JPH0148650B2 - - Google Patents

Info

Publication number
JPH0148650B2
JPH0148650B2 JP58151024A JP15102483A JPH0148650B2 JP H0148650 B2 JPH0148650 B2 JP H0148650B2 JP 58151024 A JP58151024 A JP 58151024A JP 15102483 A JP15102483 A JP 15102483A JP H0148650 B2 JPH0148650 B2 JP H0148650B2
Authority
JP
Japan
Prior art keywords
mark
alignment
partial
marks
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58151024A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6042763A (ja
Inventor
Naoki Ayada
Tadashi Konuki
Masao Kosugi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58151024A priority Critical patent/JPS6042763A/ja
Priority to GB08418927A priority patent/GB2146427B/en
Priority to DE19843428225 priority patent/DE3428225A1/de
Publication of JPS6042763A publication Critical patent/JPS6042763A/ja
Priority to US07/008,134 priority patent/US4719357A/en
Publication of JPH0148650B2 publication Critical patent/JPH0148650B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58151024A 1983-08-01 1983-08-18 アライメント装置と方法 Granted JPS6042763A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58151024A JPS6042763A (ja) 1983-08-18 1983-08-18 アライメント装置と方法
GB08418927A GB2146427B (en) 1983-08-01 1984-07-25 Semiconductor manufacture
DE19843428225 DE3428225A1 (de) 1983-08-01 1984-07-31 Geraet zur herstellung von halbleiterschaltungen
US07/008,134 US4719357A (en) 1983-08-01 1987-01-22 Semiconductor circuit manufacturing apparatus having selectively operable detectors for effecting automatic alignment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58151024A JPS6042763A (ja) 1983-08-18 1983-08-18 アライメント装置と方法

Publications (2)

Publication Number Publication Date
JPS6042763A JPS6042763A (ja) 1985-03-07
JPH0148650B2 true JPH0148650B2 (enExample) 1989-10-20

Family

ID=15509631

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58151024A Granted JPS6042763A (ja) 1983-08-01 1983-08-18 アライメント装置と方法

Country Status (1)

Country Link
JP (1) JPS6042763A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115668067A (zh) 2020-05-19 2023-01-31 Asml控股股份有限公司 基于局部对准标记变形来产生对准信号

Also Published As

Publication number Publication date
JPS6042763A (ja) 1985-03-07

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