JPH0165129U - - Google Patents

Info

Publication number
JPH0165129U
JPH0165129U JP1987160231U JP16023187U JPH0165129U JP H0165129 U JPH0165129 U JP H0165129U JP 1987160231 U JP1987160231 U JP 1987160231U JP 16023187 U JP16023187 U JP 16023187U JP H0165129 U JPH0165129 U JP H0165129U
Authority
JP
Japan
Prior art keywords
thin film
reaction tank
window plate
raw material
material gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1987160231U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0638420Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987160231U priority Critical patent/JPH0638420Y2/ja
Publication of JPH0165129U publication Critical patent/JPH0165129U/ja
Application granted granted Critical
Publication of JPH0638420Y2 publication Critical patent/JPH0638420Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP1987160231U 1987-10-20 1987-10-20 薄膜形成装置 Expired - Lifetime JPH0638420Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987160231U JPH0638420Y2 (ja) 1987-10-20 1987-10-20 薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987160231U JPH0638420Y2 (ja) 1987-10-20 1987-10-20 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPH0165129U true JPH0165129U (enrdf_load_stackoverflow) 1989-04-26
JPH0638420Y2 JPH0638420Y2 (ja) 1994-10-05

Family

ID=31442116

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987160231U Expired - Lifetime JPH0638420Y2 (ja) 1987-10-20 1987-10-20 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPH0638420Y2 (enrdf_load_stackoverflow)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60152023A (ja) * 1984-01-20 1985-08-10 Hitachi Ltd 光ｃｖｄ装置
JPS6237918U (enrdf_load_stackoverflow) * 1985-08-26 1987-03-06

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60152023A (ja) * 1984-01-20 1985-08-10 Hitachi Ltd 光ｃｖｄ装置
JPS6237918U (enrdf_load_stackoverflow) * 1985-08-26 1987-03-06

Also Published As

Publication number Publication date
JPH0638420Y2 (ja) 1994-10-05

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