JPH0145067Y2 - - Google Patents

Info

Publication number
JPH0145067Y2
JPH0145067Y2 JP10679585U JP10679585U JPH0145067Y2 JP H0145067 Y2 JPH0145067 Y2 JP H0145067Y2 JP 10679585 U JP10679585 U JP 10679585U JP 10679585 U JP10679585 U JP 10679585U JP H0145067 Y2 JPH0145067 Y2 JP H0145067Y2
Authority
JP
Japan
Prior art keywords
plasma
electrode
hcd
flow rate
hollow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10679585U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6215758U (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10679585U priority Critical patent/JPH0145067Y2/ja
Publication of JPS6215758U publication Critical patent/JPS6215758U/ja
Application granted granted Critical
Publication of JPH0145067Y2 publication Critical patent/JPH0145067Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
JP10679585U 1985-07-12 1985-07-12 Expired JPH0145067Y2 (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10679585U JPH0145067Y2 (enExample) 1985-07-12 1985-07-12

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10679585U JPH0145067Y2 (enExample) 1985-07-12 1985-07-12

Publications (2)

Publication Number Publication Date
JPS6215758U JPS6215758U (enExample) 1987-01-30
JPH0145067Y2 true JPH0145067Y2 (enExample) 1989-12-26

Family

ID=30982484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10679585U Expired JPH0145067Y2 (enExample) 1985-07-12 1985-07-12

Country Status (1)

Country Link
JP (1) JPH0145067Y2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4784977B2 (ja) * 2005-09-29 2011-10-05 国立大学法人名古屋大学 ラジカル発生装置

Also Published As

Publication number Publication date
JPS6215758U (enExample) 1987-01-30

Similar Documents

Publication Publication Date Title
US3516919A (en) Apparatus for the sputtering of materials
US6259210B1 (en) Power control apparatus for an ION source having an indirectly heated cathode
CN102046837A (zh) 溅射装置
JPH04264346A (ja) イオン注入用のプラズマソース装置
JPS6348730A (ja) イオン発生装置
EP0523695A1 (en) A sputtering apparatus and an ion source
JP3550831B2 (ja) 粒子線照射装置
JPH06176725A (ja) イオン源
JPH0145067Y2 (enExample)
JPH03134937A (ja) イオン源
JPH0129296B2 (enExample)
US3801719A (en) Emitter block assembly
Hakamata et al. Bucket type ion source using a microwave plasma cathode
JPS62224686A (ja) イオン源
RU1144548C (ru) Источник ионов
JPH024979B2 (enExample)
EP0995215A1 (en) Power control apparatus for an ion source having an indirectly heated cathode
Dudnikov et al. Surface plasma source to generate high‐brightness H− beams for ion projection lithographya
KR101954541B1 (ko) 자기장 최적화를 위한 이온원 장치
JP2620474B2 (ja) イオンプレーティング装置
JP2822249B2 (ja) イオン源
JPH0228597Y2 (enExample)
SU1145383A1 (ru) Источник ионов
CN118166316A (zh) 用于同位素核靶高效制备的重离子溅射装置
JPH03257748A (ja) イオン生成方法