent/JPH02108339U/ja
Pending legal-status Critical Current

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Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、この考案の一実施例に係るウエーハ
デイスクを示す平面図である。第2図は、第1図
の線−に沿う拡大断面図である。第3図は、
従来のウエーハデイスクの一例を示す概略断面図
である。 4……ウエーハ、12……実施例に係るウエー
ハデイスク、16……回転軸、18……ボス部、
22……リングプレート部。
FIG. 1 is a plan view showing a wafer disk according to an embodiment of this invention. FIG. 2 is an enlarged sectional view taken along line - in FIG. 1. Figure 3 shows
1 is a schematic cross-sectional view showing an example of a conventional wafer disk. 4... Wafer, 12... Wafer disk according to the embodiment, 16... Rotating shaft, 18... Boss portion,
22...Ring plate section.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 円板状をしていて回転軸に結合されるボス部と
、このボス部の周縁部に同心状にかつ着脱可能に
取り付けられていて、表面に複数枚のウエーハを
装着可能なリングプレート部とを備えて成ること
を特徴とするウエーハデイスク。
A boss part having a disk shape and connected to a rotating shaft; a ring plate part which is attached concentrically and removably to the periphery of the boss part, and on which a plurality of wafers can be attached. A wafer disk characterized by comprising:
JP1675289U 1989-02-14 1989-02-14 Pending JPH02108339U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1675289U JPH02108339U (en) 1989-02-14 1989-02-14

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1675289U JPH02108339U (en) 1989-02-14 1989-02-14

Publications (1)

Publication Number Publication Date
JPH02108339U true JPH02108339U (en) 1990-08-29

Family

ID=31229951

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1675289U Pending JPH02108339U (en) 1989-02-14 1989-02-14

Country Status (1)

Country Link
JP (1) JPH02108339U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006178471A (en) * 2004-12-23 2006-07-06 Asml Netherlands Bv Lithographic apparatus and device manufacturing method utilizing multiple substrate carrier for flat panel display substrate
JP2011507266A (en) * 2007-12-12 2011-03-03 ビーコ・インストゥルメンツ・インコーポレイテッド Wafer carrier with hub
KR101300118B1 (en) * 2010-12-15 2013-08-26 엘아이지에이디피 주식회사 Susceptor and chemical vapor deposition apparatus having the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006178471A (en) * 2004-12-23 2006-07-06 Asml Netherlands Bv Lithographic apparatus and device manufacturing method utilizing multiple substrate carrier for flat panel display substrate
JP4496165B2 (en) * 2004-12-23 2010-07-07 エーエスエムエル ネザーランズ ビー.ブイ. Lithographic apparatus and device manufacturing method using a plurality of substrate carriers for flat panel display substrates
JP2011507266A (en) * 2007-12-12 2011-03-03 ビーコ・インストゥルメンツ・インコーポレイテッド Wafer carrier with hub
KR101300118B1 (en) * 2010-12-15 2013-08-26 엘아이지에이디피 주식회사 Susceptor and chemical vapor deposition apparatus having the same

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