JPH0198164U - - Google Patents

Info

Publication number
JPH0198164U
JPH0198164U JP19248587U JP19248587U JPH0198164U JP H0198164 U JPH0198164 U JP H0198164U JP 19248587 U JP19248587 U JP 19248587U JP 19248587 U JP19248587 U JP 19248587U JP H0198164 U JPH0198164 U JP H0198164U
Authority
JP
Japan
Prior art keywords
target
sputtering
reactive
magnetron cathode
reactive gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19248587U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0527490Y2 (enrdf_load_html_response
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987192485U priority Critical patent/JPH0527490Y2/ja
Publication of JPH0198164U publication Critical patent/JPH0198164U/ja
Application granted granted Critical
Publication of JPH0527490Y2 publication Critical patent/JPH0527490Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
JP1987192485U 1987-12-17 1987-12-17 Expired - Lifetime JPH0527490Y2 (enrdf_load_html_response)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987192485U JPH0527490Y2 (enrdf_load_html_response) 1987-12-17 1987-12-17

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987192485U JPH0527490Y2 (enrdf_load_html_response) 1987-12-17 1987-12-17

Publications (2)

Publication Number Publication Date
JPH0198164U true JPH0198164U (enrdf_load_html_response) 1989-06-30
JPH0527490Y2 JPH0527490Y2 (enrdf_load_html_response) 1993-07-13

Family

ID=31483342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987192485U Expired - Lifetime JPH0527490Y2 (enrdf_load_html_response) 1987-12-17 1987-12-17

Country Status (1)

Country Link
JP (1) JPH0527490Y2 (enrdf_load_html_response)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53114787A (en) * 1977-03-18 1978-10-06 Ulvac Corp Target for high profitable sputtering apparatus
JPS58110673A (ja) * 1981-12-23 1983-07-01 Hitachi Ltd 反応性スパツタリング装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53114787A (en) * 1977-03-18 1978-10-06 Ulvac Corp Target for high profitable sputtering apparatus
JPS58110673A (ja) * 1981-12-23 1983-07-01 Hitachi Ltd 反応性スパツタリング装置

Also Published As

Publication number Publication date
JPH0527490Y2 (enrdf_load_html_response) 1993-07-13

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