JPH0210361B2 - - Google Patents
Info
- Publication number
- JPH0210361B2 JPH0210361B2 JP63146013A JP14601388A JPH0210361B2 JP H0210361 B2 JPH0210361 B2 JP H0210361B2 JP 63146013 A JP63146013 A JP 63146013A JP 14601388 A JP14601388 A JP 14601388A JP H0210361 B2 JPH0210361 B2 JP H0210361B2
- Authority
- JP
- Japan
- Prior art keywords
- objective lens
- irradiation
- onto
- optical system
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 67
- 238000001514 detection method Methods 0.000 claims description 28
- 230000004907 flux Effects 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 4
- 238000005286 illumination Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63146013A JPS6446606A (en) | 1988-06-14 | 1988-06-14 | Horizontal position detecting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63146013A JPS6446606A (en) | 1988-06-14 | 1988-06-14 | Horizontal position detecting device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6446606A JPS6446606A (en) | 1989-02-21 |
| JPH0210361B2 true JPH0210361B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-03-07 |
Family
ID=15398121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63146013A Granted JPS6446606A (en) | 1988-06-14 | 1988-06-14 | Horizontal position detecting device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6446606A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5184926A (en) * | 1990-11-05 | 1993-02-09 | Megatool, Inc. | Root-strength drill bit and method of making |
-
1988
- 1988-06-14 JP JP63146013A patent/JPS6446606A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6446606A (en) | 1989-02-21 |