JPH0153897B2 - - Google Patents
Info
- Publication number
- JPH0153897B2 JPH0153897B2 JP19608882A JP19608882A JPH0153897B2 JP H0153897 B2 JPH0153897 B2 JP H0153897B2 JP 19608882 A JP19608882 A JP 19608882A JP 19608882 A JP19608882 A JP 19608882A JP H0153897 B2 JPH0153897 B2 JP H0153897B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- reaction chamber
- glass tube
- introduction port
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 29
- 238000012545 processing Methods 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 12
- 238000002347 injection Methods 0.000 claims description 11
- 239000007924 injection Substances 0.000 claims description 11
- 239000010453 quartz Substances 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000009832 plasma treatment Methods 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 238000002474 experimental method Methods 0.000 description 9
- 239000004743 Polypropylene Substances 0.000 description 8
- 229920001155 polypropylene Polymers 0.000 description 8
- 239000007789 gas Substances 0.000 description 6
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000004698 Polyethylene Substances 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000010422 painting Methods 0.000 description 3
- 230000036470 plasma concentration Effects 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- -1 polypropylene Polymers 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19608882A JPS5986630A (ja) | 1982-11-10 | 1982-11-10 | プラズマ処理を施す方法および装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19608882A JPS5986630A (ja) | 1982-11-10 | 1982-11-10 | プラズマ処理を施す方法および装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5986630A JPS5986630A (ja) | 1984-05-18 |
| JPH0153897B2 true JPH0153897B2 (de) | 1989-11-16 |
Family
ID=16352004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19608882A Granted JPS5986630A (ja) | 1982-11-10 | 1982-11-10 | プラズマ処理を施す方法および装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5986630A (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61120835A (ja) * | 1984-11-19 | 1986-06-07 | Ulvac Corp | マイクロ波プラズマ処理装置 |
-
1982
- 1982-11-10 JP JP19608882A patent/JPS5986630A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5986630A (ja) | 1984-05-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6396214B1 (en) | Device for producing a free cold plasma jet | |
| JPH02138478A (ja) | 被膜を製造するためのｃｖｄコーティング法及びそれを実施するための装置 | |
| DE50015635D1 (en) | Bstraten | |
| BR112019005796B1 (pt) | Dispositivo de revestimento por polimerização de plasma | |
| US20130209703A1 (en) | Hollow-cathode gas lance for the interior coating of containers | |
| AU603397B2 (en) | Apparatus and method for plasma treatment of resin material | |
| US4595570A (en) | Apparatus and method for plasma treatment of resin material | |
| JPH0153897B2 (de) | ||
| KR100457455B1 (ko) | 박막 증착 속도를 조절하는 샤워헤드를 구비한 화학 기상증착 장치. | |
| JPH024976A (ja) | 薄膜形成方法 | |
| EP0152511B1 (de) | Vorrichtung und Verfahren zur Plasmabehandlung von Kunstharz | |
| EP0326191A2 (de) | Vorrichtung und Verfahren zur Plasmabearbeitung von Kunstharzmaterialien | |
| JPH033700B2 (de) | ||
| JPS629302Y2 (de) | ||
| JPH0496B2 (de) | ||
| JPS5986633A (ja) | プラズマ処理を施す方法および装置 | |
| KR200169696Y1 (ko) | 반도체 건식각장비의 전극조립체용 상부전극 | |
| JPS59189129A (ja) | プラズマ分岐処理方法 | |
| JPH11505570A (ja) | 両面基質にプラズマ付着を行う方法および装置 | |
| JP2798225B2 (ja) | 高周波プラズマｃｖｄ装置 | |
| JP3574256B2 (ja) | 加硫金型の清浄方法 | |
| JP3815580B2 (ja) | プラズマ処理装置 | |
| JP3727705B2 (ja) | マイクロ波プラズマ発生装置 | |
| JPS59189131A (ja) | プラズマ処理装置 | |
| KR100236099B1 (ko) | 반도체 식각장치 |