JPH0146587B2 - - Google Patents
Info
- Publication number
- JPH0146587B2 JPH0146587B2 JP11152780A JP11152780A JPH0146587B2 JP H0146587 B2 JPH0146587 B2 JP H0146587B2 JP 11152780 A JP11152780 A JP 11152780A JP 11152780 A JP11152780 A JP 11152780A JP H0146587 B2 JPH0146587 B2 JP H0146587B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- evaporation source
- alloy
- evaporation
- current value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000008020 evaporation Effects 0.000 claims description 34
- 238000001704 evaporation Methods 0.000 claims description 34
- 229910045601 alloy Inorganic materials 0.000 claims description 19
- 239000000956 alloy Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 19
- 239000000523 sample Substances 0.000 claims description 16
- 150000001875 compounds Chemical class 0.000 claims description 11
- 238000007733 ion plating Methods 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 description 17
- 238000010894 electron beam technology Methods 0.000 description 8
- 229910010977 Ti—Pd Inorganic materials 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- -1 resistors Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11152780A JPS5739170A (en) | 1980-08-14 | 1980-08-14 | Method for forming film of alloy or compound |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11152780A JPS5739170A (en) | 1980-08-14 | 1980-08-14 | Method for forming film of alloy or compound |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5739170A JPS5739170A (en) | 1982-03-04 |
| JPH0146587B2 true JPH0146587B2 (en:Method) | 1989-10-09 |
Family
ID=14563588
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11152780A Granted JPS5739170A (en) | 1980-08-14 | 1980-08-14 | Method for forming film of alloy or compound |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5739170A (en:Method) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10609425B1 (en) * | 1981-11-03 | 2020-03-31 | Personalized Media Communications, L.L.C. | Signal processing apparatus and methods |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8404173D0 (en) * | 1984-02-17 | 1984-03-21 | Ti Group Services Ltd | Controlling current density |
| JP2009041098A (ja) * | 2007-08-11 | 2009-02-26 | Sumitomo Electric Ind Ltd | 成膜方法 |
-
1980
- 1980-08-14 JP JP11152780A patent/JPS5739170A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10609425B1 (en) * | 1981-11-03 | 2020-03-31 | Personalized Media Communications, L.L.C. | Signal processing apparatus and methods |
| USRE48633E1 (en) * | 1981-11-03 | 2021-07-06 | Personalized Media Communications LLC | Reprogramming of a programmable device of a specific version |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5739170A (en) | 1982-03-04 |
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